Analysis of Electrical Property on Inductively Coupled Ar Plasma for Gas Pressure

유도결합형 Ar 플라즈마의 압력에 따른 전기적 특성분석

  • 조주웅 (원광대 전자재료공학과) ;
  • 이영환 (원광대 전자재료공학과) ;
  • 김광수 (원광대 전자재료공학과) ;
  • 허인성 (원광대 전자재료공학과) ;
  • 최용성 (원광대 전기전자 및 정보공학부) ;
  • 박대희 (원광대 전기전자 및 정보공학부)
  • Published : 2004.03.01

Abstract

Low-Pressure inductively coupled RF discharge sources have important industrial applications mainly because they can provide a high-density electrodeless plasma source with low ion energy and low power loss. In an inductive discharge, the RF power is coupled to the plasma by an electromagnetic interaction with the current flowing in a coil. In this paper, the experiments have been focussed on the electric characteristic and carried out using a single Langmuir probe. The internal electric characteristics of inductively coupled Ar RF discharge at 13.56(MHz) have been measured over a wide range of power at gas pressure ranging from 1∼70(mTorr).

Keywords

References

  1. D. O. Wharmby, 'Electrodeless lamps for lighting: a review', IEE Proceedings 140A, pp. 465-473, 1993
  2. B. P. Turner, M. G. Ury, and D. A. McLennan, 'Microwave excited sulfurlamp,' Paper QA2. 47th Annual Gaseous Electronics Conference (Gaithersburg, MD, USA), 1994
  3. G. I. Babat, 'Electrodeless Discharge and some applied problems', J. IEE, vol.94, pt3, pp. 27-37, 1947
  4. 박철웅, '플라즈마 온도 측정에 관한 연구', 석사학위 논문, 서울대학교, 1987
  5. F. C. Francis, 'Introduction to Plasma Physics And Controlled Fusion', Plenum Press, pp.10., 1984
  6. 홍상희, 주원태, 김동욱, 류지명, 허민, '산업용열플라즈마 발생기의 최적 설계 및 제작', 서울대학교 열플라즈마기술연구실 2차년도 연구보고서 2001