Fig. 1. Schematic diagrams of device structures.
Fig. 2. RC Delay Trends for transistor and interconnect.
Fig. 3. Schematic diagram of organic-inorganic material structure.
Fig. 4. Example of patterning characteristic of polysiloxane (SEM images).
Table 1. List of dielectrics.7-11)
Table 2. Material properties of selected organic-based dielectrics.16)
References
- S. E. Thompson, and S. Parthasarathy, "Moore's law: the future of Si microelectronics", Mater Today, 9(6), 20 (2006).
- K. C. Saraswat, and F. Mohammadi, "Effect of scaling of interconnections on the time delay of VLSI circuits", IEEE Trans. on Electron Dev., 29(4), 645 (1982). https://doi.org/10.1109/T-ED.1982.20757
- M. T. Bohr, and Y. A. El-Mansy, "Technology for advanced high-performance microprocessors", IEEE Trans. on Electron Dev., 45(3), 620 (1998). https://doi.org/10.1109/16.661223
- A. A. Vyas, C. Zhou, and C. Y. Yang, "On-Chip Interconnect Conductor Materials for End-of-Roadmap Technology Nodes", IEEE Transactions on Nanotechnology, 17(1), 4 (2018). https://doi.org/10.1109/TNANO.2016.2635583
- T. Ohba, "A study of current multilevel interconnect technologies for 90nm nodes and beyond", Fujitsu Sci. Tech. J., 38(1), 13 (2002).
- S. E. Kim, "Bumpless Interconnect System for Fine-pitch Devices", J. Microelectron. Packag. Soc., 21(3), 1 (2014). https://doi.org/10.6117/kmeps.2014.21.3.001
- D. Shamiryan, T. Abel, F. Iacopi, and K. Maex, "Low K dielectric materials", Mater. Today, 7(1), 34 (2004). https://doi.org/10.1016/S1369-7021(04)00053-7
- K. Maex, M. R. Baklanov, D. Shamiryan, F. lacopi, S. H. Brongersma, and Z. S. Yanovitskaya, "Low dielectric constant materials for microelectronics", J. Appl. Phys., 93(11), 8793 (2003). https://doi.org/10.1063/1.1567460
- J. Gambino, F. Chen, and J. He, "Copper interconnect technology for the 32nm node and beyond", Proc. IEEE Custom Integrated Circuits Conference, San Jose, 141 (2009).
- M. Morgen, E. T. Ryan, J. Zhao, C. Hu, T. Cho, and P. S. Ho, "Low dielectric constant materials for ULSI interconnects", Annu. Rev. Mater. Sci., 30(1), 645 (2000). https://doi.org/10.1146/annurev.matsci.30.1.645
- M. Topper, T. Fischer, T. Baumgartner, and H. Reichl, "A Comparison of Thin Film Polymers for Wafer Level Packaging", Proc. IEEE Electronic Components and Technology Conference (ECTC), Las Vegas, 769 (2010).
- X. Fan, "Wafer Level Packaging (WLP): Fan-in, Fan-out and Three-Dimensional Integration", Proc. Int. Conf. on Thermal, Mechanical and Multiphysics Simulation and Experiments in Micro-Electronics and Micro-Systems, Bordeaux, EuroSimE (2010).
- X. J. Fan, B. Varia, and Q. Han, "Design and optimization of thermo-mechanical reliability in wafer level packaging", Microelectronics Reliability, 50(4), 536 (2010). https://doi.org/10.1016/j.microrel.2009.11.010
- T. Meyer, G. Ofner, S. Bradl, M. Brunnbauer, and R. Hagen, "Embedded Wafer Level Ball Grid Array (eWLB)", IEEE EPTC, Singapore, 994 (2008).
- J. H. Lau, M. Li, M. L. Qingqian, T. Chen, I. Xu, Q. X. Yong, Z. Cheng, N. Fan, E. Kuah, Z. Li, K. H. Tan, Y. Cheung, E. Ng, P. Lo, W. Kai, J. Hao, K. S. Wee, J. Ran, C. Xi, R. Beica, S. P. Lim, N. C. Lee, C. Ko, H. Yang, Y. Chen, M. Tao, J. Lo, and R. S. W. Lee, "Fan-Out Wafer-Level Packaging for Heterogeneous Integration", IEEE Transactions on Components, Packaging and Manufacturing Technology, 8(9), 1544 (2018). https://doi.org/10.1109/TCPMT.2018.2848649
- M. Topper, T. Fischer, T. Baumgartner, and H. Reichl, "Comparison of Thin Film Polymers for Wafer Level Packaging", Proc. IEEE Electronic Components and Technology Conference (ECTC), Las Vegas, 769 (2010).
- L. Shi, L. Chen, D. W. Zhang, E. Liu, and J. Huang, "Investigation on solder bump process polyimide cracking for wafer level packaging", Proc. IEEE International Conference on Electronic Packaging Technology (ICEPT), China, 1140 (2016).
- S. S. Boon, K. J. Chui, S. W. D. Ho, S. A. Sek, M. Yu, P. Lianto, Y. Gu, G. H. See, and M. L. Bernt, "Evaluation on multiple layer PBO-based Cu RDL process for Fan-Out Wafer Level Packaging (FOWLP)", Proc. IEEE Electronics Packaging Technology Conference (EPTC), Singapore, 662 (2016).
- M. Nishimura, D. Matsukawa, N. Matsuie, N. Yamazaki, T. Enomoto, and M. Ohe, "Reliability of 200oC curable photodefinable PBO for re-distribution layer in WLP", Proc. IEEE CPMT Symposium Japan (ICSJ), Koyto, 197 (2016).
- A. Tanimoto, Y. Aoki, M. Kimura, S. Lee, T. Komine, Y. Okada, and M. Sasaki, "Development of Positive-tone Photodefinable Material for Redistribution Layer", J. Photopolym. Sci. Technol., 30(2), 231 (2017). https://doi.org/10.2494/photopolymer.30.231
- Y. S. Chan, S. W. R. Lee, F. Song, C. C. J. Lo, and T. Jiang, "Effect of UBM and BCB layers on the thermo-mechanical reliability of wafer level chip scale package (WLCSP)", Proc. 4th International Microsystems, Packaging, Assembly and Circuits Technology Conference, Taiwan, 407 (2009).
- P. Judeinstein, and C. Sanchez, "Hybrid organic-inorganic materials: a land of multidisciplinarity", J. Muter. Chem., 6(4), 511 (1996). https://doi.org/10.1039/JM9960600511
- E. Ayandele, B. Sarkar, and P. Alexandridi, "Polyhedral Oligomeric Silsesquioxane (POSS)-Containing Polymer Nanocomposites", Nanomaterials, 2(4), 445 (2012). https://doi.org/10.3390/nano2040445
- S. S, Hwang, K. Baek, S. S. Choi, H. S. Lee, and D. Y. Oh, "Polysilsesquioxane (in Kor.)", Polymer Science and Technology, 20(2), 135 (2009).
- K. B. Yoon, and D. H. Lee, "Synthesis and characteristics of POSS polymers", Polymer Science and Technology, 16(6), 833 (2005).
- H. M. Lin, K. H. Hseih, and F. C. Chang, "Characterization of negative-type photoresists containing polyhedral oligomeric silsesquioxane methacrylate", Microelectron. Eng., 85(7), 1624 (2008). https://doi.org/10.1016/j.mee.2008.03.012
- N. Fritz, R. Saha, S. A. B. Allen, and P. A. Kohl, "Photodefinable Epoxycyclohexyl Polyhedral Oligomeric Silsesquioxane", J. Electronic Materials, 39(2), 149 (2010). https://doi.org/10.1007/s11664-009-1031-9
- D. Kessler, and P. Theato, "Synthesis of Functional Inorganic-Organic Hybrid Polymers Based on Poly(silsesquioxanes) and Their Thin Film Properties", Macromolecules, 41(14), 5237 (2008). https://doi.org/10.1021/ma800570x
- D. Kessler, P. J. Roth, and P. Theato, "Reactive Surface Coatings Based on Polysilsesquioxanes: Controlled Functionalization for Specific Protein Immobilization", Langmuir, 25(17), 10068 (2009). https://doi.org/10.1021/la901878h
- W. Chen, F. Qi, C. Li, J. Cao, Z. Li, J. Dou, Y. Bei, J. Zhan, and Q. Zhu, "Functionalized polysilsesquioxane film fluorescent sensors for sensitive detection of polychlorinated biphenyls", Journal of Organometallic Chemistry, 749, 296 (2014). https://doi.org/10.1016/j.jorganchem.2013.10.028
- D. Cordes, P. Lickiss, and F. rataboul, "Recent Developments in the Chemistry of Cubic Polyhedral Oligosilsesquioxanes", Chem. Rev., 110(4), 2081 (2010). https://doi.org/10.1021/cr900201r
- K. Tanaka, and Y. Chujo, "Advanced functional materials based on polyhedral oligomeric silsesquioxane (POSS)", J. Mater. Chem., 22(5), 1733 (2012). https://doi.org/10.1039/C1JM14231C
- R. Tamaki, Y. Chujo, K. Kuraoka, and T. Yazawa, "Application of organic-inorganic polymer hybrids as selective gas permeation membranes", J. Mater. Chem., 8, 1741 (1999).
- T. Ogoshi, and Y. Chujo, "Synthesis of Photosensitive Organic-Inorganic Polymer Hybrids by Utilizing Caged Photoactivatable Alkoxysilane", Macromolecules, 37, 5916 (2004). https://doi.org/10.1021/ma0400057
- M. Morita, A. Tanaka, and K. Onose, "Methacrylated silicone-based negative photoresist for high resolution bilayer resist systems", J. Vac. Sci. Technol. B: Microelectronics Processing and Phenomena 4(1), 414 (1998). https://doi.org/10.1116/1.583345
- K. Kim, D. Keum, and Y. Chujo, "Organic-Inorganic Polymer Hybrids Using Polyoxazoline Initiated by Functionalized Silsesquioxane", Macromolecules, 6, 867 (2003).
- C.-L. Chiang, and C.-C. M. Ma, "Synthesis, characterization and thermal properties of novel epoxy containing silicon and phosphorus nanocomposites by sol-gel method", European Polymer Journal, 38(11), 2219 (2002). https://doi.org/10.1016/S0014-3057(02)00123-4
- C.-L. Chiang, and R.-C. Chang, "Synthesis, characterization, and thermal properties of bridged polysilsesquioxanes-molecular nanocomposites", ECCM, 13, 1 (2008).
- G. Cerveau, R. J. P. Corriu, and E. Framery, "Sol-gel process-influence of ageing on the textural properties of organosilsesquioxane materials", J. Mater. Chem., 11(3), 713 (2001). https://doi.org/10.1039/b008362n
- G. Cerveau, R. J. P. Corriu, and E. Framery, "Influence of the nature of the catalyst on the textural properties of organosilsesquioxane materials", Polyhedron, 19(3), 307 (2000). https://doi.org/10.1016/S0277-5387(99)00360-5
- S. Sankaraiah, J. M. Lee, J. H. Kim, and S. W. Choi, "Preparation and Characterization of Surface-Functionalized Polysilsesquioxane Hard Spheres in Aqueous Medium", Macromolecules, 41(16), 6195 (2008). https://doi.org/10.1021/ma8003345
- A. Dabrowski, M. Barczak, E. Robens, N.V. Stolyarchuk, G. R. Yurchenko, O. K. Matkovskii, and Y. L. Zub, "Ethylene and phenylene bridged polysilsesquioxanes functionalized by amine and thiol groups as adsorbents of volatile organic compounds", Applied Surface Science, 253(13), 5747 (2007). https://doi.org/10.1016/j.apsusc.2006.12.104
- R. Puyenbroek, J. C. van de Grampel, B. A. C. Rousseeuvv, and E. W. J. M. van der Drift, "Functionalization of polysilsesquioxanes", Polymer, 35(14), 3131 (1994). https://doi.org/10.1016/0032-3861(94)90432-4
- D. W. Scott, "Thermal Rearrangement of Branche d-C hain Me thylpoly siloxanes", J. Am. Chem. Soc., 68, 356 (1946). https://doi.org/10.1021/ja01207a003
- J. F. Brown, L. H. Vogt, A. Katchman, J. W. Eustance, K. M. Kiser, and K. W. Karntz, "Double chain polymers of phenylsilsesquioxane", J. Am. Chem. Soc., 82, 6194 (1960). https://doi.org/10.1021/ja01508a054
- A. S. S. Lee, Y. Y. Jo, Y. M. Choi, B. Kim, K. Baek, and S. S. Hwang, "Functional Silsesquioxane Coating Materials", Polymer Science and Technology, 27(4), 287 (2016).