• International Journal of Precision Engineering and Manufacturing
• /
• v.9 no.3
• /
• pp.51-54
• /
• 2008

A novel stereolithography method using evanescent light has been proposed as a means to realize 100-nanometer resolution. An in-process measurement system with high accuracy has been introduced to the nanostereolithography apparatus. Specifically, an optical microscopic system was developed to monitor the exposure process and a confocal positioning system was established to improve the longitudinal positioning accuracy in the layer-by-layer process. A high-power objective lens, a tube lens, and a charge coupled device (CCD) were included in the optical microscopic system, whereas a laser, a high-power objective lens, a piezoelectric (PZT) stage, a condenser lens, a pinhole, and a photomultiplier (PMT) made up the confocal microscopic system. Two verification experiments were conducted, and the results indicated that the optical microscopic system had a horizontal resolution of 200 nm and that the confocal positioning system provided a depth resolution of 30.8 nm. These results indicate that nanostereolithography can be successfully performed with this system.

• Korean Journal of Air-Conditioning and Refrigeration Engineering
• /
• v.27 no.10
• /
• pp.552-557
• /
• 2015

The nanostereolithography process using a femtosecond laser has been shown to have strong merits for the direct fabrication of 2D/3D micro structures. In addition, a femtosecond laser provides efficient tools for precise micromachining owing to the advantages of a small and feeble heat effect zone. In this paper, we report an effective fabrication process of 3D micro optical and fluidic devices using nanostereolithography process composed of a dual stage system. Process conditions for additive and subtractive fabrication are examined. The Piezo stage scanning system is used for 3D micro-fabrication in unit area of sub-mm scale, and the motor stage is employed in fabrication on the scale of several mm. The misalignment between the pizeo- and motor- stages is revised through rotational transformation of CAD data in the unit domain. Here, the effectiveness of the proposed process is demonstrated through examples using 3D optical and microfluidic structures.

• Proceedings of the Korean Society of Precision Engineering Conference
• /
• 2004.10a
• /
• pp.1365-1368
• /
• 2004

A scheme to control the laser power and the exposure time was studied to fabricate precise microstructures using the nanostereolithography (nSL) process. Some recent works have shown that a three-dimensional (3D) microstructure can be fabricated by the photopolymerizing process which is induced by two-photon absorption (TPA) with a femtosecond pulse laser. TPA provides the ability to confine photochemical and physical reactions within the order of laser wavelength, so neardiffraction limit features can be produced. In the nSL process, voxels are continuously generated to form a layer and then another layer is stacked in the normal direction of a plane to construct a 3D structure. Thus, fabrication of a voxel with low aspect ratio and small diameter is one of the most important parameters for fabricating precise 3D microstructures. In this work, the mechanism of a voxel formation is studied and a scheme on the control of laser power and exposure for minimizing aspect ratio of a voxel is proposed.