• 한국표면공학회지
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• 제32권3호
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• pp.303-306
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• 1999

On the effect of substrate bias at first stage of diamond synthesis at lower substrate temperature(approximately 673K) using microwave plasma CVD and effect of reaction gas system for the bias enhanced nucleation were studied. The reaction gas was mixture of methane and hydrogen or carbon monoxide and hydrogen. The nucleation density of applied bias -150V using $CH_4-H_2$ reaction gas system, significantly higher than that of $C-H_2$ reaction gas system. When the $CH_4-H_2$ reaction was used, nucleation density was increased because of existence of SiC as a interface for diamond nucleation. By use of this negative bias effect for fabrication of CVD diamond film using two-step diamond growth without pre-treatment, fabrication of the diamond film consist of diamond grains $0.2\mu\textrm{m}$ in diameter was demonstrated

• Applied Science and Convergence Technology
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• 제27권5호
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• pp.100-104
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• 2018

Herein, we present the behavior of plasma-doped graphene upon high-temperature vacuum annealing. An ammonia plasma-treated graphene sample underwent vacuum annealing for 1 h at temperatures ranging from 100 to $500^{\circ}C$. According to Raman analysis, the structural healing of the plasma-treated sample is more pronounced at elevated annealing temperatures. The crystallite size of the plasma-treated sample increases from 13.87 to 29.15 nm after vacuum annealing. In addition, the doping level by plasma treatment reaches $2.2{\times}10^{12}cm^{-2}$ and maintains a value of $1.6{\times}10^{12}cm^{-2}$, even after annealing at $500^{\circ}C$, indicating high doping stability. A relatively large decrease in the pyrrolic bonding components is observed by X-ray photoelectron spectroscopy as compared to other configurations, such as pyridinic and amino bindings, after the annealing. This study indicates that high-vacuum annealing at elevated temperatures provides a method for the structural reorganization of plasma-treated graphene without a subsequent decrease in doping level.

• 한국진공학회:학술대회논문집
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• 한국진공학회 2009년도 제38회 동계학술대회 초록집
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• pp.47-47
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• 2010

Discharge under the water is very hard and demand considerable high voltage. But specially improved electrode can generate plasma discharge to salty water with relatively low voltage. A round shape ceramic electrode having many pinholes combined with metallic one can generate plasma. 400 volt, 10 kHz and 3 micro second pulse width were applied to repeatedly running synthetic seawater with 10 L/m velocity, containing cultivated E. coli and Bacillus. As a result, 18, 94, 99.97, 100, 100 % disinfection rates to E. coli and 17.1, 17.1, 82.9, 99.4, 99.9 % disinfection rates to Bacillus subtilis were achieved to 1, 2, 3, 4, 5 times repetitive treatment respectively. In the plasma condition, the ions and electrons are separated and new kinds of components are re-synthesized by the intensive movement of the components. Especially chlorine ions are separated and recombined to residual free chlorine like HOCl, $OCl^-$. The residual free chlorine concentrations of discharged water were 0.25, 0.88, 1.39, 1.59, 1.66 mg $Cl_2$/L after 5 times treatment respectively. Another unconfirmed radical and oxidants for example, OH, $H_2O_2$, and $O_3$ can have an effect on microorganism of course.

• 열처리공학회지
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• 제5권4호
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• pp.215-223
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• 1992

This study has been performed to investigate into some effects of temperature, gas mixing ratio and time on the optical microstructure, hardness and wear characteristics of medium carbon alloy steel treated by plasma nitriding. The results obtained from the experiment are summarized as follows: (1) Optical micrographs of AISI 4140 steel plasma-nitrided by the double stage technique have revealed that the nitrided layer is composed of the compound layer and the diffusion layer. The variation in temperature at the first stage gives effects, on the formation of compound layer and the growth rate is shown to be relatively fast at $460^{\circ}C$. (2) The thickness of compound layer has been found to increase with increasing nitrogen percentage in the gas mixture and the holding time. It is therefore recommended that a shorter holding time and a lower nitrogen percentage are more effective to produce a tougher compound layer and a diffusion layer only. (3) X-ray diffraction analysis for AISI 4140 steel has shown that the compound layer consist of ${\gamma}^{\prime}-Fe_4N$ and ${\alpha}-Fe$ and that tough compound layer diffustion layer only can be obtained by the double stage plasmanitriding process. (4) There is also a tendency that the total hardened layer depth increases with increasing temperature, time and nitrogen percentage in the first stage during the double stage plasma nitriding. (5) The wear resistance of plasma nitrided specimens has been found thobe considerably increased compared to the untreated specimens and the amount of increment has appeared to increase further with increasing nitriding temperature, holding time and notrogen percentage of gas mixture in the first stage treatment.

• Journal of Periodontal and Implant Science
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• 제32권4호
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• pp.697-709
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• 2002

The present study was performed to evaluate the effect of citric acid on the change of implant surface microstructure according to application time. Implants with pure titanium machined surface, titanium plasma-sprayed surface, and sand-blasted, large grit, acid etched surface were utilized. Implant surface was rubbed with pH 1 citric acid for $\frac{1}{2}$ min., 1 min., 1 $\frac{1}{2}$ min., 2 min., and 3min, respeaively in the test group and implant surface was not treated in the control group. Then, the specimens were processed for scanning electron microscopic observation. The following results were obtained. 1. Both test and control group showed a few shallow grooves and ridges in pure titanium machined surface implants. There were not significant differences between two groups. 2. In titanium plasma-sprayed surfaces, round or amorphous particles were deposited irregularly. The irregularity of titanium plasma-sprayed surfaces conditioned with pH 1 citric acid was lessened and the cracks were increased relative to the application time of pH 1 citric acid. 3. Sand-blasted, large grit, acid etched surfaces showed the macro/micro double roughness. The application of pH 1 citric acid didn't change the characteristics of the sand-blasted, large grit, acid etched surfaces. In conclusion, the application of pH 1 citric acid to titanium plasma-sprayed surface is improper. And pure titanium machined surface implants and sand-blasted, large grit, acid etched surface implants can he treated with pH 1 citric acid for peri-implantitis treatment if the detoxification of these surfaces could be evaluated.

• 한국표면공학회지
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• 제29권5호
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• pp.443-448
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• 1996

In order to plasma-sulfnitride by combining ion-nitriding of a steel and sputtering of MoS$_2$, chromium-molybdenum steel was plasma-sulfritrided using hollow cathode discharge with parallel electrodes which are a main of the steel and a subsidiary cathode of $MoS_2$. The treatment was carried out at 823K for 10.8ks under 665Pa in a 30% $N_2$-70% $H_2$ gas atmosphere. Plasma-sulfnitriding layers formed of the steel were characterized with EDX, XRD, micrographic structure observation and hardness measurement. A compound layer of 8-15$\mu\textrm{m}$ and nitrogen diffusion layer of about 400$\mu\textrm{m}$ were formed on the surface of plasma-sulfnitrided steel. The compound layer consisted of FeS containing Mo and iron nitrides. The nitrides of $\varepsilon$-$Fe_2_3N$ and $\gamma$'-$Fe_4N$ formed under the FeS. The thickness of compound layer and surface hardness were different with the gaps between main and subsidiary cathodes even in the same sulfnitriding temperature. The surface hardnesses after plasma-sulfnitriding were distributed from 640 to 830Hv. The surface hardness was higher in the plasma-sulfnitriding than the usual sulfnitriding in molten salt. This may be due to Mo in sulfnitriding layer.

• 열처리공학회지
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• 제2권4호
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• pp.1-10
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• 1989

To investigate the influence of temperature on the TiN film, it was deposited on the STC-3 steel and Si-wafer from $TiCl_4/N_2/H_2$ gas mixture by using the radio frequency plasma assisted chemical vapor deposition. The deposition was performed at temperature of $400^{\circ}C-500^{\circ}C$. The results showed that crystalline TiN film was deposited over $480^{\circ}C$, and all specimens showed the crystalline TiN X-ray diffraction peaks after vacuum heat treatment for 3 hrs, at $1000^{\circ}C$, $10^{-5}torr$. While the film thickness was increased above $480^{\circ}C$, it was decreased under $480^{\circ}C$ as temperature increased. And the contents of titanium were increased and it of chlorine were decreased as temperature increased. Because temperature increase was attributed to the increase in the density of TiN film, surface hardness of TiN film was increased with temperature.

• 접착 및 계면
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• 제19권4호
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• pp.154-162
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• 2018

필름 형태의 Polydimethylsiloxane (PDMS)은 표면 개질을 하기 위해 Plasma 처리 또는 Corona 처리를 하여 표면을 -OH기로 활성화시키는 공정이나, 피착제와 PDMS 필름의 접착 또는 Adhesion promoter와 축합 반응을 통해 PDMS 표면을 다른 작용기로 개질시키는 공정, Grafting polymerization을 이용하는 PDMS 개질 공정이 주로 이용된다. 그러나 Plasma나 Corona 처리 후에 친수성이 오래가지 못하고, 보관에 어려움이 있다. 따라서, 본 연구에서는 코팅 공정을 통하여서 PDMS표면 개질을 하기 위해서, 먼저 새로운 형태의 실란 기능화 아크릴 고분자 전구체를 합성하고 이를 Hydroxyl-terminated PDMS와의 축합 반응을 통해 아크릴 고분자와 PDMS 고분자가 결합된 형태의 표면 개질제를 제조한 후, 이를 PDMS 필름 위에 코팅하였다. 제조한 표면 개질제의 구조와 분자량을 확인하기 위하여 1H-NMR과 GPC를 분석하였고, 표면 개질제가 코팅된 PDMS표면 특성 변화를 확인하기 위하여 XPS, ATR, WCA를 이용하여 표면 특성을 조사하였으며, PDMS 필름과의 부착을 확인하기 위해 Cross cutting test를 진행하였다. 그 결과 PDMS 필름 표면이 아크릴 고분자층이 형성된 것으로 확인하였고, PDMS 필름과 표면 개질제와의 부착성 (4 - 5B) 또한 우수한 것을 확인하였다.

• 열처리공학회지
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• 제17권1호
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• pp.17-22
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• 2004

In the present study, newly developed spark plasma sintering(SPS) technique was introduced to refine the grain size of ${\gamma}$-based TiAl intermetallic compounds. Ti-46Al-1.5Mo and Ti-46Al-1.5Mo-0.2C(at%) prealloyed powders were produced by mechanical milling(MM) in high-energy attritor. The mechanically milled powders were characterized by XRD and SEM for the microstructural evolution as a function of milling time. And then, the MMed powders were sintered by both spark plasma sintering and hot pressing in vacuum (HP). After the sintering process, MM-SPSed specimens were heat-treated in a vacuum furnace (SPS-VHT) and in the SPS equipment(MM-SPS) for microstructural control. It was found from microstrutural observation that the microstructure consisting of equiaxed ${\gamma}$-TiAl with a few hundred nanometer in average size and ${\alpha}_2-Ti_3Al$ particles were formed after both sintering processes. It was also revealed from hardness test and three-point bending test that the effect of grain refinement on the hardness and bending strength is much higher than that of carbon addition. The fully lamellar microstructures, which is less than $80{\mu}m$ in average grain size was obtained by SPS-VHT process, and the fully lamellar microstructure which is less than $100{\mu}m$ in average grain size was obtained by MM-SPS for a relatively shorter heat-treatment time.

• Asian-Australasian Journal of Animal Sciences
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• 제14권9호
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• pp.1267-1271
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• 2001

The objective of this study was to examine the significance of feeding induced hypovolemia (decrease in plasma volume) in controlling the feed intake of goats fed on dry feed. In order to alleviate hypovolemia with feeding, a 2 h intravenous infusion (16-18 ml/min) of artificial saliva or mannitol solution was begun 1 h prior to feeding and continued until 1h after the start of the 2 h feeding period. In comparison with no infusion (NI), cumulative feed intake was increased by 41% with artificial saliva infusion (ASI) and by 45% with mannitol infusion (MI) by the completion of the 2 h feeding period. Both infusion treatments (ASI and MI) were significantly different (p<0.05) from the NI treatment in terms of the cumulative feed intake. The cumulative feed intake between the ASI and MI treatments was not significantly different (p>0.05). No infusion treatment (NI) had the lowest cumulative feed intake (929 g DM), whereas MI had the highest (1345 g DM), after completion of the 2 h feeding period. Generally, infusion treatments also increased the rate of eating at all time points after feeding was commenced. Following the first 30 mins of feeding, the rate of eating decreased sharply, and subsequently declined gradually in all treatments. Compared to the NI, both ASI and MI significantly (p<0.05) decreased thirst level (water intake for 30 mins after the completion of the 2 h feeding period) by approximately 13%. However, the thirst level caused by ASI and MI was not significantly different (p>0.05). Both ASI and MI decreased the plasma concentrations of osmolality and total protein, and hematocrit at 1 h after infusion. The results suggested that the thirst sensation in the brain could be produced by feeding induced hypovolemia. Moreover, the results indicate that hypovolemia is one of the factors controlling the feed intake of goats fed on dry feed.