• Title/Summary/Keyword: $SiN_{x}$

Search Result 944, Processing Time 0.027 seconds

Adsorption Characteristics of Carbon Dioxide on Chitosan/Zeolite Composites (키토산/제올라이트 복합체의 이산화탄소 흡착 특성)

  • Hong, Woong-Gil;Hwang, Kyung-Jun;Jeong, Gyeong-Won;Yoon, Soon-Do;Shim, Wang Geun
    • Applied Chemistry for Engineering
    • /
    • v.31 no.2
    • /
    • pp.179-186
    • /
    • 2020
  • In this study, chitosan/zeolite composites were prepared by using basalt-based zeolite impregnated with aqueous chitosan solution for the adsorptive separation of CO2. The prepared composites were characterized by scanning electron microscopy (SEM), Fourier-transform infrared (FT-IR) spectroscopy, thermogravimetric analysis (TGA), X-ray photoelectron spectroscopy (XPS), and nitrogen adsorption analysis. In addition, the adsorption equilibrium isotherms for CO2 and N2 were measured at 298 K using a volumetric adsorption system, and the results were analyzed by applying adsorption isotherm equations (Langmuir, Freundlich, and Sips) and energy distribution function. It was found that CO2 adsorption capacities were well correlated with the structural characteristics of chitosan and zeolite, and the ratio of elements [N/C, Al/(Si + Al)] formed on the surface of the composite. Moreover, the CO2/N2 adsorption selectivity was calculated under the mixture conditions of 15 V : 85 V, 50 V : 50 V, and 85 V : 15 V using the Langmuir equation and the ideal adsorption solution theory (IAST).

Wear Properties of Thermal Sprayed Al-based Metal Matrix Composites Against Different Counterparts (용사법에 의해 제조된 $Al/Al_2O_3$ 복합재료의 상대재에 따른 마모특성)

  • Kim, K.T.;Kim, Y.S.
    • Journal of Power System Engineering
    • /
    • v.12 no.3
    • /
    • pp.60-65
    • /
    • 2008
  • This study aims at investigating the wear properties of thermally sprayed $Al/Al_2O_3$ metal matrix composite(MMC) coating against different counterparts. $Al/Al_2O_3$ MMC coatings were fabricated using a flame spray system on an Al 6061 substrate. Dry sliding wear tests were performed using the sliding speeds of 0.2m/s and the applied loads of 1 and 2 N. AISI 52100, $Al_2O_3$, $Si_3N_4\;and\;ZrO_2$ balls(diameter: 8mm) were used as counterpart materials. Wear properties of $Al/Al_2O_3$ MMC coatings were analyzed using a scanning electron microscope(SEM) and energy dispersive X-ray spectroscopy (EDX). It was revealed that wear properties of $Al/Al_2O_3$ composite coatings were much influenced by counterpart materials. In the case of AISI 52100 used as counterparts, the wear rate of composites coating layer increased according to the increase of the applied load. On the contrary, in the case of ceramics used as counterparts, the wear rate of composites coating layer decreased according to the increase of the applied load.

  • PDF

Mechanical Behaviour of Non-Oxide Boride Type Ceramics Formed on The AISI 1040 Plain Carbon Steel

  • Sen, Saduman;Usta, Metin;Bindal, Cuma;UciSik, A.Hikmet
    • The Korean Journal of Ceramics
    • /
    • v.6 no.1
    • /
    • pp.27-31
    • /
    • 2000
  • A series experiments were performed to evaluate mechanical behavior of non-oxide boride type ceramics formed on the AISI 1040 plain carbon steel. Boronizing was performed in a slurry salt bath consisting of borax, boric acid, and ferro-silicon at $950^{\circ}C$ for 2-6h. The AISI 1040 steel used as substrate material was containing 0.4%C, 0.13%Si, 0.65%Mn, 0.02%P, 0.014%S. The presence of non-oxide boride type ceramics $Fe_2B $ and FeB formed on the surface of steel was confirmed by metallographic technique and X-ray diffraction (XRD) analysis. The hardness of borides measured via Vickers indenter with a load of 2N reached a microhardness of up to 1800 DPN. The hardness of unborided steel was 185 DPN. The fracture toughness of borides measured by means of Vickers indenter with a load of 10N was about 2.30 MPa.$m^{1/2}$. The thickness of boride layers ranged from 72$\mu\textrm{m}$ to 145$\mu\textrm{m}$. Boride layers have a columnar morphology.

  • PDF

First Report of Xenoroussoella triseptata Isolated from Soil in Korea

  • Jung-Joo Ryu;Seung-Yeol Lee;In-Kyu Kang;Leonid N. Ten;Hee-Young Jung
    • The Korean Journal of Mycology
    • /
    • v.50 no.3
    • /
    • pp.195-204
    • /
    • 2022
  • A fungal strain, designated KNUF-20-NI009, was isolated from soil collected from Gunsan-si, Jeollabuk-do, Korea. The isolate showed cultural features typical of the genus Xenoroussoella. Colonies cultivated on malt extract agar were olivaceous-brown to pale olivaceous-white at the margins, with undersides of dark olivaceous to olivaceous-brown and a white margin. The conidia, with a size range of 2.7-5.1×1.6-3.3 ㎛ ($\bar{x}=3.6\times2.6{\mu}m$, n=50), were globoid to ellipsoid in shape, hyaline when immature, becoming light brown to golden-brown when mature, and characterized by 1 or 2 guttules. Multi-locus sequence analysis based on a combined dataset of internal transcribed spacer regions (ITS), large subunit rDNA (LSU), small subunit rDNA (SSU), translation elongation factor 1-alpha (TEF1α), and RNA polymerase II largest subunit (RPB2) sequences revealed KNUF-20-NI009 to be a strain of Xenoroussoella triseptata. This is the first report of this species in Korea.

Development of Dose Evaluation Algorithm for Film Badge Using ISO Reference Radiations (ISO 표준방사선장을 이용한 필름배지의 선량평가 알고리즘 개발)

  • Kim, Jang-Lyul;Chang, Si-Young;Lee, Jai-Ki
    • Journal of Radiation Protection and Research
    • /
    • v.20 no.1
    • /
    • pp.37-44
    • /
    • 1995
  • Since provisions on the technical criteria for personnel dosimetry was amended three years ago, several improvements in the technique of monitoring personnel doses by TLD have taken place, but for the photograpfic film as a personnel monitor, additional investigations should be carried out for its accuracy of dose estimates because of its wide use in the radiation involved industries. So, this paper describes the methods to develope dose evaluation algorithm for photographic film using ISO reference radiations by i) empirical formula, ii) degree-of-fit method, and iii) matrix approximation. These methods show a good agreement between irradiated and calculated dose within tolerance level represented in ANSI N13. 11, and can be used for the dose evaluation of X, ${\gamma}$ and/or radiation fields.

  • PDF

INITIAL ESTIMATION OF THE RADIONUCLIDES IN THE SOIL AROUND THE 100 MEV PROTON ACCELERATOR FACILITY OF PEFP

  • An, So-Hyun;Lee, Young-Ouk;Cho, Young-Sik;Lee, Cheol-Woo
    • Nuclear Engineering and Technology
    • /
    • v.39 no.6
    • /
    • pp.747-752
    • /
    • 2007
  • The Proton Engineering Frontier Project (PEFP) has designed and developed a proton linear accelerator facility operating at 100 MeV - 20 mA. The radiological effects of such a nuclear facility on the environment are important in terms of radiation safety. This study estimated the production rates of radionuclides in the soil around the accelerator facility using MCNPX. The groundwater migration of the radioisotopes was also calculated using the Concentration Model. Several spallation reactions have occurred due to leaked neutrons, leading to the release of various radionuclides into the soil. The total activity of the induced radionuclides is approximately $2.98{\times}10^{-4}Bq/cm^3$ at the point of saturation. $^{45}Ca$ had the highest production rate with a specific activity of $1.78{\times}10^{-4}Bq/cm^3$ over the course of one year. $^3H$ and $^{22}Na$ are usually considered the most important radioisotopes at nuclear facilities. However, only a small amount of tritium was produced around this facility, as the energy of most neutrons is below the threshold of the predominant reactions for producing tritium: $^{16}O(n,\;X)^3H$ and $^{28}Si(n,X)^3H$ (approximately 20 MeV). The dose level of drinking water from $^{22}Na$ was $1.48{\times}10^{-5}$ pCi/ml/yr, which was less than the annual intake limit in the regulations.

Surface reaction of $HfO_2$ etched in inductively coupled $BCl_3$ plasma ($BCl_3$ 유도결합 플라즈마를 이용하여 식각된 $HfO_2$ 박막의 표면 반응 연구)

  • Kim, Dong-Pyo;Um, Doo-Seunng;Kim, Chang-Il
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
    • /
    • 2008.06a
    • /
    • pp.477-477
    • /
    • 2008
  • For more than three decades, the gate dielectrics in CMOS devices are $SiO_2$ because of its blocking properties of current in insulated gate FET channels. As the dimensions of feature size have been scaled down (width and the thickness is reduced down to 50 urn and 2 urn or less), gate leakage current is increased and reliability of $SiO_2$ is reduced. Many metal oxides such as $TiO_2$, $Ta_2O_4$, $SrTiO_3$, $Al_2O_3$, $HfO_2$ and $ZrO_2$ have been challenged for memory devices. These materials posses relatively high dielectric constant, but $HfO_2$ and $Al_2O_3$ did not provide sufficient advantages over $SiO_2$ or $Si_3N_4$ because of reaction with Si substrate. Recently, $HfO_2$ have been attracted attention because Hf forms the most stable oxide with the highest heat of formation. In addition, Hf can reduce the native oxide layer by creating $HfO_2$. However, new gate oxide candidates must satisfy a standard CMOS process. In order to fabricate high density memories with small feature size, the plasma etch process should be developed by well understanding and optimizing plasma behaviors. Therefore, it is necessary that the etch behavior of $HfO_2$ and plasma parameters are systematically investigated as functions of process parameters including gas mixing ratio, rf power, pressure and temperature to determine the mechanism of plasma induced damage. However, there is few studies on the the etch mechanism and the surface reactions in $BCl_3$ based plasma to etch $HfO_2$ thin films. In this work, the samples of $HfO_2$ were prepared on Si wafer with using atomic layer deposition. In our previous work, the maximum etch rate of $BCl_3$/Ar were obtained 20% $BCl_3$/ 80% Ar. Over 20% $BCl_3$ addition, the etch rate of $HfO_2$ decreased. The etching rate of $HfO_2$ and selectivity of $HfO_2$ to Si were investigated with using in inductively coupled plasma etching system (ICP) and $BCl_3/Cl_2$/Ar plasma. The change of volume densities of radical and atoms were monitored with using optical emission spectroscopy analysis (OES). The variations of components of etched surfaces for $HfO_2$ was investigated with using x-ray photo electron spectroscopy (XPS). In order to investigate the accumulation of etch by products during etch process, the exposed surface of $HfO_2$ in $BCl_3/Cl_2$/Ar plasma was compared with surface of as-doped $HfO_2$ and all the surfaces of samples were examined with field emission scanning electron microscopy and atomic force microscope (AFM).

  • PDF

조류를 이용한 유기성 폐수 처리 시스템과 물벼룩 성장 조건

  • Jo, Jae-Hun;Kim, Jun-Hwi;Lee, Jeong-Seop;Yun, Seong-Myeong;Kim, Si-Uk
    • 한국생물공학회:학술대회논문집
    • /
    • 2001.11a
    • /
    • pp.568-571
    • /
    • 2001
  • Food wastewater eluted from the three-stage methane fermentation system developed in this lab showed high concentrations of TCOD, BOD, T-N and T-P. Because the effluent of biological filter chamber (BFC) still had high concentration of nitrogen and organic material, the effluent was treated with algal periphyton system using algae. The removal rates of COD, T-N and T-P wer 96, 98 and 91%, respectively, in this system. The grown algae could digested byy waterfleas using the ecological food chain system. Food wastewater is better than algal culture medium for growth of waterflea, Moima Macrocopa. During 12days, the individual of waterflea increased to 180 in the food wastewater containing a T-N concentration of 150 mg/ ${\ell}$.

  • PDF

Molecular docking study on the α3β2 neuronal nicotinic acetylcholine receptor complexed with α-Conotoxin GIC

  • Lee, Che-Wook;Lee, Si-Hyung;Kim, Do-Hyoung;Han, Kyou-Hoon
    • BMB Reports
    • /
    • v.45 no.5
    • /
    • pp.275-280
    • /
    • 2012
  • Nicotinic acetylcholine receptors (nAChRs) are a diverse family of homo- or heteropentameric ligand-gated ion channels. Understanding the physiological role of each nAChR subtype and the key residues responsible for normal and pathological states is important. ${\alpha}$-Conotoxin neuropeptides are highly selective probes capable of discriminating different subtypes of nAChRs. In this study, we performed homology modeling to generate the neuronal ${\alpha}3$, ${\beta}2$ and ${\beta}4$ subunits using the x-ray structure of the ${\alpha}1$ subunit as a template. The structures of the extracellular domains containing ligand binding sites in the ${\alpha}3{\beta}2$ and ${\alpha}3{\beta}4$ nAChR subtypes were constructed using MD simulations and ligand docking processes in their free and ligand-bound states using ${\alpha}$-conotoxin GIC, which exhibited the highest ${\alpha}3{\beta}2$ vs. ${\alpha}3{\beta}4$ discrimination ratio. The results provide a reasonable structural basis for such a discriminatory ability, supporting the idea that the present strategy can be used for future investigations on nAChR-ligand complexes.

Near IR Luminescence Properties of Er-doped Sol-Gel Films (Er이 도핑된 졸-겔 코팅막의 발광특성)

  • Lim, Mi-Ae;Seok, Sang-Il;Kim, Ju-Hyeun;Ahn, Bok-Yeop;Kwon, Jeong-Oh
    • Proceedings of the Materials Research Society of Korea Conference
    • /
    • 2003.11a
    • /
    • pp.136-136
    • /
    • 2003
  • In fiber optic networks, system size and cost can be significantly reduced by development of optical components through planar optical waveguides. One important step to realize the compact optical devices is to develop planar optical amplifier to compensate the losses in splitter or other components. Planar amplifier provides optical gain in devices less than tens of centimeters long, as opposed to fiber amplifiers with lengths of typically tens of meters. To achieve the same amount of gain between the planar and fiber optical amplifier, much higher Er doping levels responsible for the gain than in the fiber amplifier are required due to the reduced path length. These doping must be done without the loss of homogeniety to minimize Er ion-ion interactions which reduce gain by co-operative upconversion. Sol-gel process has become a feasible method to allow the incorporation of Er ion concentrations higher than conventional glass melting methods. In this work, Er-doped $SiO_2$-A1$_2$ $O_3$ films were prepared by two different method via sol -Eel process. Tetraethylorthosilicate(TEOS)/aluminum secondary butoxide [Al (OC$_4$ $H_{9}$)$_3$], methacryloxypropylcnethoxysaane(MPTS)/aluminum secondary butofde [Al(OC$_4$ $H_{9}$)$_3$] systems were used as starting materials for hosting Er ions. Er-doped $SiO_2$-A1$_2$ $O_3$ films obtahed after heat-treating, coatings on Si substrate were characterized by X-ray din action, FT-IR, and N-IR fluorescence spectroscopy. The luminescence properties for two different processing procedure will be compared and discussed from peak intensity and life time.

  • PDF