The Journal of Korea Institute of Information, Electronics, and Communication Technology (한국정보전자통신기술학회논문지)

Korea Information Electronic Communication Technology (한국정보전자통신기술학회)
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Dependence of Hot Electron Effects on Temperature in The Deep Submicron SOI n-Channel MOSFETs

Deep Submicron SOI n-채널 MOSFET에서 열전자 효과들의 온도 의존성

  • Park, Keun-Hyung (Department of Semiconductor Engineering, Graduate School, Chungbuk National University) ;
  • Cha, Ho-Il (Measurement and Analysis Team, National Nanofab Center)
  • Received : 2017.12.01
  • Accepted : 2018.03.09
  • Published : 2018.04.30
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Abstract

Nowadays most integrated circuits are built using the bulk CMOS technology, but it has much difficulty in further reduction of the power consumption and die size. As a super low-power technology to solve such problems, the SOI technology attracts great attention recently. In this paper, the study results of the temperature dependency of the hot carrier effects in the n-channel MOSFETs fabricated on the thin SOI substrate were discussed. In spite that the devices employed the LDD structure, the hot carrier effects were more serious than expected due to the high series resistance between the channel region and the substrate contact to the ground, and were found to be less serious for the higher temperature with the more phonon scattering in the channel region, which resulted in reducing the hot electron generation.

현재 대부분의 집적회로는 bulk CMOS 기술을 사용해서 제작되고 있으나 전력 소모를 낮추고 die 크기를 줄이기에는 한계점에 도달해있다. 이러한 어려움을 획기적으로 극복할 수 있는 초저전력 기술로서 SOI CMOS 기술이 최근에 크게 각광을 받고 있다. 본 논문에서는 100 nm Thin SOI 기판 위에 제작된 n-채널 MOSFET 소자들의 열전자 효과들의 온도 의존성에 관한 연구 결과들이 논의되었다. 소자들이 LDD 구조를 갖고 있음에도 불구하고 열전자 효과들이 예상보다 더 심각한 것으로 나타났는데, 이는 채널과 기판 접지 사이의 직렬 저항이 크기 때문인 것으로 믿어졌다. 온도가 높을수록 채널에서의 phonon scattering의 증가와 함께 열전자 효과는 감소하였는데, 이는 phonon scattering의 증가는 결과적으로 열전자의 생성을 감소시켰기 때문인 것으로 판단된다.

Keywords

References

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