Effect of Annealing Temperature after Deposition on the Structural, Electrical and Optical Properties of In2O3 Films |
Lee, Y.J.
(School of Materials Science and Engineering, University of Ulsan)
Lee, H.M. (School of Materials Science and Engineering, University of Ulsan) Heo, S.B. (School of Materials Science and Engineering, University of Ulsan) Kim, Y.S. (New Optics, R&D Team) Chae, J.H. (New Optics, R&D Team) Kong, Y.M. (School of Materials Science and Engineering, University of Ulsan) Kim, Daeil (School of Materials Science and Engineering, University of Ulsan) |
1 | S. B. Heo, H. M. Lee, C. W. Jung, S. K. Kim, Y. J. Lee, Y. S. Kim, Y. Z. You and D. Kim : J. Kor. Soc. Heat Treat, 24 (2011) 31. |
2 | J. H. Kwak and S. H. Cho : J. Korean Vacuum Soc, 19 (2010) 224. DOI |
3 | Daeil Kim : J. Kor. Soc. Heat Treat, 24 (2011) 140. |
4 | F. O. Adurodija, L. Semple and R. Bruning : Thin Solid Films, 492 (2005) 153. DOI |
5 | V. Korobov, M. Leibovitch and Y. Shapira : Appl. Phys. Lett, 65 (1994) 2290. DOI ScienceOn |
6 | V. Senthilkumar and P. Vickraman : Curr. Appl. Phys, 10 (2010) 880. DOI ScienceOn |
7 | H. Morikawa and M. Fujita : Thin Solid Films, 359 (2000) 61. DOI ScienceOn |
8 | B. R. Krishna, T. Subramanyam, B. Srinivasulu and S. Uthanna : Opt. Mater, 15 (2000) 217. DOI ScienceOn |
9 | G. Haacke : J. Appl. Phys, 47 (1976) 4086. DOI ScienceOn |
10 | B. D. Cullity : Elements of X-ray diffractions, Addition-Wesley, Reading, MA, (1978) 102-121. |
11 | Daeil Kim : Appl. Surf. Sci, 257 (2010) 704. DOI ScienceOn |