• Journal of the Korean Institute of Electrical and Electronic Material Engineers
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• v.14 no.9
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• pp.757-761
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• 2001

We studied emitting properties of organic electroluminescent devices fabricated using the spin-coating and Langmuir-Blodgett(LB) technique. The LB technique has the advantage of precise control of the thickness better than spin-coating method. LB monolayer of poly(3-hexylthiophene)(P3HT) was deposited 27 layers onto the indium-tin-oxide(ITO) substrate as Y-type films by the vertical dipping method. In the absorption spectra, the λ$\_$max/ of P3HT-AA LB films and of spin-coating films showed about at 510, 545 and 590 nm corresponding to 2.43, 2.28, 2.10eV. And we observed that the turn-on voltage of devices deposited by LB method(10V) was higher than that of spin-coating method(8.5V) in voltage-current-luminance characteristic. In the logV-logJ characteristics of ITO/P3HT-AA LB/Al device, we confirmed that El device fabricated by LB method follows three conduction mechanisms: ohmic, space-charge-limited current(SCLC) conduction and trapped-carrier-limited space-charge current(TCLC) conduction.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 1999.05a
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• pp.582-588
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• 1999

정보화 사회의 발전과 함께 멀티미디어에 대한 관심이 집중되고 있으며, 점유 공간이 작고 가벼우며 대면적이 가능한 정보 표시 디스플레이에 대한 기술은 고부가가치 산업으로 인식되어 지고 있다. 이러한 정보 표시 디스플레이들 중, 전기 발광 소자 (Electroluminescence Display : ELD), 액정 표시 디스플레이 (Liquid Crystal Display LCD), 플라즈마 디스플레이 (Plasma Display Panel) 등의 대한 연구가 세계적으로 매우 활발하게 진행되고 있다. 본 연구에서는 란탄 계열의 금속 착 화합물인 Tb(ACAC)$_3$(Phen)과 Tb(ACAC)$_3$(Phen-Cl)를 이용해 다비이스를 제작한후 광학적 및 전기적 특성을 조사하였다. 또한 luminous efficiency와 cyclic voltametric 방법을 이용해 에너지 밴드로 두 발광 물질인 Tb(ACAC)$_3$(Phen)과 Tb(ACAC)$_3$(Phen-Cl)을 비교.분석하였다. 본 연구의 디바이스 구조를 보면 anode/hole transporting layer (HTL)/emitting material layer (EML)/electron transporting layer (ETL)/cathode와 같고 ETL를 aluminum-tris- (8-hydroxyquinoline) (Alq$_3$)와 bis(10-hydroxybenzo(h)quinolinato)beryllium (Bebq$_2$)를 사용하였으며 HTL 로 N,N'-diphenyl-N,N'-bis(3-methylphenyl)-1,1'-biphenyl-4,4'-diamine (TPD)를 사용하였다.

• The Transactions of the Korean Institute of Electrical Engineers
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• v.34 no.4
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• pp.144-152
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• 1985

This paper temperature gradient thermally stimulated surface potentian (TG-TSSP) in measurements are applied to the study of the polarity of trapped and ionic carriers in cross-linked polyethylene (XLPE) filsm. In the thermally stimulated current in uniform temperature (TSC) of XLPE five peaks appear as indicated of the A B C D and E. In this paper A (at about -120$^{\circ}C$) D (at about 70$^{\circ}C$) and E (at about 110$^{\circ}C$) peaks are investigated. A peak is due to the biassing voltage and biassing temperature. Appear in to the glass transition temperature territory and caused in to the polarization of dipole. D peak is due to the depolarization of ionic space charge and E peak due to the detrapping of carriers injected from the electrodes. TG-TSSP and TSSP are measured to study the polarity of ionic carrier (D peak). In the unsatureated region of ionic space charge polarization, TG-TSSP is lower than TSSP during the initial stage of heating. Result of the experiment for E peak, TG-TSSP is higher than TSSP during the initial stage of heating and these results do not depend on the polarity of biassing voltage, and E peak is concerned with positive carriers (Holes).

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 1998.11a
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• pp.299-302
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• 1998

Electroluminescent(EL) devices based on organic materials have been of great interest due to their possible applications for large-area flat-panel displays. They are attractive because of multicolor emission low operation voltage. In this study, several Eu complexes such as Eu(TPB)$_3$(Phen) and Eu(TPB)$_3$(Bpy) were synthesized and the photoluminescence(PL) and electroluminescence (EL) characteristics of their thin films were investigated by fabricating the devices having a structure of glass substrate/ITO/TPD/Europium-complexs/Alq$_3$/Al, where aromatic diamine(TPD) was used as an hole transporting and Alq$_3$ was used as an electron transporting materials. It was found that the photoluminescence(PL) and electroluminescence(EL) characteristics of these Europium complexes were dependent upon the ligands coordinated to Europium metal. Details on the explanation of electrical transport phenomena of the structure with I-V characteristics of the OLEDs using the trapped-charge-limited current(TCLC) model will be discussed.

• Journal of the Korean Institute of Telematics and Electronics A
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• v.30A no.2
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• pp.53-63
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• 1993

Device degradations by the Fowler-Nordheim tunneling have been studide. The changes of device characteristics such as the threshold voltage, subthreshold slope, I-.or. curves have been measured after bidirectionally stressing n-channel MOSFET's and p-channel MOSFET's. Also the interface states have been directly measured by the charge pumping methodIt is shown that the change of interface states is determined by the number of hole carriers tunneling the gate oxide and electrons which are trapped in the gate oxide. Also, in this paper, we propose a model for device lifetime limited by the increase of interface states.

• Journal of the Korean Institute of Telematics and Electronics D
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• v.34D no.11
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• pp.30-36
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• 1997

AlGaAs/GaAs HBTs are developed well enough to be commercialized as an active device in optical transmission system, but there remains the unanswered questions about reliability. In this paper we applied the reverse constant current stress at the high voltage in avalanche region for a long time to find out a new degradation mechanism of junctrion I-V. The unction off-set voltage at which the current vanishes to zero was shifted to the negative direction of applied bias due to the increment of leakage current as the stress time increases. It was identified that the degradation was induced by the hot carriers which were generated at space charge region and trapped at the interface between GaAs base and the passivation nitride enhancing the electric field across the nesa edge.

• Journal of Electrical Engineering and Technology
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• v.8 no.1
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• pp.11-19
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• 2013

Very Fast Transients (VFT) originate mainly from disconnector switching operations in Gas Insulated Substations (GIS). In order to determine the rate-of-rise of Very Fast Transient Overvoltage (VFTO) in a 550 kV GIS, simulations are carried out using EMTP-RV. Each component of the GIS is modeled by distributed line model and lumped model based on equivalent circuits. The various switching conditions according to closing point-on-wave and trapped charge are simulated, and the results are analyzed. Also, the analysis of travelling wave using a lattice diagram is conducted to verify the simulation results.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 1996.11a
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• pp.113-116
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• 1996

The drain current of the MOSFET in the off state(i.e., Id when Vgs=0V) is undesired but nevertheless important leakage current device parameter in many digital CMOS IC applications (including DRAMs, SRAMs, dynamic logic circuits, and portable systems). The standby power consumed by devices in the off state have added to the total power consumed by the IC, increasing heat dissipation problems in the chip. In this paper, hot-carrier-induced degra- dation and gate-induced-drain-leakage curr- ent under worse case in P-MOSFET\`s have been studied. First of all, the degradation of gate-induced- drain-leakage current due to electron/hole trapping and surface electric field in off state MOSFET\`s which has appeared as an additional constraint in scaling down p-MOSFET\`s. The GIDL current in p-MOSFET\`s was decreased by hot-electron stressing, because the trapped charge were decreased surface-electric-field. But the GIDL current in n-MOS77T\`s under worse case was increased.

• Journal of the Korean Institute of Electrical and Electronic Material Engineers
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• v.16 no.3
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• pp.181-185
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• 2003

Influence of post gate oxidation anneal on Negative Bias Temperature Instability (NBTI) of PMOSFE has been investigated. At oxidation anneal temperature raised above 950$^{\circ}$C, a significant improvement of NBTI was observed which enables to reduce PMO V$\_$th/ shift occurred during a Bias Temperature (BT) stress. The high temperature anneal appears to suppress charge generations inside the gate oxide and near the silicon oxide interface during the BT stress. By measuring band-to-band tunneling currents and subthreshold slopes, reduction of oxide trapped charges and interface states at the high temperature oxidation anneal was confirmed.

• Proceedings of the KIEE Conference
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• 2007.07a
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• pp.1279-1280
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• 2007

$Al_{2}O_{3}$ 절연막을 전하포획층으로 이용하여 Top 게이트 ZnO 나노선 전계효과트랜지스터를 제작하였고, 메모리 효과를 관찰하였다. $Al_{2}O_{3}$ 층을 게이트 절연막과 전하포획층으로 사용하였다. 대표적인 Top 게이트 ZnO 나노선 전계효과트랜지스터에 대하여 게이트 전압을 Double sweep 하였을 때의 드레인 전류-게이트 전압 특성이 반시계 방향의 히스테리시스와 문턱전압변화를 나타냈다. 펄스 형태의 게이트 전압을 1초 동안 인가한 후에, 드레인 전류-게이트 전압 특성의 문턱전압 변화가 0.3 V에서 0.8 V로 증가하였다. 이러한 특성은 게이트 전극에서 음전하 캐리어가 음의 게이트 전압에 대하여 $Al_{2}O_{3}$ 층에 충전되고, 양의 게이트 전압에 대하여 방전되는 것을 나타낸다.