• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 2000년도 하계학술대회 논문집
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• pp.94-98
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• 2000

Polycrystalline SBTN ferroelectric thin films were prepared by sol-gel method with various Nb mole ratios on Pt/ $SiO_2$/Si (100) substrates. The films were annealed at different temperatures and characterized in terms of phase and microstructure. Relatively a well saturated hysteresis pattern was obtained at x =0.2 in S $r_{0.8}$B $i_{2.3}$(T $a_{1-x}$ N $b_{x}$)$_2$ $O_{9+}$$\alpha$/ thin films. At an applied voltage of 5V, the dielectric constant ($\varepsilon$$_{r}$) and dissipation factor (tan $\delta$) of typical S $r_{0.8}$B $i_{2.3}$(T $a_{1-x}$ N $b_{x}$)$_2$ $O_{9+}$$\alpha$/ thin film (x=0.2) were about 236.2 and 0.034. Measured remanent polarization (2Pr) and coercive field (Ec) were 4.28C/c $m_2$, and 38.88kv/cm respectively. No fatigue was observed up to 6$\times$10$_{10}$ switching cycles at 5V and the normalized polarization reduced by a factor of only 4%.%. 4%.%. 4%.%.%.%.%.

• 공업화학
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• 제10권1호
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• pp.73-79
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• 1999

초격자 구조의 $Li_{4/3}Ti_{5/3}O_4$를 lithium acetate (LA)와 titanium n-butoxide (TNB)의 혼합 용액을 이용한 졸겔법으로 합성하였다. 이때 얻어진 겔상은 TNB/LA 몰비 5/4에 AA/TNB의 몰비 0.125를 혼합한 clear sol 용액에 $NH_4OH/TNB$ 몰비 0.35와 $H_2O/TNH$ 몰비 3.5를 첨가하여 얻었으며, $Li_{4/3}Ti_{5/3}O_4$는 xerogel을 $600^{\circ}C$에서 30시간 동안 열처리하여 제조하였다. 그리고 합성된 $Li_{4/3}Ti_{5/3}O_4$는 0.5~3.0 V의 전위 영역에서 $0.15mA/cm^2$의 전류밀도로 Li/1M $LiClO_4(in\;PC)/Li_{4/3}Ti_{5/3}O_4$를 구성하여 실험한 결과 174 mAh/g의 초기 용량을 나타냈으며, 25 cycle 동안 27.3%의 용량 감소를 나타냈다.

• 센서학회지
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• 제4권3호
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• pp.22-29
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• 1995

$60^{\circ}C$의 질소 분위기에서 tetraethyl orthosilcate, lithium methoxide, zirconium n-propoxide 그리고 tributyle phosphate를 전구체로 써서 sol-gel법으로 Li 이온-고체 전해질을 합성하였다. 합성한 물질을 건조하고 분쇄하여, 이를 가압 성형하여 원반형 시편들을 제조하였다. 시편들을 $900^{\circ}C{\sim}1100^{\circ}C$에서 50시간 열처리하였다. 시편들의 물성을 TG/DTA, SEM, AES 및 XRD 법으로 조사하였다. Li 이온 이온-고체 전해질을 이용한 $CO_{2}$ 가스 감지 소자를 제작하고 그 동작 특성을 측정하였다. 제작된 감지 소자 중에서 $1000^{\circ}C$에서 열처리한 경우, 동작 온도가 $200^{\circ}C{\sim}300^{\circ}C$ 일 때, $CO_{2}$ 농도 변화에 대해 $35{\sim}63mV/decade$의 기전력 변화를 나타내었고, $300{\sim}6000 ppm$까지 선형성이 우수하였다.

• 한국세라믹학회지
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• 제34권7호
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• pp.774-780
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• 1997

Porous low reflective coating films of SiO2.ZrO2 system were prepared from the mixed alkoxide solutions of Zr(O-nC3H7)4 and partially prehydrolyzed TEOS by the sol-gel method using the dip-coating technique. In the case of 90SiO2.10ZrO2 porous coating films with HCl and H2O content was 0.3 mole and 4 mole, 378 m2/g of the specific surface area, 0.254 cm3/g of total pore volume, 30-50$\AA$ of average pore diameter. The transmittance of 90SiO2.10ZrO2 porous coated films was 95.38% at the wavelength of 550 nm, compared with the parent glass, the transmittance was increased with 4.38%.

• 한국표면공학회지
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• 제30권3호
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• pp.183-190
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• 1997

Fabrication and crystallization characteristics of yttria($T_2O_3$) stabilized zirconia(YSZ) thin film by sol-gel process were studied. YSZ sol was synthesized with zirconium n-propoxide($Zr(OC_3H_7)_4)$) and yttrium nitrate pentahydrate ($Y(NO_3)_3.5H_2O$). YSZ film was prepared by depositing the polymeric sol on porous $Al_2O_3$ substrate by spin-coating, and the film characteristics were investigated by FRIR, TG-DTA, XRD, DSC, optical microscopy and SEM. The film topology was uniform and cracks were not found. It was found that the annealing temperature and the concentration of stabilizer affect the crystallization of YSZ film. The YSZ film began to crystallize from amorphous to tetragonal phase at 40$0^{\circ}C$, and it was not converted to cubic structure until $1100^{\circ}C$. It seemed that the grains were formed over $700^{\circ}C$and the average grain size was obtained about 0.2$\mu\textrm{m}$.

• 한국세라믹학회지
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• 제32권1호
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• pp.95-105
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• 1995

Ceria(CeO2) stabilized zirconia(CeSZ) sol was synthesized with zirconium n-butoxide Zr(OC4H9)4 and cerium nitrate hexahydrate Ce(NO3)3.6H2O as precursors and ethylacetoacetate(EAcAc) as a chelating agent under atmosphere. CeSZ films were deposited on AISI 304 stainless steel using the prepared polymeric sol by dipcoating and the coating characteristics were investigated by XRD, ellipsometry, scratch test and SEM. The CeSZ film began to crystallize from amorphous to tetragonal phase at 40$0^{\circ}C$ and it was not converted into monoclinic phase up to 100$0^{\circ}C$ by the addition of 16mol% CeO2 as a stabilizer which could suppress phase transformation of zirconia. The CeSZ films were prepared by varying the EAcAc contents and the cncentration of CeSZ sol and measured the thickness and refractive index. From these results, it was found that the EAcAc contents and concentration of CeSZ coating sol evidently affect the densification of CeSZ film. The CeSZ film coated with 0.4M CeSZ sol and heat-treated at $600^{\circ}C$ for 10min had thickness of 50nm and 17% porosity. The CeSZ film on 304 stainless steel effectively acted as a protective layer against oxidation up to 80$0^{\circ}C$ and had superior corrosion resistance in 25% H2SO4 solution for 4.5 hrs.

• 공업화학
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• 제8권2호
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• pp.301-307
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• 1997

응집이 없는 단분산의 $SiO_2/TiO_2$ 복합 미립자를 얻기 위하여 $TiO_2$seed가 분산되어 있는 에탄올 수용액과 TEOS (Tetraethyl Orthosilicate)를 에탄올에 녹인 용액을 혼합하여 $TiO_2$ 주위에서 TEOS가 가수분해 및 축합 반응이 일어나도록 유도하여 복합 미분말을 제조하였다. 촉매로 암모니아를 사용하였고, 반응온도는 실온이었다. 반응변수는 TEOS의 농도, 암모니아의 농도, $TiO_2$ seed의 크기 및 양이었다. 응집이 없는 복합 미립자를 얻기 위한 최적조건은 [TEOS]=0.3M, [$NH_4OH$]=0.7M, $TiO_2$ seed의 크기가 200~300 nm이었고, 이때 $0.8{\sim}0.9{\mu}m$의 입자크기를 갖는 복합입자를 얻을 수 있었다.

• 센서학회지
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• 제7권4호
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• pp.243-253
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• 1998

전해질 센서 감지막으로 사용되어 온 PVC 감지막은 센서 표면과의 낮은 부착력으로 인하여 센서 수명을 단축시켰고, 감지막의 규격화와 양산화가 어려웠다. 이러한 문제를 해결하고자 감지막 용액은 중성 캐리어(ionophore), 고분자 지지체(TEOS:DEDMS=1:3), 용매(에탄올) 그리고 촉매(염산)들을 혼합하여 sol-gel 방법으로 제조하였다. 그리고 감광성 고분자물질(THB30)로 만들어진 마이크로풀(micropool)내에 리프트-오프(lift-off) 기법으로 감지막을 형성하였다. 제작된 전해질 센서는 MISFET(metal-insulator-semiconductor field-effect transistor)의 전형적인 전기적 특성을 보였다. K-, Ca-, Na-ISFET은 넓은 농도범위에서 각각 53, 25, 50 mV/decade의 감도를 보였다. 감응시간은 약 90초이며 드리프트는 약 0.05 mV/hour였다. Sol-gel 법과 리프트-오프 기법은 감지감 형성에 적용될 수 있었으며, 센서의 규격화와 양산화를 개선시킬 수 있을 것으로 기대된다.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 2001년도 하계학술대회 논문집
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• pp.283-285
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• 2001

In this paper, a new lateral insulated gate bipolar transistor (LIGBT) is proposed to improve the latch-up performance without current path underneath the n+ cathode region. The improvement of latch-up performance is verified using the two-dimensional simulator MEDICI and the simulation results on the latch-up current density are 3.12${\times}$10$\^$-4/ A/$\mu\textrm{m}$ for the proposed LIGBT and 0.94${\times}$10$\^$-4/ A/$\mu\textrm{m}$ for the conventional LIGBT. The proposed SOI LIGBT exhibits 3 times larger latch-up capability than the conventional SOI LIGBT.

• Journal of Magnetics
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• 제8권4호
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• pp.138-141
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• 2003

$Ni_{0.65}Zn_{0.35}Fe_2O_4$thin films were prepared by using a sol-gel method. Their crystallographic, dielectric and magnetic properties were investigated as a function of Cu contents by means of an X-ray diffractometer (XRD), X-ray reflectivity, LCZ meter (NF2232), a vibrating sample magnetometer (VSM), and an atomic force microscope (AFM). From typical C-V measurements for $Ni_{0.65}Zn_{0.35}Fe_2O_4$ thin films on p-type silicon substrate, the surface charge density was calculated as 1.4 ${\mu}$C/$m^2$. The dielectric constant evaluated from the capacitance at the accumulation state was 28. The high $H_{c}$ and low $M_{sat}$ at x=0.0 and 0.1 were due to the growth of the ${\alpha}$-$Fe_2O_3$ phase having antiferromagnetic properties. The rapidly decreased $H_{c}$ and increased $M_{sat}$ at x=0.2 and 0.3 can be explained that the ${\alpha}$-$Fe_2O_3$ phases have completely disappeared at x=0.3 and so, non-magnetic defects are minimized. The $M_{sat}$ was slightly decreased and the $H_{c}$ was increased above at x=0.3 because the increase of grain boundary due to smaller grain size acts as defects during magnetization process.