The Etch Characteristics of TiN Thin Film Surface in the CH4 Plasma
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Woo, Jong-Chang
(School of Electrical and Electronics Engineering, Chung-Ang University)
Um, Doo-Seung (School of Electrical and Electronics Engineering, Chung-Ang University) Kim, Gwan-Ha (School of Electrical and Electronics Engineering, Chung-Ang University) Kim, Dong-Pyo (School of Electrical and Electronics Engineering, Chung-Ang University) Kim, Chang-Il (School of Electrical and Electronics Engineering, Chung-Ang University) |
1 | K. B. Jung, H. Cho, Y. B. Hahn, D. C. Hays, E. S. Lambers, Y. D. Park, T. Feng, J. R. Childress, S. J. Pearton, J. Vac. Sci. Technol. A, 17(4) (1999) 2223-2227 DOI |
2 | A. Le Gouil, O. Joubert, G. Cunge, T. Chevolleau, L. Vallier, J. Vac. Sci. Tech. B, 25(3) (2007) 767-778 DOI ScienceOn |
3 | G. H. Kim, K. T. Kim, J. C. Woo, C. I. Kim, Ferroelectrics, 357(1) (2007) 41-47 DOI ScienceOn |
4 | S. M. Sze, VLSI Technology, New York, McGraw- Hill Book Company (1983) 106 |
5 | B. Y. Jeong, M. S. Hwang, C. M. Lee, and M. H. Kim, J. Kor. Inst. Met & Mater., 38(6) (2000) 823-828 |
6 | W. S. Hwang, J. H. Chen, W. J. Yoo, V. Bliznetsov, J. Vac. Sci. Technol. A, 23(4) (2005) 964-970 DOI ScienceOn |
7 | W. T. Chang, T. E. Hsieh, C. J. Lee, J. Vac. Sci. Technol. B, 25 (2007) 1265-1269 DOI ScienceOn |
8 | R. H. Dennard, F. H. Gaensslen, H. N. Yu, N. Rideout, E. Bessous, and A. R. Leblanc, IEEE J. Solid State Circuits., SC-9 (1974) 256 |
9 | D. R. Lide, "Handbook of Chemistry", CRC Press, 2004 10(3)-10(15) |
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