DOI QR코드

DOI QR Code

Micro-bump Joining Technology for 3 Dimensional Chip Stacking

반도체 3차원 칩 적층을 위한 미세 범프 조이닝 기술

  • Ko, Young-Ki (Micro-joining center, Korea Institute of Industrial Technology) ;
  • Ko, Yong-Ho (Micro-joining center, Korea Institute of Industrial Technology) ;
  • Lee, Chang-Woo (Micro-joining center, Korea Institute of Industrial Technology)
  • 고영기 (한국생산기술연구원 마이크로조이닝 센터) ;
  • 고용호 (한국생산기술연구원 마이크로조이닝 센터) ;
  • 이창우 (한국생산기술연구원 마이크로조이닝 센터)
  • Received : 2014.08.26
  • Accepted : 2014.09.17
  • Published : 2014.10.01

Abstract

Paradigm shift to 3-D chip stacking in electronic packaging has induced a lot of integration challenges due to the reduction in wafer thickness and pitch size. This study presents a hybrid bonding technology by self-alignment effect in order to improve the flip chip bonding accuracy with ultra-thin wafer. Optimization of Cu pillar bump formation and evaluation of various factors on self-alignment effect was performed. As a result, highly-improved bonding accuracy of thin wafer with a $50{\mu}m$ of thickness was achieved without solder bridging or bump misalignment by applying reflow process after thermo-compression bonding process. Reflow process caused the inherently-misaligned micro-bump to be aligned due to the interface tension between Si die and solder bump. Control of solder bump volume with respect to the chip dimension was the critical factor for self-alignment effect. This study indicated that bump design for 3D packaging could be tuned for the improvement of micro-bonding quality.

Keywords

References

  1. Toriyama, K., "Challenges for Micro-bump Interconnection Technologies," Proc. of 11th International Symposium on Microelectronics and Packaging, pp. 253-257, 2012.
  2. Yole development "3D IC & TSV Technology," 2011.
  3. Jinhua, Y., Anand, A., Mui, Y., Srinivasan, P., and Master, R., "Reliability Study on Copper Pillar Bumping with Lead Free Solder," Proc. of 9th EPTC, pp. 618-622, 2007.
  4. Lim, S. P. S., Siow, L. Y., Chai, T. C., Rao, V. S., Takeda, K., et al., "Challenges and Approaches of Ultra-Fine Pitch Cu Pillar Assembly on Organic Substrate using Wafer Level Underfill," Proc. of IEEE 15th EPTC, pp. 538-542, 2013.
  5. Zhan, C.-J., Chuang, C.-C., Juang, J.-Y., Lu, S.-T., and Chang, T.-C., "Assembly and Reliability Characterization of 3D Chip Stacking with 30${\mu}m$ Pitch Lead-Free Solder Micro Bump Interconnection," Proc. of 60th ECTC, pp. 1043-1049, 2010.
  6. Gerber, M., Beddingfield, C., O'Connor, S., Min, Y., MinJae, L., and et al., "Next Generation Fine Pitch Cu Pillar Technology-Enabling Next Generation Silicon Nodes," Proc. of 61th ECTC, pp. 612-618, 2011.
  7. Lin, Y. M., Zhan, C. J., Juang, J. Y., Lau, J. H., Chen, T. H., et al., "Electromigration in Ni/Sn Intermetallic Micro Bump Joint for 3D IC Chip Stacking," Proc. of 61th ECTC, pp. 351-357, 2011.
  8. Lee, M., Yoo, M., Cho, J., Lee, S., Kim, J., et al., "Study of Interconnection Process for Fine Pitch Flip Chip," Proc. of 59th ECTC, pp. 720-723, 2009.
  9. Orii, Y., Toriyama, K., Noma, H., Oyama, Y., Nishiwaki, H., et al., "Ultrafine-pitch C2 Flip Chip Interconnections with Solder-Capped Cu Pillar Bumps," Proc. of 59th ECTC, pp. 948-953, 2009.
  10. Bigas, M. and Cabruja, E., "Characterisation of electroplated Sn/Ag solder bumps," Microelectronics Journal, Vol. 37, No. 4, pp. 308-316, 2006. https://doi.org/10.1016/j.mejo.2005.05.017
  11. Zhao, Q., Hu, A., Li, M., and Sun, J., "Effect of Electroplating Layer Structure on Shear Property and Microstructure of Multilayer Electroplated Sn-3.5 Ag Solder Bumps," Microelectronics Reliability, Vol. 53, No. 2, pp. 321-326, 2013. https://doi.org/10.1016/j.microrel.2012.08.010
  12. Tsai, C. G., Hsieh, C. M., and Yeh, J. A., "Self-Alignment of Microchips using Surface Tension and Solid Edge," Sensors and Actuators A: Physical, Vol. 139, No. 1, pp. 343-349, 2007. https://doi.org/10.1016/j.sna.2007.04.019