Proceedings of the Materials Research Society of Korea Conference (한국재료학회:학술대회논문집)
- 1995.11a
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- Pages.42-42
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- 1995
The Crystallization Behavior of Amorphous $Si/Si_{0.69}Ge_{0.31}, Si_{0.69}Ge_{0.31}Si$ and Si Layer Deposited by LP(CVD)
$SiO_2$ 위에 LP-CVD로 증착한 비정질 $Si/Si_{0.69}Ge_{0.31}, Si_{0.69}Ge_{0.31}Si$ 및 Si의 결정화 거동
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