• 한국재료학회지
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• 제21권4호
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• pp.220-224
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• 2011

Zircon has excellent thermal, chemical, and mechanical properties, but it is hard to make a dense sintered product because of dissociation during the sintering process. This study analyzes how the addition of $SiO_2$ and $Al_2O_3$ affects the mechanical properties of sintered zircon, particularly in regards to reducing the thermal dissociation and improving the mechanical properties of $ZrSiO_4$. Zircon specimens containing different amounts of $SiO_2$ and $Al_2O_3$ were prepared and sintered to observe how the mechanical properties of $ZrSiO_4$ changed according to the differing amount of $SiO_2$ and $Al_2O_3$. The $ZrSiO_4$ that was used for the starting material was ground by ball mill to an average particle size of 3 ${\mu}m$. The $SiO_2$ and $Al_2O_3$ that was used for additives were ground to an average particle size of 3 ${\mu}m$ and 0.5 ${\mu}m$, respectively. Adding $SiO_2$ resulted in transformation in the liquid phase at high temperatures, which had little effect on suppressing the thermal dissociation but enhanced the mechanical properties of $ZrSiO_4$. When $Al_2O_3$ was added, the mechanical properties of $ZrSiO_4$ decreased due to the formation of pores and abnormal grains in the microstructure of the sintered zircon.

• E2M - 전기 전자와 첨단 소재
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• 제16권9호
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• pp.65.1-65
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• 2003

The interface of zirconium oxide thin films on silicon is analyzed in detail for their potential applications in the microelectronics. The formation of an interfacial layer of ZrSi$\sub$x/O$\sub$y. with graded Zr concentration is observed by the x-ray photoelectron spectroscopy and secondary ion mass spectrometry analysis. The as-deposited ZrO$_2$/ZrSi$\sub$x/O$\sub$y//Si sample is thermally stable up to 880$^{\circ}C$, but is less stable compared to the ZrO$_2$/SiO$_2$/Si samples. Post-deposition annealing in oxygen or ammonia improved the thermal stability of as-deposited ZrO$_2$/ZrSi$\sub$x/O$\sub$y/Si to 925$^{\circ}C$, likely due to the oxidation/nitridation of the interface. The as-deposited film had an equivalent oxide thickness of∼13 nm with a dielectric constant of ∼21 and a leakage current of 3.2${\times}$10e-3 A/$\textrm{cm}^2$ at 1.5V. Upon oxygen or ammonia annealing, the formation of SiO$\sub$x/ and SiH$\sub$x/N$\sub$y/O$\sub$z/ at the interface reduced the overall dielectric constants.

• 한국진공학회지
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• 제7권2호
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• pp.82-87
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• 1998

$O_2$기체에 $NH_3/O_2$기체를 첨가하여 실리콘 표면에 산화막을 형성하는 $NH_3/O_2$산화법 에 의한 산화공정시 반응석영관 외부에 방출하는 기체는 $N_2,O_2$및 $H_2O$이며 극소량의 $CO_2$, NO 및 $NO_2$가 검출되었다. 두 종류의 산화제($O_2$ 및 $H_2O$)가 산화에 기여하며 성장률은 $NH_3$및 $O_2$ 의 부분압과 온도에 의해 결정되며, 그 기울기는 건식 및 습식 산화법의 중간에 평행 하게 위치함을 확인하였다. Auger Electron Spectroscopy(AES) 측정결과 $NH_3/O_2$ 산화막은 정확한 $SiO_2$의 화학량론을 가지며 $SiO_2/Si$계면에 발생하는 결합을 억제하며 고정전하의 발 생을 최소화함을 알 수 있었다. $NH_3/O_2$ 산화막(470$\AA$)의 항복전압을 57.5Volt이며, C-V특성 곡선을 축정한 결과 플랫밴드 전압은 0.29Volt이며 곡선의 형태는 이상곡선과 일치하였다.

• 한국진공학회지
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• 제5권3호
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• pp.245-250
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• 1996

$Y_2O_3$ thin film on si(100) was successfully grown by ionized cluster beam(ICBD) technique at substrate temperature of around $500^{\circ}C$ and pressure of ~$10^{-5}$Torr.To prevent the oxidation of Si substrae, a very thin yttrium layer was deposited on Si before reactive depositing of oxygen and yttrium source. In asdeposited stage, b.c.c and h.c.p strucutres of $Y_2O_3$ were observed from S-ary analysis. From the observation of spots and ring patterns in selected area diffractin(SAD) patterns. crystallane formation and growth could be proceeded during the deposition. $Y_2O_3$/mixed layer/$SiO_2=170\AA/50\AA/10\AA$ structure were verified by high resolution transmition electron imcroscopy(HRTEM) image, and the formation of amorphous layer of SiO2 was discussed . Electricla charateristics of the film were also investigated . In as-deposited Pt/$Y_2O_3$/Si sturcuture, leakage current was less than $10^{-6}$A/$\textrm{cm}^2$ at 7MV/cm strength.

• 전기학회논문지
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• 제57권11호
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• pp.2015-2022
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• 2008

The effect of content of $Al_2O_3+Y_2O_3$ sintering additives on the densification behavior, mechanical and electrical properties of the pressureless-sintered $SiC-ZrB_2$ electroconductive ceramic composites was investigated. The $SiC-ZrB_2$ electroconductive ceramic composites were pressurless-sintered for 2 hours at 1,700[$^{\circ}C$] temperatures with an addition of $Al_2O_3+Y_2O_3$(6 : 4 mixture of $Al_2O_3$ and $Y_2O_3$) as a sintering aid in the range of $8\;{\sim}\;20$[wt%]. Phase analysis of $SiC-ZrB_2$ composites by XRD revealed mostly of $\alpha$-SiC(6H), $ZrB_2$ and In Situ YAG($Al_5Y_3O_{12}$). The relative density, flexural strength, Young's modulus and vicker's hardness showed the highest value of 89.02[%], 81.58[MPa], 31.44[GPa] and 1.34[GPa] for $SiC-ZrB_2$ composites added with 16[wt%] $Al_2O_3+Y_2O_3$ additives at room temperature respectively. Abnormal grain growth takes place during phase transformation from $\beta$-SiC into $\alpha$-SiC was correlated with In Situ YAG phase by reaction between $Al_2O_3$ and $Y_2O_3$ additive during sintering. The electrical resistivity showed the lowest value of $3.l4{\times}10^{-2}{\Omega}{\cdot}cm$ for $SiC-ZrB_2$ composite added with 16[wt%] $Al_2O_3+Y_2O_3$ additives at 700[$^{\circ}C$]. The electrical resistivity of the $SiC-TiB_2$ and $SiC-ZrB_2$ composite was all negative temperature coefficient resistance (NTCR) in the temperature ranges from room temperature to 700[$^{\circ}C$]. Compositional design and optimization of processing parameters are key factors for controlling and improving the properties of SiC-based electroconductive ceramic composites.

• 대한화학회지
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• 제27권6호
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• pp.424-482
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• 1983

분석시료에 일정량의 표준물을 첨가한 후 희석제로 묽히는 방법을 이용하여 주석슬랙중의 $Ta_2O_5$,$Nb_2O_5$ 및 $SnO_2$를 X-선 분광 분석법으로 정량하였다. 희석제로는 $SiO_2$와 $Fe_2O_3$를 사용하였으며 첨가시료와 1:1의 비로 희석 시켰다. $Ta_2O_5$와 $SnO_2$ 의 분석결과는 $Fe_2O_3$보다 $SiO_2$로 희석시킨 것이 표준 검정곡선법에 의해 얻은 분석값과 더 잘 일치하고, $Nb_2O_5$는 이와 반대로 $SiO_2$보다 $Fe_2O_3$로 희석시킨 것이 더 잘 일치함을 보여주었다.

• 마이크로전자및패키징학회지
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• 제19권2호
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• pp.41-45
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• 2012

백색 LED용 산질화물계 녹색발광 형광체를 합성하고, 광특성을 분석하였다. $SrSi_2O_{2-{\delta}}N_{2+2/3{\delta}}:Eu^{2+}$의 조성을 갖는 $SrSi_2O_2N_2:Eu^{2+}$ 경우 합성조건에 따라서 N/O비 ($\delta$)가 변하고 있었다. 수소 분위기로 $1700^{\circ}C $에서 합성된 시편이 Eu의 농도가 5 mol%일 때 $Eu^{2+}$의 $5d{\rightarrow}4f$ 전이에 의한 545 nm 근처에서의 가장 높은 녹색 발광강도를 얻을 수 있었다. $Ca_{0.5m-0.005}Yb_{0.005}Si_{12-(m+n)}Al_{m+n}O_nN_{16-n}$의 조성을 갖는 $Ca-{\alpha}-SiAlON:Yb^{2+}$는 m = 3 (n = 0.15)에서 잘 발달된 결정성과 균일한 크기를 갖는 입자를 얻을 수 있었고, 이 것이 550 nm 근처에서 가장 높은 녹색 발광을 하고 있었다.

• 대한전자공학회논문지
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• 제3권2호
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• pp.2-9
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• 1966

실리콘 프래너트 npn 랜짓스터 제작과정을 기술하였다. 표면처리, 산화, K.P.R. boron 확산, 인확산 및 Al 증착등은 중요한 과정들이다. Boron층은 box method로 B2O3-SiO2계확산물을 사용하여 만들었고 린은 P2O5-SiO2계확산물을 사용하였다. 이 중간과정으로서 "실리콘·프래너·다이오드"도 제작되었다.

• 한국해양공학회:학술대회논문집
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• 한국해양공학회 2006년 창립20주년기념 정기학술대회 및 국제워크샵
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• pp.25-28
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• 2006

This paper dealt with the LPS process for the development of high performance SiC materials, based on the detailed analysis of their microstructure and mechanical properties. The submicron SiC powder was used for the fabrication of LPS-SiC materials. A mixture of $Al_2O_3$ and $Y_2O_3$ particles was also used as a sintering additive in the LPS process. LPS-SiC materials were fabricated at different temperatures, using various additive composition ratio ($Al_2O_3/Y_2O_3$). The total amount of additive materials ($Al_2O_3+Y_2O_3$) was fixed as 10 wt%. The characterization Of LPS-SiC materials was investigated by means of SEM, XRD and three point bending test. The LPS-SiC material represented a relative density of about 98 % and a flexural strength of about 800MPa, when it was fabricated at the temperature of $1820^{\circ}C$ and the additive compositional ratio of 1.5.

• Journal of the Korean Wood Science and Technology
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• 제48권1호
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• pp.41-49
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• 2020

Jabon (Anthocephalus cadamba) is a fast-growing wood species that is widely utilized for light construction and other purposes in Indonesia. The objectives of the current study were to determine the effects of monoethylene glycol (MEG) and SiO₂ nanoparticles (nano SiO₂) impregnation treatment on the dimensional stability and density of jabon wood and to identify the characteristics of impregnated jabon wood. Wood samples were immersed in water (as untreated), MEG, 0.5% MEGSiO₂, then impregnated by applying 0.5 bar of vacuum for 60 min, and then applying 2.5 bar of pressure for 120 min. The results showed that impregnation with MEG and Nano SiO₂ had a significant effect on the dimensional stability of jabon wood. Polymers can fill cell walls in wood indicated by increasing weight percentgain, antiswelling efficiency, bulking effect, and density, then decreasing in water uptake value. Jabon wood morphology by using SEM showed that MEGSiO₂ polymers can cover part of the pitsin the wood vessel wall of jabon. This finding was reinforced by EDX results showing that the silicon content was increased due to the addition of SiO₂ nano. The XRD diffraction pattern indicated that MEGSiO₂ treatment increased the degree of crystallinity in wood samples. Overall, treatment with 0.5% MEGSiO₂ led to the most improvement in the dimensional stability of 5-year-old jabon wood in this study.