• 한국정보디스플레이학회:학술대회논문집
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• 한국정보디스플레이학회 2007년도 7th International Meeting on Information Display 제7권2호
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• pp.1273-1276
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• 2007

We provide a newly developed dry etching process for the fabrication of ZnO-based oxide TFTs. The etching characteristics of ZnO (active layer) and $Al_2O_3$ (gate insulator) thin films were systematically investigated when the etching gas mixtures and their mixing ratios were varied in the heliconplasma etching system.

• 한국세라믹학회지
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• 제34권1호
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• pp.88-94
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• 1997

플라즈마 용사법(plasma spray method)으로 제작된 상용 가스 터빈 연소기의 finned segment의 열차폐용 코팅계, ZrO2-8wt%Y2O3 top coat/Ni-26Cr-5Al-0.5Y bond coat/Hastelloy X superalloy 기판에서 NiCrAlY bond coat의 산화 거동과 열피로 파괴에 대하여 조사하였다. 생성된 bond coat의 주산화물은 NiO, CrO2, Al2O3였다. ZrO2/bond coat계면에서 생성된 산화물의 분포는 고온에서의 사용 전에 이 계면 아래에 얇은 층의 Al2O3가없는 곳에서는 NiO 산화층 및에 Cr2O3와 Al2O3가 혼합된 형태를 나타내었다. 열피로에 의해 박리된 시편의 파면을 관찰한 결과, 파괴는 주로 ZrO2/산화층 계면보다 세라믹층내로 약간 치우쳐서 일어나지만, 산화층 내에서도 약간 일어남을 알 수 있었다.

• 대한화학회지
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• 제54권4호
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• pp.380-386
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• 2010

황산 용액에서 양극산화(anodization)에 의하여 생성되는 산화피막의 생성과정(growth kinetics)과 이 피막의 전기적 성질을 전기화학적 임피던스 측정법(electrochemical impedance spectroscopy)으로 조사하였다. 산화피막은 $Al_2O_3$로 점-결함 모형(point defect model)에 따라 성장하였으며, n-형 반도체의 전기적 성질을 보였다.

• 한국재료학회지
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• 제26권3호
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• pp.160-165
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• 2016

To increase the capacitance of an Al electrolytic capacitor, the anodic oxide film, $Al_2O_3$, was partly replaced by an $Al_2O_3-ZrO_2$ (Al-Zr) composite film prepared by the vacuum infiltration method and anodization. The microstructure and composition of the prepared samples were investigated by scanning electron microscopy and transmission electron microscopy. The coated and anodized samples showed multi-layer structures, which consisted of an inner Al hydrate layer, a middle Al-Zr composite layer, and an outer $Al_2O_3$ layer. The thickness of the coating layer could go up to 220 nm when the etched Al foil was coated 8 times. The electrical properties of the samples, such as specific capacitance, leakage current, and withstanding voltages, were also characterized after anodization at 100 V and 600 V. The capacitances of samples with $ZrO_2$ coating were 36.3% and 27.5% higher than those of samples without $ZrO_2$ coating when anodized at 100 V and 600 V, respectively.

• 한국세라믹학회지
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• 제36권4호
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• pp.410-416
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• 1999

The reactivity of three kinds of spinels which CaO-Al2O3-SiO2 slag was investigated in terms of mineral phases and microstructures. New crystal products were not formed by reaction of 12CaO.7Al2O3 in the slag with spinels and free MgO components was preferenctially dissolved into slag for MgO-rich spinel and stoichiometric spinel. Meanwhile mineral phase was changed from 12CaO.7Al2O3 to CaO.Al2O3 to CaO.2Al2O3 finally to CaO.6Al2O3 having high melting point for Al2O3 -rich spinel. The Fe-oxide component of the slag was taken up by only stoichiometric spinel grains within the spinel clinker and the trapped amount of Fe-oxide was independent of MgO content of MgO in spinel clinker the more th resistance to slag corrosion but the less resistance to slag penetration.

• 한국진공학회:학술대회논문집
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• 한국진공학회 2016년도 제50회 동계 정기학술대회 초록집
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• pp.304.2-304.2
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• 2016

Hafnium oxide-aluminum oxide (HfO2-Al2O3) dielectric films have been fabricated by Pulsed Laser Deposition (PLD), and their properties are studied in comparison with HfO2 films. As a gate dielectric of the TFT, in spite of its high dielectric constant, HfO2 has a small energy band gap and microcrystalline structure with rough surface characteristics. When fabricated by the device, it has the drawback of generating a high leakage current. In this study, the HfAlO films was obtained by Pulsed Laser Deposition with HfO2-Al2O3 target(chemical composition of (HfO2)86wt%(Al2O3)14wt%). The characteristics of the thin Film have been investigated by x-ray diffraction (XRD), atomic force microscopy (AFM) and spectroscopic ellipsometer (SE) analyses. The X-ray diffraction studies confirmed that the HfAlO has amorphous structure. The RMS value can be compared to the surface roughness via AFM analysis, it showed HfAlO thin Film has more lower properties than HfO2. The energy band gap (Eg) deduced by spectroscopic ellipsometer was increased. HfAlO films was expected to improved the interface quality between channel and gate insulator. Apply to an oxide thin Film Transistors, HfAlO may help improve the properties of device.

• 한국결정성장학회지
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• 제24권3호
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• pp.106-110
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• 2014

Atomic layer deposition(ALD)을 이용하여 $Al_2O_3$ 박막을 형성하고 이에 대한 패시베이션 특성에 대한 연구를 수행하였다. ALD로 증착된 $Al_2O_3$ 박막은 $400^{\circ}C$ 5분간 후속 열처리 공정 후에도 $Al_2O_3$ - 실리콘 계면 반응 없이 비정질 상태를 유지할 만큼 구조적으로 안정한 특성을 나타내었다. 후속 열처리 후 $Al_2O_3$ 박막의 패시베이션 특성이 향상되었으며, 이는 field effective 패시베이션과 화학적 패시베이션 효과가 동시에 상승에 기인하는 것으로 판단된다. $Al_2O_3$ 박막의 음고정 전하를 정량적으로 평가하기 위해서 후속 열처리 공정을 거친 $Al_2O_3$ 박막을 이용하여 metal-oxide-semiconductor(MOS) 소자를 제작하고 capacitance-voltage(C-V) 분석을 수행하였다. C-V 결과로부터 추출된 flatband voltage($V_{FB}$)와 equivalent oxide thickness(EOT)의 관계식을 통하여 $Al_2O_3$ 박막의 고정음전하는 $2.5{\times}10^{12}cm^{-2}$로 계산되었으며, 이는 본 연구에서 제시된 $Al_2O_3$ 박막 공정이 N-type 실리콘 태양전지의 패시베이션 공정에 응용 가능하다는 것을 의미한다.

• 한국재료학회지
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• 제12권8호
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• pp.656-660
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• 2002

It was investigated that $Al_2$$O_3$/Cu nanocomposite powder could be optimally prepared by dispersion and reduction of Cu oxide, and suitably consolidated by employing pulse electric current sintering (PECS) process. $\alpha$-$Al_2$$O_3$ and CuO powders were used as elemental powders. In order to obtain $Al_2$O$_3$ embedded by finely and homogeneously dispersed CuO particles, the elemental powders were high energy ball milled at the rotating speed of 900 rpm, with the milling time varying up to 10 h. The milled powders were heat treated at $350^{\circ}C$ in H$_2$ atmosphere for 30 min to reduce CuO into Cu. The reduced powders were subsequently sintered by employing PECS process. The composites sintered at $1250^{\circ}C$ for 5 min showed the relative density of above 98%. The fracture toughness of the $Al_2$$O_3$/Cu nanocomposite was as high as 4.9MPa.$m^{1}$2//, being 1.3 times the value of pure $Al_2$$O_3$ sintered under the same condition.

• 한국환경과학회지
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• 제14권4호
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• pp.427-433
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• 2005

Activity of manganese oxide supported on ${\nu}-Al_2O_3$ was increased when cerium was added. Also, cerium-added manganese oxide on ${\nu}-Al_2O_3$ was more effective in oxidation of toluene than that without cerium. XRD result, it was observed that $MnO_2+CeO_2$ crystalline phases were present in the samples. For the used catalyst, a prominent feature has increased by XPS. TPR/TPO profiles of cerium-added manganese oxide on ${\nu}-Al_2O_3$ changed significantly increased at a lower temperature. The activity of $18.2 wt{\%}\;Mn+ 10.0 wt{\%}\;Ce/{\nu}-Al_2O_3$ increased at a lower temperature. The cerium added on the manganese catalysts has effects on the oxidation of toluene.

• Journal of Korean Vacuum Science & Technology
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• 제2권2호
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• pp.63-77
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• 1998

The oxidation of NiAl(110) was investigated in the temperature regime between 300K and 1300 K using LEED (low energy electron diffraction), TPD (temperature programmed desorption) and HREELS (high resolution electron energy loss spectroscopy). The adsorption of N2O and O2 up to reconstructions. Stepwise annealing of the oxygen-saturated sample from 600 K to 1300K in UHV (ultra-high vacuum,) results in firstly the onset of randomly oriented then finally fairly well-ordered. 5 ${\AA}$ Al2O3 film with quasi-hexagonal periodicity. Ordered thicker oxide films of 18-30 ${\AA}$ seem to be grown on this interfacial oxide layer by direct oxidation of sample at elevated temperature between 1150 and 1300 K because of the LEED pattern consisting of new broad hexagonal spots and the previous 5 ${\AA}$ spots. Although the periodicity of surface oxygen arrays shows no significant change from an hexagonal close-packing, the O-O distance changes from ∼3.0 ${\AA}$ film to ∼2.9 ${\AA}$ for thicker oxides. with the appearance of Auger parameter, for the 5${\AA}$ film can be described better as an interfacial oxide layer. The observation of three symmetric phonon peaks can be also a supporting evidence for this phase assignment since thicker oxide films on the Same Ni2Al3(110) show somewhat different phonon structure much closer to that of the ${\gamma}$-Al2O3. The adsorption/desorption of methanol further proves the preparation of less-defective and/or oxygen-terminated Al2O3 films showing ordered phase transitions with the change of oxide thickness between 5 ${\AA}$ to 30 ${\AA}$.