• 제목/요약/키워드: $SeO_3$

검색결과 1,170건 처리시간 0.035초

환원기화 원자 흡광광도법에 의한 대기분진중의 총 셀렌의 정량 (Hydride Generation-Atomic Absorption Spectrophotometric Determination of Total Selenium in Atmospheric Particulate)

  • 이용근;최건형;이동수;황규자
    • 한국대기환경학회지
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    • 제6권2호
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    • pp.147-154
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    • 1990
  • A sensitive method for the determination of total selenium in aerosol particles is described. The method involves dissolution of aerosol particles by $HNO_3-HClO_4$ mixed acids, pre-reduction of Se (VI) to Se (IV) by boiling hydrochloric acid, and hydride generation followed by atomic absorption detection. Dissolved Se (IV) in 4M hydrochloric acid is reacted with $NaBH_4$ to form $H_2Se$, which is subsequently collected in an U-tube cooled in liquid nitrogen. Upon the completion of $H_2Se$ generation, the collected $H_2Se$ is rapidly vaporized into a quartz cuvette burner by removing the U-tube from liquid nitrogen, atomized, and then detected by an atomic absorption spectrophotometer. The absolute sensitivity of the method is 0.49 ng/0.0044 Abs. The accuracy of the method evaluated by analyzing standard reference materials for urban aerosol is better than 10%. Analytical results for urban and rural aerosol particles are reported.

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Si 나노 입자와 Er3+를 공첨가한 SiO2계 도파로의 제작과 평가 (Fabrication and characterization of SiO2 based waveguide co-doped with Si-nanocrystal and Er3+)

  • 최세원;고영호;장세훈;오익현;강창석
    • 한국재료학회지
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    • 제17권4호
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    • pp.222-226
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    • 2007
  • [ $SiO_2$ ]thin films containing Si-nanocrystals and $Er^{3+}$ were fabricated by the RF-sputtering method. Intense emission of $Er^{3+}$ was observed at 1530 nm region after the annealing of the film at $1050^{circ}C$ for 5 min. Channel waveguides were fabricated using such films for the core. The films containing Si higher than 2.4 at% exhibited the change in stress from compression to tension after annealing, which induced the fatal loss-increase in waveguide. The optical gain might be attained by the Er-doped waveguide with Si lower than 2.4 at% by a visible-light-excitation.

Development of the 3 Dimensional ZnO Nanostructures for the Highly Efficient Quantum Dot Sensitized Solar Cells

  • 김희진;용기중
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2013년도 제44회 동계 정기학술대회 초록집
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    • pp.672-672
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    • 2013
  • 본 연구에서는 수열합성법을 기반으로 한 3차원 ZnO 나노구조의 합성을 통해 효율적인 양자점 감응형 태양전지로의 응용을 하고 그 특성을 평가하였다. 기존의 1차원 ZnO 나노구조의 경우 높은 전자이동도와 구조적으로 얻을 수 있는 방향성 있는 전자의 효율적인 전달을 통해 효과적인 광전극으로 많은 관심을 받아왔다. 하지만 나노파티클 기반의 필름에 비해 표면적이 크게 떨어지기 때문에 효과적인 흡광이 어렵다는 단점이 존재하여 높은 효율특성을 내지는 못하였다. 본 연구에서는 이러한 단점을 극복하면서 기존 ZnO 나노선의 장점을 극대화 하기 위해 성장시킨 ZnO 나노선 위에 추가적으로 가지를 형성하여 표면적 향상과 효과적인 전자전달 특성을 얻고자 하였다. 3차원 ZnO 나노구조는citrate 계열의 capping agent의 첨가를 통한 수열 합성법을 통해 1차원의 ZnO 나노선 위에 nanosheet 형식의 가지를 형성하였고 이는 빛의 효과적인 산란특성 및 표면적 향상을 통한 CdS, CdSe의 양자점 증착량을 증가시키는 효과를 얻을 수 있었다. 이러한 태양전지의 소자 특성은 SEM, TEM을 통한 구조 특성평가 및 DRS, J-V curve 및 IPCE를 통한 광학적 특성평가를 통해 확인하였다.

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Defects Evaluation of Blue Light Emitting Materials by Wet Etching and Transmission Electron Microscoppy

  • Hong, Soon-Ku;Kim, Bong-Jin
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 1998년도 제14회 학술발표회 논문개요집
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    • pp.105-106
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    • 1998
  • Evaluation of def3ects by etch-ppit formation was studied. A NaOH(30 mol%) etchant was found useful for etch-ppit developpment on ZnSe-based eppilayers grown on (001) gaAs. And a H3ppO4(85 mol%) was used in order to developp etch-ppits on GaN-base eppilayers grown on (0001) Al2O3 After etch-ppit formation on the surfsce. Transmission Electron Microscoppy(TEM) was cppmdicted. By etch-ppit developpment and TEM observation we could determine the defect typpes by etch-ppit configurfations and found origin of etch-ppit in the cse of ZnSe-based materials. Based uppon these results we can do defect identification by etch-ppit test simpply. In the case of GaN-based materials we could evaluate nanoppippe density. however high density of threading dislocations in GaN eppilayers were not revealed by etch-ppit developpment. Based uppon these results we can evaluate the nanoppippe density which difficult to evaluate using TEM beacause of its small size(diameter). And at ppresent status direct matching of etch-ppit density to dislocation density would make severe mistake.

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