마이크로전자및패키징학회지 (Journal of the Microelectronics and Packaging Society)

  • 제23권4호
  • /
  • Pages.7-10
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  • 2016
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  • 1226-9360(pISSN)
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  • 2287-7525(eISSN)
한국마이크로전자및패키징학회 (The Korean Microelectronics and Packaging Society)
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OLED공정에서 사용되는 섀도마스크의 습식 세정 후 세정표면 및 세정용액 분석에 관한 연구

Analysis of Post Cleaning Solution After Wet Cleaning of Shadow Mask Used in OLED Process

  • 최은화 (중앙대학교 융합공학과 나노공학) ;
  • 표성규 (중앙대학교 융합공학과 나노공학)
  • Cui, Yinhua (Department of Nanomaterials Science & Engineering, School of Integrative Engineering, Chung-Ang University) ;
  • Pyo, Sung Gyu (Department of Nanomaterials Science & Engineering, School of Integrative Engineering, Chung-Ang University)
  • 투고 : 2016.12.09
  • 심사 : 2016.12.14
  • 발행 : 2016.12.31
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초록

The post cleaning method for clean the shadow mask using in OLED (organic light emitting diode) emitter layer is always reforming. The cleaning solution and analysis method of shadow mask is still lack and not optimized. We use the simple and useful analytical method to determine the quantity and quality of organic and inorganic residue on surface of shadow mask. Finally analyze the cleaning solution using Raman spectroscopy efficiently.

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참고문헌

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