• Korean Journal of Materials Research
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• 제9권6호
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• pp.577-582
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• 1999

In order to make the electroconductive $Si_3N_4$-TiN composities, the Si-Ti(N) compacts were nitrided at $1450^{\circ}C$ for 20hours, and then they were post-sintered by a gas-pressure-sintering technique at 1TEX>$1950^{\circ}C$ for 3.5 hours. As starting powders, commercial si powder of about $10\mu\textrm{m}$, two types of Ti powders of 100 and 325 mesh, and fine-sized TiN of $2.5\mu\textrm{m}$ powders were used. In the $Si_3N_4$-TiN sintered bodies used Ti powders, the relative density and fracture strength and electrical conductivity are low due to the existence of large amounts of coarse pores. However, in the $Si_3N_4$-TiN composite used TiN powder, the fracture toughness, fracture strength and electrical resistivity were $5.0MPa{\cdot}m^{1/2}$, 624MPa and $1400{\omega}cm$, respectively. The dispersion of TiN particles in the composite inhibited the growth of $Si_3N_4$ in the shape of rod and made strong strain field contrasts at the $Si_3N_4$-TiNinterfaces. It was recognized that microstructural control is required to improve the electrical conductivity and mechanical properties of $Si_3N_4$-TiN composites by dispersing TiN particles homogeneously.

• Journal of the Korean Applied Science and Technology
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• 제34권4호
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• pp.746-755
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• 2017

In this study, $CeO_2/TiO_2$ nanoparticle with structure of core and shell was synthesized by growing $TiO_2$ onto the surface of $CeO_2$ according to hydrolysis of $Ti(SO_4)_2$. Reaction time, temperature, concentration of $CeO_2$ slurry, pH control of $Ti(SO_4)_2$ were optimized about synthesis of $CeO_2/TiO_2$ core-shell nanoparticle. It was found that optimal mole ratio range of $CeO_2:TiO_2$ was 1:0.2~1.1, the optimal concentration of $CeO_2$ slurry was 1 %, and the optimal reaction temperature was $50^{\circ}C$. The optimal concentration of $CeO_2$ slurry could be increased up to 10 % by adjusting the pH of $Ti(SO_4)_2$ to 1 using $NH_4OH$ and adding to $CeO_2$ slurry. If reaction was carried at $80^{\circ}C$ or higher, the separated $TiO_2$ particles were obtained instead of $CeO_2/TiO_2$ core-shell nanoparticles. The optimal reaction temperature was $50^{\circ}C$ at which good shaped core-shell structure of $CeO_2/TiO_2$ was obtained.

• Journal of the Korean Crystal Growth and Crystal Technology
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• 제31권1호
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• pp.37-42
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• 2021

The effect of chemical composition on the structural and thermal properties of TiZrN thin films was studied. As the Zr fraction in the deposited TixZr1-xN (x = 0.87, 0.82, 0.7, 0.6, and 0.28) increased, microstructural changes consisted of reduction in the grain size and a gradual transition from columnar structure to granular structure were observed. In addition, it was also confirmed that a gradual crystal phase transition from TiN to TiZrN has occurred as the Zr fraction increased up to 0.4. After heat treatment at 900℃, Ti0.82Zr0.18N and Ti0.7Zr0.3N layers were converted to a form in which rutile phase TiO2 and TiZrO4 oxides coexist, while Ti0.6Zr0.4N layer was converted to TiZrO4 oxide. Among the five compositions of TiZrN films, the Ti0.6Zr0.4N showed the best high temperature stability and produced a significant enhancement in the thermal oxidation resistance of Inconel 617 through suppressing the surface diffusion of Cr caused by thermal oxidation of the Inconel 617 substrate.

• Journal of the Korean Crystal Growth and Crystal Technology
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• 제14권3호
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• pp.83-89
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• 2004

In this work, HA/$TiO_2$ biocomposite to get high mechanical properties with biocompatibility were prepared. HA/$TiO_2$ biocomposite powders were prepared by mixing $TiO_2$ and HA powders which were synthesized through sol-gel, precipitation and hydrothermal methods. The mixing ratio was fixed at 1:1 ratio (HA/$TiO_2$, wt%). HA/$TiO_2$ biocomposite powders showed different microstructures depending on their particle size and shape. The smaller particles were coated on the surface of larger particles, whereas they were well mixed and dispersed when both $TiO_2$ and HA were nanocrystallites. HA/$TiO_2$ biocomposite powders with homogeneous microstructure showed high sintered density and good mechanical properties.

• Journal of the Korean Vacuum Society
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• 제10권3호
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• pp.321-327
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• 2001

Ti-Si-N films obtained by using RF reactive sputtering of targets with various Ti/Si ratios in a $N_2(Ar+N_2)$ gas mixture have been investigated in terms of films resistivity and diffusion barrier performance. The chemical bonding state of Si in the Ti-Si-N film which contained a higher Si content was in the form of amorphous $Si_3N_4$, producing increased film resistivity with increased $N_2$flow rate. Lowering the Si content in the deposited Ti-Si-N film favored the formation of crystalline TiN even at low $N_2$flow rates, and leads to low film resistivity. In addition increasing the N content led to Ti-Si-N films having a higher density and compressive stress, suggesting that the N content in the films appear to be one of the most important factors affecting the diffusion barrier characteristics. Consequently, we proposed the optimum composition in the range of 29~49 at.% of Ti, 6~20 at.% of Si, and 45~55 at.% of N for the Ti-Si-N films having both low resistivity and excellent diffusion barrier performance.

• Proceedings of the Korean Society for Technology of Plasticity Conference
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• 한국소성가공학회 2003년도 춘계학술대회논문집
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• pp.99-104
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• 2003

TiN coated films show a good mechanical properties, high thermal properties and wear, erosion and corrosion resistance and are widely used as a coating materials in tools, ornaments, parts and semiconductors. In spite of these good properties, the fracture of TiN coated films occur during use. The fracture of TiN thin films is related to their microstructure. Especially, the life of TiN coated layer is related to the texture of the TiN films. One researcher suggested that the corrosion and erosion resistance of the TiN thin films is related to a uniform and dense structure of films. In this study, we studied the relationships between textures and friction coefficient, erosion and corrosion in TiN coated films. The flatness of (115) texture surface of TiN thin films is flatter than that of (111) texture surface. The friction coefficient of (115) texture surface of TiN thin films is similar with that of (111) texture surface. The wear resistance of (115) texture surface of TiN thin films is better than that of (111) texture surface. The erosion and corrosion resistance of (115) texture surface of TiN thin films is better than that of (111) torture surface. As well as texture, the wear, erosion and corrosion of TiN thin films has to consider defects such as pinholes, cracks, surface roughness and open columnar structure. The life of TiN coated products is influenced by the properties of wear, erosion, and corrosion resistance of TiN thin films and is related to texture of TiN coated films, density of pinholes and cracks, density of structure, and surface flatness.

• Journal of the Korean Ceramic Society
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• 제35권4호
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• pp.325-332
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• 1998

Crystalline TiO2 ultrafine powders were prepared simply by heating and stirring aqueous TiOCl2 solution with {{{{ {Ti }^{4+ } }} concentration of 0.5 M from room temperature to 10$0^{\circ}C$ under 1 atmoshpere. The crystallinity and the particle shape of TiO2 ultrafine powders obtained by simple precipitation method were analyzed us-ing XRD(X-ray diffractometer). SEM(scanning electron microscopy) and TEM(transmission electron mi-croscopy) TiO2 crystalline precipitate with rutile phases is fully formed at the temperatures of up to $65^{\circ}C$ and then TiO2 crystalline precipitate with anatase phase starts to be formed above temperatures $65^{\circ}C$ showing its full formation at 10$0^{\circ}C$ These behaviors of TiO2 crystalline precipitate directly from an aqueous TiOCl2 solution would be caused due to the existence of {{{{ OMICRON ^2+ }} ions from distilled water which oxydize TiOCl2 to TiO2 not hydrolyzing it to Ti(OH)4 Here thermodynamically stable TiO2 rutile phase generally formed at higher temperature is practically precipitated at lower temperatures in this study This may be due to the precipitation by very slow reaction enough to make TiO2 particles allocated into stable rutile structure.

• Analytical Science and Technology
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• 제9권2호
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• pp.192-197
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• 1996

The purpose of this study is to develop new V-free Ti alloys which have good mechanical properties and corrosion resistance. Although pure Ti has an excellent biocompatibility and corrosion resistance in body, it is inferior to Ti alloys in mechanical properties, and Ti-6Al-4V which has good mechanical properties was known to be cytotoxic due to the alloying element V. New Ti based alloys which do not contain the toxic metallic components were developed by the alloy design technique. Their corrosion and mechanical characteristics were compared with pure Ti and Ti-6Al-4V in this study. The results showed that Ti-20Zr-3Nb-3Ta-0.2Pd-1In and Ti-5AI-4Zr-2.5Mo exhibit good mechanical oroperties and an excellent corrosion resistance in 0.9% NaCl solution.

• Journal of the Korean Vacuum Society
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• 제21권5호
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• pp.242-248
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• 2012

Valence band of a vacuum-reduced $TiO_2$ (001) surface has been carefully examined using synchrotron x-ray photoelectron spectroscopy to investigate variation of the gap state upon oxidation and thermal diffusion of $Ti^{3+}$ interstitials from the bulk. We compare our results with that obtained from $TiO_2$ (110) and aim to address a crystal-face dependency in the oxidation and diffusion rates of $Ti^{3+}$ interstitials. We find very similar behaviors in the oxidation and thermal diffusion rate of $Ti^{3+}$ interstitials between the two crystal faces suggesting a negligible crystal-face dependency in this case.

• Korean Journal of Materials Research
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• 제9권7호
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• pp.688-694
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• 1999

Ti-6Al-4V-N films have been grown onto glass substrates by dc reactive magnetron sputtering from a Ti-6Al-4V-N alloy target at different nitrogen partial pressure, input powers and sputtering times. The influence of various sputtering conditions on structural properties of Ti-6Al-4V-N films was investigated by measuring their X-ray diffraction. The quaternary Ti-6Al-4V-N film is crystallizing in a face centered cubic TiN structure, the lattice parameter is smaller than the TiN parameter as titanium atoms of the TiN lattice are replaced by aluminum and vanadium atoms. The films show the (111) preferred orientation and the (111) peak intensity decreases as the nitrogen partial pressure is increased, but the intensity increases as the sputtering time is increased. The deposition rate and the grain size are alto related with the variation of various sputtering conditions.