패키지 반도체소자의 ESD 손상에 대한 실험적 연구

Experimental Investigation of the Electrostatic Discharge(ESD) Damage in Packaged Semiconductor Devices

  • Kim, Sang-Ryull (Department of Occupational Health, Andong Science College) ;
  • Kim, Doo-Hyun (Department of Safety Engineering, Chungbuk National University) ;
  • Kang, Dong-Kyu (Department of Safety Engineering, Chungbuk National University)
  • 발행 : 2002.12.01

초록

As the use of automatic handling equipment for sensitive semiconductor devices is rapidly increased, manufacturers of electronic components and equipments need to be more alert to the problem of electrostatic discharges(ESD). In order to analyze damage characteristics of semiconductor device damaged by ESD, this study adopts a new charged-device model(CDM), field-induced charged model(FCDM) simulator that is suitable for rapid, routine testing of semiconductor devices and provides a fast and inexpensive test that faithfully represents ESD hazards in plants. High voltage applied to the device under test is raised by the field of non-contacting electrodes in the FCDM simulator, which avoids premature device stressing and permits a faster test cycle. Discharge current and time are measured and calculated. The characteristics of electrostatic attenuation of domestic semiconductor devices are investigated to evaluate the ESD phenomena in the semiconductors. Also, the field charging mechanism, the device thresholds and failure modes are investigated and analyzed. The damaged devices obtained in the simulator are analyzed and evaluated by SEM. The results obtained in this paper can be used to prevent semiconductor devices form ESD hazards and be a foundation of research area and industry relevant to ESD phenomena.

키워드

참고문헌

  1. W. D. Greason, 'Electrostatic Discharge : A Charge Driven phenomenon,' Joumal of Electrostatics, 28, pp. 199-218, 1992 https://doi.org/10.1016/0304-3886(92)90073-3
  2. W. D. Greason, 'Quasi-static Analysis of Electrostatic Discharge(ESD) and the Human Body Using a Capacitance Model,' Joumal of Electmstatics, 28, pp. 199-218, 1992 https://doi.org/10.1016/0304-3886(92)90073-3
  3. R. G. Renninger, M. C. Jon, D. L. Lin, T. Diep and T. L. Welsher, 'A field-induced charged-device model simulator, EOS / ESD Symposium Proceedings,' EOS-ll, pp. 59-71, 1989
  4. 김두현, 김상렬, '반도체소자의 정전기 완화특성,' 산업안전학회지, Vol. 14, No. 3, pp. 69-77, 1999
  5. 和泉健吉,'靜電氣についての基礎實驗'靜誘電學會誌,Vol.18 ,No.4, pp. 376-384,1994
  6. 김두현, 김상렬, 'ESD에 의한 반도체소자의 손상특성,' 산업안전학회지, Vol. 15, No. 4, pp.62- 68, 2000
  7. 김상렬, 김두현, '유도대전소자모델(FCDM)을 이용한 ESD에 의한 반도체소자의 손상 메카니즘 해석,' 산업안전학회지, Vol. 16, No. 2, pp.57- 62, 2001
  8. T. S. Speakman, 'A Model for Failuns of Bipolar Silicon Integrated Circuit Subjected 1o ElectrostaticDischarge,' Proceedings 12th Annual Reliability Physics Symposium, pp. 60-69, April 1974
  9. 靜電氣學會(EIAJ), '半導體デバイスの環境 及び 耐久性試驗方法 (追補 1),' EDX과702, 1994
  10. M. C. Jon and T. L. Welsher, 'An Experimental Investigation of the Electrostatic Discharee(ESD) Mechanism in Packaged Semiconductor Devices,'Joumal of Electiostatics, 32, pp. 43-70, 1994 https://doi.org/10.1016/0304-3886(94)90028-0
  11. Timothy J. Maloney, 'Integrated Circuit Metal in the Charged Device Model Bootstrap Heating, Melt Damage, and Scaling Laws,' Joumal of Electmstatics, 31, pp. 313-321, 1993
  12. 鈴木功一,' 諍電誘導による半導體デバイスの故障,メカニズム, 諍電氣學會誌,Vol.23, No. 6, pp. 303-308,1999
  13. 藤江明雄,'電子産業分野の諍電誘導のトラブル槪要,'諸電氣會誌, Vol . 23, No. 6, .297-302. 1999