• 제목/요약/키워드: $R_s$(Sheet Resistance)

검색결과 42건 처리시간 0.023초

Effects of Plasma Treatment on Contact Resistance and Sheet Resistance of Graphene FET

  • Ra, Chang-Ho;Choi, Min Sup;Lee, Daeyeong;Yoo, Won Jong
    • 한국표면공학회지
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    • 제49권2호
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    • pp.152-158
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    • 2016
  • We investigated the effect of capacitively coupled Ar plasma treatment on contact resistance ($R_c$) and channel sheet resistance ($R_{sh}$) of graphene field effect transistors (FETs), by varying their channel length in the wide range from 200 nm to $50{\mu}m$ which formed the transfer length method (TLM) patterns. When the Ar plasma treatment was performed on the long channel ($10{\sim}50{\mu}m$) graphene FETs for 20 s, $R_c$ decreased from 2.4 to $1.15k{\Omega}{\cdot}{\mu}m$. It is understood that this improvement in $R_c$ is attributed to the formation of $sp^3$ bonds and dangling bonds by the plasma. However, when the channel length of the FETs decreased down to 200 nm, the drain current ($I_d$) decreased upon the plasma treatment because of the significant increase of channel $R_{sh}$ which was attributed to the atomic structural disorder induced by the plasma across the transfer length at the edge of the channel region. This study suggests a practical guideline to reduce $R_c$ using various plasma treatments for the $R_c$ sensitive graphene and other 2D material devices, where $R_c$ is traded off with $R_{sh}$.

안티몬 이온주입시 Sb2O3 빔튜닝 방법 및 모니터링 연구 (A Study on Sb2O3 Beam Tuning and Monitoring in Antimony Implantation -)

  • 김상용;최민호;김남훈;정헌상;장의구
    • 한국전기전자재료학회논문지
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    • 제17권5호
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    • pp.476-480
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    • 2004
  • The characteristics of antimony implants are relatively well-known. Antimony has lower diffusion coefficient, shorter implantation range, and smaller scattering as compared with conventional dopants such as phosphorous and arsenic. It has been commonly used in the doping of buried layer in Bi-CMOS process. In this paper, characteristics and appropriate condition of monitoring in antimony implant beam tuning using Sb$_2$O$_3$were investigated to get a reliable process. TW(Thema Wave) and R$_{s}$(Sheet Resistance) test were carried out to set up condition of monitoring for stable operation through the periodic inspection of instruction condition. The monitoring was progressed at the point that the slant of R$_{s}$ varied significantly to Investigate the variation of instruction accurately.

낮은 접촉저항을 갖는 Ni/Si/Ni n형 4H-SiC의 오옴성 접합 (Low Resistivity Ohmic Ni/Si/Ni Contacts to N-Type 4H-SiC)

  • 김창교;양성준;조남인;유홍진
    • 대한전기학회논문지:전기물성ㆍ응용부문C
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    • 제53권10호
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    • pp.495-499
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    • 2004
  • Characteristics of ohmic Ni/Si/Ni contacts to n-type 4H-SiC are investigated systematically. The ohmic contacts were formed by annealing Ni/Si/Ni sputtered sequentially The annealings were performed at 950℃ using RTP in vacuum ambient and N₂ ambient, respectively. The specific contact resistivity(p/sub c/), sheet resistance(R/sub s/), contact resistance (R/sub c/) transfer length(L/sub T/) were calculated from resistance(R/sub T/) versus contact spacing(d) measurements obtained from TLM(transmission line method) structure. While the resulting measurement values of sample annealed at vacuum ambient were p/sub c/ = 3.8×10/sup -5/Ω㎠, R/sub c/ = 4.9 Ω and R/sub T/ = 9.8 Ω, those of sample annealed at N₂ ambient were p/sub c/ = 2.29×10/sup -4/Ω㎠, R/sub c/ = 12.9 Ω and R/sub T/ = 25.8 Ω. The physical properties of contacts were examined using XRD 3nd AES. The results showed that nickel silicide was formed on SiC and Ni was migrated into SiC. This result indicates that Ni/Si/Ni ohmic contact would be useful in high performance electronic devices.

PEDOT:PSS의 두께가 유무기 하이브리드 태양전지 성능에 미치는 영향 (The Effect of PEDOT:PSS Thickness on the Characteristics of Organic-Inorganic Hybrid Solar Cells)

  • 김석윤;한주원;오준호;김용현
    • Current Photovoltaic Research
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    • 제7권3호
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    • pp.61-64
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    • 2019
  • In this study, we investigate organic-inorganic hybrid solar cells with a very simple three-layer structure (Al/n-Si/PEDOT:PSS). The performance of hybrid solar cells is optimized by controlling the sheet resistance and optical transmittance of the PEDOT:PSS layers. As the thickness of the PEDOT:PSS layer decreases, the optical absorption of the n-Si increases, which greatly improves the short-circuit current density ($J_{SC}$) of devices, but the increase in sheet resistance leads to a decrease in the open-circuit voltage ($V_{OC}$) and the fill factor (FF). The solar cell with the 180-nm thick PEDOT:PSS layer shows a highest efficiency of 8.45% ($V_{OC}$: 0.435 V, $J_{SC}$: $33.7mA/cm^2$, FF: 57.5%). Considering these results, it is expected that the optimizing process for the sheet resistance and transmittance of the PEDOT:PSS layer is essential for producing high-efficiency organic-inorganic hybrid solar cells and will serve as an important basis for achieving low-cost, high-efficiency solar cells.

증착 후 열처리 온도에 따른 In2O3 박막의 구조적, 전기적, 광학적 특성 변화 (Effect of Annealing Temperature after Deposition on the Structural, Electrical and Optical Properties of In2O3 Films)

  • 이영진;이학민;허성보;김유성;채주현;공영민;김대일
    • 열처리공학회지
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    • 제24권6호
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    • pp.307-310
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    • 2011
  • We have investigated the structural, electrical and optical properties of $In_2O_3$ thin films deposited by RF magnetron sputtering and then annealed at $150^{\circ}C$ and $300^{\circ}C$ in vacuum. The structural and electrical properties are strongly related to annealing temperature. All the annealed $In_2O_3$ films are grown as a hexagonal wurtzite phase and the largest grain size is observed in the films annealed at $300^{\circ}C$. The sheet resistance decreases with a increase in annealing temperature and $In_2O_3$ film annealed at $300^{\circ}C$ shows the lowest sheet resistance of $174{\Omega}/{\Box}$. The optical transmittance of $In_2O_3$ films in a visible wavelength region also depends on the annealing temperature. The films annealed at $300^{\circ}C$ show higher transmittance of 76% than those of the films prepared in this study.

마그네트론 스퍼터링 법을 이용한 IZO/Ag/IZO 다층 박막 투명 면상 발열체 (IZO/Ag/IZO Multilayers Prepared by Magnetron Sputtering for Flexible Transparent Film Heaters)

  • 박소원;강동령;김나영;황성훈;전승훈;;김태훈;김서한;박철우;송풍근
    • 한국표면공학회:학술대회논문집
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    • 한국표면공학회 2017년도 춘계학술대회 논문집
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    • pp.114.2-114.2
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    • 2017
  • Transparent film heaters (TFHs) based on Joule heating are currently an active research area. However, TFHs based on an indium tin oxide (ITO) monolayer have a number of problems. For example, heating is concentrated in part of the device. Also, heating efficiency is low because it has high sheet resistance ($R_S$). Resistance of indium zinc oxide (IZO) is similar to ITO and it can be used to flexible applications due to its amorphous structure. To solve these problems, our study introduced hybrid layers of IZO/Ag/IZO deposited by magnetron sputtering, and the electrical, optical, and thermal properties were estimated for various thickness of the metal interlayer. It was found that the sheet resistance of the multilayer was mainly dependent on the thickness of the Ag layers. The $R_S$ of IZO(40)/Ag/IZO(40nm) multilayer was 5.33, 3.29, $2.15{\Omega}/{\Box}$ for Ag thickness of 10, 15, and 20nm, respectively, while the $R_S$ of an IZO monolayer(95nm) was $59.58{\Omega}/{\Box}$. The optical transmittance at 550nm for the IZO(95nm) monolayer is 81.6%, and for the IZO(40)/Ag/IZO(40nm) multilayers with Ag thickness 10, 15 and 20nm, is for 72.8, 78.6, and 63.9%, respectively. The defrost test showed that the film with the lowest RS had the highest heat generation rate (HGR) for the same applied voltage. The results indicated that IZO(40)/Ag(15)/IZO(40nm) multilayer has the best suitable property, which is a promising thin film heater for the application in vehicle windshield.

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비정질 실리콘 박막 트랜지스터 소자 특성 향상을 위한 저 저항 금속 박막 전극의 형성 및 전기적 저항 특성 평가 (Metallizations and Electrical Characterizations of Low Resistivity Electrodes(Al, Ta, Cr) in the Amorphous Silicon Thin Film Transistor)

  • 김형택
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 1993년도 춘계학술대회 논문집
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    • pp.96-99
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    • 1993
  • 대면적 액정 표시판 (Liquid Crystal Display:LCD) panel내(內)의 구동소자인 비정질 실리콘 (amorphous silicon) 박막 트랜지스터 (Thin Film Transistor:TFT)의 구동신호전달 소자특성 향상을 위한 본(本) 연구의 목적은 액정 panel TFT 제조공정 상(上)의 증착금속 전극박막들의 Test Elements Group(TEG) metal line pattern별(別) 전기적 저항특성 평가에 있다. 현(現) TFT 전극용(用)으로 개발이 진행 중(中)인 Aluminum(Al), Tantalum(Ta) 및 Chromium(Cr) 이 특성평가 대상 금속 박막으로 선정 되었으며, 이들 금속막의 증착 thickness 와 TEG metal line width가 저항특성 변수로 성립 되었다. 본(本) 실험을 통해 금속 박막의 TEG line width별(別) 체적(體積)저항 (bulk resistance), 면(面)저항(sheet resistance), 비(比)저항 (resistivity) 및 기판 상(上)의 metal pattern 위치 변화에 따른 전기적 저항 uniformity 특성변화 평가가 있었다. TEG metal line 측정 변위에 따른 저항율의 선형변화 특성도 연구 되었으며, metal line별(別) 전기적 연속, 불연속 배선 단락 특성(electrical continuity test) 관찰도 있었다.

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열가소성 고무를 사용한 RUBBER SHEET의 제조 및 물성 (Development and Properties of Rubber Sheet using Thermoplastic Elastomer)

  • 천승한;한민현;문일식
    • Elastomers and Composites
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    • 제38권2호
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    • pp.122-127
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    • 2003
  • 환경에 유해한 PVC 재질의 바닥재나 시트를 대체하기 위하여 styrene-ethylene-butadiene-styrene(SEBS)과 같은 열가소성고무를 사용하고 polypropylene(PP) 등의 폴리머와 오일, 무기물 및 안정제 등을 혼합하여 내충격성 또는 탄성이 우수한 새로운 소재를 개발하기 위한 컴파운딩 연구를 진행하였다. SEBS와 오일의 혼합물에서 경도는 오일의 함량이 증가함에 따라서 선형적으로 감소하였고, SEBS/oil/PP의 조성물에서는 PP의 함량이 증가하면 인장강도는 선형적으로 증가하는 반면, 신율은 PP가 50phr상에서는 거의 영향이 없었다. PVC 소재의 바닥재나 시트를 대체 사용하기 위한 실질적인 SEBS 혼합물의 조성물에서도 인장 및 인열강도, 그리고 경도는 PP 함량에 비례하여 증가하는 것으로 나타났으나, 용융지수는 PP 함량이 증가하면 감소하는 것으로 나타났다.

Ni/Si/Ni n형 4H-SiC의 오옴성 접합 (Ni/Si/Ni Ohmic contacts to n-type 4H-SiC)

  • 이주헌;양성준;노일호;김창교;조남인;정경화;김은동;김남균
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2001년도 추계학술대회 논문집 Vol.14 No.1
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    • pp.197-200
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    • 2001
  • In this letter, we report on the investigation of Ni/Si/Ni Ohmic contacts to n-type 4H-SiC. Ohmic contacts have been formed by a vacuum annealing and $N_2$ gas ambient annealing method at $950^{\circ}C$ for 10 min. The specific contact resistivity ( $\rho_{c}$ ), sheet resistance($R_s$), contact resistance($R_c$), transfer length($L_T$) were calculated from resistance($R_T$) versus contact spacing(d) measurements obtained from 10 TLM(transmission line method) structures. The resulting average values of vacuum annealing sample were $\rho_{c}=3.8{\times}10^{-5}\Omega cm^{3}$, $R_{c}=4.9{\Omega}$, $R_{T}=9.8{\Omega}$ and $L_{T}=15.5{\mu}m$, resulting average values of another sample were $\rho_{c}=2.29{\times}10^{-4}\Omega cm^{3}$, $R_{c}=12.9{\Omega}$ and $R_{T}=25.8{\Omega}$. The physical properties of contacts were examined using X-Ray Diffraction and Auger analysis, there was a uniform intermixing of the Si and Ni, migration of Ni into the SiC.

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Ni/Si/Ni n형 4H-SiC의 오옴성 접합 (Ni/Si/Ni Ohmic contacts to n-type 4H-SiC)

  • 이주헌;양성준;노일호;김창교;조남인;정경화;김은동;김남균
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2001년도 추계학술대회 논문집
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    • pp.197-200
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    • 2001
  • In this letter, we report on the investigation of Ni/Si/Ni Ohmic contacts to n-type 4H-SiC. Ohmic contacts have been formed by a vacuum annealing and N$_2$ gas ambient annealing method at 950$^{\circ}C$ for 10 min. The specific contact resistivity($\rho$$\sub$c/), sheet resistance(R$\sub$S/), contact resistance(R$\sub$S/), transfer length(LT) were calculated from resistance(R$\sub$T/) versus contact spacing(d) measurements obtained from 10 TLM(transmission line method) structures. The resulting average values of vacuum annealing sample were $\rho$$\sub$c/=3.8x10$\^$-5/ Ω$\textrm{cm}^2$ , R$\sub$c/=4.9Ω, R$\sub$T/=9.8Ω and L$\sub$T/=15.5$\mu\textrm{m}$, resulting average values of another sample were $\rho$$\sub$c/=2.29x10$\^$-4/ Ω$\textrm{cm}^2$ , R$\sub$c/=12.9Ω, R$\sub$T/=25.8Ω. The Physical properties of contacts were examined using X-Ray Diffraction and Auger analysis, there was a uniform intermixing of the Si and Ni, migration of Ni into the SiC.

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