• Title/Summary/Keyword: $TiO_2/TiOF_2$

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Thickness Dependence of Orientation, Longitudinal Piezoelectric and Electrical Properties of PZT Films Deposited by Using Sol-gel Method (솔젤법에 의해 제조한 PZT(52/48) 막의 두께에 따른 우선배향성의 변화 및 이에 따른 압전 및 전기적 물성의 변화 평가)

  • Lee, Jeong-Hoon;Kim, Tae-Song;Yoon, Ki-Hyun
    • Journal of the Korean Ceramic Society
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    • v.38 no.10
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    • pp.942-947
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    • 2001
  • Thickness dependence of orientation on piezoelectric and electrical properties was investigated by PZT (52/48) films by diol based sol-gel method. The thickness of each layer by spinning at one time was $0.2{\mu}m$ and crack-free films could be successfully deposited on 4 inches Pt/Ti/$SiO_2$/Si substrates by 0.5 mol solutions in the range from $0.2{\mu}m$ to $3.8{\mu}m$. Excellent P-E hysteresis curves were achieved, which were attributed to the well-densified PZT films and columnar grain without pores or any defects between interlayers. The (111) preferred orientation of films were shown in the range of thickness below $1{\mu}m$. As the thickness increased, the (111) preferred orientation disappeared from $1{\mu}m$ to $3{\mu}m$ region, and the orientation of films became random above $3{\mu}m$. Dielectric constants and longitudinal piezoelectric coefficient, $d_{33}$, measured by pneumatic method were saturated around the value of about 1400 and 300 pC/N respectively above the thickness of $1{\mu}m$.

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Sensitivity Measurement of the Piezoelectric Paint Sensor according to the Poling Electric Field (분극 전계에 따른 압전 페인트 센서 감도 측정)

  • Han, Dae-Hyun;Park, Seung-Bok;Kang, Lae-Hyong
    • Composites Research
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    • v.27 no.4
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    • pp.146-151
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    • 2014
  • In this study, the experimental study has been performed by varying the polarization of the electric field and impact force to check the piezoelectric characteristics of piezoelectric paint sensor. Piezoelectric paint sensor used in this study is composed of epoxy resin with a hardener and PNN-PZT powder in 1:1 weight ratio. The dimensions of the paint sensor specimen are $40{\times}40{\times}1mm^3$ and regular specimens were made using a mold. The voids are removed from the specimen in the vacuum desiccator. Both upper side and bottom side of the paint sensor were coated with silver paste for making an electrode and then dried at room temperature for a day. The poling treatment has been carried out under controlled conditions of the electric field in order to check the effect of piezoelectric sensitivities, while the poling temperature was fixed at room temperature and the poling time was set to 30 min. The piezoelectric sensitivities have been measured by comparing output voltage from paint sensor with output force from impact hammer when the impact hammer hits the paint sensor. In result, the effect of the electric field has been evaluated for the sensitivity and describe the result.

Degradation from Polishing Damage in Ferroelectric Characteristics of BLT Capacitor Fabricated by Chemical Mechanical Polishing Process (화학적기계적연마 공정으로 제조한 BLT Capacitor의 Polishing Damage에 의한 강유전 특성 열화)

  • Na, Han-Yong;Park, Ju-Sun;Jung, Pan-Gum;Ko, Pil-Ju;Kim, Nam-Hoon;Lee, Woo-Sun
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2008.06a
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    • pp.236-236
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    • 2008
  • (Bi,La)$Ti_3O_{12}$(BLT) thin film is one of the most attractive materials for ferroelectric random access memory (FRAM) applications due to its some excellent properties such as high fatigue endurance, low processing temperature, and large remanent polarization [1-2]. The authors firstly investigated and reported the damascene process of chemical mechanical polishing (CMP) for BLT thin film capacitor on behalf of plasma etching process for fabrication of FRAM [3]. CMP process could prepare the BLT capacitors with the superior process efficiency to the plasma etching process without the well-known problems such as plasma damages and sloped sidewall, which was enough to apply to the fabrication of FRAM [2]. BLT-CMP characteristics showed the typical oxide-CMP characteristics which were related in both pressure and velocity according to Preston's equation and Hernandez's power law [2-4]. Good surface roughness was also obtained for the densification of multilevel memory structure by CMP process [3]. The well prepared BLT capacitors fabricated by CMP process should have the sufficient ferroelectric properties for FRAM; therefore, in this study the electrical properties of the BLT capacitor fabricated by CMP process were analyzed with the process parameters. Especially, the effects of CMP pressure, which had mainly affected the removal rate of BLT thin films [2], on the electrical properties were investigated. In order to check the influences of the pressure in eMP process on the ferroelectric properties of BLT thin films, the electrical test of the BLT capacitors was performed. The polarization-voltage (P-V) characteristics show a decreased the remanent polarization (Pr) value when CMP process was performed with the high pressure. The shape of the hysteresis loop is close to typical loop of BLT thin films in case of the specimen after CMP process with the pressures of 4.9 kPa; however, the shape of the hysteresis loop is not saturated due to high leakage current caused by structural and/or chemical damages in case of the specimen after CMP process with the pressures of 29.4 kPa. The leakage current density obtained with positive bias is one order lower than that with negative bias in case of 29.4 kPa, which was one or two order higher than in case of 4.9 kPa. The high pressure condition was not suitable for the damascene process of BLT thin films due to the defects in electrical properties although the better efficiency of process. by higher removal rate of BLT thin films was obtained with the high pressure of 29.4 kPa in the previous study [2].

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Effects of hydrogen and ammonia partial pressure on MOCVD $Co/TaN_x$ layer for Cu direct electroplating

  • Park, Jae-Hyeong;Mun, Dae-Yong;Han, Dong-Seok;Yun, Don-Gyu;Park, Jong-Wan
    • Proceedings of the Materials Research Society of Korea Conference
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    • 2012.05a
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    • pp.84-84
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    • 2012
  • 소자가 고집적화 됨에 따라, 비저항이 낮고 electro migration (EM), Stress Migration (SM) 특성이 우수한 구리(Cu)를 배선재료로서 사용하고 있다. 그러나, 구리는 Si과 $SiO_2$의 내부로 확산이 빠르게 일어나, Si 소자 내부에 deep donor level을 형성하고, 누설 전류를 증가시키는 등 소자의 성능을 저하시킬 수 있는 문제점을 가지고 있다. 그러나, electroplating 을 이용하여 증착한 Cu 박막은 일반적으로 확산 방지막으로 쓰이는 TiN, TaN, 등의 물질과의 접착 (adhesion) 특성이 나쁘다. 따라서, Cu CMP 에서 증착된 Cu 박막의 벗겨지거나(peeling), EM or SM 저항성 저하 등의 배선에서의 reliability 문제를 야기하게된다. 따라서 Cu 와 접착 특성이 좋은 새로운 확산방지막 또는 adhesion layer의 필요성이 대두되고 있다. 본 연구에서는 이러한 Cu 배선에서의 접착성 문제를 해결하고자 Metal organic chemical vapor deposition (MOCVD)을 이용하여 제조한 코발트(Co) 박막을 $Cu/TaN_x$ 사이의 접착력 개선을 위한 adhesion layer로 적용하려는 시도를 하였다. Co는 비저항이 낮고, Cu 와 adhesion이 좋으며, Cu direct electroplating 이 가능하다는 장점을 가지고 있다. 하지만, 수소 분위기에서 $C_{12}H_{10}O_6(Co)_2$ (dicobalt hexacarbonyl tert-butylacetylene, CCTBA) 전구체에 의한 MOCVD Co 박막의 경우 탄소, 산소와 같은 불순물이 다량 함유되어 있어, 비저항, surface roughness 가 높아지게 된다. 따라서 구리 전착 초기에 구리의 핵 생성(nucleation)을 저해하고 핵 생성 후에도 응집(agglomeration)이 발생하여 연속적이고 얇은 구리막 형성을 방해한다. 이를 해결하기 위해, MOCVD Co 박막 증착 시 수소 반응 가스에 암모니아를 추가로 주입하여, 수소/암모니아의 분압을 1:1, 1:6, 1:10으로 변화시켜 $Co/TaN_x$ 박막의 특성을 비교 분석하였다. 각각의 수소/암모니아 분압에 따른 $Co/TaN_x$ 박막을 TEM (Transmission electron microscopy), XRD (X-ray diffraction), AES (Auger electron spectroscopy)를 통해 물성 및 조성을 분석하였고, AFM (Atomic force microscopy)를 이용하여, surface roughness를 측정하였다. 실험 결과, $Co/TaN_x$ 박막은 수소/암모니아 분압 1:6에서 90 ${\mu}{\Omega}-cm$의 낮은 비저항과 0.97 nm 의 낮은 surface roughness 를 가졌다. 뿐만 아니라, MOCVD 에 의해 증착된 Co 박막이4-6 % concentration 의 탄소 및 산소 함량을 가지는 것으로 나타났고, 24nm 크기의 trench 기판 위에 약 6nm의 $Co/TaN_x$ 박막이 매우 균일하게 형성된 것을 확인 할 수 있었다. 이러한 결과들은, 향후 $Co/TaN_x$ 박막이 Cu direct electroplating 공정이 가능한 diffusion barrier로서 성공적으로 사용될 수 있음을 보여준다.

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A Study of the Chemical Composition of Korean Traditional Ceramics (III): Comparison of Punch'$\breve{o}$ng with Kory$\breve{o}$ Ware and Chos$\breve{o}$n Whiteware (한국 전통 도자기의 화학 조성에 대한 연구 (III): 분청에 대한 고려자기와 조선백자와의 비교)

  • KohChoo, Carolyn Kyong-Shin;Choo, Woong-Kil;Ahn, Sang-Doo;Lee, Young-Eun;Kim, Gyu-Ho;Lee, Yeon-Sook
    • Journal of Conservation Science
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    • v.27 no.1
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    • pp.75-90
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    • 2011
  • At the beginning of the Chos$\breve{o}$n dynasty, punch'$\breve{o}$ng began as a simplified form of inlaid celadon, and in the two following centuries it developed into a popular folk craft in various styles and expressive decorations; overtime, it was increasingly made to resemble whiteware, and its production stopped after the Japanese invasion of Korea. In the present study, the body and glaze compositions of punch'$\breve{o}$ng were examined and compared with those of celadon and whiteware, whose compositions have previously been compared with those of Chinese ceramics. Here, the analyzed shards were organized into 28 groups based on their production sites and archaeological characteristics. For each group, the body and glaze compositions of several shards(usually three to five) were obtained, averaged, and compared with those of the other groups. These comparisons showed that the majority of the punch'$\breve{o}$ng bodies were formed, like those of celadon and whiteware, with mica-quartz porcelain stone, which was commonly used in Yuezhou, Jingdezhen, and other southern Chinese kilns. The glazes consisted of clay materials and flux components made from various proportions of wood ash, burnt limestone (glaze ash) and crushed limestone. Overall, the punch'$\breve{o}$ng glazes resembled the Kory$\breve{o}$ celadon and Kory$\breve{o}$ whiteware glazes more closely than the Chos$\breve{o}$n white wareglazes. However, the $TiO_2$ levels found in the tested punch'$\breve{o}$ng were low, similar to those of Chos$\breve{o}$n whiteware; this indicated that glaze stone was used as the clay component of the punch'$\breve{o}$ng glazes, as was the case for Chos$\breve{o}$n whiteware. This study of the material characteristics of punch'$\breve{o}$ng may be used as a comparative framework for analyzing ceramic shards discovered at current and future excavations within Korea.

Environmental Geophysical Survey of Abandoned Landfills for Contamination Evaluation: A Case Study (불량 매립지 오염평가를 위한 지구물리 탐사 사례연구)

  • Lee, Sung-Soon;Lee, Jin-Yong;Yoon, Hee-Sung;Lee, Kang-Kun;Kim, Chang-Gyun;Yu, Young-Chul
    • Journal of Korean Society of Environmental Engineers
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    • v.28 no.5
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    • pp.463-471
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    • 2006
  • Electrical resistivity surveys were conducted at areas of abandoned landfills in Cheonan and Wonju. Geology and extent of leachate migration around the landfills were evaluated with collected resistivity data by 2-D and 3-D resistivity inverse modeling. The Cheonan landfill is located above the paddy fields and the resistivity survey lines were crossed to examine possible pollution at the paddy fields by leakage of the landfill leachate. In Wonju, the landfill and the downgradient paddy fields are divided by a concrete barrier wall. At the bottom of the landfill, there is a leachate settlement system, which has not been in operation. To evaluate leachate leakage into the paddy fields, a total of 4 survey lines were used. According to the resistivity survey results, the landfill leachate in Cheonan appeared to be restricted only within the interior of the landfill, not to migrate into the subsurface of the paddy fields. These results are well consistent with electrical conductivity values of groundwaters obtained from a periodic analysis of water qualities. In Wonju, however, it was inferred that the leachate emanating from the landfill migrated beneath the abandoned leachate settlement system and the leachate would reach the downgradient paddy fields. Low resistivity area was observed in the old reservoir area and it appeared to be derived from convergence of groundwater flows from the surrounding valley and the moist wet land. In addition, groundwater flow into the paddy fields occurs beneath the old reservoir embankment at depths of $7{\sim}8m$. This paper reports details of the resistivity surveys for the uncontrolled landfills.

Interfacial reaction and Fermi level movements of p-type GaN covered by thin Pd/Ni and Ni/Pd films

  • 김종호;김종훈;강희재;김차연;임철준;서재명
    • Proceedings of the Korean Vacuum Society Conference
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    • 1999.07a
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    • pp.115-115
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    • 1999
  • GaN는 직접천이형 wide band gap(3.4eV) 반도체로서 청색/자외선 발광소자 및 고출력 전자장비등에의 응용성 때문에 폭넓게 연구되고 있다. 이러한 넓은 분야의 응용을 위해서는 열 적으로 안정된 Ohmic contact을 반드시 실현되어야 한다. n-type GaN의 경우에는 GaN계면에서의 N vacancy가 n-type carrier로 작용하기 때문에 Ti, Al, 같은 금속을 접합하여 nitride를 형성함에 의해서 낮은 접촉저항을 갖는 Ohmic contact을 하기가 쉽다. 그러나 p-type의 경우에는 일 함수가 크고 n-type와 다르게 nitride가 형성되지 않는 금속이 Ohmic contact을 할 가능성이 많다. 시료는 HF(HF:H2O=1:1)에서 10분간 초음파 세척을 한 후 깨끗한 물에 충분히 헹구었다. 그런 후에 고순도 Ar 가스로 건조시켰다. Pd와 Ni은 열적 증착법(thermal evaporation)을 사용하여 p-GaN에 상온에서 증착하였다. 현 연구에서는 열처리에 의한 Pd의 clustering을 줄이기 위해서 wetting이 좋은 Ni을 Pd 증착 전과 후에 삽입하였으며, monchromatic XPS(x-ray photoelectron spectroscopy) 와 SAM(scanning Auger microscopy)을 사용하여 열처리 전과 40$0^{\circ}C$, 52$0^{\circ}C$ 그리고 695$0^{\circ}C$에서 3분간 열처리 후의 온도에 따른 morphology 변화, 계면반응(interfacial reaction) 및 벤드 휨(band bending)을 비교 연구하였다. Nls core level peak를 사용한 band bending에서 Schottky barrier height는 Pd/Ni bi-layer 접합시 2.1eV를, Ni/Pd bi-layer의 경우에 2.01eV를 얻었으며, 이는 Pd와 Ni의 이상적인 Schottky barrier height 값 2.38eV, 2.35eV와 비교해 볼 때 매우 유사한 값임을 알 수 있다. 시료를 후열처리함에 의해 52$0^{\circ}C$까지는 barrier height는 큰 변화가 없으나, $650^{\circ}C$에서 3분 열처리 후에 0.36eV, 0.28eV 만큼 band가 더 ?을 알 수 있었다. Pd/Ni 및 Ni/Pd 접합시 $650^{\circ}C$까지 후 열 처리 과정에서 계면에서 matallic Ga은 온도에 비례하여 많은 양이 형성되어 표면으로 편석(segregation)되어지나, In-situ SAM을 이용한 depth profile을 통해서 Ni/Pd, Pd/Ni는 증착시 uniform하게 성장함을 알 수 있었으며, 후열처리 함에 의해서 점차적으로 morphology 의 변화가 일어나기 시작함을 볼 수 있었다. 이는 $650^{\circ}C$에서 열처리 한후의 ex-situ AFM을 통해서 재확인 할 수 있었다. 이상의 결과로부터 GaN에 Pd를 접합 시 심한 clustering이 형성되어 Ohoic contact에 문제가 있으나 Pd/Ni 혹은 Ni/Pd bi-layer를 사용함에 의해서 clustering의 크기를 줄일 수 있었다. Clustering의 크기는 Ni/Pd bi-layer의 경우가 작았으며, $650^{\circ}C$ 열처리 후에 barrier height는 Pd/Ni bi-layer의 경우에도 Ni의 영향을 받음을 알 수 있었다.

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A Study on the Usage of Miào(廟) and Gōng(宮) in Zhou Dynasty through the Mentions to Them in the Scripture Sentences of 『Chūn-qiū(春秋)』 - In the Process of Investigating the Existence of Zhou Dynasty's System to Regulate the Number of Zōng-miào(宗廟) 【1/2】 (『춘추』 경문에서의 묘(廟)·궁(宮) 언급을 통한 주대(周代)의 그 쓰임 사례 일고찰 - 주대의 묘수제(廟數制) 실재 여부에 대한 궁구 과정에서 【1/2】-)

  • Seo, Jeong-Hwa
    • The Journal of Korean Philosophical History
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    • no.57
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    • pp.57-90
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    • 2018
  • In this discussion, as a way to verify the existence of the system to regulate Zhou dynasty's $z{\bar{o}}ng-mi{\grave{a}}o$(宗廟) numbers, the discussion was focused on '$mi{\grave{a}}o$ (廟)' and '$g{\bar{o}}ng$(宮)' in the records of "$Ch{\bar{u}}n-qi{\bar{u}}$(春秋)". As for the parts where the contents of scripture sentences were not specific, the context of the case was investigated through the writings in "$Zu{\breve{o}}-zhu{\grave{a}}n$(左傳)" and other materials. In the cases of the usage of the letter, '$mi{\grave{a}}o$(廟 : a ruler's house, a nation's royal court)', in the scripture sentences in "$Ch{\bar{u}}n-qi{\bar{u}}$(春秋)", the followings need to be noticed. In $t{\grave{a}}i-mi{\grave{a}}o$(太廟) of State $L{\check{u}}$(魯), nationwide events and a ruler's political ancestral rite, $d{\grave{i}}$(?) ritual, were performed, and fancy tools for ancestral rites used in those rituals were equipped. As for the $z{\bar{o}}ng-mi{\grave{a}}o$(宗廟) of a ruler of those times, a ritual of royal court, $ch{\acute{a}}o$(朝) rite, was performed. The usage case of the letter, '$g{\bar{o}}ng$(宮 : house)', is as the following. In $g{\bar{o}}ng$(宮) where a ruler's personal family lived was a family ancestral rite for them carried out. The record about the ornate decorating for the $hu{\acute{a}}n-g{\bar{o}}ng$ house(桓宮), which can be said to have been the political base of $s{\bar{a}}n-hu{\acute{a}}n-sh{\grave{i}}$(三桓氏), three politically noble families of State $L{\check{u}}$(魯), is outstanding. The $x{\bar{i}}-g{\bar{o}}ng$ house(西宮) during $X{\bar{i}}-g{\bar{o}}ng$(魯 僖公)'s reign and a $x{\bar{i}}n-g{\bar{o}}ng$ house(新宮 : a newly built house) destroyed by fire at the third year of $Ch{\acute{e}}ng-g{\bar{o}}ng$(魯 成公), are assumed to have been a ruler's another house, such as the $ch{\check{u}}-g{\bar{o}}ng$ house(楚宮) in which $Xi{\bar{a}}ng-g{\bar{o}}ng$(魯 襄公) used to enjoy staying, which is different from the viewpoint that it might be a $m{\acute{i}}-g{\bar{o}}ng$ shrine(?宮 : a house constructed as a shrine for the deceased father or the deceased grand father) that had been formed since Han dynasty. It has been discussed that, regarding the records that the '$w{\check{u}}-g{\bar{o}}ng$ house(武宮) was built' and that the '$y{\acute{a}}ng-g{\bar{o}}ng$ house(煬宮) was built', certain buildings were established with the symbols of '$w{\check{u}}$(武 : martial arts and force of arms)' and '$y{\acute{a}}ng$(煬 : to burn and get rid of everything)', and the events that a lord stood as its lord continued. Therefore, its main goal was not the performance of a dutiful ancestral rite by a ruler of those times for deceased rulers, for instance, $W{\check{u}}-g{\bar{o}}ng$(魯 武公) or $Y{\acute{a}}ng-g{\bar{o}}ng$(魯 煬公), but display of certain political symbolism through the ritual. This symbolism is most obvious with the $hu{\acute{a}}n-g{\bar{o}}ng$ house(桓宮) and the $x{\bar{i}}-g{\bar{o}}ng$ house(僖宮). As a consequence, all $mi{\grave{a}}os$(廟) and $g{\bar{o}}ngs$(宮) in scripture sentences had the functions of a shrine in some part, but it has been verified that they were not the buildings set up as a shrine to follow '$z{\bar{o}}ng-mi{\grave{a}}o$(宗廟)'s number regulation system' of '$ti{\bar{a}}nz{\check{i}}-7-mi{\grave{a}}o$(天子七廟 : an emperor owns seven $mi{\grave{a}}os$(廟))' or '$zh{\bar{u}}h{\acute{o}}u-5-mi{\grave{a}}o$(諸侯五廟 : a lord owns five $mi{\grave{a}}os$(廟))'.

New Liquid Crystal-Embedded PVdF-co-HFP-Based Polymer Electrolytes for Dye-Sensitized Solar Cell Applications

  • Vijayakumar, G.;Lee, Meyoung-Jin;Song, Myung-Kwan;Jin, Sung-Ho;Lee, Jae-Wook;Lee, Chan-Woo;Gal, Yeong-Soon;Shim, Hyo-Jin;Kang, Yong-Ku;Lee, Gi-Won;Kim, Kyung-Kon;Park, Nam-Gyu;Kim, Suhk-Mann
    • Macromolecular Research
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    • v.17 no.12
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    • pp.963-968
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    • 2009
  • Liquid crystal (LC; E7 and/or ML-0249)-embedded, poly(vinylidenefluoride-co-hexafluoropropylene) (PVdF-co-HFP)-based, polymer electrolytes were prepared for use in dye-sensitized solar cells (DSSCs). The electrolytes contained 1-methyl-3-propylimidazolium iodide (PMII), tetrabutylammonium iodide (TBAI), and iodine ($I_2$), which participate in the $I_3^-/I^-$ redox couple. The incorporation of photochemically stable PVdF-co-HFP in the DSSCs created a stable polymer electrolyte that resisted leakage and volatilization. DSSCs, with liquid crystal(LC)-embedded PVdF-co-HFP-based polymer electrolytes between the amphiphilic ruthenium dye N719 absorbed to the nanocrystalline $TiO_2$ photoanode and the Pt counter electrode, were fabricated. These DSSCs displayed enhanced redox couple reduction and reduced charge recombination in comparison to that fabricated from the conventional PVdF-co-HFP-based polymer electrolyte. The behavior of the polymer electrolyte was improved by the addition of optimized amounts of plasticizers, such as ethylene carbonate (EC) and propylene carbonate (PC). The significantly increased short-circuit current density ($J_{sc}$, $14.60\;mA/cm^2$) and open-circuit voltage ($V_{oc}$, 0.68 V) of these DSSCs led to a high power conversion efficiency (PCE) of 6.42% and a fill factor of 0.65 under a standard light intensity of $100\;mW/cm^2$ irradiation of AM 1.5 sunlight. A DSSC fabricated by using E7-embedded PVdF-co-HFP-based polymer electrolyte exhibited a maximum incident photon-to-current conversion efficiency (IPCE) of 50%.

THE EFFECT OF CASTING MACHINE AND INVESTMENT ON THE CASTABILITY OF TITANIUM ALLOY (주조기와 매몰재의 성분변화에 따른 티타늄의 주조성에 관한 연구)

  • Chung, Da-Woon;Yang, Hong-So
    • The Journal of Korean Academy of Prosthodontics
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    • v.44 no.5
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    • pp.654-664
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    • 2006
  • Statement of problem: There has been a eat interest in the use of titanium for fixed and removable prostheses in recent because of its excellent biocompatibility. However, the melting temperature and chemical reactivity of titanium necessities casting system different from those used in conventional casting. The current titanium casting systems are based on an electric-arc design for melting the metal in an argon atmosphere and its exclusive investment. Despite the new development in Ti casting system, inadequate mold filling and internal porosity are frequently observed casting defects. Purpose : The purposes of this study were to compare the castibility and reaction layer of the casting titanium under the two casting machines and their investment condition. Material and method: coping and machine-milled titanium coping according to the casting methods and the marginal configurations. The total 28 specimens were used, and these are divided into 4 groups according to 2 casting machines and 2 investments. The castings were analyzed using x-ray microanalysis and microhardness testing. The reaction layer between margin of titanium casting and the investments was observed and analyzed with scanning electron microscope. Result: 1. Castabiliy of casting titanium specimen was best in the group of centrifugal casting machine and Selevest $CB^{\circledR}$ and good that of Selevest CB and pressure differential casting machine, Rematitan plus and centrifugal casting machine, Rematitan plus and pressure differential casting machine in order. 2. There was no significanct correlation in titanium castability in respect of casting machine. However ANOVA indicated that Selevest $CB^{\circledR}$ groups had significantly better castability than Rematitan $plus^{\circledR}$ groups.(p<0.05) 3. There was a significant microhardness difference between centrifugal casting machine groups and pressure differential groups.(p<0.05) Titanium castings in centifugal groups had significantly harder than those in pressure differential groups. 4. The addition of zirconia decreased interfacial reactivity. Conclusion: above result revealed that of the castability of titanium casting specimens had little correlation in casting machines and was better in magnesia-based investment contained ZrO2 groups. However in order to practice casting titanium in clininic, its castability should be improved, also there should be more research on factor of castability so that long-span prothesis and removable partial denture metla frame may be casted completly.