• Title/Summary/Keyword: tool material

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Analysis of the TPP(Texturization of Plant Protein) Production Process Using Twin Screw Extruder (2축 압출기를 이용한 식물성 단백질의 조직화(TPP)제조공정 분석에 관한 연구)

  • Song, D.B.;Koh, H.K.;Kim, Y.H.
    • Journal of Biosystems Engineering
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    • v.19 no.1
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    • pp.42-49
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    • 1994
  • Texturization of plant protein means the physical or chemical recomposition method of plant protein damaged during the extracting process of soybean oil. As a stable protein supplement, substituted for meat, needs of texturized products have been increased. Twin screw extruder is a very effective tool for texturization process as a physical method. This research, using defatted soy flour as raw material and twin screw extruder manufactured in domestic, showed that plant protein was texturized successfully on the operating conditions of barrel temperature of $120{\sim}140^{\circ}C$, material feed rate of 30~36kg/hr and water content of 20~25%. It also showed that the shape of die affected the texturization continuity.

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Pushover analysis - result borders due to hinge formation orders

  • Kulkarni, Supriya R.;Narayan, K.S. Babu
    • Structural Monitoring and Maintenance
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    • v.5 no.2
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    • pp.173-187
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    • 2018
  • Performance evaluation of RC frame building by nonlinear static pushover analysis that accounts for elastic and post elastic behavior is becoming very popular as a valid decision making tool in seismic hazard resistant designs. Available literature suggests great amount of interest has shown by researchers in suggesting refinements to geometric and material modelling to bridge the gap between analytical predictions and observed performances. Notwithstanding the attempts gaps still exists. Sequence of plastic hinge formation which has great influence on pushover analysis results is an area less investigated. This paper attempts to highlight the importance of hinge sequence considerations to make analysis results more meaningful. Variation in analysis results due to different hinge sequences have been quantified, compared and bounds on analysis results have been presented.

A Study on the Physical Parameters of Amorphous Silicon using a Two-Dimensional Device Simulator(TFT2DS) (이차원 소자 시뮬레이터를 이용한 비정질 실리콘 물성 파라메타에 관한 연구)

  • 곽지훈;최종선
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 1997.04a
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    • pp.168-171
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    • 1997
  • TFT2DS was developed to provide the usefulness as an analytic and design tool. The static characteristics of a-Si:H TFTs demonstrated a good agreement between simulated and measured data. This paper shows that TFT2DS can optimize the physical parameters of a-Si:H through sensitivity simulations and compute the static characteristics of a-Si:H TFTs. Moreover, through the sensitivity study of the parameters, it is shown that the optimizations of both the physical parameters of a-Si:H and the parameters of a-Si:H deposition, which must be inter-related, might be possibl.

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Optimal Design of Spiral Inductors on Silicon Substrates for RF ICs

  • Moon, Yeong-Joo;Choi, Moon-Ho;Na, Kee-Yeol;Kim, Nam-Su;Kim, Yeong-Seuk
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.18 no.3
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    • pp.216-218
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    • 2005
  • Planar spiral inductors on silicon substrates were optimally designed using MATLAB, which is a tool to perform numerical computations with matrices. The equivalent circuit parameters of the spiral inductors were extracted from the data measured from the spiral inductors fabricated using a 0.18 $\mu\textrm{m}$ RF CMOS process. The metal width, which is a critical design parameter, was optimized for the maximum quality factor with respect to the operating frequency.

Analysis of one- and two-dimensional boron distribution in implanted $BF_2$ silicon (실리콘에 $BF_2$로 이온주입후에 Boron 이온의 일차원 및 이차원적인 분포해석)

  • Jung, Won-Chae
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2006.11a
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    • pp.99-100
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    • 2006
  • $BF_2$ molecule 이온주입은 ULSI기술에 있어서 ultra shallow 정합형성을 위해고 P-MOS를 제작하는데 매우 유용한 기술이다. 주입된 boron 이온의 분포를 위해서 $0.05{\mu}m$ 나노스케일의 마스크사이즈의 패턴에 이온 주입한 결과를 일차원적인 분포해석을 위해서 UT-Marlowe tool을 사용하여 gauss 및 pearson 모델의 도핑분포를 나타내었다. 또한 이 데이터를 TSUPREM4에 적용하여 이차원적인 도핑분포와 열처리 후에 boron의 gauss 및 pearson의 모델의 도핑분포를 본 논문에 나타내었다.

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The Determination of electron collision cross sections by electron swarm method (전자군 방법에 의한 충돌단면적 결정)

  • 전병훈;박재준;하성철
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2002.07a
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    • pp.236-239
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    • 2002
  • The electron-atom collision studies has been essentially use\ulcorner for testing and developing suitable theories of the scattering and collision processes, and for providing a tool for obtaining detailed information on the structure of the target atoms and molecules and final collision products. And, the development of that has also been strongly motivated by the need for electron collision data in such fields as laser physic and development, astrophysics, plasma devices, upper atmospheric processes and radiation physics. Therefore, we explains the concept and the principle of determination of the electron collision cross sections for atoms and molecules by using the present electron swarm method.

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Modeling of ZrO$_2$ dielectric characteristics (ZrO$_2$ 유전체의 전기적 특성 모델링)

  • 이봉용;허광수;박민철;유정호;이동원;남서은;명재민;고대홍;윤일구
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2002.07a
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    • pp.410-413
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    • 2002
  • In this paper, the performance of high-k dielectric is modeled by observing electrical characteristics through the process and device simulation. ZrO$_2$ on Si substrate is used as test structures to characterize the current-voltage and the capacitance-voltage profiles. In order to verify the simulation results, the experimental results are used as a reference. Based on the modeling results, the methodology can be a potential tool to predict the characteristics of the ZrO$_2$ dielectric.

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Comparison with Finger Print Method and NN as PD Classification (PD 분류에 있어서 핑거프린트법과 신경망의 비교)

  • Park, Sung-Hee;Park, Jae-Yeol;Lee, Kang-Won;Kang, Seong-Hwa;Lim, Kee-Joe
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2003.07b
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    • pp.1163-1167
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    • 2003
  • As a PD classification method, statistical distribution parameters have been used during several ten years. And this parameters are recently finger print method, NN(Neural Network) and etc. So in this paper we studied finger print method and NN with BP(Back propagation) learning algorithm using the statistical distribution parameter, and compared with two method as classification method. As a result of comparison, classification of NN is more good result than Finger print method in respect to calculation speed, visible effect and simplicity. So, NN has more advantage as a tool for PD classification.

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Analysis of back "mura" in prism light guide plate for high brightness LCD's (고휘도용 프리즘 도광판의 암선연구)

  • Oh, Young-Sik;Yoon, Dae-Keun;Bae, Kyung-Woon;Kim, Youn-Ho;Lim, Young-Jin
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2004.05a
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    • pp.165-168
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    • 2004
  • We have analyzed the cause of black "mura" and measured it in prism light-guide plate (LGP). Properties of components used in a back light. unit (BLU) have changed by Simulation Tool. We get major factor of black "mura" for improvement in prism LGP. For the improvement of black "mura", removal of brightness "mura" at input light part must precede preferentially because of reflection characteristics of the prism LGP. Removal of brightness "mura" is improved by changing of input light part in LGP and dispersion treatment.

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A study of multiple-exposure nanosphere lithography for photonic quasi-crystals fabrication (광자 준결정 제작을 위한 다중 노광 나노구 리소그라피 연구)

  • Yeo, Jong-Bin;Lee, Hyun-Yong
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2010.06a
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    • pp.62-62
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    • 2010
  • Photonic quasi-crystals(PQCs) have been fabricated by a multiple-exposure nanosphere lithography (MENSL) method using the self-assembled nanospheres as lens-mask patterns. The multiple-exposing source is collimated laser beam and rotation, tilting system. The arrays of the PQCs exhibited variable lattice structures and shape the control of ratating angle ($\theta$), tilting angle ($\gamma$) and the exposure conditions. The used nanosphere size is upto the $1\;{\mu}m$. Images of prepared 2D PQCs were observed by SEM. We believe that the MENSL method is a suitable useful tool to realize the PQCs arrays of large area.

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