• 제목/요약/키워드: top-electrode distance

검색결과 9건 처리시간 0.035초

a-Se 기반의 X선 검출기에서의 고전장 간섭 연구 (The High Voltage Research of X-ray Detector Based on Amorphous Selenium)

  • 차병열;강상식;조성호;이규홍;김재형;남상희
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2002년도 하계학술대회 논문집 Vol.3 No.2
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    • pp.853-856
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    • 2002
  • Present. direct method x-ray conversion detector is studied by abroad medical instrument and country with amorphous Selenium. And we search the method for large area x-ray detector. Amorphous-Selenium based photoreceptor is widely used on the X-ray conversion materials. But amorphous-selenium based x-ray conversion detector is broken by high voltage and leakage defect point. In this paper, We investigated top-electrode distance rate to improve defect point and high voltage broken. The result to appoint to made large area x-ray conversion detector with base data.

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링거액 소진 감지를 위한 정전용량방식의 차동센서 설계 및 제작 (Design & implementation of differential sensor using electrostatic capacitance method for detecting Ringer's solution exhaustion)

  • 심요섭;김청월
    • 센서학회지
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    • 제19권5호
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    • pp.391-397
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    • 2010
  • This paper proposes a differential structure sensor for detecting Ringer's solution exhaustion, in which three C-type electrodes of 10 mm width are disposed on a ringer hose at a distance of 5 mm each other in the direction of Ringer's solution flow. In the center of middle electrode, two capacitances are formed at the proposed sensor. When ringer hose is filled with Ringer's solution, there is no difference between two capacitances. But capacitance difference exist under the Ringer's solution shortage, because the shortage causes the hose filled with air from the top position electrode. The capacitance difference got to maximum 1.81 pF, when air was filled between top and middle electrode and the last of hose was filled with 10 % dextrose injection Ringer's solution. The capacitance difference varied with hose-wraparound coverage of electrodes as well as the width of them. For hose-wraparound electrode coverage of 90 % and 70 %, the maximum capacitance difference was 1.81 pF and 1.56 pF, respectively. A differential charge amplifier converted the capacitance difference to electric signal, and minimized electrodes' adhering problem and external noise coupling problem.

Deposition Pressure Dependent Electric Properties of (Hf,Zr)O2 Thin Films Made by RF Sputtering Deposition Method

  • Moon, S.E.;Kim, J.H.;Im, J.P.;Lee, J.;Im, S.Y.;Hong, S.H.;Kang, S.Y.;Yoon, S.M.
    • Journal of the Korean Physical Society
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    • 제73권11호
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    • pp.1712-1715
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    • 2018
  • To study the applications for ferroelectric non-volatile memory and ferroelectric memristor, etc., deposition pressure dependent electric the properties of $(Hf,\;Zr)O_2$ thin films by RF sputtering deposition method were investigated. The bottom electrode was TiN thin film to produce stress effect on the formation of orthorhombic phase and top electrode was Pt thin film by DC sputtering deposition. Deposition pressure was varied along with the same other deposition conditions, for example, sputtering power, target to substrate distance, post-annealing temperature, annealing gas, annealing time, etc. The structural and electric properties of the above thin films were investigated. As a result, it is confirmed that the electric properties of the $(Hf,\;Zr)O_2$ thin films depend on the deposition pressure which affects structural properties of the thin films, such as, structural phase, ratio of the constituents, etc.

TOLED 용 ITO 음전극 제작 특성

  • 김현웅;금민종;서화일;김광선;김경환
    • 한국반도체및디스플레이장비학회:학술대회논문집
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    • 한국반도체및디스플레이장비학회 2005년도 추계 학술대회
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    • pp.106-109
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    • 2005
  • The ITO thin films for Top-Emitting Organic Light Emitting Devices (TOLEDs) were prepared on cell(LiF/Organic Layer/Bottom Electrode : ITO ) by FTS (Facing Targets Sputtering) system under different sputtering conditions which were varying gas pressure, input current and distance of target to target($D_{T-T}$). As a function of sputtering conditions, I-V characteristics of prepared ITO thin films on cell were measured by 4156A (HP). In the results, when the In thin films were deposited at $D_{T-T}$ 70mm and working pressure 1mTorr, the leakage current of ITO/cell was about 11[V] and 5E-6[$mA/cm^2$].

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LCD Backlight용 FFL(Flat Fluorescent Lamp)의 제작 및 특성 연구 (Fabrication and properties of Xe plasma flat fluorescent lamp)

  • 강종현;이양규;허성택;오명훈;이동구
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2007년도 하계학술대회 논문집 Vol.8
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    • pp.431-432
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    • 2007
  • In this study, we used screen printing on the rear glass with silver electrodes, phosphor and a dielectric which is on the silver electrodes, and carried out firing in the temperature of $550^{\circ}C$, $570^{\circ}C$, $450^{\circ}C$ each. To seal the rear and top glass together, we used crystalline frit paste as a sealing material with dispenser and carried out firing up to $450^{\circ}C$. As using this panel, we focused on optimizing the condition which influences characteristics of discharging by the distance between electrodes, electrode structure, type and pressure of gases for FFL.

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Fabrication of Schottky Device Using Lead Sulfide Colloidal Quantum Dot

  • Kim, Jun-Kwan;Song, Jung-Hoon;An, Hye-Jin;Choi, Hye-Kyoung;Jeong, So-Hee
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2012년도 제43회 하계 정기 학술대회 초록집
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    • pp.189-189
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    • 2012
  • Lead sulfide (PbS) nanocrystal quantum dots (NQDs) are promising materials for various optoelectronic devices, especially solar cells, because of their tunability of the optical band-gap controlled by adjusting the diameter of NQDs. PbS is a IV-VI semiconductor enabling infrared-absorption and it can be synthesized using solution process methods. A wide choice of the diameter of PbS NQDs is also a benefit to achieve the quantum confinement regime due to its large Bohr exciton radius (20 nm). To exploit these desirable properties, many research groups have intensively studied to apply for the photovoltaic devices. There are several essential requirements to fabricate the efficient NQDs-based solar cell. First of all, highly confined PbS QDs should be synthesized resulting in a narrow peak with a small full width-half maximum value at the first exciton transition observed in UV-Vis absorbance and photoluminescence spectra. In other words, the size-uniformity of NQDs ought to secure under 5%. Second, PbS NQDs should be assembled carefully in order to enhance the electronic coupling between adjacent NQDs by controlling the inter-QDs distance. Finally, appropriate structure for the photovoltaic device is the key issue to extract the photo-generated carriers from light-absorbing layer in solar cell. In this step, workfunction and Fermi energy difference could be precisely considered for Schottky and hetero junction device, respectively. In this presentation, we introduce the strategy to obtain high performance solar cell fabricated using PbS NQDs below the size of the Bohr radius. The PbS NQDs with various diameters were synthesized using methods established by Hines with a few modifications. PbS NQDs solids were assembled using layer-by-layer spin-coating method. Subsequent ligand-exchange was carried out using 1,2-ethanedithiol (EDT) to reduce inter-NQDs distance. Finally, Schottky junction solar cells were fabricated on ITO-coated glass and 150 nm-thick Al was deposited on the top of PbS NQDs solids as a top electrode using thermal evaporation technique. To evaluate the solar cell performance, current-voltage (I-V) measurement were performed under AM 1.5G solar spectrum at 1 sun intensity. As a result, we could achieve the power conversion efficiency of 3.33% at Schottky junction solar cell. This result indicates that high performance solar cell is successfully fabricated by optimizing the all steps as mentioned above in this work.

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Fluctuation in Plasma Nanofabrication

  • Shiratani, Masaharu
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2016년도 제50회 동계 정기학술대회 초록집
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    • pp.96-96
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    • 2016
  • Nanotechnology mostly employs nano-materials and nano-structures with distinctive properties based on their size, structure, and composition. It is quite difficult to produce nano-materials and nano-structures with identical sizes, structures, and compositions in large quantities, because of spatiotemporal fluctuation of production processes. In other words, fluctuation is the bottleneck in nanotechnology. We propose three strategies to suppress such fluctuations: employing 1) difference between linear and nonlinear phenomena, 2) difference in time constants, and 3) nucleation as a bottleneck phenomenon. We are also developing nano- and micro-scale guided assembly using plasmas as a plasma nanofabrication.1-5) We manipulate nano- and micro-objects using electrostatic, electromagnetic, ion drag, neutral drag, and optical forces. The accuracy of positioning the objects depends on fluctuation of position and energy of an object in plasmas. Here we evaluate such fluctuations and discuss the mechanism behind them. We conducted in-situ evaluation of local plasma potential fluctuation using tracking analysis of fine particles (=objects) in plasmas. Experiments were carried out with a radio frequency low-pressure plasma reactor, where we set two quartz windows at the top and bottom of the reactor. Ar plasmas were generated at 200 Pa by applying 13.56MHz, 450V peak-to-peak voltage. The injected fine particles were monodisperse methyl methacrylate-polymer spheres of $10{\mu}m$ in diameter. Fine particles were injected into the reactor and were suspended around the plasma/sheath boundary near the powered electrode. We observed binary collision of fine particles with a high-speed camera. The frame rate was 1000-10000 fps. Time evolution of their distance from the center of mass was measured by tracking analysis of the two particles. Kinetic energy during the collision was obtained from the result. Potential energy formed between the two particles was deduced by assuming the potential energy plus the kinetic energy is constant. The interaction potential is fluctuated during the collision. Maximum amplitude of the fluctuation is 25eV, and the average is 8eV. The fluctuation can be caused by neutral molecule collisions, ion collisions, and fluctuation of electrostatic force. Among theses possible causes, fluctuation of electrostatic force may be main one, because the fine particle has a large negative charge of -17000e and the corresponding electrostatic force is large compared to other forces.

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Dielectric Properties of Continuous Composition Spreaded $BaTiO_3-SrTiO_3$ Thin Films Prepared by Off-Axis RF Magnetron Sputtering System

  • Kim, Yoon-Hoe;Jung, Keun;Yoon, Seok-Jin;Park, Kyung-Bong;Choi, Ji-Won
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2010년도 하계학술대회 논문집
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    • pp.326-326
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    • 2010
  • The dielectric properties of continuous composition spreaded (CCS) $BaTiO_3-SrTiO_3$ (BST) thin filmsgrown at room temperature and annealed at different temperature ($350^{\circ}C$ and $550^{\circ}C$) were investigated. Moreover, electrical properties (leakage current and breakdown voltage) of CCS BST thin films were also investigated. The aluminum top-electrode, sized by $200{\times}200\;{\mu}m2$ and apart from each other by $300\;{\mu}m$, were deposited on the CCS BST thin films by the DC sputtering system. The dielectric properties of the CCS BST thin films were significantly influenced depending on the distance from $BaTiO_3$ and $SrTiO_3$ targets which was attributed to the $BaTiO_3-SrTiO_3$ composition ratio. The maps of dielectric constants and loss tangents were plotted via $1500\;{\mu}m$ - step measuring. The specific points showing the dielectric constant (k: ~300) and loss tangent (tand: ~0.008) at 1 MHz were found.

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풍력 발전단지내 아두이노를 활용한 스마트 다기능 대지 고유 저항 측정 장치 개발 (Development of Smart Multi-function Ground Resistivity Measuring Device using Arduino in Wind Farm)

  • 김홍용;윤동기;신승중
    • 한국인터넷방송통신학회논문지
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    • 제19권6호
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    • pp.65-71
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    • 2019
  • 기존의 대지저항률과 접지저항 현장 측정 방식은 일정한 간격의 측정전극을 설치하여 전류를 인가하여 대지의 저항값에 따른 전압강하를 측정하게 되는데 현장 대지의 층상 구조가 특이성을 갖게 되면 역산 시 경계 조건의 오차를 발생하게 되고 접지 설계 시 중요한 대지저항률 분석이 시뮬레이션 상과 많은 차이를 보이게 된다. 본 연구는 정보통신 융합환경에서 아두이노 모듈과 스마트 접지 측정 기술를 활용하여 대지의 층상이 특이성을 갖는 구조라도 신뢰할 수 있는 스마트 대지 저항 측정장치를 개발하여 대지저항을 분석하고 데이터를 축적하여 대지의 경년변화를 예측한다. 현장의 지형적인 특성을 고려하여 접지저항과 대지저항 측정 시 각도와 거리를 정확하게 위치시켜 보조전극을 설치할 수 있는 접지저항 측정장치 및 측정방법을 제안한다. 정확한 접지저항 값을 선정할 수 있게 하기 위해 설치된 전극을 통해 접지저항 값뿐만 아니라, 대지저항률을 취득할 수 있어 유사지역에 전기시설물 설치 시에 유용한 자료로 활용할 수 있다. 또한 신뢰성 높은 데이터를 활용하고 현장의 대지구조를 분석하여 공사비용 뿐 아니라 접지설계에서 중요한 비중을 차지하는 대지에 대한 정밀한 분석으로 전위상승 등의 접지설비설계에서 많은 활용이 기대된다.