마이크로전자및패키징학회지 (Journal of the Microelectronics and Packaging Society)

  • 제23권4호
  • /
  • Pages.1-6
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  • 2016
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  • 1226-9360(pISSN)
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  • 2287-7525(eISSN)
한국마이크로전자및패키징학회 (The Korean Microelectronics and Packaging Society)
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Recent Progress in Electroless Plating of Copper

  • 투고 : 2016.12.09
  • 심사 : 2016.12.14
  • 발행 : 2016.12.31
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초록

In this article, the recent developments in electroless plating of copper, electroless bath formulation and effect of plating parameters have been reviewed. Cyanide free electroless baths are now being developed and studied due to the various environmental concerns. Various organic chemicals such as complexing agents, reducing agents, and additives such as poly-alcohols and aromatic ring compounds have been added to copper plating baths for promising results. The effects of various reducing and complexing agents, bath conditions like additives, bath pH, and composition have been summarized. Finally the applications of the electroless plating of copper and latest developments have been overviewed for further guidance in this field.

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참고문헌

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