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http://dx.doi.org/10.6117/kmeps.2016.23.4.007

Analysis of Post Cleaning Solution After Wet Cleaning of Shadow Mask Used in OLED Process  

Cui, Yinhua (Department of Nanomaterials Science & Engineering, School of Integrative Engineering, Chung-Ang University)
Pyo, Sung Gyu (Department of Nanomaterials Science & Engineering, School of Integrative Engineering, Chung-Ang University)
Publication Information
Journal of the Microelectronics and Packaging Society / v.23, no.4, 2016 , pp. 7-10 More about this Journal
Abstract
The post cleaning method for clean the shadow mask using in OLED (organic light emitting diode) emitter layer is always reforming. The cleaning solution and analysis method of shadow mask is still lack and not optimized. We use the simple and useful analytical method to determine the quantity and quality of organic and inorganic residue on surface of shadow mask. Finally analyze the cleaning solution using Raman spectroscopy efficiently.
Keywords
shadow mask; OLED; organic and inorganic residue; cleaning solution; Raman spectroscopy;
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Times Cited By KSCI : 1  (Citation Analysis)
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