• Title/Summary/Keyword: $Si_3 N_4 O_3$

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The Effect of SiO2 on the Microstructure and Electrical Properties of BaTiO3 PTC Thermistor (BaTiO3 PTC 써미스터의 미세구조 및 전기적 특성에 대한 SiO2 영향)

  • Chun, Myoung-Pyo
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.26 no.1
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    • pp.22-26
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    • 2013
  • PTCR ceramics of $(Ba_{0.998}Sm_{0.002})TiO_3+0.001MnCO_3+xSiO_2$ (x=1, 2, 3, 4, 5, 6 mol%) were fabricated by solid state method. Disk samples of diameter 5 mm and thickness about 1mm were sintered at $1,290^{\circ}C$ for 2 h in reduced atmosphere of $5%H_2-95%N_2$ followed by re-oxidation at $600^{\circ}C$ for 30 min. in $20%O_2-80%N_2$.and their microstructures and electrical properties were investigated with SEM and Multimeter. The color of sintered samples was strongly dependent on $SiO_2$ content showing that the color of samples with $SiO_2$ of 1~2 mol% was gray but that of samples with $SiO_2$ of 4~6 mol% was changed from gray to blue, which seems to be related with the reduction of samples due to the oxygen vacancies created during the sintering in reduced atmosphere. $SiO_2$ content had a great influence on the microstructure and the electrical properties. With increasing $SiO_2$ content, the grain size of samples increased and the resistivity as well as the resistivity jump ($R_{285}/R_{min}$) decreased, which is considered to be attributed to the resistivity change at grain interior and grain boundary due to the fast mass transfer through $SiO_2$ liquide phase during the sintering. Samples with 2 mol% $SiO_2$ has the resistivity of $202{\Omega}cm$ and the resistivity jump of 3.28. It is expected that $SiO_2$ doped $BaTiO_3$ based PTC ceramics can be used for multilayered PTC thermistor due to the resistance to the sintering in reduced atmosphere.

Optimization of ceramic grinding by Applying Taguchi Method (다구찌 방법을 적용한 세라믹 연삭가공의 최적화)

  • 임홍섭;유봉환;소의열;이근상;사승윤
    • Proceedings of the Korean Society of Precision Engineering Conference
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    • 2002.10a
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    • pp.155-159
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    • 2002
  • This paper has studied to obtain the grinding characteristics and optimal grinding conditions of ceramics in the grinding with diamond wheel by Taguchi method. Feed rate was most important factor to the surface roughness. In the case of 4{Si_3}{N_4}$ and ${A1_2}{O_3}$, surface roughness value were small at 3m/min of feed rate. In the case of $ZrO_2$. surface roughness value was small at 4m/min of feed rate. Surface roughness have much influenced by major load for the :ii3N4 and $ZrO_2$. On the other hand, ${A1_2}{O_3}$ have more influenced by grain shedding of brittle fracture phenomenon. The major factors affecting the surface roughness and the optimum grinding conditions were obtained with minimum experiment using Taguchi method.

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Synthesis of $\beta$-Sialon from Wando Pyrophyllite (완도납석으로 부터 $\beta$-Sialon의 합성)

  • 이홍림;신현곤
    • Journal of the Korean Ceramic Society
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    • v.21 no.1
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    • pp.5-10
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    • 1984
  • $eta$-Sialon synthesis was investigated via the simulataneous reduction and nitriding of Wando pyrophyllite. When Wando pyrophyllite-graphite-$Si_3N_4$ seed mixture was heated at 135$0^{\circ}C$ for as long as 10 hours in 80% $N_2$-20%$H_2$ atomsphere $eta$-$Si_3N_4$ solid solution was mainly formed together with a small amount of $\alpha$-$Si_3N_4$ The value z of the forming $Si_{6-x}Al_2O_2N{8-z}$ was decreased with heating time.

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Process Characteristics of SiOx and SiOxNy Films on a Gas Barrier Layer using Facing Target Sputtering (FTS) System (FTS 장치를 이용한 가스 차단막용 SiOx 및 SiOxNy 박막의 공정특성)

  • Son, Jin-Woon;Park, Yong-Jin;Sohn, Sun-Young;Kim, Hwa-Min
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.22 no.12
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    • pp.1028-1032
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    • 2009
  • In this study, the influences of silicon-based gas barrier films fabricated by using a facing target sputtering(FTS) system on the gas permeability for flexible displays have been investigated. Under these optimum conditions on the $SiO_x$ film with oxygen concentration($O_2/Ar+O_2$) of 3.3% and the $SiO_xN_y$ film with nitrogen concentration($N_2/Ar+O_2+N_2$) of 30% deposited by the FTS system, it was found that the films were grown about 4 times higher deposition rate than that of the conventional sputtering system and showed high transmittance about 85% in the visible light range. Particularly, the polyethylene naphthalate(PEN) substrates with the $SiO_x$ and/or $SiO_xN_y$ films showed the enhanced properties of decreased water vapor transmission rate (WVTR) over $10^{-1}\;g/m^2{\cdot}day$ compared with the PEN substrate without any gas barrier films, which was due to high packing density in the Si-based films with high plasma density by FTS process and/or the denser chemical structure of Si-N bond in the $SiO_xN_y$ film.

Nitridation Behavior of Kaolin with Reduced Alumina Content Obtained by Acid Treatment (산처리에 의하여 알루미나 함량을 줄인 카올린의 질화거동)

  • 배원태;정원도;조철구
    • Journal of the Korean Ceramic Society
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    • v.29 no.5
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    • pp.347-356
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    • 1992
  • Various kaolin samples with different alumina content were prepared from calcined admixture of kaolin and ammonium sulfate by varying the treatment time in sulfuric acid. Samples were nitridated under N2 or N2-H2 atmosphere with changing the amount of added carbon, the reaction time and temperature. As the alumina content lowered, the size of kaolin particles decreased and the specific surface area increased. XRD analysis indicated that ${\alpha}$-quartz remained by decomposition of halloysite and meta-halloysite. Experimental results of nitridation behavior are summerized as follows; 1) Nitridation under N2 atmosphere. With the increase of C/SiO2 ratio and with the decrease of Al2O3 content, disappearance of XRD pattern peaks of mullite, ${\alpha}$-quartz and ${\alpha}$-Al2O3 were accelerated at 1300$^{\circ}C$. SiC was the main phase in the reaction product of acid-treated kaolin samples nitridated at 1300$^{\circ}C$ for 10 hours regardless of C/SiO2 ratio. But the XRD peak intensities of ${\beta}$-Si3N4, ${\beta}$-sialon and SiC did not show much difference when untreated raw kaolin was fired at the same condition. When the ratio of C/SiO2 was 3.5, ${\beta}$-sialon and ${\beta}$-Si3N4 existed in the reaction product of about 22% alumina containing kaolin sample fired at 1350$^{\circ}C$ for 7 hours. Only ${\beta}$-sialon existed in the same sample fired at 1400$^{\circ}C$ for 10 hours. ${\beta}$-sialon was obtained from all of the acid-treated kaolin samples fired at 1400$^{\circ}C$ for 40 hours, but AlN and SiC remained in the untreated kaolin sample. Z value of the ${\beta}$-sialon obtained from the 22% alumina containing kaolin sample fired at 1400$^{\circ}C$ for 40 hours was about 1.3(XRD) and 1.5(EDS). 2) Nitridation under 80N2+2OH2 mixed gas atmosphere with the C/SiO2 ratio of 1 Mullite was not found, but ${\alpha}$-Si3N4, and ${\beta}$-sialon were present in the reaction product of about 22% alumina containing kaolin sample fired at 1300$^{\circ}C$ for 10 hours. When untreated kaolin sample was nitridated at the same condition, mullite remained. AlN and SiC were not found in the reaction product of about 22% alumina containing kaolin sample fired at 1350$^{\circ}C$ for 5 hours. On the other hand, AlN and SiC remained in the product of untreated kaolin fired at the same condition.

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Synthesis and Optical Properties of M-Si(Al)-O-N (M: Sr, Ca) Phosphors for white Light Emitting Diodes (백색 발광다이오드용 M-Si(Al)-O-N (M: Sr, Ca) 형광체의 합성 및 발광 특성)

  • Lee, Seung-Jae;Lee, Jun-Seong;Kim, Young-Jin
    • Journal of the Microelectronics and Packaging Society
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    • v.19 no.2
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    • pp.41-45
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    • 2012
  • Oxynitride green phosphors for white light emitting diodes (LEDs) were synthesized and their optical properties were evaluated. The N/O ratio ($\delta$) of $SrSi_2O_{2-{\delta}}N_{2+2/3{\delta}}:Eu^{2+}$ closely depended on the synthesizing conditions. The most excellent green emission (545 nm), which was assigned to the $5d{\rightarrow}4f$ transition of $Eu^{2+}$ ions, was achieved at the conditions of $1700^{\circ}C$, 5 mol% $Eu^{2+}$, and $H_2$ atmosphere. The well-developed $Ca-{\alpha}-SiAlON:Yb^{2+}$ particles with homogeneous size were obtained at m = 3 (n = 0.15) for the compound of $Ca_{0.5m-0.005}Yb_{0.005}Si_{12-(m+n)}Al_{m+n}O_nN_{16-n}$, resulting in the strong green emission at around 550 nm.

Synthesis of $\beta$-Sialon from Wando Pyrophyllite (2) (완도 납석으로부터 $\beta$-Sialon의 합성 (2))

  • 이홍림;장병국;이형복
    • Journal of the Korean Ceramic Society
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    • v.22 no.5
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    • pp.35-42
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    • 1985
  • $eta$-Sialon powders were prepared by reduction-nitridation from mixture of Wando pyrophyllite and graphite as a reducing agent at 135$0^{\circ}C$ in 80% $N_2$-20% $H_2$ atmosphere. As the reaction products $Si_2ON_2$, $\beta$-$Si_3N_4$ a--$Si_3N_4$ and $\beta$-SiC were observed. Additive agents of MgO, CaO, $Y_2O_3$ were used for promoting the reduction and nitridiation aeaction. The present study was conducted to investigate the effects of silica-carbon ratio ($SiO_2$/C=weight ratio), raction time gas flow rate pellet size and powder packing on synthesis of $\beta$-Sialon from Wando pyropyllite.

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Effect of Additive Composition on Fracture Toughness of In Situ-Toughened SiC−Si3N4 Composites

  • Lee, Young-Il;Kim, Young-Wook
    • Journal of the Korean Ceramic Society
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    • v.44 no.4 s.299
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    • pp.189-193
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    • 2007
  • Effect of additive composition on fracture toughness of in situ-toughened $SiC-Si_3N_4$ composites was investigated for five different additive compositions. The highest toughness $(6.4MPa{\cdot}m^{1/2})\;in\;SiC-Si_3N_4$ composites investigated herein was obtained when an Y-Mg-Si-Al-O-N oxynitride glass was used as a sintering additive. The improvement in fracture toughness was produced by enhanced bridging and deflection by $Si_3N_4$ grains.

Electrical Characteristics of Staggered Capacitor ($Si_3N_4$ / HfAlO) for High Performance of Non-volatile Memory

  • Lee, Se-Won;Cho, Won-Ju
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2010.06a
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    • pp.358-358
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    • 2010
  • To improve the programming/erasing speed and leakage current of multiple dielectric stack tunnel barrier engineering (TBE) Non-volatile memory, We propose a new concept called staggered structure of TBE memory. In this study, We fabricated staggered structure capacitor on $Si_3N_4$ stacked HfAlO and measured C-V curve that can observe tunneling characteristic of this device as various annealing temperature compared with that of single layer $SiO_2$ capacitor.

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