• 제목/요약/키워드: tunneling magnetoresistance

검색결과 88건 처리시간 0.032초

Nanoscale microstructure and magnetic transport in AlN/Co/AlN/Co... discontinuous multilayers

  • Yang, C.J.;Zhang, M.;Zhang, Z.D.;Han, J.S.
    • 한국자기학회:학술대회 개요집
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    • 한국자기학회 2003년도 하계학술연구발표회 및 한.일 공동심포지엄
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    • pp.21-21
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    • 2003
  • Microstructure and magnetic transport phenomina in rf sputtered AlN/Co type ten-layered discontinuous films of nanoscaled [AlN (3 nm)/Co (t nm)]...$\sub$10/ with t$\sub$Co/=1.0∼2.0 nm have been investigated. The microstructure and tunneling magnetic resistance of the samples are strongly dependent on the thickness of Co layer. Negative tunneling magneto-resistance due to the spin-dependent transport has been observed along the current-in-plane configuration in the samples having the Co layers below 1.6 nm thick. When the thickness of Co layer was less than 1,2 nm, randomly oriented granular Co particles were completely isolated and embedded in amorphous AlN matrix, and the films showed the superparamagnetic behavior with a high MR value of Δ$\rho$/$\rho$$\sub$0/=1.8 %. As t$\sub$Co/ increases, a transition from the regime of co-existence of superparamagnetic and ferromagnetic behaviors to ferromagnetic behavior was observed. Tunneling barrier called "decay length for tunneling" for the films having the thickness of Co layer from 1.4 to 1.6 nm was measured to be ranged from 0.004 to 0.021 ${\AA}$$\^$-1/.

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Sintering Effects on Fe/Mo Ordering and Magnetoresistance in Double Perovskite Sr2FeMoO6

  • Kim, J;Park, B.J;Lee, B.W
    • Journal of Magnetics
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    • 제9권1호
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    • pp.9-12
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    • 2004
  • We have investigated sintering effects on Fe/Mo ordering and magnetoresistance (MR) in double perovskite-reflection lines due to $Sr_2FeMoO_6$ (SFMO). Polycrystalline samples have been prepared by the conventional solid-state reaction by sintering in a stream of 5% $H_2/Ar$ gas. All samples are single phase and exhibit a series of superstructurecation ordering at Fe and Mo sites. As sintering temperature increases from 900 to $1300^{\circ}C$, the degree of Fe/Mo ordering increases from 82 to 92%, magnetization (15 K, 7 kOe) increases from 1.6 to 2.7 ${\mu}_B/f.u.,$ and Curie temperature increases at a rate of 4.3 K/% with the increase of Fe/Mo ordering ratio. The magnitude of MR measured at 5 K is 19% for sample prepared at $1000^{\circ}C$ with magnetic fields of 7 kOe. The observed MR is proportional to the square of magnetization indicating that the MR feature in SFMO is explained by the spin-polarized tunneling at grain boundaries.

MBE-growth and Oxygen Pressure Dependent Electrical and Magnetic Properties of Fe3O4 Thin Films

  • ;;신유리미;;조성래
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2011년도 제40회 동계학술대회 초록집
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    • pp.60-60
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    • 2011
  • Giant magnetoresistance (GMR), tunneling magnetoresistance (TMR), and magnetic random-access memory (MRAM) are currently active research areas in spintronics. The high magnetoresistance and the high spin polarization (P) of electrons in the ferromagnetic electrodes of tunnel junction or intermediate layers are required. Magnetite, Fe3O4, is predicted to possess as half-metallic nature, P ~ 100% spin polarization, and has a high Curie temperature (TC~850 K). Experiments demonstrated that the P~($80{\pm}5$)%, ~($60{\pm}5$)%, and ~40-55% for epitaxial (111), (110) and (001)-oriented Fe3O4 thin films, respectively. Epitaxial Fe3O4 films may enable us to investigate the effects of half metals on the spin transport without grain-boundary scattering.In addition, it has been reported that the Verwey transition (TV, a first order metal-insulator transition) of 120 K in bulk Fe3O4 is strongly affected by many parameters such as stoichiometry and stress, etc. Here we report that the growth modes, magnetism and transport properties of Fe3O4 thin films were strongly dependent on the oxygen pressure during film growth. The average roughness decreases from 1.021 to 0.263 nm for the oxygen pressure increase from $2.3{\times}10-7$ to $8.2{\times}10^{-6}$ Torr, respectively. The 120 K Verwey transition in Fe3O4 was disappeared for the sample grown under high oxygen pressure.

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CoFe의 삽입과 산화조건에 따른 자기 터널 접합의 자기저항특성에 관한 연구 (CoFe Layer Thickness and Plasma Oxidation Condition Dependence on Tunnel Magnetoresistance)

  • 이성래;박병준
    • 한국자기학회지
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    • 제11권5호
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    • pp.196-201
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    • 2001
  • Si(100)/Ta(50 )/NiFe(60 )/FeMn(250 )/NiFe(70 )/Al$_2$O$_3$/NiFe(150 )/Ta(50 )구조를 가진 자기터널접합의 자기저항비 향상에 관해서 연구하였다. 자성층과 절연층 사이 계면에 CoFe을 삽입하여 5.75%에서 13.7%까지 향상시켰다. 그리고 절연층은 16 의 Al을 순수한 산소 및 산소/아르곤 혼합 분위기에서 프라즈마 산화법으로 형성하였다. 순수한 산소 분위기에서는 최적 산화시간 30초에서 13.7%의 자기저항비를 얻었지만,산소/아르곤의 혼합기체를 사용하면 최적 산화시간 40초에서 15.3%의 자기저항비를 얻었다.

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Co/Pd 다층막구조가 수직자기터널접합의 자기저항에 미치는 영향 (Effect of Co/Pd Multilayer on the Magnetoresistance of Perpendicularly Magnetized Magnetic Tunnel Junction)

  • 김성동;임동원;이성래
    • 한국자기학회지
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    • 제16권6호
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    • pp.271-275
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    • 2006
  • Co/Pd 다층막을 이용한 수직자기터널접합에서 Co 전극 및 Co, Pd 다층막의 두께변화가 터널링 자기저항비에 미치는 영향에 대해 조사하였다. Co 전극의 경우 0.5nm 두께 부근에서 최대 자기저항비 값을 얻을 수 있었으며, 이는 터널배리어층 부근의 계면영역이 터널링 스핀분극에 주요한 역할을 하기 때문으로 보인다. 다층막내의 Co층의 두께가 증가함에 따라 자기저항비는 다소 복잡한 거동을 나타내었으며, 이는 Co층의 두께 증가에 따른 수직자기이방성의 변화와 계면거칠기 감소에 따른 접합저항의 감소가 복합적으로 작용하기 때문이다. Pd층의 경우 Co층과는 달리 자기저항변화(${\Delta}R$)감소가 자기저항비의 거동에 영향을 주었으며, 이는 비자성층인 Pd층의 증가에 따라 스핀산란이 증가하기 때문이다.

Tunneling Magnetoresistance: Physics and Applications for Magnetic Random Access Memory

  • Park, Stuart in;M. Samant;D. Monsma;L. Thomas;P. Rice;R. Scheuerlein;D. Abraham;S. Brown;J. Bucchigano
    • 한국자기학회:학술대회 개요집
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    • 한국자기학회 2000년도 International Symposium on Magnetics The 2000 Fall Conference
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    • pp.5-32
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    • 2000
  • MRAM, High performance MRAM using MTJS demostrated, fully integrated MTJ MRAM with CMOS circuits, write time ~2.3 nsec; read time ~3 nsec, Thermally stable up to ~350 C, Switching field distibution controlled by size & shape. Magnetic Tunnel Junction Properties, Magnetoresistance: ~50% at room temperature, enhanced by thermal treatment, Negative and Positive MR by interface modification, Spin Polarization: >55% at 0.25K, Insensitive ot FM composition, Resistance $\times$ Area product, ranging from ~20 to 10$^{9}$ $\Omega$(${\mu}{\textrm}{m}$)$^{2}$, Spin valve transistor, Tunnel injected spin polarization for "hot" electrons, Decrease of MTJMR at high bias originates from anode.

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Ferromagnetic Heterostructures based on Semiconductors

  • Tanaka, M.;Sugahara, S.;Nazmul, A.M.
    • 한국자기학회:학술대회 개요집
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    • 한국자기학회 2003년도 하계학술연구발표회 및 한.일 공동심포지엄
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    • pp.262-262
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    • 2003
  • Creating a new spin-based electronics (often called "spin-electronics" or "spintronics") is one of the hot topics in the current solid-state physics and electronics research. In order to utilize the spin degree of freedom in solids, particularly in semiconductors the current electronics is based on, we need to fabricate appropriate materials, understand and control the spin-dependent phenomena. In this ta1k, I will review the recent deve1opments of epitaxial ferromagnetic hetero structures based on semiconductors towards spintronics. This includes the semiconductor materials and hetero structures having high ferromagnetic transition temperature (III-V based alloy magnetic semiconductors, Mn-delta-doped magnetic semiconductors, and related heterostructures), spin-dependent transport and tunneling, and their device applications (tunneling magnetoresistance devices and three-terminal devices). Future issues and prospects will be also discussed.

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