• Proceedings of the Korean Vacuum Society Conference
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• 1999.07a
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• pp.249-249
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• 1999

GaN과 같은 III-nitride 반도체 관한 식각 기술의 연구는 blue-emitting laser diode(LD)를 위한 경면(mirror facet)의 형성뿐만아니라 새로운 display 용도의 light emitting diodes (LED), 고온에서 작동되는 광전소자 제조 등에도 그 중요성이 증대되고 있다. 최근에는 III-nitride 물질의 높은 식각속도와 미려하고 수직한 식각형상을 이루기 위하여 ECR(Electron Cyclotron Resonance)이나 ICP(Inductively Coupled Plasma)와 같은 고밀도 플라즈마 식각과 CAIBE(Chemically assisted ion beam etching)를 이용한 연구가 진행되고 있다. 현재 제조되어 지고 있는 LED 및 LD와 같은 광소자의 구조의 대부분은 p-GaN/AlGaN/InGaN(Q.W)/AlGaN/n-GaN 와 같은 여러 층의 형태로 이루어져 있다. 이중 InGaN는 광소자나 전자소자의 특성에 영향을 주는 가장 중요한 부분으로써 현재까지 보고된 식각연구는 undoped GaN에 대부분 집중되고 있고 이에 비해 소자 특성에 핵심을 이루는 InGaN의 식각특성에 관한 연구는 미흡한 상황이다. 본 연구에서는 고밀도 플라즈마원인 ICP 장비를 이용하여 InGaN를 식각하였고, 식각에는 Cl2/CH4, Cl2/Ar 플라즈마를 사용하였다. InGaN의 식각특성에 영향을 미치는 플라즈마의 특성을 관찰하기 위하여 quadrupole mass spectrometry(QMS)와 optical emission spectroscopy(PES)를 사용하였다. 기판 온도는 5$0^{\circ}C$, 공정 압력은 5,Torr에서 30mTorr로 변화시켰고 inductive power는 200~800watt, bias voltage는 0~-200voltage로 변화시켰으며 식각마스크로는 SiO2를 patterning 하여 사용하였다. n-GaN, p-GaN 층 이외에 광소자 제조시 필수적인 InGaN 층을 100% Cl2로 식각한 경우에 InGaN의 식각속도가 GaN에 비해 매우 낮은 식각속도를 보였다. Cl2 gas에 소량의 CH4나 Ar gas를 첨가하는 경우와 공정압력을 감소시키는 경우 식각속도는 증가하였고, Cl2/10%Ar 플라즈마에서 공정 압력을 감소시키는 경우 식각속도는 증가하였고, Cl2/10%CHF3 와 Cl2/10%Ar 플라즈마에서 공정압력을 15mTorr로 감소시키는 경우 InGaN과 GaNrks의 선택적인 식각이 가능하였다. InGaN의 식각속도는 Cl2/Ar 플라즈마의 이온에 의한 Cl2/CHF3(CH4) 플라즈마에서의 CHx radical 형성에 의하여 증가하는 것으로 사료되어 진다.

• Journal of the Korean earth science society
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• v.22 no.4
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• pp.278-291
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• 2001

Mesothermal gold vein minerals of the Seolhwa mine were deposited in a single stage of massive quartz veins which filled the mainly NE-trending fault shear zones exclusively in the granitoid of the Gyeonggi Massif. The Seolhwa mesothermal gold mineralization is spatially associated with the Jurassic granitoid of 161 Ma. The vein quartz contains three main types of fluid inclusions at 25$^{\circ}$C: 1) low-salinity (< 5 wt.% NaCl), liquid CO$_{2}$-bearing, type IV inclusion; 2) gas-rich (> 70 vol.%), aqueous type II inclusions; 3) aqueous type I inclusions (0${\sim}$15 wt.% NaCl) containing small amounts of CO$_{2}$. The H$_{2}$O-CO$_{2}-CH$_{4}$-N$_{2}$-NaCl inclusions represent immiscible fluids trapped earlier along the solvurs curve at temperatures from 430$^{\circ}$ to 250$^{\circ}$C and pressures of 1 kbars. Detailed fluid inclusion chronologies may suggest a progressive decrease in pressure during the auriferous mineralization. The aqueous inclusion fluids represent either later fluids evelved through extensive fluid unmixing (CO$_{2}-CH$_{4}$ effervescence) from a homogeneous H$_{2}$O-CO$_{2}-CH$_{4}$-N$_{2}$-NaCl fluid due to decreases in temperature and pressure, or the influence of deep circulated meteoric waters possibly related to uplift and unloading of the mineralizing suites. The initial fluids were homogeneous containing H$_{2}$O-CO$_{2}-CH$_{4}$-N$_{2}$-NaCl components and the following properties: the initital temperature of >250$^{\circ}$ to 430$^{\circ}$C, X$_{CO}\;_{2}$ of 0.16 to 0.62, 5 to 14 mole% CH$_{4}$, 0.06 to 0.3 mole% N$_{2}$ and salinities of 0.4 to 4.9 wt.% NaCl. The T-X data for the Seolhwa gold mine may suggest that the Seolhwa auriferous hydrothermal system has been probably originated from adjacent granitic melt which facilitated the CH$_{4}$ formation and resulted in a reduced fluid state evidenced by the predominance of pyrrhotite. The dominance of negative ${\delta}\;^{34}$S values of sulfides (-0.6 to 1.4$%_o$o) are consistent with their deep igneous source.

• Bulletin of the Korean Chemical Society
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• v.26 no.6
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• pp.892-898
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• 2005

A long, bis(monodentate), linking Schiff-base ligand L (py-CH=N-$C_6H_4$-N=CH-py) was prepared from 1,4-phenylenediamine and 3-pyridinecarboxaldehyde by the Schiff-base condensation. Ligand L has two terminal pyridyl groups capable of coordinating to metals through their nitrogen atoms. In contrast, the same reaction between 1,2-phenylenediamine and 3-pyridinecarboxaldehyde produced a mixture of imidazol isomers (2-pyridin-3-yl-1H-benzoimidazole), which are connected to one another by the N-H…N hydrogen bonding to form a tetramer. From Zn($NO_3)_2{\cdot}6H_2O$ and ligand L under various conditions, one discrete molecule, trans- [Zn($H_2O)_4L_2]{\cdot}(NO_3)_2{\cdot}(MeOH)_2$, and two 1-D zinc polymers, [Zn$(NO_3)(H_2O)_2(L)]{\cdot}(NO_3){\cdot}(H_2O)_2$ and [Zn(L) (OBC)($H_2O$)], were prepared. In ligand L, the N$\ldots$N separation between the terminal pyridyl groups is 13.994 $\AA$, with their nitrogen atoms at the meta positions (3,3’) in a trans manner. The corresponding N$\ldots$N separations in its compounds range from 13.853 to 14.754 $\AA$.

• Journal of the Korean Chemical Society
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• v.39 no.8
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• pp.643-649
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• 1995

The Menschutkin type reactions of substituted(Z)-benzyl systems with substituted(Y)-pyridines and N,N-dimethyl aniline have been studied by the electro-conductometric method in acetonitrile at 35$^{\circ}C$ and 50$^{\circ}C$. On the plot of $k_{obs}$ versus concentrations of nucleophile under pseudo-first order conditions, 3,$4-(CH_3/O)_2$-benzyl bromide and $4-CH_3O$-benzyl bromide were a positive intercept at zero concentration of nucleophile. The $k_1$ value for each compound was invariant with the different nucleoephile. However, $4-CH_3-$ and other electron withdrawing substituents of benzyl bromides did not show the positive intercept. These results are suggested that the reactions have been proceeding simultaneously and independently for the activated benzyl bromides via direct bimolecular and intimate ion pair intermediate.

• Membrane Journal
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• v.4 no.4
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• pp.205-212
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• 1994

Gas permeation properties of simple gases(He, $H_2,\;CO_2,\;O_2,\;N_2,\;CH_4$) through plasma-polymerized films were investigated, and the chemical structure of the plasma polymers was analyzed by infrared spectra. The plasma-polymerized films were prepared by plasma polymerization of fluorine-containing aromatic compounds, and permeation measurements were made at $35^{\circ}C$, latm. The permeability coefficient of the plasma films decreased as the size of penetrant molecules increased. The plasma polymers showed higher $CO_2/CH_4$ selectivities than those of commonly used polymers, while $O_2/N_2$ selectivities were similar of slightly lower than those of common polymers. FT-IR spectra shows that the plasma polymers contain both aromatic and aliphatic structures.

• Economic and Environmental Geology
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• v.55 no.4
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• pp.407-419
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• 2022

Soil(vadose zone) gas compositions were measured for about 3 days to suggest a method for monitoring and interpreting soil gas data collected around wells from which methane(CH₄) is outflowing. The vadose zone gas samples were collected within 1 m around two test wells(TB2 and TB3) at Pohang and analyzed for CO₂, CH₄, N₂ and O₂ concentrations in situ. CO₂ flux was measured beside TB2. In addition, gas samples from well head in TB2 and atmospheric air samples were collected for comparison. Carbon isotopes of CO₂(δ¹³C_CO2) of samples collected on the last day of the study period were analyzed in the laboratory. The two test wells (TB2 and 3) were 12.7 m apart and only TB3 was cemented to the surface. According to the bio-geochemical process-based interpretation, the relationships between CO₂ and O₂, N₂, and N₂/O₂ of vadose zone gas were plotted between the lines of CH₄ oxidation and CO₂ dissolution. In addition, the CH₄ concentrations of gas samples from the wellhead of the uncemented well (TB2) were 5.2 times higher than the atmospheric CH₄ concentration. High CO₂ concentrations (average 1.148%) of vadose zone gas around TB2 seemed to be attributed to the oxidation of CH₄. On the other hand, the vadose zone CO₂ around the cemented well(TB3) showed a relatively low concentration(0.136%). This difference indicates that the vadose zone gas(including CO₂) around the CH₄ outflowing well were strongly affected by well completion(cementing). This study result can be used to establish strategies for environmental monitoring of soil around natural gas sites, and can be used to monitor leakage around injection and observation wells for CO₂ geological storage. In addition, the method of this study is useful for soil monitoring in natural gas storage and oil-contaminated sites.

• Journal of the Korean institute of surface engineering
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• v.41 no.5
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• pp.189-193
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• 2008

In this study, we carried out an investigation of the etching characteristics (etch rate, selectivity to $SiO_2$ and $HfO_2$) of TiN thin films in the $CH_4$/Ar inductively coupled plasma. The maximum etch rate of $274\;{\AA}/min$ for TiN thin films was obtained at $CH_4$(80%)/Ar(20%) gas mixing ratio. At the same time, the etch rate was measured as function of the etching parameters such as RF power, Bias power, and process pressure. The X-ray photoelectron spectroscopy analysis showed an efficient destruction of the oxide bonds by the ion bombardment as well as showed an accumulation of low volatile reaction products on the etched surface. Based on these data, the ion-assisted chemical reaction was proposed as the main etch mechanism for the $CH_4$ containing plasmas.

• Bulletin of the Korean Chemical Society
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• v.18 no.3
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• pp.311-316
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• 1997

The synthesis and characterization of the mononuclear group 13 heterocyclic carboxaldehyde methyldithiocarbazate complexes Me2M[NC5H4CRNNC(S)SCH3] (M=Al, R=H(1); M=Ga, R=H(2); M=Al, R=CH3(3); M-Ga, R=CH3(4); M=In, R=CH3(5)) are described. Compounds 1-5 were prepared by the reaction of MMe3 (M=Al, Ga, In) with 2-formy or 2-acetylpyridine-S-methyldithiocarbazate in toluene. These compounds 1-5 have been characterized by microanalysis, NMR (1H, 13C) spectroscopy, mass spectra, and single-crystal X-ray diffraction. X-ray single-crystal diffraction analyses reveal that 4-5 are mononuclear metal compounds with coordination number of 5 and N,N,S coordination mode.

• Bulletin of the Korean Chemical Society
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• v.7 no.6
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• pp.462-465
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• 1986

Kinetics and Mechanism of $N_2H_4-KBrO_3$ reaction in the presence of allyl alcohol have been studied. The pseudo-first order rate constant for gas evolution was found to be $10^{-4}{\sim}10^{-2}\;sec^{-1}\;at\;25.0{\pm}0.1^{\circ}C$, increasing with concentration of hydrogen ion. When concentrations of sulfuric acid and allyl alcohol are both sufficiently high, the following overall reaction explains experimental results reasonably well: $N_2H_4\;+\;BrO_3^-\;+\;H^+\;{\to}\;N_2\;+\;HOBr\;+\;2H_2O,\;CH_2\;=\;CHCH_2OH\;+\;HOBr\;{\to}\;CH_2-OHCHBrCH_2OH$. More complicated reaction mechanisms at lower acidity conditions have been contemplated.

• Tribology and Lubricants
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• v.4 no.2
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• pp.44-51
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• 1988

Titanium carbide(TiC), Titanium nitride(TiN), and Titanium carbonnitride(Ti(C,N)) films were deposited on $Si_3N_4$-TiC composite cutting tools by chemical vapor deposition(CVD) using $TiCl_4-CH_4-H_2$, $TiCl_4-N_2-H_2$, and $TiCl_4-CH_4-N_2-H_2$ gas mixtures, respectively. The experimental results indicate that TiC coatings compared with TiN coatings on $Si_3N_4$ -TiC ceramic have an improved microstructural property, good thermal shock resistance, and good interfacial bonding. However TiN coatings compared with TiC coatings have a low friction coefficient with steel and good chemical stability. It is found by cutting test that coated insert compared with $Si_3N_4$-TiC ceramic have a superior flank and crater wear resistance. And multilayer coating compared with monolayer coating shows a improved wear resistance.