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Preparation of Epoxy/Organoclay Nanocomposites for Electrical Insulating Material Using an Ultrasonicator

  • Park, Jae-Jun (Department of Electrical and Electronic Engineering, Joongbu University) ;
  • Park, Young-Bum (Department of Electrical and Electronic Engineering, Joongbu University) ;
  • Lee, Jae-Young (Hydrogen Fuel Cell Parts and Applied Technology Regional Innovation Center, Woosuk University)
  • Received : 2011.03.08
  • Accepted : 2011.04.07
  • Published : 2011.06.25

Abstract

In this paper, we discuss design considerations for an n-channel metal-oxide-semiconductor field-effect transistor (MOSFET) with a lateral asymmetric channel (LAC) doping profile. We employed a 0.35 ${\mu}M$ standard complementary MOSFET process for fabrication of the devices. The gates to the LAC doping overlap lengths were 0.5, 1.0, and 1.5 ${\mu}M$. The drain current ($I_{ON}$), transconductance ($g_m$), substrate current ($I_{SUB}$), drain to source leakage current ($I_{OFF}$), and channel-hot-electron (CHE) reliability characteristics were taken into account for optimum device design. The LAC devices with shorter overlap lengths demonstrated improved $I_{ON}$ and $g_m$ characteristics. On the other hand, the LAC devices with longer overlap lengths demonstrated improved CHE degradation and $I_{OFF}$ characteristics.

Keywords

References

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