• Title/Summary/Keyword: $P_2O_5-V_2O_5-ZnO$

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도핑 농도에 따른 GaN-doped ZnO 박막의 제조 및 특성 평가

  • Lee, Dong-Uk;Sim, Byeong-Cheol;Lee, Won-Jae
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2009.06a
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    • pp.142-142
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    • 2009
  • Zinc Oxide (ZnO)는 wurtzite 결정구조를 가지고 있으며, 밴드갭 에너지가 약 3.4eV인 산화물 반도체 이다. GaN가 도핑된 ZnO 박막을 Pulsed Laser Deposition (PLD) 법을 이용하여 사파이어 기판과 실리콘 기판에 각각 증착하였다. $500^{\circ}C$의 증착온도에서 1at%~10at%까지의 GaN 도핑농도에 따른 ZnO 박막의 결정성, 성분 분석을 비롯한 전기적 특성을 조사하였다. 첨가된 GaN의 농도에 따라 ZnO 박막의 결정성이 변화하였으며, 농도 변화에 상관없이 ZnO(002) 방향으로 성장함을 알 수 있었다. 또한 실리콘 기판에 증착한 GaN-doped ZnO 박막은 5at%에서 $9.3\;{\times}\;10-3{\Omega}cm$, 10at%에서 $9.2\;{\times}\;10-3{\Omega}cm$의 비저항 값을 가지며 각각 p-type 특성을 나타내었다.

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Solution-processible Inorganic-organic Hybrid Bipolar Field Effect Transistors

  • Chae, Gil Jo;Walker, Bright;Kim, Kang Dae;Cho, Shinuk;Seo, Jung Hwa
    • Proceedings of the Korean Vacuum Society Conference
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    • 2014.02a
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    • pp.391.2-391.2
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    • 2014
  • Solution-processible hybrid bipolar field effect transistors (HBFETs) with balanced hole and electron mobilities were fabricated using a combination of the organic p-type poly (3-hexylthiophene) (P3HT) layer and inorganic n-type ZnO material. The hole and electron mobilities were first optimized in single layer devices by using acetonitrile as a solvent additive to process the P3HT and annealing to process the ZnO layer. The highest hole mobility of the P3HT-only-devices with 5% acetonitrile was 0.15 cm2V-1s-1, while the largest electron mobility was observed in the ZnO-only-devices annealed at $200^{\circ}C$ and found to be $7.2{\times}10-2cm2V-1s-1$. The inorganic-organic HBFETs consisting of P3HT with 5% acetonitrile and ZnO layer annealed at $200^{\circ}C$ exhibited balanced hole and electron mobilities of $4.0{\times}10-2$ and $3.9{\times}10-2cm2V-1s-1$, respectively. The effect on surface morphology and crystallinity by adding acetonitrile and thermal annealing were investigated through X-ray diffraction and atomic force microscopy (AFM). Our findings indicate that techniques demonstrated herein are of great utility in improving the performance of inorganic-organic hybrid devices

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Arsenic Doping of ZnO Thin Films by Ion Implantation (이온 주입법을 이용한 ZnO 박막의 As 도핑)

  • Choi, Jin Seok;An, Sung Jin
    • Korean Journal of Materials Research
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    • v.26 no.6
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    • pp.347-352
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    • 2016
  • ZnO with wurtzite structure has a wide band gap of 3.37 eV. Because ZnO has a direct band gap and a large exciton binding energy, it has higher optical efficiency and thermal stability than the GaN material of blue light emitting devices. To fabricate ZnO devices with optical and thermal advantages, n-type and p-type doping are needed. Many research groups have devoted themselves to fabricating stable p-type ZnO. In this study, $As^+$ ion was implanted using an ion implanter to fabricate p-type ZnO. After the ion implant, rapid thermal annealing (RTA) was conducted to activate the arsenic dopants. First, the structural and optical properties of the ZnO thin films were investigated for as-grown, as-implanted, and annealed ZnO using FE-SEM, XRD, and PL, respectively. Then, the structural, optical, and electrical properties of the ZnO thin films, depending on the As ion dose variation and the RTA temperatures, were analyzed using the same methods. In our experiment, p-type ZnO thin films with a hole concentration of $1.263{\times}10^{18}cm^{-3}$ were obtained when the dose of $5{\times}10^{14}$ As $ions/cm^2$ was implanted and the RTA was conducted at $850^{\circ}C$ for 1 min.

$LiZnBO_3$: Crystal Structure ($LiZnBO_3$ : 결정구조)

  • Chang, Ki Seog
    • Journal of the Korean Chemical Society
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    • v.45 no.3
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    • pp.251-255
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    • 2001
  • The structure of the lithium zinc borate LiZnBO3 has been established by single-crystal X-ray diffraction methods. It crystallizes in the triclinic space group P1(Z=2), with unit-cell parameters - $a=5.0915(9)\AA$, $b=5.059(1)\AA$, $c=6.156(1)\AA$, $V=120.6(1)\AA3$ , $\alpha=65.81(1)^{\circ}$, $\beta=65.56(1)^{\circ}$ and $\gamma=59.77(1)^{\circ}$. The structure was determined from 704 unique reflections and refined to the final residuals R=0.039 and wR=0.056. It is characterized by an association of BO3 triangles and LiO4 and ZnO4 tetrahedra. The Li and Zn atoms are disordered around the average positions between Li1 and Li2 atoms or between Zn1 and Zn2 atoms. The disorder can be described by four half-occupied positions about Li1, Li2, Zn1 and Zn2 atoms.

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Effect of V2O5 Content and Pre-Sintering Atmosphere on Adhesive Property of Glass Frit for Laser Sealing of OLED (OLED 레이저 실링용 글라스 프릿에서 V2O5 함량 및 가소성 분위기가 접합 특성에 미치는 영향)

  • Jeong, HyeonJin;Lee, Mijai;Lee, Youngjin;Kim, Jin-Ho;Jeon, Dae-Woo;Hwang, Jonghee;Lee, Jungsoo;Yang, Yunsung;Youk, Sookyung;Park, Tae-Ho;Moon, Yun-Gon
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.29 no.8
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    • pp.489-493
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    • 2016
  • In this study, the effect of vanadium oxide ($V_2O_5$) content and pre-sintering atmosphere on sealing property of glass frit that consisted of $V_2O_5-BaO-ZnO-P_2O_5-TeO_2-CuO-Fe_2O_3-SeO_2$ was investigated by XPS (X-ray photoelectron spectroscopy). The content of V2O5 was changed to 15, 30, and 45 mol%, and the pre-sintering was carried out in air and $N_2$ condition, respectively. XPS analysis conducted before and after laser irradiation with identical sample. Before laser treatment, glass frits that were pre-sintered at air condition showed both $V^{4+}$ and $V^{5+}$, but the valence state was changed to $V^{5+}$ after laser irradiation when the glass frits contained 30 and 45 mol% $V_2O_5$; this change led to non-adhesive property. On the other hand, glass frits that were pre-sintered at $N_2$ condition exhibited only $V^{4+}$ and it showed fine adhesion irrespective of the $V_2O_5$ content. As a result, the existence of $V^{4+}$ seems to be a major factor for controlling the adhesive property of glass frit for laser sealing.

Substrate effects of ZnO films deposited by rf magnetron sputtering (고주파 마그네트론 스펏터링법으로 제조한 ZnO박막의 기판에 따른 효과)

  • Kim, Y.J.;Kwon, O.J.;Yu, S.D.;Kim, K.W.
    • Journal of Sensor Science and Technology
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    • v.5 no.6
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    • pp.68-73
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    • 1996
  • ZnO thin films were prepared on glass and (012) sapphire substrates by rf magnetron sputtering. Polycrysralline ZnO films with a (002) orientation were obtained on glass substrates. (110) ZnO films were epitaxially grown on the (012) sapphire substrates. Surface acoustic wave properties were also measured for propagating along the c axis of ZnO film on the glass and sapphire substrates. The phase velocities ($V_{p}$) on glass and sapphire substrate at center frequency were 2680 m/sec and 5980 m/sec and the effective coupling coefficient ($k^{2}$) on the 0th mode were 0.98 % and 1.43 %, respectively.

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Highly Transparent Indium Oxide Doped ZnO Spreading Layer for GaN Based Light Emitting Diodes

  • Lim, Jae-Hong;Park, Seong-Ju
    • Korean Journal of Materials Research
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    • v.19 no.8
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    • pp.443-446
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    • 2009
  • This study develops a highly transparent ohmic contact scheme using indium oxide doped ZnO (IZO) as a current spreading layer for p-GaN in order to increase the optical output power of nitride-based lightemitting diodes (LEDs). IZO based contact layers of IZO, Ni/IZO, and NiO/IZO were prepared by e-beam evaporation, followed by a post-deposition annealing. The transmittances of the IZO based contact layers were in excess of 80% throughout the visible region of the spectrum. Specific contact resistances of $3.4\times10^{-4}$, $1.2\times10^{-4}$, $9.2\times0^{-5}$, and $3.6\times10^{-5}{\Omega}{\cdot}cm^2$ for IZO, Ni/Au, Ni/IZO, and NiO/IZO, respectively were obtained. The forward voltage and the optical output power of GaN LED with a NiO/IZO ohmic contact was 0.15 V lower and was increased by 38.9%, respectively, at a forward current of 20 mA compared to that of a standard GaN LED with an Ni/Au ohmic contact due to its high transparency, low contact resistance, and uniform current spreading.

Gamma radiation attenuation properties of tellurite glasses: A comparative study

  • Al-Hadeethi, Y.;Sayyed, M.I.;Tijani, S.A.
    • Nuclear Engineering and Technology
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    • v.51 no.8
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    • pp.2005-2012
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    • 2019
  • This work investigated the radiation attenuation characteristics of three series of tellurite glass systems with the following compositions: 30PbO-10ZnO-xTeO2-(60-x)B2O3 where x = 10, 30, 40, 50 and 60 mol%, xBaO-xB2O3-(100-2x)TeO2 with x = 15-40 mol% and 50ZnO-(50-x)P2O5-xTeO2, where x = 0, 10, .40 mol%. The results revealed that the attenuation parameters in all the samples decrease with increase in the energy, which implied that all the samples have better interaction with gamma photons at low energies and thus higher photon attenuating efficiency. From the three systems, the samples coded as PbZnBTe60, BaBTe70 and ZnPTe40 have the lowest half value layer values and accordingly have superior photon attenuation efficacy. The maximum effective atomic number values were found for energy less than 0.1 MeV particularly near the K-edges absorption of the heavy atomic number elements such as Te, Ba and Pb. At the lowest energy, the Zeff values are found in the range of 62.33-66.25, 49.43-50.81 and 24.99-35.83 for series 1-3 respectively. Also, we found that the density of the glass remarkably affects the photon attenuation ability of the selected glasses. The mean free path results showed that the PbO-ZnO-TeO2-B2O3 glass system has better radiation shielding efficiency than the glass samples in series 2 and 3.

Irradiation-Induced Electronic Structure Modifications in ZnO Thin Films Studied by X-Ray Absorption Spectroscopy

  • Gautam, Sanjeev;Yang, Bum Jin;Lee, Yunju;Jung, Ildoo;Won, Sung Ok;Song, Jonghan;Asokan, K.;Chae, Keun Hwa
    • Proceedings of the Korean Vacuum Society Conference
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    • 2013.02a
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    • pp.456-456
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    • 2013
  • We report the modifications in the electronic structureof ZnO thin films induced by swift heavy ion (SHI) irradiated ZnO thin films by using near edge X-ray absorption fine structure (NEXAFS) spectroscopy at O K-edge was performed at BL10D XAS-KIST beamline at Pohang Accelerator Lab (PAL). ZnO films of 250 nm thickness oriented in [200] plane deposited by RF magnetron sputtering using equal $Ar:O_2$ atmosphere and air annealed at $500^{\circ}C$ for 6 hours for stability were irradiated with 120 MeV Au and 100 MeV O beams separately with different doses ranging from $1{\times}10^{11}$ to $5{\times}10^{12}$ ions/$cm^2$. High Resolution X-ray diffraction and NEXAFS analysis indicates significant changes in the electronic structure and the SHI effect is different for Ag and O-beams. The NEXAFS measurements provide direct evidence of O 2p and Zn 3d orbital hybridization. The NEXAFS results will be presented in detail.

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DC Accelerated Aging Characteristics of Dy2O3-Doped ZPCCD-Based Varistors (Dy2O3가 첨가된 ZPCCD계 바리스터의 DC 가속열화 특성)

  • 남춘우;박종아;김명준
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.16 no.12
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    • pp.1071-1076
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    • 2003
  • The nonlinear properties and their stability of ZPCCD- based varistors, which are composed of ZnO P $r_{6}$ $O_{ll}$ - CoO-C $r_2$ $O_3$-D $y_2$ $O_3$-based ceramics, were investigated in the D $y_2$ $O_3$ content range of 0.0∼2.0 mol%. The incorporation of D $y_2$ $O_3$ greatly affected the nonlinear properties and the best nonlinearity was obtained from 0.5 mol% D $y_2$ $O_3$ with nonlinear exponent of 66.6 and leakage current of 1.2 $\mu$A. Further addition of D $y_2$ $O_3$ deteriorated the nonlinear properties. In stability against DC accelerated aging stress state: 0.95 $V_{1mA}$/15$0^{\circ}C$/24 h, the 0.5 mol% D $y_2$ $O_3$-doped varistor exhibited the highest stability, in which the variation rate of varistor voltage and nonlinear exponent are -1.9% and 10.5%, respectively. The remainder varistors resulted in thermal runaway due to low density of ceramics.s.s.