• Korean Journal of Materials Research
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• v.29 no.11
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• pp.697-702
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• 2019

In this study, using a wet chemical process, we evaluate the effectiveness of different solution concentrations in removing layers from a solar cell, which is necessary for recovery of high-purity silicon. A 4-step wet etching process is applied to a 6-inch back surface field(BSF) solar cell. The metal electrode is removed in the first and second steps of the process, and the anti-reflection coating(ARC) is removed in the third step. In the fourth step, high purity silicon is recovered by simultaneously removing the emitter and the BSF layer from the solar cell. It is confirmed by inductively coupled plasma mass spectroscopy(ICP-MS) and secondary ion mass spectroscopy(SIMS) analyses that the effectiveness of layer removal increases with increasing chemical concentrations. The purity of silicon recovered through the process, using the optimal concentration for each process, is analyzed using inductively coupled plasma atomic emission spectroscopy(ICP-AES). In addition, the silicon wafer is recovered through optimum etching conditions for silicon recovery, and the solar cell is remanufactured using this recovered silicon wafer. The efficiency of the remanufactured solar cell is very similar to that of a commercial wafer-based solar cell, and sufficient for use in the PV industry.

• Journal of the Korean Ceramic Society
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• v.31 no.6
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• pp.601-608
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• 1994

Aluminum oxide thin films were deposited on p-type(100) silicon substrates by electron cyclotron resonance plasma enhanced CVD(ECR-PECVD) using TMA[Al(CH3)3] and oxygen as reactant gases at 16$0^{\circ}C$ or lower temperatures. The aluminum oxide films deposited by ECR-PECVD have the amorphous structure with the refractive index of 1.62~1.64 and the O/Al ratio of 1.6~1.7. Oxygen flow rate necessary for the stable deposition of the aluminum oxide films increases as the deposition temperature increases. It was found from the OES analysis that the ECR plasma had les cooling effect by introducing the TMA reactant gas in comparison with the RF plasma. The properties of aluminum oxide films prepared by ECR-PECVD were compared with those prepared by RF-PECVD. The ECR-PECVD aluminum oxide films have the higher refractive indices, the lower contents of impurities (H and C) and the stronger wet etch resistance than those deposited by RF-PECVD.

• Proceedings of the KIEE Conference
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• 1996.07c
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• pp.1816-1818
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• 1996

A micro-size nonthermal plasma generator, using a $SiO_2$ film as a dielectric barrier, has been studied experimentally for a high frequency ac voltage in 2LPM oxygen gas fed. The $SiO_2$ film as a micro-size dielectric barrier was made by the wet oxidation of n-type Si wafer($220[{\mu}mt]$). It can be generated ozone, as a nonthermal plasma intensity parameter, at very low level of applied voltage about 1[kV] by using the micro-size dielectric barrier. As a result, in case that have no air gap spacing i.e. surface discharge case shows relatively higher ozone concentration rather than that case of the micro-airgap spacing.

• Proceedings of the Korean Institute of Surface Engineering Conference
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• 2009.05a
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• pp.199-199
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• 2009

실리콘을 기판으로 하는 대부분의 태양전지에서는 표면반사에 의한 광 에너지 손실을 최소화 시키고자 습식에칭 (wet etching)에 의한 텍스쳐링 처리가 이루어진다. 그러나 습식 에칭은 공정 과정이 번거롭고 비용이 많이 든다. Inductively Coupled Plasma Etcher 장비를 이용한 플라즈마 에칭 (plasma etching)을 실리콘 표면에 적용하여 공정을 간단하고, 저렴하게 하며 반사도를 획기적으로 낮추는 기술을 개발되었다. 플라즈마 에칭으로 형성된 나노구조는 내부전반사를 일으키며 대부분의 태양에너지를 흡수한다. 나노구조는 필라(pillar)의 형태로 나타나며, 이는 플라즈마 에칭 시 발생하는 이온폭격과 에칭 측벽 식각 보호막 (SiOxFy : Silicon- Oxy-Fluoride)의 형성 때문이다. 최저의 반사도를 얻기 위해서 나노필라 형성에 기여하는 플라즈마 에칭 시간, RF bias power, SF6/O2 gas ratio의 변화에 따른 실험이 진행되었다. 플라즈마 발생 초기에는 표면의 거칠기만 증가할 뿐 필라가 형성되지 않지만 특정조건에서 4um 이상의 필라를 얻는다. 이 구조에 알루미늄 전극을 형성하여 전기적 특성을 관찰하였다. 플라즈마 에칭을 적용하여 제작된 태양전지는 표면의 반사도가 가시광 영역에서 약 1%에 불과하며, 마스크 없이 공정이 가능한 장점이 있다.

• Applied Chemistry for Engineering
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• v.25 no.4
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• pp.341-345
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• 2014

Catalyst nanoparticles are prepared by arc plasma deposition (APD). First, overview of the APD technique is reviewed and second, some applications of the technique for nanocatalyst preparation are reviewed. Nanoparticles prepared by APD are typically 1~5 nm in size and their catalytic activity is generally better than that of conventional wet-chemically prepared nanocatalysts.

• Korean Journal of Air-Conditioning and Refrigeration Engineering
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• v.14 no.8
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• pp.671-675
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• 2002

The gas adsorption efficiency for various surfaces with three different characteristics has been reviewed. The dimethyl disulfide gas has been used to investigate characteristics of gas adsorption for different surface characteristics such as plasma treated, lacquer coated and untreated. Three different surfaces were evaluated in dry conditions initially and tested at wet surface conditions with spraying water to evaluate the gas adsorption efficiency which usually occurred at defrost cycles. The results show that the gas adsorption of the plasma treated sample has better performance than others. The lacquer coated and untreated samples showed the similar result, but the lacquer coated sample showed a slightly better performance.

• Proceedings of the Membrane Society of Korea Conference
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• 1997.04b
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• pp.32-33
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• 1997

중공사막은 제조과정인 wet spining의 과정에서 defect가 형성될 수 있어 분리선택도에 큰 영향을 미친다. 이러한 defect의 처리 방법으로는 dipping method등의 방법이 현재 널리 쓰이고 있다. dipping method는 제조된 중공사막을 PDMS 등의 고분자용액 속으로 통과시켜 결과적으로 중공사막 표면에 얇은 고분자막이 형성되도록 하는 방법이다. 그러나 이러한 방법으로 중공사 막을 처리할 경우 고분자 용액이 pore내로 침입하거나 중력으로 인하여 용액이 아래쪽으로 몰려 하반부의 두께가 두꺼워진다는 단점이 있다. 본 연구에서는 플라즈마 반응기 내의 전극사이의 공간에서 substrate의 위치를 변화시켜가면서 thickness를 측정하여 중공사막의 plasma coating을 위한 기초 자료를 정립하여 중공사막 plasma 표면처리 장치 개발에 기여하고자 한다.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2006.04a
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• pp.49-51
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• 2006

OLEOs was fabricated by PLD method. Wet etching process and plasma treatment of ITO on the glass were performed to extend the lifetime of the OLED and increase its brightness. The NPB, $Alq_3$, Li-Benzoate and AI layers on ITO pattern on the glass were deposited by PLO method, sequentially. When the etched ITO was treated by $O_2$ plasma with RF power of 50W, the best result was obtained. The lifetime of the OLED treated by $O_2$ plasma was extended from 3,770sec to 12,586sec compared to that without the plasma treatment.

• Journal of Nutrition and Health
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• v.33 no.6
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• pp.597-612
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• 2000

The aim of this study was to evaluate the effects of soyoligosaccharides on intestinal microflora transit time lipid profiles and immune responses. Forty-eight male rats of Sprague-Dawley strain were divided into six groups(SYS: soybean oil-sucrose SYO: soybean oil-oligo SES; esame oil-sucrose SEO:sesame oil-oligo BFS : beef tallow-sucrose BFO : beef tallow-oligo) soyoligo-groups(SYO, SEO, BEO) were fed the diet containing 5% soyoligosaccharides but control groups not fed them and all groups were fed 20% fats for 4 weeks. The number of fecal bifidobacteria tended to increase after soyoligosaccharides feeding. The significant increase was found in SEO group compared to SES in that of fecal bifidobacteria,. Stool wet weight dry fecal weight and stool water content were increased significantly in soyoligo-group(SYO, SEO, BFO) compared to control groups(SYS, SES, BFS) and gastrointestinal transit time(TT) tended to increase. Soyoligosaccharides lowered plasma cholesterol in SEO group significantly more than did other groups. soyoligo-groups(SYO, SEO, BFO) tended to decrease liver triglycerides compared to control groups. Plasma IgG concentration increased in beef tallow groups(BFS, BFO) than that in other dietary fat groups. Soyoligosaccharides and kinds of fats had effects on plasma C3 concentration and mitogenesis of the spleen cells. Soyoligosaccharides had no effects on plasma leptin and insulin concentration but kinds of fats did so that sesame groups were decreased significantly in plasma leptin concentration but increased significantly in plasma insulin concentration compared to other dietary fat groups. In conclusion dietary soyoligosaccharides changed the composition of the intestinal microflora beneficially with sesame oil and partially had effect on plasma and liver lipid profiles .(Korean J Nutrition 33(6) : 597∼612, 2000)

• Particle and aerosol research
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• v.15 no.1
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• pp.1-13
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• 2019

Current desulfurization and denitrification technologies have reached a considerable level in terms of reduction efficiency. However, when compared with the simultaneous reduction technology, the individual reduction technologies have issues such as economic disadvantages due to the difficulty to scale-up apparatus, secondary pollution from wastewater/waste during the treatment process, requirement of large facilities for post-treatment, and increased installation costs. Therefore, it is necessary to enable practical application of simultaneous SOx and NOx treatment technologies to remove two or more contaminants in one process. The present study analyzes a technology capable of maintaining simultaneous treatment of SOx and NOx even at low temperatures due to the electrochemically generated strong oxidation of the wet-pulse complex system. This system also reduces unreacted residual gas and secondary products through the wet scrubbing process. It addresses common problems of the existing fuel gas treatment methods such as SDR, SCR, and activated carbon adsorption (i.e., low treatment efficiency, expensive maintenance cost, large installation area, and energy loss). Experiments were performed with varying variables such as pulse voltage, reaction temperature, chemicals and additives ratios, liquid/gas ratio, structure of the aeration cleaning nozzle, and gas inlet concentration. The performance of individual and complex processes using the wet-pulse discharge reaction were analyzed and compared.