References
- K. Jain, M. Zemel, and M. Klosner, “Large-Area High-Resolution Lithography and Photoablation Systems for Microelectronics and Optoelectronics Fabrication,” PROCEEDINGS OF THE IEEE, vol. 90, no. 10, pp. 1681-1688, 2002 https://doi.org/10.1109/JPROC.2002.803662
- Kahp Y. Suh and Hong H. Lee, “Capillary force Lithography: Large-area patterning, self-organization, and anisotropic dewetting,” Advanced Functional Materials, vol. 12, issue 6+7, pp. 405-413, June 2002 https://doi.org/10.1002/1616-3028(20020618)12:6/7<405::AID-ADFM405>3.0.CO;2-1
- Lebib A., Chen Y., Bourneix J, Carcenac F., Cambril E., Couraud L., and Launois H., “Nanoimprint lithography for a large area pattern replication,” Microelectronic Engineering, vol. 46, issue1-4, pp. 319-322, 1999 https://doi.org/10.1016/S0167-9317(99)00094-5
- Cambell M., Sharp DN., Harrison MT., et al., “Fabrication of photonic crystals for the visible spectrum by holographic lithography,” Nature, vol. 404, issue 6773, pp. 53-56, Mar. 2000 https://doi.org/10.1038/35003523
- Y. Chen, Y. Shroff, and W. G. Oldham, “Modeling and control of nanomirrors for EUV maskless lithography,” Technical Proc. Int. Conf. Modeling and Simulation of Microsystems, pp. 602-604, San Diego, CA, Mar. 2000
- Marc J. Madou, Fundamentals of microfabrication the science of miniaturization 2nd ed. (CRC press, Florida, USA, 2002), pp. 22-28
- Clube F., Gray S., Struchen D., Tisserand J. C., Malfoy S., and Darbellay Y., “Holographic microlithography,” Opt. Eng., vol. 34, no. 9, pp. 2724-2730, Sept. 1995 https://doi.org/10.1117/12.205673
- Dandliker R. and Brook J., “Holographic photolithography for submicron VLSI structure,” Holographic Systems, Components and Applications, 1989., Second International Conference on 1989, pp. 127-132, 1989
- Ross I. N., David G. M., and Klemitz D., “High-resolution holographic image projection at visible and ultraviolet wavelengths,” Appl. Opt., vol. 27, no. 5, pp. 967-972, 1988 https://doi.org/10.1364/AO.27.000967
- Ehbets P., Herzig H. P., and Clube F., “High-carrierfrequency fan-out gratings fabricated by total internal reflection holographic lithography,” Opt. Eng., vol. 34, no. 8, pp. 2377-2383, 1995 https://doi.org/10.1117/12.205661
- H. J. Coufal, et al., Holographic data storage (Springer series in optical sciences, New York, USA, 2000), pp. 7-9
- J. H. Hong, I. McMichael, and T. Y. Chang, “Volume holographic memory systems: techniques and architectures,” Opt. Eng., vol. 34, no. 8, pp. 2193-2203, 1995 https://doi.org/10.1117/12.213214
- Fai H. Mok, “Angle-multiplexed storage of 5000 holograms in lithium niobate,” Opt. Lett., vol. 18, no. 11, pp. 915-917, 1993 https://doi.org/10.1364/OL.18.000915
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