참고문헌
- Meng Yu and Jungyol Jo "Sputtering Growth of ZnO Thin-Film Transistor Using Zn Target", The Journal of the Korean Institute of Electrical and Electronic Material Engineers, September Vol. 13, pp.35-38, 2014.
- J. L. Vossen, Physics of Thin films 9 (1977), 1-71.
- K. Nakashima and Y. Kumahara, Effect of tin oxide dispersion on nodule formation in ITO Sputtering, Vacuum, 66, 221-226, 2002. https://doi.org/10.1016/S0042-207X(02)00145-8
- D. S. Hecht, L. Hu, and G. Irvin, Emerging transparent electrodes based on thin films of carbon nanotubes, graphene, and metallic nanostructures, Adv. Mater, 23, 1482-1513 2011. https://doi.org/10.1002/adma.201003188
- G. A. Potoczny, T. S. Bejitual, J. S. Abell, K. A. Sierros, D. R. Cairns, and S. N. Kukureka, Flexibility and electrical stability of polyesterbased device electrodes under monotonic and cyclic buckling conditions, Vol 528, 15January 2013, pp. 205-212. https://doi.org/10.1016/j.tsf.2012.09.082
- D.-H.Kim, H.Jeon, G. Kims, S. Hwangboe, V.P.Verma, W.Choi, M. Jeon, Optics Communications 281 (2008) 2120-2125. https://doi.org/10.1016/j.optcom.2007.12.015
- H.J.KO, Y.F. Chen, S.K. Hong, H. Wenisch, T. Yao, D.C. Look, Appl. Phys. Lett. 77(2000) 3761. https://doi.org/10.1063/1.1331089
- B. O. Park, K. H. Ko and J. H. Lee, "Electrical and Optical Properties of ZnO Transparent Conducting Films by the Sol-gel Method", J. Cryst. Growth, Vol.247, 119-125, 2003. https://doi.org/10.1016/S0022-0248(02)01907-3
- S. B. Majumder, M Jain, P.S Dobal, R.S Kaityar "Investigations on Solution Derived Aluminium" Vol. 103, lssue 1, 25 September 2003, pp. 16-25. https://doi.org/10.1016/S0921-5107(03)00128-4
- S. k. Kim, "Effect of annealing temperature on the properties of GZO/ZnO films", pp. 1, 2015.
- Su-kyeong kwon and Kyu-mann Lee "Electrical and Optical Characteristics of IZO Thin Films Deposited in Different Oxygen Flow Rate", Journal of the Semiconductor & Display Technology December Vol. 12, pp.49-54, 2013.
- D. H. Hwang, H. H. Ahn, K. N. Hui, K. S. Hui, and Y. G. Son, "Effect of Oxygen Partial Pressure Contents on the Properties of Al-doped ZnO Thin Films Prepared by Radio Frequency Sputtering", J. Ceram. Proc. Res., Vol. 12, pp. 150-154, 2011.
- H. M. Kim and J. J. kim, "Heat Treatment Effects on the Electrical Properties of In2O3-ZnO Flms prepared by RF-Magnetron Sputtering Method", J. Korean Vacuum Society, Vol. 14, pp.238-244, 2005.