• 열처리공학회지
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• 제22권5호
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• pp.267-274
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• 2009

Titanium Chromium Nitrided (TiCrN) coatings were deposited on stainless steel 316 L and Si (100) wafer by inductively coupled plasma assisted D.C. magnetron sputtering at the various sputtering power on Cr target and $N_2/Ar$ gas ratio. Increasing the sputtering power of Cr target, XRD patterns were changed from TiCrN to nitride $Cr_2Ti$. The maximum hardness was $Hk_{3g}$ 3900 at $0.3\;N_2/Ar$ gas ratio. The thickness of the TiCrN films increased as the Cr target power increased, and it showed over $Hk_{5g}3100$ hardness at 100 W, 150 W. TiCrN films were deposited by the ICP assisted DC magnetron sputtering shown good wear resistance as the $N_2/Ar$ gas ratio was 0.1, 0.3.

• 센서학회지
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• 제8권3호
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• pp.291-297
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• 1999

텅스텐 박막의 RIE 플라즈마 에칭공정에서 에칭속도는 $SF_6$와 $N_2$ 가스와의 상대적인 비와 공정 변수들에 매우 민감하게 의존함을 알았다. 질소 첨가효과와 텅스텐 박막/PR과의 에칭 선택비에 관련된 애칭 profile 결과를 SEM 사진으로 나타내었다. $SF_6-N_2$ 가스 에칭 후 텅스텐 막 표면에 잔존하는 화합물을 XPS를 이용하여 그 종류와 화학적 결합상태를 조사하고, 남아있는 F 이온들은 플라즈마가 켜져 있는 상태에서 OES를 이용하여 측정함으로써 정확한 에칭 메커니즘을 규명하고자 하였다.

• 열처리공학회지
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• 제17권2호
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• pp.87-93
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• 2004

Nitrocarburizing was carried out with various $CH_4$ gas composition with 4 torr gas pressure at $570^{\circ}C$ for 3 hours and post oxidation was carried out with 100% $O_2$ gas atmosphere with 4 torr at different temperatures for various time. In the case of plasma nitrocarburizing, It is that the ratio of ${\varepsilon}-Fe_{2-3}$(N, C) and ${\gamma}^{\prime}-Fe_4$(C, N), which comprise the compound layer phase, depend on concentrations of $N_2$ gas and $CH_4$ such that when the concentration of $N_2$ and $CH_4$ increased, the ratio of ${\gamma}^{\prime}-Fe_4$(C, N) decreased, but the ratio of ${\varepsilon}-Fe_{2-3}$(N, C) increased. The thickness of compound layer consistently increased as gas concentration increased regardless of $N_2$ and $CH_4$ expect when the concentration of $CH_4$ was 3.5 volume%, it decreased insignificantly. When oxidizing for 15min in the temperature range of $460{\sim}570{^\circ}C$, the study found small amount of $Fe_3O_4$ at the temperature of $460{^\circ}C$ and also found that amounts of $Fe_2O_3$. and $Fe_3O_4$ on the surface and amount of ${\gamma}^{\prime}-Fe_4$(C, N) in the compound layer increased as the increased over $460^{\circ}C$, but the thickness of the compound layer decreased. Corrosion resistance was influenced by oxidation times and temperature.

• 공업화학
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• 제33권1호
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• pp.71-77
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• 2022

바이오매스 활용을 높이기 위하여, 쌀겨 기반 활성탄소(RHAC)를 제조한 뒤 질소 플라즈마 표면처리를 수행하여 전기이중층 커패시터(EDLC) 성능을 고찰하였다. 질소 플라즈마 표면처리를 통하여, RHAC 표면에 최대 2.17%의 질소가 도입되었으며 특히, 5 min 동안 반응한 샘플의 경우 pyrrolic/pyridine계 N 작용기의 형성이 우세하였다. 또한, 실리카 제거에 의해 쌀겨 기반 탄소재에 메조기공이 형성되었고 질소 플라즈마 표면처리에 의해 탄소재 표면 거칠기가 증가하여 미세기공이 많이 형성되는 것을 확인할 수 있었다. 순환전압전류법 측정 실험으로부터, 5 mV/s의 전압 주사 속도에서 질소 플라즈마 처리된 RHAC의 비정전용량은 최대 200 F/g로, 미처리 RHAC (111 F/g)에 비교하여 80.2% 향상된 값을 나타내었다. 이러한 결과는 질소 플라즈마 표면처리로 인해 탄소재 표면에 도입된 pyrrolic/pyridine계 질소 작용기 도입과 탄소재 표면 미세기공 부피 향상으로 인한 시너지 효과인 것으로 판단된다. 본 연구는 폐기 자원을 재활용하고, 플라즈마 표면처리법을 통해 이종원소 도입을 한다는 점에서 환경적으로 긍정적인 영향을 미칠 것으로 사료된다.

• 열처리공학회지
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• 제8권4호
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• pp.255-265
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• 1995

Stainless steel type 304L has been nitrided in the low pressure (600Pa) and high nitrogen (80% $N_2$+20% $H_2$) environment for 5 hours by the square-wave-pulsed-d.c. plasma as a function of temperature $400{\sim}550^{\circ}C$ and pulsation. At the lower temperature range of $400{\sim}500^{\circ}C$ and at the relatively high ratio of pulse duration to pulse period. "S-phase" has been developed in the form of thin nitrided surface layer which has many cracks, leading to be nearly impossible for the industrial anti-wear and anti-corrosion applications. At the higher temperature up to $550^{\circ}C$ with the increasing ratio of the pulse duration to pulse period up to $50{\mu}s/100{\mu}s$, the nitrided layer, whose growth rate has increased also, has been composed mainly of CrN and $Fe_4N$ phases and has become thick, uniform and nearly crack-free.

• 열처리공학회지
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• 제13권2호
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• pp.91-97
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• 2000

The structure and mechanical properties of TiN and TiCN thin films deposited on STD61 steel substrates by the RF-sputtering methods has been studied by using XPS, XRD, micro-hardness tester, scratch tester, and wear-resistance tester. XPS results showed that the TiCN thin film formed with chemical bonding state. The TiN thin films grew with (111) orientation having the lowest strain energy by compressive stress, whereas the TiCN thin films grew with both (111) and (200) orientation, but (200) orientation having the lowest surface energy becomes dominant as carbon contents increase. The pre-etching treatment of substrate did not affect on the preferred orientation of thin films, but it played an important role in improving mechanical properties of thin films such as the hardness, adhesion and wear- resistance. Especially, the TiCN thin films showed the superior wear resistances due to high hardness and low friction coefficient compared with TiN thin films.

• 한국환경과학회지
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• 제20권7호
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• pp.907-917
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• 2011

This study investigated the application of experimental design methodology to optimization of conditions of air-plasma and oxygen-plasma oxidation of N, N-Dimethyl-4-nitrosoaniline (RNO). The reactions of RNO degradation were described as a function of the parameters of voltage ($X_1$), gas flow rate ($X_2$) and initial RNO concentration ($X_3$) and modeled by the use of the central composite design. In pre-test, RNO degradation of the oxygen-plasma was higher than that of the air-plasma though low voltage and gas flow rate. The application of response surface methodology (RSM) yielded the following regression equation, which is an empirical relationship between the RNO removal efficiency and test variables in a coded unit: RNO removal efficiency (%) = $86.06\;+\;5.00X_1\;+\;14.19X_2\;-\;8.08X_3\;+\;3.63X_1X_2\;-\;7.66X_2^2$ (air-plasma); RNO removal efficiency (%) = $88.06\;+\;4.18X_1\;+\;2.25X_2\;-\;4.91X_3\;+\;2.35X_1X_3\;+\;2.66X_1^2\;+\;1.72X_3^2$ (oxygen-plasma). In analysis of the main effect, air flow rate and initial RNO concentration were most important factor on RNO degradation in air-plasma and oxygen-plasma, respectively. Optimized conditions under specified range were obtained for the highest desirability at voltage 152.37 V, 135.49 V voltage and 5.79 L/min, 2.82 L/min gas flow rate and 25.65 mg/L, 34.94 mg/L initial RNO concentration for air-plasma and oxygen-plasma, respectively.

• 동의생리병리학회지
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• 제25권1호
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• pp.48-54
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• 2011

This study was conducted to investigate the effects of dandelion (Teraxacum platycarpum) extracts obtained by only water and with ultrasonification on antioxidative system and lipid metabolism in high cholesterol-fed rats. Five groups of rats were given high cholesterol diets for 8 weeks. The control group received without dandelion extracts and the other four groups received with one of dandelion extracts for 4 weeks respectively ; TP-N-1(100 mg/kg/day of Teraxacum platycarpum water extract), TP-N-2(200 mg/kg/day of Teraxacum platycarpum water extract), TP-S-1(100 mg/kg/day of Teraxacum platycarpum water-ultrasonification extract), TP-S-2(200 mg/kg/day of Teraxacum platycarpum water-ultrasonification extract). The results are summarized as follows; The hepatic and plasma TBARS levels significantly decreased in the dandelion extracts groups compared to those of no treatment group. Especially the group TP-N-2 was comparatively best among those. TP-N-2 groups had significantly higher levels of glutathione peroxidase (GSH-Px) and catalase activities. There was no significant difference between dandelion extracts groups and no treatment group in SOD levels. In plasma triglyceride level, plasma FFA level, TP-S-2 group had significantly lower levels than that of the other groups. In plasma glucose levels, dandelion extracts group were similar to those of normal rats. Plasma total cholesterol levels significantly decreased in the TP-S-2 group compared to those of the other groups. HDL levels were also significantly higher than those of the other groups. Compared with those of no treatment group, dandelion extract groups had significantly higher levels of LDL. In liver total cholesterol level, TP-S-2 groups had significantly lower levels than that of the other groups. Compared with those of no treatment group, dandelion extracts groups had significantly lower levels of liver triglyceride, but especially the TP-S-2 group showed comparatively the best significant effect among those. TBARS, triglyceride, LDL, FFA levels significantly decreased in TP-S-2 groups compared to the other four groups. HDL levels was also significantly higher than the other four groups. According to the above result, it could be suggested that ultrasonic extraction have the upper hand in lipid metabolism and water extraction have the advantage of antioxidative system.

• Journal of Welding and Joining
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• 제18권2호
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• pp.222-222
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• 2000

PBGA(Plastic Ball Grid Array) is composed of some materials such as PCB(Printed Circuit Board), epoxy molding compound, die attach and so on. Reliability of PBGA package is weak compared with plastic packages. The weak points of reliability are the lower resistance to popcorn cracking, which is induced by moisture absorption in PCB, and the pressure cooker test corrosion, which is the basic problem due to the material characteristics of PCB. Introducing the PCB baking and the plasma treatment cleared the popcorn cracking phenomenon. The PCB baking and plasma treatment reduced the epoxy void by eliminating the source of moisture vaporization during the epoxy curing and enhanced the adhesion between PCB and epoxy. Also, plasma treatment enhanced the wettability of epoxy on PCB. The problem of corrosion is cleared using multi-functional epoxy. This type of EMC(Epoxy Molding Compound) is recommended in package using PCB as a substrate. (Received November 19, 1999)

• 한국진공학회지
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• 제19권1호
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• pp.10-13
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• 2010

본 논문은 N-face n-type GaN 표면에 산소 플라즈마 처리에 의해서 오믹전극과 접촉 저항을 낮추기 위한 연구를 하였다. 120초 산소 플라즈마 처리후 Ti (50 nm) / Al (35 nm)을 증착한 결과 오믹 전극을 구현하였으며, $1.25{\times}10^{-3}\;{\Omega}cm^2$의 접촉저항을 보였다. 이는 산소 플라즈마 처리가 기존의 플라즈마 처리와 같이 질소결원이 발생하였기 때문이다. 이를 통해 쇼트키장벽 높이(SBH)이 낮아지게 되었고, 오믹 전극및 플라즈마 처리를 안 한 경우보다 더 낮은 접촉저항의 결과를 획득하였다.