Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference (한국전기전자재료학회:학술대회논문집)

The Korean Institute of Electrical and Electronic Material Engineers (한국전기전자재료학회)
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Holographic grating formation of $MgF_2$/As-Ge-Se-S multi-layer

$MgF_2$/As-Ge-Se-S 다층 박막에서의 홀로그래픽 격자 형성

  • 나선웅 (광운대학교 반도체 및 신소재공학과) ;
  • 여철호 (광운대학교 반도체 및 신소재공학과) ;
  • 박정일 (광운대학교 반도체 및 신소재공학과) ;
  • 이영종 (여주대학 전자공학과) ;
  • 정홍배 (광운대학교 반도체 및 신소재공학과)
  • Published : 2002.07.08
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Abstract

We have carried out two-beam interference experiments to form holographic gratings on amorphous $MgF_2$/As-Ge-Se-S multi-layer. In this study, holographic gratings have been formed using He-Ne laser(632.8nm). under different polarization combinations. The diffraction efficiency was obtained by +1st order intensity. The maximum diffraction efficiency of As-Ge-Se-S single layer and $MgF_2$/As-Ge-Se-S multi-layer were 0.8% and 1.4%

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