• Title/Summary/Keyword: $In_{0.8}Ga_{0.2}As$

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Growth and optic characteristics of AgGaS$_2$/GaAs single crystal thin film by hot wall epitaxy (HWE 방법에 의한 AgGaS$_2$/GaAs 단결정 박막 성장과 광학적 특성)

  • 이상열;홍광준;정준우
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2002.07a
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    • pp.281-287
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    • 2002
  • The stochiometric composition of AgGaS$_2$ polycrystal source materials for the AgGaS$_2$/GaAs epilayer was prepared from horizontal furnace. From the extrapolation method of X-ray diffraction patterns it was found that the polycrystal AgGaS$_2$ has tetragonal structure of which lattice constant a$\sub$0/ and c$\sub$0/ were 5.756 ${\AA}$ and 10.305 ${\AA}$, respectively. AgGaS$_2$/GaAs epilayer was deposited on throughly etched GaAs(100) substrate from mixed crystal AgGaS$_2$ by the Hot Wall Epitaxy (100) system. The source and substrate temperature were 590$^{\circ}C$ and 440$^{\circ}C$ respectively. The crystallinity of the grown AgGaS$_2$/GaAs epilayer was investigated by the DCRC (double crystal X-ray diffraction rocking curve). The optical energy gaps were found to be 2.61 eV for AgGaS$_2$/GaAs epilayer at room temperature. The temperature dependence of the photocurrent peak energy is well explained by the Varshni equation, then the constants in the Varshni equation are given by ${\alpha}$ : 8.695${\times}$10$\^$-4/ eV/K, and ${\beta}$ = 332 K. From the photocurrent spectra by illumination of polarized light of the AgGaS$_2$/GaAs epilayer, we have found that crystal field splitting ΔCr was 0.28 eV at 20 K. From the PL spectra at 20 K, the peaks corresponding to free and bound excitons and a broad emission band due to D-A pain are identified. The binding energy of the free excitons are determined to be 0.2676 eV and 0.2430 eV and the dissociation energy of the bound excitons to be 0.4695 eV.

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A Fabrication and Characteristics of 16x8 Reflection Type Symmetric Self Electro-optic Effect Device Array (16x8 반사형 S-SEED 어레이 제작 및 특성)

  • 김택무;이승원;추광욱;김석태;정문식;김성우;권오대;강봉구
    • Journal of the Korean Institute of Telematics and Electronics A
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    • v.30A no.10
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    • pp.33-40
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    • 1993
  • A reflection type 16x8 S-SEED array from LP(Low Pressure)-MODVD-grown GaAs/AlGaAs extremely shallow quantum well(ESQW) structures, with 4% Al fraction, has been fabricated. Its intrinsic region consists of 50 pairs of alternating 100.angs. GaAs and 100.angs. $Al_{0.04}$Ga$_{0.96}$As layers. A multilayer reflector stack of $Al_{0.04}$/Ga$_{0.96}$ As(599$\AA$)/AlAs(723$\AA$) was incorporated for the reflection plane below the p-i-n structures. The device processing after the MOCVD growth includes the mesa etching, isolation etching, insulator deposition, p & n metallization, and AR(Anti-Reflection) coating. For switching characteristics of the S-SEED in the form of p-i-n ESQW diode, the maximum optical negative resistance was observed at 856nm. Reflectance measurements showed a change from 15.6% to 43.3% for +0.9V to -6V bias. The maximum contrast ration of the S-SEED array was 2.0 and all the 128 devices showed optical bistability with contrast ratios over 2.4 at 5V reverse bias.

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nBn Based InAs/GaSb Type II Superlattice Detectors with an N-type Barrier Doping for the Long Wave Infrared Detection (InAs/GaSb 제2형 응력 초격자 nBn 장적외선 검출소자 설계, 제작 및 특성평가)

  • Kim, Ha Sul;Lee, Hun;Klein, Brianna;Gautam, Nutan;Plis, Elena A.;Myers, Stephen;Krishna, Sanjay
    • Journal of the Korean Vacuum Society
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    • v.22 no.6
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    • pp.327-334
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    • 2013
  • Long-wave infrared detectors using the type-II InAs/GaSb strained superlattice (T2SL) material system with the nBn structure were designed and fabricated. The band gap energy of the T2SL material was calculated as a function of the thickness of the InAs and GaSb layers by the Kronig-Penney model. Growth of the barrier material ($Al_{0.2}Ga_{0.8}Sb$) incorporated Te doping to reduce the dark current. The full width at half maximum (FWHM) of the $1^{st}$ satellite superlattice peak from the X-ray diffraction was around 45 arcsec. The cutoff wavelength of the fabricated device was ${\sim}10.2{\mu}m$ (0.12 eV) at 80 K while under an applied bias of -1.4 V. The measured activation energy of the device was ~0.128 eV. The dark current density was shown to be $1.0{\times}10^{-2}A/cm^2$ at 80 K and with a bias -1.5 V. The responsivity was 0.58 A/W at $7.5{\mu}m$ at 80 K and with a bias of -1.5 V.

Growth and optical properties for $AgGaS_2$ epilayer by hot wall epitaxy (HWE 방법에 의한 $AgGaS_2$ 박막성장과 광학적특성)

  • Youn, Seuk-Jin;Hong, Kwang-Joon
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2004.04b
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    • pp.56-59
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    • 2004
  • The stochiometric composition of $AgGaS_2$ polycrystal source materials for the $AgGaS_2/GaAs$ epilayer was prepared from horizontal furnace. From the extrapolation method of X-ray diffraction patterns it was found that the polycrystal $AgGaS_2$ has tetragonal structure of which lattice constant $a_0$ and $c_0$ were 5.756 ${\AA}$ and 10.305 ${\AA}$, respectively. $AgGaS_2/GaAs$ epilayer was deposited on throughly etched GaAs (100) substrate from mixed crystal $AgGaS_2$ by the Hot Wall Epitaxy (HWE) system. The source and substrate temperature were $590^{\circ}C$ and $440^{\circ}C$ respectively. The crystallinity of the grown $AgGaS_2/GaAs$ epilayer was investigated by the DCRC (double crystal X-ray diffraction rocking curve). The optical energy gaps were found to be 2.61 eV for $AgGaS_2/GaAs$ epilayer at room temperature. The temperature dependence of the photocurrent peak energy is well explained by the Varshni equation, then the constants in the Varshni equation are given by ${\alpha}=8.695{\times}10^{-4}eV/K$, and $\beta$=332 K. From the photocurrent spectra by illumination of polarized light of the $AgGaS_2/GaAs$ epilayer, we have found that crystal field splitting $\Delta$ Cr was 0.28 eV at 20 K. From the PL spectra at 20 K, the peaks corresponding to free and bound excitons and a broad emission band due to D-A pairs are identified. The binding energy of the free excitons are determined to be 0.2676 eV and 0.2430 eV and the dissociation energy of the bound excitons to be 0.4695 eV.

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Design and Simulation of an 808 nm InAlAs/AlGaAs GRIN-SCH Quantum Dot Laser Diode

  • Chan, Trevor;Son, Sung-Hun;Kim, Kyoung-Chan;Kim, Tae-Geun
    • Journal of the Optical Society of Korea
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    • v.15 no.2
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    • pp.124-127
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    • 2011
  • Quantum dots were designed within a GRIN-SCH(Graded index - Separate confinement Heterostructure) heterostructure to create a high power InAlAs/AlGaAs laser diode. 808 nm light emission was with a quantum dot composition of In0.665Al0.335As and wetting layer composition of Al0.2Ga0.8As by LASTIP simulation software. Typical characteristics of GRIN structures such as high confinement ratios and Gaussian beam profiles were shown to still apply when quantum dots are used as the active media. With a dot density of 1.0x1011 dots/cm2, two quantum dot layers were found to be good enough for low threshold, high-power laser applications.

A Study on the Breakdown in MHEMTs with InAlAs/InGaAs Heterostructure Grown on the GaAs substrate (InAlAs/InGaAs/GaAs MHEMT 소자의 항복 특성에 관한 연구)

  • Son, Myung-Sik
    • Journal of the Institute of Electronics Engineers of Korea SD
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    • v.48 no.11
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    • pp.1-8
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    • 2011
  • One of the most important parameters that limit maximum output power of transistor is breakdown. InAlAs/InGaAs/GaAs Metamorphic HEMTs (MHEMTs) have some advantages, especially for cost, compared with InP-based ones. However, GaAs-based MHEMTs and InP-based HEMTs are limited by lower breakdown voltage for output power even though they have good microwave and millimeter-wave frequency performance with lower minimum noise figure. In this paper, InAlAs/$In_xGa_{1-x}As$/GaAs MHEMTs are simulated and analyzed for breakdown. The parameters affecting breakdown are investigated in the fabricated 0.1-${\mu}m$ ${\Gamma}$-gate MHEMT device having the modulation-doped $In_{0.52}Al_{0.48}As/In_{0.53}Ga_{0.47}As$ heterostructure on the GaAs wafer using the hydrodynamic transport model of a 2D commercial device simulator. The impact ionization and gate field effect in the fabricated device including deep-level traps are analyzed for breakdown. In addition, Indium mole-fraction-dependent impact ionization rates are proposed empirically for $In_{0.52}Al_{0.48}As/In_xGa_{1-x}As$/GaAs MHEMTs.

A Study on ZnSe/GaAs Heterojunction Solar Cells Grown by MBE (MBE법으로 제작한 ZnSe/GaAs 이종접합 태양전지에 관한 연구)

  • Lee, Hong-Chan;Lee, Sang-Tae;Oh, Jin-Suck;Kim, Yoon-Sik;Chang, Ji-Ho
    • Proceedings of the Korean Society of Marine Engineers Conference
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    • 2006.06a
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    • pp.289-290
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    • 2006
  • We report a study of Zn(S)Se/GaAs heterojunction solar cells grown by molecular beam epitaxy (MBE). Zn(S)Se/GaAs heterostructures prepared under different conditions were characterized in-situ by reflection high-energy electron diffraction (RHEED). Structural and electrical properties were investigated with double crystal X-ray diffraction and current-voltage characteristics, respectively. The fabricated $n-ZnS_{0.07}Se_{0.93}/p-GaAs$ solar cell (SC #2) exhibited open circuit voltage($V_{oc}$) of 0.37 V, short circuit current($I_{sc}$) of $1.7{\times}10^{-2}$ mA, fill factor of 0.62 and conversion efficiency of 7.8 % under 38.5 $mW/cm^2$ illumination.

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Effect of Seed Pretreatment with Chilling, $GA_3$ and Light on Bupleurum falcatum Germination (파종 전 저온, $GA_3$ 및 광 처리가 시호의 발아에 미치는 영향)

  • 강진호;김동일;류옥경;김은실;김영광
    • KOREAN JOURNAL OF CROP SCIENCE
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    • v.42 no.4
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    • pp.384-391
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    • 1997
  • In the cultivation of Bupleurum falcatum, one of the problems to surmount is long-term germination period and unstable germination. This experiment was done to examine the effect of $GA_3$ concentration [0(water), 0.01, 0.lmM], chilling, their treatment period [2, 4, 8 days ($GA_3$) : 0, 2, 4 weeks (chilling)] and light quality (red, white, dark) given during the period as pretreatment before sowing on the seed germination of its two cultivars (cv. Jaerae, cv. Jangsu). Light treatment was given during all the periods of $GA_3$ treatment or for 0, 2, 4 days at the end of the chilling treatment. There was no difference in the mean germination rate between the levels of all the treatments except the $GA_3$ concentration meaning that water imbibition and $GA_3$ treatment had the same effect. As light quality treatment during the water imbibition was forced, the mean germination rate of Jaerae, 2 to 4 days imbibition period or red light was more increased or accelerated compared to the other levels of the same treatment, respectively. The rate of Jaerae not affected by the light quality was the greatest in the 2 days water imbibition while the rate of Jangsu was the greatest when water-imbibed for 4 days or treated by red light. No chilling before sowing showed the highest rate due to the light quality and white light forced after sowing had greater rate than the dark treatment. Although there was no difference between the rates of light quality treatment levels in the condition of no chilling before sowing and white light treatment after sowing, the rate of Jangsu was enhanced or accelerated only under illumination during 2 days water imbibition before sowing.

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Stimulated Emission with 349-nm Wavelength in GaN/AlGaN MQWs by Optical Pumping

  • Kim, Sung-Bock;Bae, Sung-Bum;Ko, Young-Ho;Kim, Dong Churl;Nam, Eun-Soo
    • Applied Science and Convergence Technology
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    • v.26 no.4
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    • pp.79-85
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    • 2017
  • The crack-free AlGaN template has been successfully grown by using selective area growth with triangular GaN facet. The triangular GaN stripe structure was obtained by vertical growth rate enhanced mode with low growth temperature of $950^{\circ}C$ and high growth pressure of 500 torr. The lateral growth rate enhanced mode of AlGaN for crack-free and flat surface was also investigated. Low pressure of 30 torr and high V/III ratio of 4400 were favorable for lateral growth of AlGaN. It was confirmed that the $4{\mu}m$ -thick $Al_{0.2}Ga_{0.8}N$ was crack-free over entire 2-inch wafer. The dislocation density of $Al_{0.2}Ga_{0.8}N$ was as low as ${\sim}7.6{\times}10^8/cm^2$ measured by cathodoluminescence. Based on the high quality AlGaN with low dislocation density, the ultraviolet laser diode epitaxy with cladding, waveguide and GaN/AlGaN multiple quantum well (MQW) was grown by metalorganic chemical vapor deposition. The stimulated emission at 349 nm with full width at half maximum of 1.8 nm from the MQW was observed through optical pumping experiment with 193 nm KrF laser. We also have fabricated the deep ridge type ultraviolet laser diode (UV-LD) with $5{\mu}m-wide$ and $700{\mu}m-long$ cavity for electrical properties. The turn on voltage was below 5 V and the resistance was ${\sim}55{\Omega}$ at applied voltage of 10 V. The amplified spontaneous emission spectrum of UV-LD was also observed from pulsed current injection.

Effects of Ga Substitution on Crystallographic and Magnetic Properties of Co Ferrites

  • Chae, Kwang Pyo;Choi, Won-Ok;Kang, Byung-Sub;Lee, Young Bae
    • Journal of Magnetics
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    • v.20 no.1
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    • pp.26-30
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    • 2015
  • The crystallographic and magnetic properties of gallium-substituted cobalt ferrite ($CoGa_xFe_{2-x}O_4$) were investigated. The new material was synthesized using conventional ceramic methods, with gallium substituted for ferrite in the range of x = 0.0 to 1.0, in steps of 0.2. X-ray diffraction and M$\ddot{o}$ssbauer spectroscopy were used to confirm the presence of crystallized particles in the $CoGa_xFe_{2-x}O_4$ ferrite powders. All of the samples exhibited a single phase with a spinel structure, and the lattice parameters decreased as the gallium content increased. The particle size of the samples also decreased as gallium increased. For $x{\leq}0.4$, the M$\ddot{o}$ssbauer spectra of $CoGa_xFe_{2-x}O_4$ could be fitted with two Zeeman sextets, which are the typical spinel ferrite spectra of $Fe^{3+}$ with A- and B-sites. However, for $x{\geq}0.6$, the M$\ddot{o}$ssbauer spectra could be fitted with two Zeeman sextets and one doublet. The variation in the M$\ddot{o}$ssbauer parameters and the absorption area ratio indicated a cation distribution of $(Co_{0.2-0.2x}Ga_xFe_{0.8-0.6x})[Co_{0.8+0.2x}Fe_{1.2-0.4x}]O_4$, and the magnetic behavior of the samples suggested that the increase in gallium content led to a decrease in the saturation magnetization and in the coercivity.