• The Transactions of The Korean Institute of Electrical Engineers
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• v.56 no.1
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• pp.151-155
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• 2007

A compact discharge plasma system with a photocatalyst has been proposed and investigated experimentally for application to air conditioners. It was found that there was intense ultra violet radiation with high energy of 3.2 eV from the corona discharge due to the DC-biased pulse voltage applied on a wire. An electrophotochemical reaction took place apparently on the surfaces of the photocatalyst of $TiO_2$ irradiated ultra violet front the discharge plasma in the proposed plasma system. The proposed discharge plasma system with the photocatalyst of $TiO_2$ showed very high removal efficiency of VOCs by tile additional electrophotochemical reactions on the photocatalyst. The proposed discharge plasma system also showed very high removal efficiency of particles such as smokes, suspended bacteria, and pollen and mite allergens by the electrostatic precipitation part. This type of corona discharge plasma system with a photocatalyst can be used as an effective means of removing both indoor pollutant gases and particles including suspended allergens.

• Journal of Korean Society for Atmospheric Environment
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• v.22 no.6
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• pp.922-928
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• 2006

An absolute absorption cross section of benzene was measured with a spectrometer system including a mono-chrometer and a grating in the wavelength region of $240{\sim}280nm$ under the atmospheric pressure and room temperature in the laboratory. A certificated reference benzene gas ($98{\mu}mol/mol$ in $N_2$) was used to measure its absorption cross section. A 710 mm cell with a quartz window and a 150 W Xe arc lamp were employed. The magnitude of absorption cross section of $1.41{\times}10^{-18}cm^2$ was lower than that of the reference spectra ($2.5{\times}10^{-18}cm^2$) of high resolution spectrometer, Total measurement uncertainty was estimated to be 4.0%.

• Journal of the Institute of Electronics Engineers of Korea SD
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• v.43 no.8 s.350
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• pp.1-5
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• 2006

At-wavelength inspection system of extreme Ultra-violet lithography was developed and the inspection results were compared with the optical mask inspection system by cross correlation experiments. In at-wavelength EUV mask inspection system, a raster scan of focused euv light is used to illuminate euv light to mask blank and specularly and non-specularly reflected euv light are detected by photo diode and microchannel plate. The cross correlation results between at-wavelength inspection tool and optical inspection tool shows strong correlation. Far-field scattering fringe pattern from programmed phase and opqque defect, which were detected by phosphor plate and CCD camera shows that distinct diffraction fringes were observed with fringe spacing dependent on the defect size.

• Journal of Korean Society of Water and Wastewater
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• v.26 no.4
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• pp.521-533
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• 2012

Interest in application of ultraviolet light technology for primary disinfection that used for the treatment of water for consumption and wastewater has increased significantly in recent years. Analysis of these systems has been carried out using Computational Fluid Dynamics (CFD) procedure. It offers advantages over other techniques in specific circumstances. CFD has emerged as a powerful tool to aid design of a UV reactor by providing the UV dose delivered by the proposed reactor design and allowing engineers to evaluate alternative designs in much less time and at a reasonable cost. In this study, five different configurations of the apparatus depending on the location of the exit are evaluated in terms of maximum dose, minimum dose, flow patterns, particle tracks and transient dose. The configuration 3 results have higher minimum UV dose value and uniform particle distribution of the UV dose on the outlet than other's.

• Journal of the Korean Ceramic Society
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• v.39 no.8
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• pp.807-811
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• 2002

In this work, we investigated the deposition behavior of Mo/Si multilayer thin film structures simulated by a PVD process simulator based on Monte Carlo method to assist the optimized fabrication of the high quality mask in EUVL(Extreme Ultra-Violet Lithography) process. The shape of simulated thin film structures turned out to be largely dependent on the gas pressure(1∼30 mTorr), the target-substrate distance(1∼30 cm) and the diffusion length(1∼10 nm). From the simulation studies, it was predicted that relatively uniform thin film structures can be fabricated by decreasing gas pressure and increasing the target-substrate distance.

• Composites Research
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• v.27 no.6
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• pp.236-241
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• 2014

This paper aims to evaluate material property variation of polymer concretes under ultra-violet exposure condition. The components and mixing ratio of the polymer composite specimens were determined by the previous research results. The equivalent UV exposure time was calculated with the consideration of the power of metal halide lamp and maximum 3 years were selected for the experiments. From the tests, it was found that the generated heat during UV exposure affected much the material properties of polymer concrete by means of post cure. As a result, the compressive strength increased and ductility factor decreased.

• Transactions of the Korean Society of Mechanical Engineers A
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• v.24 no.9 s.180
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• pp.2371-2380
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• 2000

In this paper, we developed the proximity exposure system with the vertical structure of glass and mask stage to minimize the mask's warp caused by the pull of gravity. This system, which canirradiate the ultra violet through 1440 H 850 $\textrm{mm}^2$ and 1330X 1015 $\textrm{mm}^2$ exposure area, has the followingcharacteristics. The glass stage can be inclined by 80 degrees at vertical structure to load substrate withsafety on it. When the glass stage is the vertical state, the gap control, alignment control and exposureof ultra violet are executed. So, it enhances the pattern uniformity by minimizing the mask's warp. Theglass stage can also control the gap between the mask and the substrate by the coarse and fine motioncontrol. The mask stage can adjust the posture of photomask to the position of substrate by imageprecessing method. The galss stage for the gap control and the mask stage for the alignment aredesigned independently for each function.

• Korean Journal of Microbiology
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• v.27 no.3
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• pp.297-303
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• 1989

Attempts to isolate the naturally occurring ultra-violet resistant bacteria from environmental sources were made. The isolates, designated No.29, 100, and 107, among numbers of bacterial isolates revealed a remarkable resistance to UV ray, whose degree of resistance in dose/response kinetics was comparable to that of an endospore-former, Bacillus subtilis. In a range of 100-300 $Jm^{-2}$/min of UV irradiation, the isolates exhibited 500-1000 fold resistance compated with E. coli. The isolated appeared to possiss cell-bound pigment of organge or crimson-red. The isolate 29 is spherical in pairs or tetrads, whereas the isolates 100 and 107 are rod. All are Gram-gositive bacteria and seemed to be non-endospore-bearer. A number of biochemical studies pursued on the isolates suggested that they are quite different to each other. Electron microscopic examination and the physiological characters of the isolate 29 suggested that this UV resistant spherical bacterium might be one species of Deinococcus, probably Deinococus radiophilus. Since there is no documents on UV resistant, Gram-positive, non-sporeformer bacillus so far, the isolates 100 and 107 might be turned out as new kinds of UV resistant bacteria occurring in nature by further investigation.

• Journal of the Korean Institute of Electrical and Electronic Material Engineers
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• v.24 no.4
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• pp.314-318
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• 2011

Recently, ultrasound, infrared detector, V-I characteristic, gas analysis, UV (ultra-violet rays) camera etc. is used as inspections and diagnoses of the safety of power equipment. Especially, UV camera have attracted a great deal of interest from the view point of easy judgement. UV camera is used corona discharge. One of the most important and difficult problems to be solved filer design, materials and corona discharge. This paper is studied on the temperature characteristics, UV generation and shape analysis and corona pulse count according to the electrode distance and applied voltage. Also, Corona discharge characteristics in air are analyzed using prototype UV camera of Korea. UV generation due to surface discharge of AC is higher than that of DC.

• Korean journal of applied entomology
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• v.14 no.3 s.24
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• pp.155-161
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• 1975

The results of studies on the synthesis of B group vitamins by plant pathogenic bacteria indicate that most bacteria utilize thiamine, nicotinic acid, biotin and P-Aminobenzoic acid as growth factors. Riboflavin (vitamin $B_2$) was produced by most bacterial genera including the Corynebacteria but with the exception of C. rathay and C.fasciant. The results suggest that the ability to produce riboflavin is not a generic characteristic of Corynebacterium, and that the accuracy of the ultra-violet light method (one of the diagnostic tests for potato bacterial ring rot disease caused by Corynebacterium sepedonicum) must he reconsidered.