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http://dx.doi.org/10.5012/jkcs.2010.54.4.380

Investigation of the Growth Kinetics of Al Oxide Film in Sulfuric Acid Solution  

Chon, Jung-Kyoon (Department of Chemistry, College of Natural Science, Hankuk University of Foreign Studies)
Kim, Youn-Kyoo (Department of Chemistry, College of Natural Science, Hankuk University of Foreign Studies)
Publication Information
Journal of the Korean Chemical Society / v.54, no.4, 2010 , pp. 380-386 More about this Journal
Abstract
We have investigated the growth kinetics of Al oxide film by anodization in sulfuric acid solution and the electronic properties of this film using electrochemical impedance spectroscopy. Al oxide film consisted $Al_2O_3$ was grown based on the point defect model and shown the eclctronic properties of n-type semiconductor.
Keywords
Aluminum oxide; Passive film; Oxide film; n-Type semiconductor; Mott-Schottky; $Al_2O_3$; Al(OH)$_3$;
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