Browse > Article
http://dx.doi.org/10.3740/MRSK.2007.17.4.227

Properties of ITO on PES film in dependence on the coating conditions and vacuum annealing temperatures  

Lee, Jae-Young (School of Materials Science and Engineering, Ulsan University)
Park, Ji-Hye (School of Materials Science and Engineering, Ulsan University)
Kim, Yu-Sung (School of Materials Science and Engineering, Ulsan University)
Chun, Hui-Gon (School of Materials Science and Engineering, Ulsan University)
You, Yong-Zoo (School of Materials Science and Engineering, Ulsan University)
Kim, Dae-Il (School of Materials Science and Engineering, Ulsan University)
Publication Information
Korean Journal of Materials Research / v.17, no.4, 2007 , pp. 227-231 More about this Journal
Abstract
Transparent conducting indium tin oxide (ITO) films were deposited onto the Polyethersulfone (PES) substrate by using a magnetron sputter type negative metal ion source. In order to investigate the influence of cesium (Cs) partial pressure during deposition and annealing temperature on the optoelectrical properties of ITO/PES film the films were deposited under different Cs partial pressures and post deposition annealed under different annealing temperature from $100^{\circ}C$ to $170^{\circ}C$ for 20 min at $3\;{\times}\;10^{-1}$ Pa. Optoeleetrical properties of ITO films deposited without intentional substrate heating was influenced strongly by the Cs partial pressure and the Cs partial pressure of $1.5\;{\times}\;10^{-3}$ Pa was characterized as an optimal Cs flow condition. By increasing post-deposition vacuum annealing temperature both optical transmission in visible light region and electrical conductivity of ITO films were increased. Atomic force microscopy (AFM) micrographs showed that the surface roughness also varied with post-deposition vacuum annealing temperature.
Keywords
ITO; Flexible substrate; Magnetron sputtering; Figure of merit;
Citations & Related Records

Times Cited By SCOPUS : 0
연도 인용수 순위
  • Reference
1 A. Dawar and J. Joshi, J. Mater. Sci. 19, 1 (1984)   DOI
2 G. Haacke, J. Appl. Phys., 47, 4086 (1976)   DOI   ScienceOn
3 M. Bender, W. Seelig, C, Daube and J. Stollenwerk, Thin Solid Films, 326, 67 (1998)   DOI   ScienceOn
4 H. Fallah and M.Ghasemi, Mat. Res. Bull. 42, 487 (2007)   DOI   ScienceOn
5 L. Lin, F. Lai, Y. Qu and R. Gai, Mat. Sci. Eng. B. 138, 166 (2007)   DOI   ScienceOn
6 D. Kim, M. Park, H. Lee and G. Lee, Appl. Surf. Sci., 253, 409 (2006)   DOI   ScienceOn
7 N. Paik, Appl. Surf. Sci., 226, 412 (2004)   DOI   ScienceOn
8 D. Kim and S. Kim, J. Vac. Sci. Technol., A20(4), 1314 (2002)   DOI   ScienceOn
9 A. Kulkarni, K. Schulz, T. Lim and M. Khan, Thin Solid Films, 308, 1 (1997)   DOI   ScienceOn
10 D. Kim, Vacuum, 81, 279 (2006)   DOI   ScienceOn
11 D. Morgen, Y. Aliyu and A. Salehi, Thin Solid Films, 312, 268 (1998)   DOI   ScienceOn
12 K. Chopre, S. Major and D. Pandya, Thin Solid Films, 102, 1 (1983)   DOI   ScienceOn
13 G. Sanon, R. Rup and A. Mansingh, Thin Solid Films, 190, 287 (1990)   DOI   ScienceOn
14 I. Hamberg and C. Granqvist, J. Appl. Phys., 60, R123 (1986)   DOI