• Title/Summary/Keyword: vapor treatment

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Preparation of Carbon Nanomaterial from the Microbial Cellulose (미생물 셀룰로오스로부터 탄소 나노물질의 제조)

  • Kim Bong Gyun;Sohng Jae Kyung;Liou Kwangkyoung;Lee Hei Chan
    • KSBB Journal
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    • v.20 no.1 s.90
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    • pp.50-54
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    • 2005
  • Tar is often produced during the carbonization of cellulose that limits the formation fibrous structure of the carbonized sample. This problem was reduced by applying a high temperature $(up\;to\;800{\circ}C)$ during carbonization process. Alternatively, dry cellulose was immersed in toluene and ultrasonicated prior to carbonization. In both cases, complete fibrous structures were not achieved. The formation of tar was reduced by the heat treatment of cellulose in the presence of HCI vapor before carbonization process. Such treatment before carbonization yielded mostly the fibrous structures of the carbonized sample as evident from SEM analysis. Similar results were found when the cellulose was subjected to a heat treatment in an inert condition followed by the removal of tar by the oxidation process prior to the carbonization.

Effect of a Multi-Step Gap-Filling Process to Improve Adhesion between Low-K Films and Metal Patterns

  • Lee, Woojin;Kim, Tae Hyung;Choa, Yong-Ho
    • Korean Journal of Materials Research
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    • v.26 no.8
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    • pp.427-429
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    • 2016
  • A multi-step deposition process for the gap-filling of submicrometer trenches using dimethyldimethoxysilane (DMDMOS), $(CH_3)_2Si(OCH_3)_2$, and $C_xH_yO_z$ by plasma enhanced chemical vapor deposition (PECVD) is presented. The multi-step process consisted of pre-treatment, deposition, and post-treatment in each deposition step. We obtained low-k films with superior gap-filling properties on the trench patterns without voids or delamination. The newly developed technique for the gap-filling of submicrometer features will have a great impact on inter metal dielectric (IMD) and shallow trench isolation (STI) processes for the next generation of microelectronic devices. Moreover, this bottom up gap-fill mode is expected to be universally for other chemical vapor deposition systems.

Selective Growth of Multi-walled Carbon Nanotubes by Thermal Chemical Vapor Deposition and Their Field Emission Characteristics

  • Jeong, Se-Jeong;Lee, Seung-Hwan;Lee, Nae-Sung;Han, In-Taek;Kim, Ha-Jin;Kim, Jong-Min
    • 한국정보디스플레이학회:학술대회논문집
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    • 2005.07b
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    • pp.1096-1099
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    • 2005
  • Multi-walled carbon nanotubes (CNTs) grown on catalyst dots by thermal chemical vapor deposition were vertically aligned with a high population density. Such densely populated CNTs showed poor field emission characteristics due to the electrical screening effect. We reduced the number density of CNTs using an adhesive tape treatment. For dotpatterned CNTs, the tape treatment decreased the CNT density by three orders of magnitude, drastically improved the turn-on electric field from 4.8 to $1.8V/{\mu}m$, and changed the emission image from spotty to uniform luminescence. We also report long-term emission stability of dot-patterned CNTs by measuring the emission currents with time at different duty ratios.

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Effect of Deposition Parameters on TiN by Plasma Assisted Chemical Vapor Deposition(III) -Influence of r.f. power and electrode distance on the Tin deposition- (플라즈마 화학증착법에서 증착변수가 TiN 증착에 미치는 영향(III) -r.f. power 및 전극간 거리를 중심으로-)

  • Kim, C.H.;Shin, Y.S.;Kim, M.I.
    • Journal of the Korean Society for Heat Treatment
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    • v.3 no.1
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    • pp.1-7
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    • 1990
  • To investigate the influence of r.f. power and electrode distance on the TiN deposition, TiN films were deposited onto STC3, STD11 steel and Si-wafer from gas mixtures of $TiC_4/N_2/H_2$ using the radio frequency plasma assisted chemical vapor deposition. The crystallinity of TiN film could be improved by the increase of r.f. power and the decrease of electrode distance. The TiN coated layer contains chlorine, its content were decreased with increasing r.f. power as well as decreasing electrode distance. And the thickness of deposited TiN was largely affected by r.f. power and electrode distance. The hardness of deposited TiN reached a maximum value of about Hv 2,000.

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Toward Charge Neutralization of CVD Graphene

  • Kim, Soo Min;Kim, Ki Kang
    • Applied Science and Convergence Technology
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    • v.24 no.6
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    • pp.268-272
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    • 2015
  • We report the systematic study to reduce extrinsic doping in graphene grown by chemical vapor deposition (CVD). To investigate the effect of crystallinity of graphene on the extent of the extrinsic doping, graphene samples with different levels of crystal quality: poly-crystalline and single-crystalline graphene (PCG and SCG), are employed. The graphene suspended in air is almost undoped regardless of its crystallinity, whereas graphene placed on an $SiO_2/Si$ substrate is spontaneously p-doped. The extent of p-doping from the $SiO_2$ substrate in SCG is slightly lower than that in PCG, implying that the defects in graphene play roles in charge transfer. However, after annealing treatment, both PCG and SCG are heavily p-doped due to increased interaction with the underlying substrate. Extrinsic doping dramatically decreases after annealing treatment when PCG and SCG are placed on the top of hexagonal boron nitride (h-BN) substrate, confirming that h-BN is the ideal substrate for reducing extrinsic doping in CVD graphene.

Properties of Biodegradable Films Produced from Rice Bran and Roasted Sesame Meal through Chemical Modifications

  • Bae, Dongho;Kim, Woo Jung;Jang, In Sook
    • Journal of Applied Biological Chemistry
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    • v.43 no.2
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    • pp.79-85
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    • 2000
  • Biodegradable films were prepared from roasted sesame meal and rice bran. Acetic anhydride, succinic anhydride, and formaldehyde were added to the film-forming solutions, and their effects on tensile strength, percent elongation, water vapor permeability, and water solubility of the films were studied. Roasted sesame meal did not form film without acylation or addition of formaldehyde. Acylated roasted sesame films had higher tensile strength and water-solubility, and lower % elongation than rice bran films. Acylation with acetic and succinic anhydrides increased tensile strength, percent elongation, and water solubility of rice bran films, but decreased water vapor permeability. Treatment with formaldehyde increased tensile strength of roasted sesame and rice bran films and % elongation of rice bran films, while reducing water-solubility of roasted sesame and rice bran films and water vapor permeability of rice bran films.

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Chemical Vapor Deposition Polymerization of Poly(arylenevinylene)s and Applications to Nanoscience

  • Joo, Sung-Hoon;Lee, Chun-Young;Kim, Kyung-kon;Lee, Ki-Ryong;Jin, Jung-Il
    • Bulletin of the Korean Chemical Society
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    • v.27 no.2
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    • pp.169-184
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    • 2006
  • A review is made on the chemical vapor deposition polymerization (CVDP) of insoluble and infusible poly(arylenevinylene)s and its applications to nanoscience. Poly(p-phenylenevinylene) (PPV), poly(naphthylenevinylene)s, poly(2,5-thinenylenevinylene) (PTV), and other homologous polymers containing oligothiophenes could be prepared by the CVDP method in the form of films, tubes, and fibers of nano dimensions. They would be readily converted to graphitic carbons of different structures by thermal treatment. Field emission FE) of carbonized PPV nanotubes, photoconductivity of carbonized PPV/PPV bilayer nanotubes and nanofilms also were studied.

The Surface Effect of Polyimide Thin Film by Vapor Deposition Polymerization Method With Plasma Treatment (진공증착중합법에 의해 제조된 폴리이미드 박막의 플라즈마 처리에 의한 표면의 변화)

  • Kim, Hyeong-Gweon;Lee, Boong-Joo;Kim, Jong-Teak;Kim, Yong-Bong;Lee, Duck-Chool
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.11 no.5
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    • pp.340-346
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    • 1998
  • In this study, we intended to investigate aging effect of polyimide prepared by VDPD(vapor deposition polymerized method). The prepared polymide was treated by the oxygen and argon gas plasma. And we evaluated the polyimide treated by plasma from contact angle, surface leakage current, FT-IR and SEM. We know that the structure of polyimide at surface are changed to amide structure by plasma treating. It seems that strong energy of plasma causes breaking the molecular chin of the polyimide. And surface roughness increases with plasma treating time increased and sequentially the wettability and leakage current increases.

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Rotary CVD Process for Surface Treatment of Powders (분말소재의 표면처리를 위한 회전형 CVD 공정)

  • Jong-Hwan Lee;Goo-Hwan Jeong
    • Journal of the Korean institute of surface engineering
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    • v.56 no.6
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    • pp.341-352
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    • 2023
  • This paper reviews the potentials of a rotary chemical vapor deposition (RCVD) process for nanomaterial synthesis and coating on powder-based materials. The rotary reactor offers a significant improvement over traditional CVD methods having horizontal and fixed reaction chambers. The RCVD system yields enhanced productivity and surface coating uniformity of nanoparticles applied in various purposes, such as efficient heat dissipation, surface hardness enhancement, and enhanced energy storage performances. The effectiveness of the RCVD system would open up new possibilities in various applications because uniform coating on powder-based materials with massive productivity is inevitable to develop multi-functional materials with high reliability.