• 제목/요약/키워드: $TiO_2$thin film

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Sol-Gel법으로 제조된 $PbTiO_3$ 강유전 박막의 구조적, 유전적 특성 (Structural and Dielectric Properties of $PbTiO_3$ Ferroelectric Thin Film Prepared by Sol-Gel Processing)

  • 김준한;백동수;박창엽
    • 한국세라믹학회지
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    • 제30권9호
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    • pp.695-700
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    • 1993
  • In this study, we prepared Pb-Ti stock solution by sol-gel processing and deposited PbTiO3 thin film on a Pt coated SiO2/Si wafer by spin coating using the stock solution. We used lead acetate trihydrate and titanium isopropoxide. The stock solution was partially hydrolized and finally a 0.25M coating solution was prepared. We achieved spin coating at 4000rpm for 30 seconds and heated the thin film at 375$^{\circ}C$ for 5 minutes and at $600^{\circ}C$ for 5 minutes successively, first and second heating state. And the thin film was finally sintered at 90$0^{\circ}C$ for 1 hour in the air. The upper electrode of the thin film was made by gold sputtering and was cricle shape with radius 0.4mm. Measured dielectric constant, dissipation factor and phase transition temperature(Cuire Temp.) were about 275, 0.02 and 521$^{\circ}C$ respectively. To observe ferroelectric characteristics we calculated Pr(remnant polarization) and Ec(coercive field) byhysteresis curve. Ec was 72kV/cm and Pr was 11.46$\mu$C/$\textrm{cm}^2$.

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PLT(28) 박막의 제작과 전기적 특성에 관한 연구 (Preparation and Electrical properties of the PLT(28) Thin Film)

  • 강성준;정양희
    • 한국정보통신학회:학술대회논문집
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    • 한국해양정보통신학회 2002년도 추계종합학술대회
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    • pp.784-787
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    • 2002
  • Sol-gel 법으로 PLT(28) 박막을 제작하여, 박막의 구조적 및 전기적 특성을 조사하였다. XRD와 AFM 관찰결과, $650^{\circ}C$에서 annealing 된 박막은 완전한 perovskite 구조를 가지며 표면거칠기도 22$\AA$ 으로 양호한 값을 나타내었다. Pt/TiO$_{x}$SiO2/Si 기판위에 PLT(28) 박막을 증착시켜 planar 형태의 캐패시터를 제작하여 전기적 특성을 조사하였다. 그 결과, PLT(28) 박막은 상유전상을 가지며,10kHz에서 비유전률과 유전손실은 761 과 0.024 이었다. 또, 5V에서 전하축적 밀도와 누설전류밀도는 각각 134fC/$\mu$m2 과 1.01 $\mu$A/cm2 이었다. 이로부터, PLT(28) 박막이 차세대 DRAM 용 캐패시터 절연막으로 사용될 수 있는 유망한 재료라고 생각된다.다.

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보급형 He-Ne 타원해석기의 제작과 $TiO_2$ 박막 유효밀도 변화의 in-situ 측정 (Fabrication of He-Ne ellipsometer and in-situ measurement of effective density variation of $TiO_2$thin films)

  • 김상준;방현용;김상열
    • 한국진공학회지
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    • 제8권4A호
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    • pp.432-437
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    • 1999
  • We have fabricated an in situ ellipsometer operating at He-Ne wavelength. It can be applied to the real-time, in-situ tracking of the ellisometric change which occurs during various sample treatments. As a rotating analyzer type, all optical elements and related parts are designed to share a common hollow-axis configuration, and hence the ellipsometer is compact in shape and simple in design. It is mountable on the spare ports of vacuum chamber with ease. Using this ellipsometer, we observed the effective density variation of previously grown $TiO_2$ thin films by using electron beam evaporation. The packing density of the as-grown film was 82%. When exposed to atomsphere, the micro-void of the film was filled with water vapor. This water-filled $TiO_2$ thin film was subject to heating/cooling cycles in vacuum and the ellipsometric variation versus temperature and cycling number was measured in real time using this in situ He-Ne ellipsometer.

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TiO2 박막의 증착거동에 미치는 스퍼터링 공정변수의 영향 (Effect of Sputtering Parameter on the Deposition Behavior of TiO2 Thin Film)

  • 김을수;이건환;권식철;안효준
    • 한국수소및신에너지학회논문집
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    • 제14권1호
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    • pp.8-16
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    • 2003
  • $TiO_2$ thin films were deposited by DC reactive magnetron sputtering with variations in sputtering parameter such as Ar and $O_2$ flow rate, DC power, substrate temperature and magnetic field. Deposition rate, crystal structure, chemical bond of $TiO_2$ films on the deposition conditions were investigated by Alpha-step, X-ray Diffractometer(XRD), X-ray Photoelectron Spectroscopy(XPS). When the DC power was applied at 500watt, deposition rate of $TiO_2$ film was about 480A/min. $TiO_2$ films coated under the deposition condition of 15sccm Ar and 7~10sccm $O_2$ flow rate was only observed anatase phase. With increasing substrate temperature from RT to $300^{\circ}C$, crystal orientation of $TiO_2$ films variously became.

PRTMOCVD 법을 통한 단성분계 산화막의 적층형 구조로부터 Zirconium Titanate 박막의 제조 (Fabrication of Zirconium Titanate Thin film from Layer-by-Layer Structure of Primitive Oxides prepared by PRTMOCVD)

  • 송병윤;권영중;이원규
    • Korean Chemical Engineering Research
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    • 제45권4호
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    • pp.378-383
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    • 2007
  • Zirconium titanate($Zr_xTi_{1-x}O_2$)와 같은 다성분계 금속산화물의 박막을 형성함에 있어 비교적 저온에서 박막성분 간의 정확한 조성조절이 이루어지며 균일한 박막특성을 같게 하는 새로운 박막제조 공정방법을 제시하였다. 이 공정방법은 우선 다성분계 금속산화박막을 구성하는 단성분계 금속산화막들을 적층식구조로 형성하여 적절한 열처리로 고상확산 반응을 통한 단일상 다성분계 박막을 형성하는 것을 특징으로 한다. 본 연구에서는 단성분계 산화박막층을 형성하는 방법으로 나노두께의 박막을 형성할 수 있는 능력과 두께조절성이 우수한 PRTMOCVD(pulsed rapid thermal metalorganic chemical vapor deposition) 법이 개발 적용하였다. PRTMOCVD 법으로 $ZrO_2$$TiO_2$ 단성분 산화막의 두께를 제어하면서 교차로 적층시킨 후 $850^{\circ}C$의 질소분위기에서 30분간 열처리를 통한 박막간의 상호확산을 통해 $Zr_xTi_{1-x}O_2$ 다성분계 산화박막을 형성하였다. 박막내의 Zr과 Ti의 조성은 $ZrO_2$$TiO_2$ 단성분 산화막의 두께로 조절하였다. 형성된 $Zr_xTi_{1-x}O_2$ 박막에 대한 상세한 물성을 분석하였다.

강유전체 PZT박막의 신뢰도에 미치는 헤테로구조 전극의 영향에 대한 연구 (Effects of Heterostructure Electrodes on the Reliability of Ferroelectric PZT Thin Film)

  • 이병수;이복희;이덕출
    • 전기학회논문지P
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    • 제52권1호
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    • pp.14-19
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    • 2003
  • The effect of the Pt electrode and the $Pt-IrO_2$ hybrid electrode on the performance of ferroelectric device was investigated. The modified Pt thin films with non-columnar structure significantly reduced the oxidation of TiN diffusion barrier layer, which rendered it possible to incorporate the simple stacked structure of Pt/TiN/poly-Si plug. When a $Pt-IrO_2$ hybrid electrode is applied, PZT thin film properties are influenced by the thickness and the partial coverage of the electrode layers. The optimized $Pt-IrO_2$ hybrid electrode significantly enhanced the fatigue properties of the PZT thin film with minimal leakage current.

Structural, Morphological and Electrical Properties of TiO2 Thin Films Deposited by ALD Method

  • Seung-Yeon Oh;Jae-Min Shin;Gyeong-Hun Na;Min-Seok Kwon;Sang-Jeen Hong;Bumsuk Jung
    • 반도체디스플레이기술학회지
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    • 제22권2호
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    • pp.87-95
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    • 2023
  • TiO2 thin films were grown using the Atomic Layer Deposition (ALD) and their structural and electrical properties were investigated. The crystal structure, dielectric constant, and surface roughness of the TiO2 thin films grown by the ALD deposition method were studied. The grown TiO2 thin films showed an anatase crystal structure, and their properties varied with temperature. In particular, the properties of the TiO2 thin films were confirmed by changing the process temperature. The electrical properties of Metal-Insulator-Silicon (MIS) capacitor structures were analyzed using a probe station. The performance improvement of capacitors using TiO2 as a dielectric was confirmed by measuring capacitance through Capacitance-Voltage (C-V) curves.

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습식 공정법에 의한 초발수 $TiO_2$ 박막 제조 (Fabrication of superhydrophobic $TiO_2$ thin films by wet process)

  • 김진호;정현호;황종희;임태영;최덕균;정덕수;김세훈
    • 한국결정성장학회지
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    • 제19권5호
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    • pp.262-267
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    • 2009
  • 초발수 $TiO_2$ 박막을 습식 공정법에 의해 유리 기판 위에 성공적으로 제조하였다. Micro-nano 복합구조의 거친 표면을 갖는 박막을 제조하기 위하여 layer-by-layer(LBL) deposition 법과 liquid phase deposition(LPD) 법이 이용되었다. 초발수 박막은 LBL 법에 의해 texture 구조를 갖는(PAH/PAA) 박막을 제조 한 후 그 위에 LPD 법에 의해 $TiO_2$ 나노 입자를 적층시키고 그 표면을 fluoroalkyltrimethoxysilane(FAS)를 사용하여 발수 처리를 하여 제조하였다. $(PAH/PAA)_{10}$ 박막의 표면에 45분 동안 $TiO_2$를 적층한 박막은 RMS roughness가 65.6 nm로 거친 표면을 보여주었고 발수 처리 이후에 접촉각 $155^{\circ}$ 정도의 초발수 특성과 함께 파장 650 nm 이상에서는 80% 이상의 투과율을 보여주었다. 서로 다른 조건에서 제조된 박막의 표면 구조,광학적 특성, 접촉각을 FE-SEM, AFM, UV-Vis, contact angel meter를 이용하여 측정하였다.

Interfaces of Stacking $TiO_2$ Thin Layers Affected on Photocatalytic Activities

  • 주동우;부진효
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2013년도 제45회 하계 정기학술대회 초록집
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    • pp.189.1-189.1
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    • 2013
  • Titanium dioxide (TiO2) is a wide bandgap semiconductor possessing photochemical stability and thus widely used for photocatalysis. However, enhancing photocatalytic efficiency is still a challenging issue. In general, the efficiency is affected by physio-chemical properties such as crystalline phase, crystallinity, exposed crystal facets, crystallite size, porosity, and surface/bulk defects. Here we propose an alternative approach to enhance the efficiency by studying interfaces between thin TiO2 layers to be stacked; that is, the interfacial phenomena influencing on the formation of porous structures, controlling crystallite sizes and crystallinity. To do so, multi-layered TiO2 thin films were fabricated by using a sol-gel method. Specifically, a single TiO2 thin layer with a thickness range of 20~40 nm was deposited on a silicon wafer and annealed at $600^{\circ}C$. The processing step was repeated up to 6 times. The resulting structures were characterized by conventional electron microscopes, and followed by carrying out photocatalytic performances. The multi-layered TiO2 thin films with enhancing photocatalytic efficiency can be readily applied for bio- and gas sensing devices.

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정전분무법을 이용한 염료감응형 태양전지의 $TiO_2$ 박막 특성에 관한 연구 (A Study on the Characteristics of $TiO_2$ thin Film in Dye-sensitized Solar Cells using Electrospray Method)

  • 김희제;이정기;홍지태;김호성;이동길;허국성;안태풍;장진주
    • 전기학회논문지
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    • 제58권11호
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    • pp.2223-2228
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    • 2009
  • Dye sensitized solar cells(DSCs) have been very economical and easy method to convert solar energy to electricity. DSC can reach low costs in future outdoor power applications. However, to commercialize the DSC, there are still many shortages to overcome such a low efficiency in a large size DSC. In this study, DSCs were fabricated by an electrospray coating method for the $TiO_2$ thin film. They were compared with DSCs prepared by conventional coating methods. We conducted an experiment to obtain the optimized parameters of voltage, flow rate, incident angle and distance in the electrospray method. After we fabricated $TiO_2$ film using that way, we investigated the characteristics of DSC through I-V Curve, SEM and EIS. This novel method shows stable performance with an energy conversion efficiency of 3.44 % under 1 sun illumination (AM 1, $P_{in}$ of $100\;mW/cm^2$).