반도체디스플레이기술학회지 (Journal of the Semiconductor & Display Technology)

한국반도체디스플레이기술학회 (The Korean Society Of Semiconductor & Display Technology)
권호 표지

PET 기판 위에 RF magnetron sputtering으로 증착한 AZO 박막의 구조적, 광학적, 전기적 특성

The Structure, Optical and Electrical Characteristics of AZO Thin Film Deposited on PET Substrate by RF Magnetron Sputtering Method

  • 이윤승 (청주대학교 대학원 반도체공학과) ;
  • 김홍배 (청주대학교 이공대학 반도체공학과)
  • Lee, Yun seung (Department of Semiconductor Engineering, Cheongju University) ;
  • Kim, Hong bae (Department of Semiconductor Engineering, Cheongju University)
  • 투고 : 2016.11.17
  • 심사 : 2016.12.27
  • 발행 : 2016.12.31
PDF 다운로드
⟨ 이전 논문 다음 논문 ⟩

초록

The 2 wt.% Al-doped ZnO(AZO) thin films were fabricated on PET substrates with various RF power 20, 35, 50, 65, and 80W by using RF magnetron sputtering in order to investigate the structure, electrical and optical properties of AZO thin films in this study. The XRD measurements showed that AZO films exhibit c-axis orientation. At a RF power of 80W, the AZO films showed the highest (002) diffraction peak with a FWHM of 0.42. At a RF power of 65W, the lowest electrical resistivity was about $1.64{\times}[10]$ ^(-4) ${\Omega}-cm$ and the average transmittance of all films including substrates was over 80% in visible range. Good transparence and conducting properties were obtained due to RF power control. The obtained results indicate that it is acceptable for applications as transparent conductive electrodes.

키워드

참고문헌

  1. T. Minami, Thin Solid Films, 516, P. 5822-5828(2008). https://doi.org/10.1016/j.tsf.2007.10.063
  2. B. Yaglioglu, Y.J. Huang, H.Y. Yeom, and D.C. Paine, "A Study of Amorphous and Crysalline Phases in In2O3-10wt.% ZnO Thin Films Deposited by DC Magnetron Sputtering," Thin Solid Films, vol. 496, pp. 89, (2006). https://doi.org/10.1016/j.tsf.2005.08.255
  3. S. Y. Sohn, H. M. Kim, S. H. Park, and J. J. Kim, "Effects of Sn-doping on the Transparent Conducting Characteristics of Indium - Zinc - Oxide Thin Films," Sae Mulli, vol. 51, pp. 397-403, 2005.
  4. D. S. Hecht, L. Hu, and G. Irvin, Emerging transparent electrodes based on thin films of carbon nanotubes, graphene, and metallic nanostructures, Adv. Mater, 23, 1482-1513 (2011). https://doi.org/10.1002/adma.201003188
  5. B. D. Ahn, S. H. Oh, C. H. Lee, G. H. Kim, H. J. Kim, and S. Y. Lee, "Influence of Annealing Ambient on Gadoped ZnO Thin Films," J. Crystal Growth, vol. 309, pp. 128-133, (2007). https://doi.org/10.1016/j.jcrysgro.2007.09.014
  6. J. K. Kim, J. M. Lee, J. W. Lim, J. H. Kim, and S. J. Yun, "High-Performance Transparent Conducting Gadoped ZnO Films Deposited by RF Magnetron Sputter Deposition," Jpn. J. Appl. Phys., vol. 49, pp. 04DP09, (2010).
  7. J. F. Wager, D. A. Keszler, and R. E. Presley, Transparent Electronics, NY. U.S.A. : Springer, (2008).
  8. S. Y. Sohn, H. M. Kim, S. H. Park, and J. J. Kim, "Effects of Sn-doping on the Transparent Conducting Characteristics of Indium - Zinc - Oxide Thin Films," Sae Mulli, vol. 51, pp. 397-403, (2005).
  9. Y. C. Lin, J. Y. Li, and W. T. Yen, "Low Temperature ITO Thin Film Deposition on PES Substrate Using Pulse Magnetron Sputtering," Appl. Surf. Sci., vol. 254, pp. 3262-3268, (2008). https://doi.org/10.1016/j.apsusc.2007.11.006
  10. S. I. Han, H. B. Kim, "A Study on Propertires of RFsputtered Al-doped ZnO Thin Films Prepared with Different Ar Gas Flow Rates" Appl. Sci. Converg. Technol. 25(6) 145-148, (2016). https://doi.org/10.5757/ASCT.2016.25.6.145