• Title/Summary/Keyword: $HfO_2/Al_2O_3$

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Surface Modification of a Li[Ni0.8Co0.15Al0.05]O2 Cathode using Li2SiO3 Solid Electrolyte

  • Park, Jin Seo;Park, Yong Joon
    • Journal of Electrochemical Science and Technology
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    • v.8 no.2
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    • pp.101-106
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    • 2017
  • $Li_2SiO_3$ was used as a coating material to improve the electrochemical performance of $Li[Ni_{0.8}Co_{0.15}Al_{0.05}]O_2$. $Li_2SiO_3$ is not only a stable oxide but also an ionic conductor and can, therefore, facilitate the movement of lithium ions at the cathode/electrolyte interface. The surface of the $Li_2SiO_3$-coated $Li[Ni_{0.8}Co_{0.15}Al_{0.05}]O_2$ was covered with island-type $Li_2SiO_3$ particles, and the coating process did not affect the structural integrity of the $Li[Ni_{0.8}Co_{0.15}Al_{0.05}]O_2$ powder. The $Li_2SiO_3$ coating improved the discharge capacity and rate capability; moreover, the $Li_2SiO_3$-coated electrodes showed reduced impedance values. The surface of the lithium-ion battery cathode is typically attacked by the HF-containing electrolyte, which forms an undesired surface layer that hinders the movement of lithium ions and electrons. However, the $Li_2SiO_3$ coating layer can prevent the undesired side reactions between the cathode surface and the electrolyte, thus enhancing the rate capability and discharge capacity. The thermal stability of $Li[Ni_{0.8}Co_{0.15}Al_{0.05}]O_2$ was also improved by the $Li_2SiO_3$ coating.

High-k 감지막 평가를 통한 고성능 고감도 Electrolyte-insulator-semiconductor pH센서 제작

  • Bae, Tae-Eon;Jang, Hyeon-Jun;Jo, Won-Ju
    • Proceedings of the Korean Vacuum Society Conference
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    • 2012.02a
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    • pp.447-447
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    • 2012
  • 최근 생물전자공학에서 의료 산업 환경 등 많은 분야에 응용 가능한 바이오센서의 연구가 활발해지고 있다. 그 중 의료 분야에서, 수소이온 ($H^+$)의 농도 감지는 인간의 질병을 예측하는데 중요한 지표가 되며 이러한 수소이온 ($H^+$) 농도의 변화를 실시간으로 감지하기 위해 반도체를 기반으로 한 다양한 pH 센서가 제안되었다. Ion sensitive field effect transistor (ISFET), electrolyte-insulator-semiconductor (EIS)는 대표적인 반도체 pH센서로, 작은 소자 크기, 견고한 구조, 빠른 응답속도와 CMOS 공정과의 호환성이 좋다는 장점이 있다. 특히, EIS는 제조공정이 간단하고 감지막의 감지 특성 평가가 용이하기 때문에 지속적으로 연구되고 있는 pH 센서이다. 센서의 감지 특성을 평가함에 있어 감지막의 감지감도와 안정성이 우수해야 하며 이를 위해 high-k 물질이 감지막으로 사용되고 있다. 추가적으로 high-k 물질은 기존의 $SiO_2$$Si_3N_4$를 대신하여 높은 유전상수로 인한 고성능, 고감도 센서제작을 가능케 한다. 본 연구에서는, high-k 물질인 $HfO_2$, $Ta_2O_5$, $ZrO_2$, $Al_2O_3$를 각각 $SiO_2$ 완충막에 적층한 이단 감지막을 제작하였고, 그 특성을 기존의 $SiO_2$, $Si_3N_4$ 감지막의 감지특성과 비교하였다. pH 감지 특성을 평가해 본 결과, 기존의 $SiO_2$, $Si_3N_4$ 감지막과 비교했을 때 high-k 물질의 감지막을 갖는 EIS pH 센서에서 감지감도와 안정성 모두 우수하게 나타났다. 특히, high-k 물질 중 $HfO_2$에서 감지감도가 다소 크게 평가되었으나, 화학적 용액에 대한 안정성은 떨어졌다. 반면에 $Al_2O_3$$Ta_2O_5$은 화학용액에 대한 안정성 측면에서 최적의 특성을 보임을 확인하였다. 결론적으로, high-k 물질에 대한 전반적인 평가를 통하여 높은 pH 감지감도뿐만 아니라 우수한 안정성의 EIS pH 센서를 제작 할 수 있었다.

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AlGaN/GaN Field Effect Transistor with Gate Recess Structure and HfO2 Gate Oxide (게이트 하부 식각 구조 및 HfO2 절연층이 도입된 AlGaN/GaN 기반 전계 효과 트랜지스터)

  • Kim, Yukyung;Son, Juyeon;Lee, Seungseop;Jeon, Juho;Kim, Man-Kyung;Jang, Soohwan
    • Korean Chemical Engineering Research
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    • v.60 no.2
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    • pp.313-319
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    • 2022
  • AlGaN/GaN based HfO2 MOSHEMT (metal oxide semiconductor high electron transistor) with different gate recess depth was simulate to demonstrate a successful normally-off operation of the transistor. Three types of the HEMT structures including a conventional HEMT, a gate-recessed HEMT with 3 nm thick AlGaN layer, and MIS-HEMT without AlGaN layer in the gate region. The conventional HEMT showed a normally-on characteristics with a drain current of 0.35 A at VG = 0 V and VDS = 15 V. The recessed HEMT with 3 nm AlGaN layer exhibited a decreased drain current of 0.15 A under the same bias condition due to the decrease of electron concentration in 2DEG (2-dimensional electron gas) channel. For the last HEMT structure, distinctive normally- off behavior of the transistor was observed, and the turn-on voltage was shifted to 0 V.

High temperature oxidation behavior and surface modification of Ni-based superalloys (니켈기 초합금의 고온산화거동과 표면개질에 관한 연구)

  • Seol, Gyeong-Won
    • Korean Journal of Materials Research
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    • v.4 no.2
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    • pp.166-176
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    • 1994
  • Ni base superalloys are composed of solid sohltion hardening elements(Co, Cr. Mo. W and so on) and $\gamma '$ precipitation hardening elements(A1, Ti, Nb, Ta and so on). To Improve the mechanical properties and oxidation resistanre of superalloys, rare earth elements(%r, Hf, Y and so on) are added to the inner substrate, or are used as coating materials. Their pffects on the growth rate and adhes~on of oxide are changed according to the kinds of oxides such as $AI_2O_3$ and $Cr_2O_3$. The effect of yttrium on the oxidation rate, grain size of oxide, internal structure, and crack resistance was investigated for two kinds of Ni-base superalloys. One in AF'115 superalloy containing Hf and the other is MA6000 superalloy containing $Y_2O_3$. They werr owid~zed at high temperature after yttrium surface modification using ion coater. Yttrium coating on the AF115 and MA6000 superalloys results in a marked change in the growth of the inner oxide. For AF115 superalloy, the degree of gram boundary segregation of $Cr_2O_3$, and prefer en^ tial oxidation of Hf are decreased, and the shape of inner oxidation layer was changed from triangle to plate type. For MA6000 superalloy, $Cr_2O_3$ oxide scale was transformed as outer oxidation layer of CrZOI and inner oxidation layer of $Cr_2O_3$.

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Vertical β-Ga2O3 Schottky Barrier Diodes with High-κ Dielectric Field Plate (고유전율 필드 플레이트를 적용한 β-Ga2O3 쇼트키 장벽 다이오드)

  • Se-Rim Park;Tae-Hee Lee;Hui-Cheol Kim;Min-Yeong Kim;Soo-Young Moon;Hee-Jae Lee;Dong-Wook Byun;Geon-Hee Lee;Sang-Mo Koo
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.36 no.3
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    • pp.298-302
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    • 2023
  • In this paper, we discussed the effect of field plate dielectric materials such as silicon dioxide (SiO2), aluminum oxide (Al2O3), and hafnium oxide (HfO2) on the breakdown characteristics of β-Ga2O3 Schottky barrier diodes (SBDs). The breakdown voltage (BV) of the SBDs with a field plate was higher than that of SBDs without a field plate. The higher dielectric constant of HfO2 contributed to the superior reduction in electric field concentration at the Schottky junction edge from 5.4 to 2.4 MV/cm. The SBDs with HfO2 field plate showed the highest BV of 720 V, and constant specific on-resistance (Ron,sp) of 5.6 mΩ·cm2, resulting in the highest Baliga's figure-of-merit (BFOM) of 92.0 MW/cm2. We also investigated the effect of dielectric thickness and field plate length on BV.

Electrical Characteristics of Staggered Capacitor ($Si_3N_4$ / HfAlO) for High Performance of Non-volatile Memory

  • Lee, Se-Won;Cho, Won-Ju
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2010.06a
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    • pp.358-358
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    • 2010
  • To improve the programming/erasing speed and leakage current of multiple dielectric stack tunnel barrier engineering (TBE) Non-volatile memory, We propose a new concept called staggered structure of TBE memory. In this study, We fabricated staggered structure capacitor on $Si_3N_4$ stacked HfAlO and measured C-V curve that can observe tunneling characteristic of this device as various annealing temperature compared with that of single layer $SiO_2$ capacitor.

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Memristors based on Al2O3/HfOx for Switching Layer Using Single-Walled Carbon Nanotubes (단일 벽 탄소 나노 튜브를 이용한 스위칭 레이어 Al2O3/HfOx 기반의 멤리스터)

  • DongJun, Jang;Min-Woo, Kwon
    • Journal of IKEEE
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    • v.26 no.4
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    • pp.633-638
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    • 2022
  • Rencently, neuromorphic systems of spiking neural networks (SNNs) that imitate the human brain have attracted attention. Neuromorphic technology has the advantage of high speed and low power consumption in cognitive applications and processing. Resistive random-access memory (RRAM) for SNNs are the most efficient structure for parallel calculation and perform the gradual switching operation of spike-timing-dependent plasticity (STDP). RRAM as synaptic device operation has low-power processing and expresses various memory states. However, the integration of RRAM device causes high switching voltage and current, resulting in high power consumption. To reduce the operation voltage of the RRAM, it is important to develop new materials of the switching layer and metal electrode. This study suggested a optimized new structure that is the Metal/Al2O3/HfOx/SWCNTs/N+silicon (MOCS) with single-walled carbon nanotubes (SWCNTs), which have excellent electrical and mechanical properties in order to lower the switching voltage. Therefore, we show an improvement in the gradual switching behavior and low-power I/V curve of SWCNTs-based memristors.

Petrogeochemistry of Shales in Cretaceous Gyeongsang Supergroup from the Euiseong Basin, Korea (의성분지(義城盆地)에 분포(分布)하는 백악기(白堊紀) 경상누층군(慶尙累層群)의 셰일에 관(關)한 암석지구화학(岩石地球化學))

  • Lee, Hyun Koo;Lee, Chan Hee;Kim, Sang Jung
    • Economic and Environmental Geology
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    • v.30 no.1
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    • pp.1-14
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    • 1997
  • The shales from the Euiseong area are interbedded along the bedding in Cretaceous Gyeongsang Supergroup, which are composed mainly of quartz, plagioclase, K-feldspar and associated with trace amount of biotite, muscovite, chlorite, pyrite, hematite, carbonate and clay minerals. The ratio of $Al_2O_3/Na_2O$ and $K_2O/Na_2O$ in shales from the Shindong Group are ranged from 9.16 to 24.32 and from 1.70 to 5.97, and the Hayang Group ranged from 2.76 to 8.89 and from 0.42 to 2.74, which are negative correlated between $K_2O/Na_2O$ and $Al_2O_3/Na_2O$ against $SiO_2/Al_2O_3$ respectively. Those are suggested that controlled of mineral compositions in shales due to substitution and migration of elements by sedimentation and diagenesis. These shale formation were deposited in basin of terrestrial environments originated from the igneous rocks, and the REE of these rocks are not influenced with diagenesis and hydrothermal alterations on the basis of $Al_2O_3$ versus La, La against Ce, Zr versus Yb, the ratios of La/Ce (0.43 to 0.62) and Th/U (1.11 to 10.71). The narrow range in trace and REE element characteristics as Co/Th (0.63 to 1.92), La/Sc (1.98 to 5.90), Sc/Th (0.58 to 1.30), V/Ni (0.90 to 3.25), Cr/V (0.45 to 1.78), Ni/Co (1.88 to 6.67) and Zr/Hf (30.04~60.87) of these shales argues for inefficient mixing of the simple source lithologies during sedimentation. These rocks also show much variation in $La_N/Yb_N$ (6.90 to 17.02), Th/Yb (4.17 to 13.68) and La/Th (1.98 to 5.90), and their origin is explained by derivation from a mixture of intermediate to acidic igneous rocks.

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