• 마이크로전자및패키징학회지
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• 제25권4호
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• pp.75-81
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• 2018

Cu-Cu 웨이퍼 본딩 강도를 향상시키기 위한 Cu 박막의 표면처리 기술로 $Ar-N_2$ 플라즈마 처리 공정에 대해 연구하였다. $Ar-N_2$ 플라즈마 처리가 Cu 표면의 구조적 특성에 미치는 영향을 X선 회절분석법, X선 광전자 분광법, 원자간력현미경을 이용하여 분석하였다. Ar 가스는 플라즈마 점화 및 이온 충격에 의한 Cu 표면의 활성화에 사용되고, $N_2$ 가스는 패시베이션(passivation) 층을 형성하여 -O 또는 -OH와 같은 오염으로부터 Cu 표면을 보호하기 위한 목적으로 사용되었다. Ar 분압이 높은 플라즈마로 처리한 시험편은 표면이 활성화되어 공정 이후 더 많은 산화가 진행되었고, $N_2$ 분압이 높은 플라즈마 시험편에서는 Cu-N 및 Cu-O-N과 같은 패시베이션 층과 함께 상대적으로 낮은 수치의 산화도가 관찰되었다. 본 연구에서는 $Ar-N_2$ 플라즈마 처리가 Cu 표면에서 Cu-O 형성 억제 반응에 기여하는 것을 확인할 수 있었으나 추가 연구를 통하여 질소 패시베이션 층이 Cu 웨이퍼 전면에 형성되기 위한 플라즈마 가스 분압 최적화를 진행하고자 한다.

• 마이크로전자및패키징학회지
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• 제24권2호
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• pp.43-48
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• 2017

SnO:Sn(80:20 mol%) 혼합 타겟을 이용한 RF 반응성 스퍼터링으로 투명하고 전도성이 있는 $Sn_xO_y$ 박막을 증착하였다. 혼합 타겟은 화학적으로 안정한 조성과 높은 투과도를 주는 세라믹 타겟과 Sn과 산소의 반응성 증착으로 박막내 구조적 결함 조절이 용이한 금속 타겟의 장점을 고루 택하고 있다. 산소 분압 0%~12% 구간에서 박막을 증착하였으며, 증착 후 $300^{\circ}C$에서 1시간 동안 진공 열처리를 진행하였다. Sn 함량이 많은 $P_{O2}=0%$의 경우를 제외하고 모든 시편들은 열 처리 전후에 80~90% 이상의 투과도를 보였으며, 안정된 p형 $Sn_xO_y$ 박막은 $P_{O2}=12%$에서 확인하였고, $P_{O2}=12%$에서 열 처리 후 캐리어 농도와 이동도는 각각 $6.36{\times}10^{18}cm^{-3}$와 $1.02cm^2V^{-1}s^{-1}$ 이었다.

• 공업화학
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• 제2권2호
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• pp.138-146
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• 1991

실리카-알루미나에 담지된 팔라듐 촉매를 제조하여 아크로레인과 암모니아로부터 피리딘과 ${\beta}$-피콜린의 합성반응에 사용하였다. 시간이 경과함에 따라 촉매표면에 생성된 침적물에 의하여 촉매의 활성이 크게 감소하였다. TPR 실험 결과 이 침적물은 아크로레인과 암모니아의 축합 중합에 의하여 생성됨을 알 수 있었다. 전화율과 피리딘 및 ${\beta}$-피콜린의 생성속도는 아크로레인의 분압이 증가할수록 감소하였다. 침적물의 양과 촉매재생 온도는 아크로레인의 분압에 따라 증가하였으나 암모니아의 분압에는 큰 영향을 받지 않았다.

• Journal of Electrical Engineering and Technology
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• 제7권6호
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• pp.959-964
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• 2012

Internal pressure of vacuum interrupter (VI) is one of the most important parameters in VI operation and may increase due to the outgassing from the materials inside VI or gas permeation through metal flange or ceramic vessel. The increase of the pressure above a certain level leads to the failures of switching or insulation. Therefore, an effective pressure check of VI is essential and an analysis of partial discharge (PD) characteristics is an effective monitoring method to identify the degree of the internal pressure of VI. This paper introduces a research work on monitoring the internal pressure of VI by analyzing PDs which were measured using a capacitive PD coupler. The authors have developed cost effective capacitive coupler based on the ceramic material that has an excellent insulation properties and the main component of the capacitive coupler is made by SrTiO3. Detectable internal pressure range and distinguishability of the internal pressure of VI were investigated. From the PD tests results, the internal pressure range, from $10^{-2}$ torr to 500 torr, can be monitored by PD measurements using the capacitive coupler and PD inception voltage (PDIV) follows the Paschen's law. In addition, rise time of PD pulse at 13.2kV decreases with the increase of the internal pressure of VI.

• 한국세라믹학회지
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• 제48권5호
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• pp.426-432
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• 2011

The oxidation behavior of CVD ${\beta}$-SiC was investigated for Very High Temperature Gas-Cooled Reactor (VHTR) applications. This study focused on the surface analysis of the oxidized CVD ${\beta}$-SiC to observe the effect of impurity gases on active/passive oxidation. Oxidation test was carried out at $950^{\circ}C$ in the impurity-controlled helium environment that contained $H_2$, $H_2O$, CO, and $CH_4$ in order to simulate VHTR coolant chemistry. For 250 h of exposure to the helium, weight changes were barely measurable when $H_2O$ in the bulk gas was carefully controlled between 0.02 and 0.1 Pa. Surface morphology also did not change based on AFM observation. However, XPS analysis results indicated that a very small amount of $SiO_2$ was formed by the reaction of SiC with $H_2O$ at the initial stage of oxidation when $H_2O$ partial pressure in the CVD ${\beta}$-SiC surface placed on the passive oxidation region. As the oxidation progressed, $H_2O$ consumed and its partial pressure in the surface decreased to the active/passive oxidation transition region. At the steady state, more oxidation did not observable up to 250 h of exposure.

• 대한화학회지
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• 제36권4호
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• pp.511-516
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• 1992

산화이테르븀의 비화학양론적 화학식인 YbO$_x$의 x값을 600∼1150$^{\circ}C$ 온도범위와 1.00 ${\times}$ 10$^{-2}$ 산소분압∼대기압 하에서 측정된 결과 1.5543∼1.60794에서 변화되었다. YbO$_{1.5＋x'}$로 표시되는 비화학양론적 조성식에서 x'의 생성엔탈피는 위의 산소분압 조건하에서 각각 1.55, 1.18 및 1.05kJ/mol이었다. 이 산화물의 전기전도도는 600∼1100$^{\circ}C$의 온도범위와 1.00 ${\times}$ 10$^{-5}$ ∼ 2.00 ${\times}$ 10$^{-1}$ atm의 산소분압 하에서 반도체 영역인 10$^{-9}$∼10$^{-5}\;{\Omega}^{-1}$ cm$^{-1}$ 범위에서 변화하였다. 전기전도도의 아레니우스 도시는 직선성을 보이며 활성화에너지는 1.7eV이었다. 전기전도도는 산소분압이 증가함에 따라 증가하였으며 산소분압 의존성 또는 1/n값은 1/5.3이었다. x값, ${\sigma}$값 및 열역학적 데이타를 사용하여 이 산화물의 비화학양론적 전도성 메카니즘을 고찰하였다.

• 한국재료학회지
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• 제19권11호
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• pp.601-606
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• 2009

$BiFeO_3$ (BFO) thin films were prepared on $Pt/TiO_2/Si$ substrate by r.f. magnetron sputtering. The effects of deposition pressure on electrical properties were investigated using measurement of dielectric properties, leakage current and polarization. When BFO targets were prepared, Fe atoms were substituted with Mn 0.05% to increase electrical resistivity of films. (Fe+Mn)/Bi ratio of BFO thin films increases with increasing partial pressure of $O_2$ gas. The deposited films showed the only BFO phase at 10 mTorr, the coexistence of BFO and $Bi_2O_3$ phase at 30-50 mTorr, and the only $Bi_2O_3$ phase at 70 mTorr. The crystallinity of BFO films was reduced due to the higher Bi contents and the decrease of surface mobility of atoms at high temperature. The porosity and surface roughness of films increased with the increase of the deposition pressure. The films deposited at high pressure showed low dielectric constant and high leakage current. The dielectric constant of films deposited at various deposition pressures was 84${\sim}$153 at 1 kHz. The leakage current density of the films deposited at 10${\sim}$70 mTorr was about $7{\times}10.6{\sim}1.5{\times}10.2A/cm^2$ at 100 kV/cm. The leakage current was found to be closely related to the morphology and composition of the BFO films. BFO films showed poor P-E hysteresis loops due to high leakage current.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 2007년도 추계학술대회 논문집
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• pp.241-241
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• 2007

We fabricated SmBCO coated conductors(CCs) on IBAD-MgO templates using co-evaporation method. IBAD-MgO templates consist of PLD-LMO/epi-MgO/IBAD-MgO/Ni-alloy and showed good in-plane texture of below FWHM 7 degree. Evaporation rates of Sm, Ba, and Cu were precisely controlled to get the optimum composition ratio after deposition process. To optimize the oxygen partial pressure of reaction region, wide range of the partial pressure was investigated from 1 mTorr to 15 mTorr. By reducing the oxygen partial pressure to 5mTorr, (103)grains in SmBCO layer have been increased. On the other hand, there were only (001)grains in SmBCO layer deposited at 15 mTorr $O_2$. Deposition temperature was also investigated from $600^{\circ}C\;to\;800^{\circ}C$ to make high Ic SmBCO CCs. SmBCO on IBAD MgO template showed that the Ic increased gradually at higher growth temperature to $800^{\circ}C$, which the highest Jc and Ic is $2.6\;MA/cm^2$ and 500 A/cm-w., respectively.

• 한국전기전자재료학회논문지
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• 제15권4호
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• pp.349-355
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• 2002

The ionic conductivity of cubic solid solutions in the systems of CaO-$ZrO_2$, $Y_2O_3-ZrO_2$ prepared by SHS was examined. The higher conductivity appears to be related to a lower activation energy rather than to the number of oxygen vacancies dictated by composition. Conductivity-temperature data was obtained at 1000 $^{\circ}C$ in atmosphere of low oxygen partial pressure (~$10^{-40}$ atm) for $Y_2O_3-ZrO_2$ cubic solid solutions. The data indicated that these materials could be reduced, and the decree of reduction would be related with the measuring electric field.

• 한국세라믹학회지
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• 제19권4호
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• pp.309-315
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• 1982

$FeAl_2O_4$ was formed from the starting material of $Fe_2O_3$ and $Al_2O_3$ by controlling the oxygen partial pressure using $H_2-CO_2$ gas mixture, over the temperature range of 800~120$0^{\circ}C$. The formation mechanism of $FeAl_2O_4$ was found to be a second order chemical reaction, and the activation energy of formation was observed as 39.97 kcal/mole. Vaporization behavior of $FeAl_2O_4$ under $CO_2$ atmosphere was observed over the temperature range of 800~120$0^{\circ}C$. $FeAl_2O_4$ was vaporized by a second order chemical reaction and the activation energy was found to be 21.8kcal/mole. Electrical conductivity of $FeAl_2O_4$ was also measured.