• 제목/요약/키워드: transparent conducting oxide

검색결과 344건 처리시간 0.03초

The Electrical and Optical properties of Al-doped ZnO with high density O2 Plasma treatment on PES substrate

  • 이상협;송찬문;엄태우;임동건
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2016년도 제50회 동계 정기학술대회 초록집
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    • pp.283.2-283.2
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    • 2016
  • 최근 ZnO는 무독성, 저가격, 수소 플라즈마에 대한 내구성 및 열적 안정성 등의 활발히 연구되고 있으며, III족 원소(Al, Ga, In) 불순물을 도핑하여 전기적 성질의 열적 불안정성을 해결하고 전기적 성질을 향상 시키고 또한 밴드갭 에너지가 3.3 eV 이상으로 증가하여 가시광선 영역에서 광투과율이 높은 투명도 전성 재료를 제공할 수 있다. 본 연구에서는 RF Magnetron Sputtering을 이용하여 내열성과 광학적 측면에서 우수한 성능을 가지는 PES 기판에 표면 에너지를 높이고 치밀한 구조의 박막을 증착하기 위해서 $O_2$ 플라즈마 처리를 하여 ZnO계 투명 전도막을 제작함으로써 투명전극에서 요구하는 $10^{-3}{\Omega}{\cdot}cm$ 이하의 낮은 비저항과 80% 이상의 광투과율을 가지는 방안에 대하여 연구하였다. PES 기판 위에 고밀도 $O_2$ 플라즈마를 이용하여 전 처리를 실시한 후 4인치의 Al-doped ZnO(ZnO 98 wt% : $Al_2O_3$ 2 wt%), AZO의 타겟을 이용하여 상온에서 RF Magnetron Sputtering 법으로 AZO 박막을 증착하였다. PES 기판상의 AZO 박막 두께가(100~400nm) 증가함에 따라 캐리어 농도와 홀 이동도가 점차 증가하는 경향을 보였다. 이는 박막 두께가 증가할수록 면저항과 비저항은 감소하며 결정립 크기가 커지고 결정입계에서 산란이 줄어들기 때문에 전기적 특성이 개선된 것으로 판단된다. 고밀도 $O_2$ 플라즈마 표면처리 시간이 증가함에 따라 플라스틱 기판의 결합에너지와 부착력이 증가하여 AZO 박막의 결정립 크기를 증가시키며, 접촉각은 감소하였다. 또한 급속열처리 온도가 증가함에 따라 전기적 특성과 광학적 특성이 향상됨을 확인할 수 있었다. 제작된 AZO 박막은 급속열처리 시간 10분에서 온도 $200^{\circ}C$일 때, 캐리어 농도 $2.32{\times}10^{21}cm^{-3}$, 홀 이동도 $4.3cm^{-2}/V$로 가장 높은 것을 확인할 수 있었고, 가장 낮은 비저항 $1.07{\times}10^{-3}{\Omega}{\cdot}cm$과 가시광 영역(300 nm ~ 1100 nm)에서의 AZO 박막의 광 투과율은 약 86%를 얻을 수 있었다.

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고품질 실리콘 박막을 이용한 저가 고효율 실리콘 박막 및 a-Si:H/c-Si 이종접합 태양전지 개발 (Development of low cost and high efficiency silicon thin-film and a-Si:H/c-Si hetero-junction solar cells using low temperature silicon thin-films)

  • 이정철;임충현;안세진;윤재호;김석기;김동섭;양수미;강희복;이보영;이준신;송진수;윤경훈
    • 한국신재생에너지학회:학술대회논문집
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    • 한국신재생에너지학회 2005년도 춘계학술대회
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    • pp.113-116
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    • 2005
  • In this paper, silicon thin-film solar cells(Si- TFSC) and a-Si/c-Si heterojunction solar cells(HJ-cell) are investigated. The Si-TFSC was prepared on glass substrate by depositing $1-3{\mu}m$ thin-film silicons by glow discharge method. The $a-Si:H/{\mu}c-Si:H$ tandem solar cells on textured ZnO:A1 TCO (transparent conducting oxide) showed improved Jsc in top and bottom cells than that on $SnO_2:F$ TCO. This enhancement of jsc resulted from improved light trapping effect by front textured ZnO:A1. The a-Si/c-Si HJ-cells with simple structure without high efficiency features are suffering from low Voc and Jsc. The improvement of front nip and back interface properties by adopting high quality silicon-films at low temperature should be done both for increasing device performances and production cost.

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Al이 도핑된 ZnO 소재의 PLD 박막 두께 변화가 특성에 미치는 영향 (Effect of Thickness on the Properties of Al Doped ZnO Thin Films Deposited by Using PLD)

  • 빈민욱;배기열;박미선;이원재
    • 한국전기전자재료학회논문지
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    • 제24권7호
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    • pp.568-573
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    • 2011
  • AZO (Al doped ZnO) thin films were deposited on the quartz substrates with thickness variation from 25 to 300 nm by using PLD (pulsed laser deposition). XRD (x-ray diffractometer), SPM (scanning probe microscopy), Hall effect measurement and uv-visible spectrophotometer were employed to investigate the structural, morphological, electrical and optical properties of the thin films. XRD results demonstrated that films were preferrentially oriented along the c-axis and crystallinity of film was improved with increase of film thickness. As for the surface morphologies, the mean diameter and root mean square of grains were increased as the film thickness was increased. When the film thickness was 200 nm, the lowest resistivity of $4.25{\times}10^{-4}\;{\Omega}cm$ obtained with carrier concentration of $6.84{\times}10^{20}\;cm^{-3}$ and mobility of $21.4\;cm^2/V{\cdot}S$. All samples showed more than 80% of transmittance in the visible range. Upon these results, it is found that the samples thickness can affect their structural, morphological, optical and electrical properties. This study suggests that the resistivity can be improved by controlling film thickness.

Sputtered Al-Doped ZnO Layers for Cu2ZnSnS4 Thin Film Solar Cells

  • Lee, Kee Doo;Oh, Lee Seul;Seo, Se-Won;Kim, Dong Hwan;Kim, Jin Young
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2013년도 제44회 동계 정기학술대회 초록집
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    • pp.688-688
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    • 2013
  • Al-doped ZnO (AZO) thin films have attracted a lot of attention as a cheap transparent conducting oxide (TCO) material that can replace the expensive Sn-doped In2O3. In particular, AZO thin films are widely used as a window layer of chalcogenide-based thin film solar cells such as Cu(In,Ga)Se2 and Cu2ZnSnS4 (CZTS). Mostly important requirements for the window layer material of the thin film solar cells are the high transparency and the low sheet resistance, because they influence the light absorption by the activelayer and the electron collection from the active layer, respectively. In this study, we prepared the AZO thin films by RF magnetron sputtering using a ZnO/Al2O3 (98:2wt%) ceramic target, and the effect of the sputtering condition such as the working pressure, RF power, and the working distance on the optical, electrical, and crystallographic properties of the AZO thin films was investigated. The AZO thin films with optimized properties were used as a window layer of CZTS thin film solar cells. The CZTS active layers were prepared by the electrochemical deposition and the subsequent sulfurization process, which is also one of the cost-effective synthetic approaches. In addition, the solar cell properties of the CZTS thin film solar cells, such as the photocurrent density-voltage (J-V) characteristics and the external quantum efficiency (EQE) were investigated.

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폴리이미드 기판 위에 RF 마그네트론 스퍼터링 공정으로 증착된 ZnO:Ga 박막의 특성 (Properties of ZnO:Ga Thin Film Fabricated on Polyimide Substrate by RF Magnetron Sputtering)

  • 박승범;김정연;김병국;임종엽;여인환;안상기;권순용;박재환;임동건
    • 한국전기전자재료학회논문지
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    • 제23권5호
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    • pp.374-378
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    • 2010
  • The effects of $O_2$ plasma pretreatment on the properties of Ga-doped ZnO films on polyimide substrate were studied. GZO films were fabricated by RF magnetron sputtering process. To improve surface energy and adhesion between the polyimide substrate and the GZO film, $O_2$ plasma pretreatment process was used prior to GZO sputtering. As the RF power and the treatment time increased, the crystallinity increased and the contact angle decreased significantly. When the RF power was 100 W and the treatment time was 120 sec, the resistivity of GZO films on the polyimide substrate was $1.90{\times}10^{-3}{\Omega}-cm$.

염료감응형 태양전지의 착색 특성 개선 연구 (A Study on the Improvement of Coloring in Dye-sensitized Solar Cell)

  • 서현웅;김미정;손민규;이경준;홍지태;김희제
    • 한국신재생에너지학회:학술대회논문집
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    • 한국신재생에너지학회 2007년도 추계학술대회 논문집
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    • pp.297-300
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    • 2007
  • In this study, we have attempted a new method to enhance the coloring of dye on the $TiO_2$ surface in the dye sensitized solar cell. In the conventional coloring process in a dye sensitized solar cells, dye is absorbed by the covalent bond between TiO2 and dye molecule while the photo-electrode coated with $TiO_2$ layer is soaked in dye solution for about 12-24 hours. But this process takes long time, so we have researched more effective and faster way than the conventional process by applying electric field. Three kinds of electric power such as direct voltage, alternating voltage and pulse voltage were applied to the transparent conducting oxide during the coloring process. As a result, we achieved improved power, fill factor and efficiency of dye-sensitized solar cell in case of applying direct voltage and pulse voltage. In contrast, alternating voltage tend to reduce the dye adsorption on the $TiO_2$ surface and hence the efficiency. We measured the absorption spectra of dye by UV-VIS spectrophotometer before and after soaking the $TiO_2$ in the dye and found no characteristic change in the dye was observed. In this study, we researched on shortening time of coloring process which spent much time in the whole process.

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Characteristics of IZO/Ag/IZO Multilayer Electrode Grown by Roll-to-roll Sputtering for Touch Screen Panel

  • Cho, Chung-Ki;Bae, Jin-Ho;Kim, Han-Ki
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2011년도 제41회 하계 정기 학술대회 초록집
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    • pp.125-125
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    • 2011
  • In this study, we investigated the electrical, optical, structural, and surface properties of indium zinc oxide (IZO)/Ag/IZO multilayer electrode grown by specially designed roll-to-roll sputtering system using the flexible substrate. By the continuous roll-to-roll sputtering of the bottom IZO, Ag, and top IZO layers at room temperature, they were able to fabricate a high quality IZO/Ag/IZO multilayer electrode. At optimized conditions, the bottom IZO layer (40 nm) was deposited on a flexible substrate. After deposition of the Bottom IZO layer, Ag layer was deposited onto the bottom IZO film as a function of DC power (200~500 W). Subsequently, the top IZO layer was deposited onto the Ag layer at identical deposition conditions to the bottom IZO layer (40 nm). We investigated the characteristics of IZO/Ag/IZO multilayer electrode as a function of Ag thickness. It was found that the electrical and optical properties of IZO/Ag/IZO multilayer electrode was mainly affected thickness of the Ag layer at optimized condition. In case of IZO/Ag/IZO multilayer electrode with the Ag power (350W), it exhibited a low sheet resistance of 7.1 ohm/square and a high transparency of 86.4%. Furthermore, we fabricated the touch screen panel using the IZO/Ag/IZO multilayer electrode, which demonstrate the possibility of the IZO/Ag/IZO multilayer electrode grown by roll-to-roll sputtering system as a transparent conducting layer in the touch screen panel.

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Properties of ZnO:Al Films Prepared by Spin Coating of Aged Precursor Solution

  • Shrestha, Shankar Prasad;Ghimire, Rishi;Nakarmi, Jeevan Jyoti;Kim, Young-Sung;Shrestha, Sabita;Park, Chong-Yun;Boo, Jin-Hyo
    • Bulletin of the Korean Chemical Society
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    • 제31권1호
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    • pp.112-115
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    • 2010
  • Transparent conducting undoped and Al impurity doped ZnO films were deposited on glass substrate by spin coat technique using 24 days aged ZnO precursor solution with solution of ethanol and diethanolamine. The films were characterized by UV-Visible spectroscopy, X-ray diffraction (XRD), scanning electron microscope (SEM), electrical resistivity ($\rho$), carrier concentration (n), and hall mobility ($\mu$) measurements. XRD data show that the deposited film shows polycrystalline nature with hexagonal wurtzite structure with preferential orientation along (002) crystal plane. The SEM images show that surface morphology, porosity and grain sizes are affected by doping concentration. The Al doped samples show high transmittance and better resistivity. With increasing Al concentration only mild change in optical band gap is observed. Optical properties are not affected by aging of parent solution. A lowest resistivity ($8.5 \times 10^{-2}$ ohm cm) is observed at 2 atomic percent (at.%) Al. With further increase in Al concentration, the resistivity started to increase significantly. The decrease resistivity with increasing Al concentration can be attributed to increase in both carrier concentration and hall mobility.

Reduced graphene oxide field-effect transistor for biomolecule detection and study of sensing mechanism

  • Kim, D.J.;Sohn, I.Y.;Kim, D.I.;Yoon, O.J.;Yang, C.W.;Lee, N.E.;Park, J.S.
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2011년도 제40회 동계학술대회 초록집
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    • pp.431-431
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    • 2011
  • Graphene, two dimensional sheet of sp2-hybridized carbon, has attracted an enormous amount of interest due to excellent electrical, chemical and mechanical properties for the application of transparent conducting films, clean energy devices, field-effect transistors, optoelectronic devices and chemical sensors. Especially, graphene is promising candidate to detect the gas molecules and biomolecules due to the large specific surface area and signal-to-noise ratios. Despite of importance to the disease diagnosis, there are a few reports to demonstrate the graphene- and rGO-FET for biological sensors and the sensing mechanism are not fully understood. Here we describe scalable and facile fabrication of rGO-FET with the capability of label-free, ultrasensitive electrical detection of a cancer biomarker, prostate specific antigen/${\alpha}1$-antichymotrypsin (PSA-ACT) complex, in which the ultrathin rGO sensing channel was simply formed by a uniform self-assembly of two-dimensional rGO nanosheets on aminated pattern generated by inkjet printing. Sensing characteristics of rGO-FET immunosensor showed the highly precise, reliable, and linear shift in the Dirac point with the analyte concentration of PSA-ACT complex and extremely low detection limit as low as 1 fg/ml. We further analyzed the charge doping mechanism, which is the change in the charge carrier in the rGO channel varying by the concentration of biomolecules. Amenability of solution-based scalable fabrication and extremely high performance may enable rGO-FET device as a versatile multiplexed diagnostic biosensor for disease biomarkers.

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증착조건과 진공열처리 온도에 따른 ITO/PES 박막의 특성 연구 (Properties of ITO on PES film in dependence on the coating conditions and vacuum annealing temperatures)

  • 이재영;박지혜;김유성;천희곤;유용주;김대일
    • 한국재료학회지
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    • 제17권4호
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    • pp.227-231
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    • 2007
  • Transparent conducting indium tin oxide (ITO) films were deposited onto the Polyethersulfone (PES) substrate by using a magnetron sputter type negative metal ion source. In order to investigate the influence of cesium (Cs) partial pressure during deposition and annealing temperature on the optoelectrical properties of ITO/PES film the films were deposited under different Cs partial pressures and post deposition annealed under different annealing temperature from $100^{\circ}C$ to $170^{\circ}C$ for 20 min at $3\;{\times}\;10^{-1}$ Pa. Optoeleetrical properties of ITO films deposited without intentional substrate heating was influenced strongly by the Cs partial pressure and the Cs partial pressure of $1.5\;{\times}\;10^{-3}$ Pa was characterized as an optimal Cs flow condition. By increasing post-deposition vacuum annealing temperature both optical transmission in visible light region and electrical conductivity of ITO films were increased. Atomic force microscopy (AFM) micrographs showed that the surface roughness also varied with post-deposition vacuum annealing temperature.