Journal of the Korean Society for Precision Engineering (한국정밀공학회지)
- Volume 14 Issue 9
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- Pages.68-79
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- 1997
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- 1225-9071(pISSN)
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- 2287-8769(eISSN)
A Fine Manipulator with Compliance for Wafer Probing System
컴플라이언스를 갖는 웨이퍼 탐침 시스템용 미동 매니퓰레이터
- Choi, Kee-Bong ;
- Kim, Soo-Hyun ;
- Kwak, Yoon Keun
- 최기봉 (한국과학기술원 기계공학과) ;
- 김수현 (한국과학기술원 기계공학과) ;
- 곽윤근 (한국과학기술원 기계공학과)
- Published : 1997.09.01
Abstract
A six DOF fine manipulator based on magnetic levitation is developed. Since most of magnetic levitation system are inherently unstable, a proposed magnetically levitated fine manipulator is implemented by use of an antagonistic structure to increase stability. From mathematical modeling and experiment, the equations of motion are derived. In addition, a six DOF sensing system is implemented by use of three 2-axis PSD sensors. A model reference-
Keywords
- Magnetic Levitation;
- Fine Manipulator;
- Antagonistic Structure;
- PSD Sensor;
- MR-H controller;
- Wafer Probing System;
- Compliance
- 자기부상;
- 미동 매니퓰레이터;
- 상반구조;
- PSD 센서;
- 모델기준-H 제어기;
- 웨이퍼 탐침 시스템;
- 컴플라이언스;