참고문헌
- Chou, S. Y., Krauss, P. R., Renstrom, P. J., 'Nanoimprint lithography,' J. Vac. Sci. Technol. B, Vol. 14(6),pp. 4129-4133, 1996 https://doi.org/10.1116/1.588605
-
Krauss, P. R., Chou, S. Y., 'Nano-compact disks with 400Gbit/
${in}^²$ storage density fabricated using nanoimprint lithography and read with proximal probe,' Appl. Phys. Lett., Vol. 71(21), pp. 3174-3716, 1997 https://doi.org/10.1063/1.120280 - Yu, Z., Schablitsky, S. J., Chou, S. Y., 'Nanoscale GaAs metel-semiconductor-metal phtodetectors fabricated using nanoimprint lithography,' Appl. Phys. Lett., Vol. 74(16),pp. 2381-2383, 1999 https://doi.org/10.1063/1.123858
- Cao, H., Yu, Z., Wang, J., Tegenfeldt, J. O., Austin, R. H., Chen, E., Wu, W. and Chou, S. Y., 'Fabrication of 10nm enclosed nanofluidic channels,' Appl. Phys. Lett., Vol. 81(1),pp. 174-176, 2002 https://doi.org/10.1063/1.1489102
- Chou, S. Y., Keimel, C., Gu, J., 'Ultrafast and direct imprint of nanostructures in silicon,' Nature, Vol. 417,pp.835-837, 2002 https://doi.org/10.1038/nature00792
- Xia, Q., Keimel, C., Ge, H., Yu, Z., Wu, W., Chou, S. Y., 'Nanosecond patterning of naostructures in polymers using laser-assisted nanoimprint lithography(LA-NIL),' The First Conference on Nanoimprint and Nanoprint Technology, San Francisco, CA, Decemver 11-13, 2002
- Colburn, M., Johnson, S., Stewart, M., Damle, S., Bailey, T., Choi, B., Wedlake, M., Michaelson, T., Sreenivasan, S. V., Ekerdt, J., Wilson, C. G., 'Step and flash imprint lighography: a new approach to high-resolution pattering,' SPIE's 24th International Symposium on Microlithography: Emerging Lithographic Technologies III, Santa Clara, CA, Vol. 3676(I), pp. 379-389,1999 https://doi.org/10.1117/12.351155
- Haisma, J., Verheijen, M., Heuvel, K., 'Mold-assisted nanolithography: A process for reliable pattern replication,' J. Vac. Sci. Technol. B, Vol. 14(6), pp. 4124-4128, 1996 https://doi.org/10.1116/1.588604
- Sreenivasan, S. V., 'Nanoimprint lithography using UV curable liquids', ASME International Conference on Integrated Nanosystems, Berkelely, CA, September 18-20, 2002
- Bailey, T. C., Resnick, D. J., Mancini, D., Nordquist, K. J., Dauksher, W. J., Ainley, E., Talin, A., Gehoski, K., Baker, J. H., Choi, B. J., Johnson, S., Colburn, M., Meissl, M., Sreenivasan, S. V., Ekerdt, J. G., Willson, C. G., 'Template fabrication schemes for step and flash imprint lithography,' Microelectronics Eng, Vol. 61-62, pp. 461-467, 2002 https://doi.org/10.1016/S0167-9317(02)00462-8
- Bulthaup, C. A., Wilhelm, E. J., Hubert, B. N., Ridley, B. A., Jacobson, J. M., 'All-additive fabrication of inorganic logic elements by liquid embossing,' Appl. Phys. Lett., Vol. 79(10),pp. 1525-1527, ,2001 https://doi.org/10.1063/1.1383269
- Scheer, H. C., Schulz, H., Hoffmann, T., Torres, C. M. S., 'Problems of the nanoimprinting technique for nanometer scale pattern definition,' J. Vac. Sci. Technol. B, Vol. 16(6), pp. 3917-3921, 1998 https://doi.org/10.1116/1.590436
- Heidari, B., Maximov, I., Montelius, L., 'Nanoimprint lithography at the 6 in. wafer scale,'J. Vac. Sci. Technol. B, Vol.18(6),pp. 3557-3560, 2000 https://doi.org/10.1116/1.1326923
- Heydermann, L. J., Schift, H., Davied, C., Gobrecht, J., Schweizer, T., 'Flow behavior of thin polymer films used for hot embossing lithography,' Microelectronics Eng., Vol. 54, pp. 229-245, 2000 https://doi.org/10.1016/S0167-9317(00)00414-7
- Otto, M., Bender, M., Hadam, B., Spangenberg, B., Kurz, H., 'Characterization and application of a UV-based imprint technique,' Microelectronics Eng., Vol. 57-58, pp. 361-366, 2001 https://doi.org/10.1016/S0167-9317(01)00536-6
- Schulz, H., Korbes, A. S., Scheer, H. C., Balk, L. J., 'Combination of local tailoring of sidewalls of nonometer devices,' Microelectronics Eng., Vol. 53, pp. 221-224, 2000 https://doi.org/10.1016/S0167-9317(00)00301-4
- Pfeiffer, K., Fink, M., Gruetzner, G., Bleidiessel, G., Schulz, H., Sheer, H., 'Multistep profiles by mix and match of nanoimprint and UV lithography,' Microelectronics Eng., Vol. 57-58, pp. 381-387, 2001 https://doi.org/10.1016/S0167-9317(01)00537-8
- Shulz, H., Roos, N., Bendfeldt, L., Pfeiffer, K., Glinsner, T., Scheer, H. C., 'Multi-stack 4 inch wafer-scale imprint lithography with a commertial wafer bonder', 45th International Conference on Electron, Ion & Photon Beam Technology and Nanofabrication, 2001
- Roos, N., Luxbacher, T., Glinsner, T., Pfeiffer, K., Schulz, H., Scheer, H. C., 'Nanoimprint lithography with a commercial 4 inch bond system for hot embossing,' SPIE'S Microlithography, Santa Clara, CA, February 27-28, 2001
- Lebib, A., Chen, Y., Cambril, E., Youinou, P., Studer, V., Natali, M., Pepin, A., Janssen, H. M., Sijbesman, R. P., 'Room-temperature and low-pressure nanoimprint lithography,' Microelectronics Eng., Vol.61-62, pp. 371-377, 2002 https://doi.org/10.1016/S0167-9317(02)00485-9
- Pfeiffer, K., Fink, M., Ahrens, G., Gruetzner, G., Reuther, F., Seekamp, J., Zankovych, S., Torres, C. M. S., Maximov, I., Beck, M., Graczyk, M., Montelius, L., Schulz, H., Scheer, H. C., Steingrueber, F., 'Polymer stamp for nanoimprint,' Microelectronics Eng., Vol. 61-62, pp. 393-398, 2002 https://doi.org/10.1016/S0167-9317(02)00577-4
- Haatainnen, T. and Ahopelto, J., 'Step & stamp imprint lithography: A versatile method for nanoimprint,' The First Conference on Nanoimprint and Nanoprint Technology, San Francisco, CA, December 11-13, 2002
- Bender, M., Otto, M., Hadam, B., Vratzov, B., Spangenberg, B. and Kurz, H., 'Fabrication of Nanostructures using a UV-based imprint technique,' Microelectronics Eng., Vol. 53, pp. 233-236, 2000 https://doi.org/10.1016/S0167-9317(00)00304-X
- Bender, M., Otto, M., Hadam, B., Spangenberg, B. and Kurz H., 'Multiple imprinting in UV-based nanoimprint lithography related material issues,' Microelectronics Eng., Vol. 61-62, pp. 407-413, 2002 https://doi.org/10.1016/S0167-9317(02)00470-7
- Taniguchi, J., Tokano, Y., Miyamoto, I., Komuro, M., Hiroshima, H., Kobayashi, K., Miyazaki, T. and Ohyi, H., 'Preparation of diamond mold using electron beam lithography for application to nanoimprint lithography,' Jpn. J. Appl. Phys., Vol.39, pp. 7070-7074, 2000 https://doi.org/10.1143/JJAP.39.7070
- Taniguchi, J., Tokano, Y., Miyamoto, I., Komuro, M. and Hiroshima, H., 'Diamond nanoimprint lithography,' Nanotechnology, Vol. 13, pp. 592-596, 2002 https://doi.org/10.1088/0957-4484/13/5/309
- Taniguchi, J., Kawasaki, T., Tokano, Y., Kogo, Y., Miyamoto, I., Komuro, M., Hiroshima, H., Sakai, N. and Tada, K., 'Measurement of adhesive force between mood and photocurable resin in imprint technology,' Jpn. J. Appl. Phys., Vol. 41, pp. 4194-4197, 2002 https://doi.org/10.1143/JJAP.41.4194
- Hirai, Y., Harada, S., Isaka, S., Kobayashi, M., and Tanaka, Y., 'Nano-imprint lithography using replicated mold by Ni electroforming,' Jpn. J. Appl. Phys., Vol. 41, pp. 4186-189, 2002 https://doi.org/10.1143/JJAP.41.4186
- Igaku, Y., Matsui, S., Ishigaki, H., Fujita, J., Ishida, M., Ochiai, Y., Namatsu, H., Komuro, M. and Hiroshima, H. 'Room temperature nanoimprint technology using Hydrogen Silsequioxane(HSQ),' Jpn. J. Appl. Phys., Vol. 41, pp.4198-4202, 2002 https://doi.org/10.1143/JJAP.41.4198
- Komuro, M., Tokano, Y., Taniguchi, J., Kawasaki, T., Miyamoto, I. and Hiroshima, H., 'Improvement of imprinted pattern uniformity using sapphire mold,' Jpn. J. Appl. Phys., Vol. 41, pp. 4182-4185, 2002 https://doi.org/10.1143/JJAP.41.4182
- Hiroshima, H., Komuro, M., Kasahara, N., Kurashima, Y., Taniguchi, J. and Miyamoto, I., 'Elimination of bubble defects during nanoimprint in atmospheric ambient,' The First Conference on Nanoimprint and Nanoprint Technology, San Francisco, CA, December 11-13, 2002
- Khang, D. Y. and Lee, H. H., 'Room-temperature imprint lithography by solvent vapor treatment,' Appl. Phys. Lett., Vol. 76(7),pp. 870-872, 2000 https://doi.org/10.1063/1.125613
- Suh, K. Y., Kim, Y. S. and Lee, H. H.. 'Capillary force lithography,' Adv. Mater., Vol. 13(18), pp. 1386-1389, 2001 https://doi.org/10.1002/1521-4095(200109)13:18<1386::AID-ADMA1386>3.0.CO;2-X
- Khang, D. Y., Yoon, H. and Lee, H. H., 'Room-temperature imprint lithography,' Adv. Mater., Vol. 13(10), pp. 749-752, 2001 https://doi.org/10.1002/1521-4095(200105)13:10<749::AID-ADMA749>3.0.CO;2-7
- Kim, Y. S., Suh, K. Y. and Lee, H. H., 'Fabrication of three-dimensional microstructures by soft molding,' Appl. Phys. Lett., Vol. 79(14),pp. 2285-2287, 2001 https://doi.org/10.1063/1.1407859