• Title/Summary/Keyword: thin substrate

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Adhesion Characteristics of Diamond Thin Film on WC-Co Substrate (초경합금상에 합성된 다이아몬드 박막의 부착력 특성)

  • 이상희;박상현;이덕출
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.14 no.7
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    • pp.584-589
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    • 2001
  • Diamond thin films were synthesized on WC-Co substrate by RF PACVD(radio frequency plasma-assisted chemical vapor deposition) technique with H$_2$-CH$_4$-O$_2$ gas mixture. WC-Co substrate was pre-treated in HNO$_3$solution, scratched with 3$\mu\textrm{m}$ diamond paste and exposed in the O$_2$ plasma before deposition. The diamond thin film prepared at 11% oxygen concentration showed the best quality of good adhesion and wear resistance at various oxygen concentration with the fixed 5% CH$_4$ concentration.

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High temperature poly-Si thin film transistors on a molybdenum substrate

  • Kim, Do-Young;Gangopadhyay, Utpal;Park, Joong-Hyun;Ko, Jae-Kyung;Yi, Jun-Sin
    • 한국정보디스플레이학회:학술대회논문집
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    • 2002.08a
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    • pp.523-525
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    • 2002
  • The poly-Si thin film can be used in high mobility active matrix liquid-crystal display (AMLCD) and system on panel (SOP). In this paper, poly-Si thin films were grown by novel high temperature process on the molybdenum (Mo) substrate. By applying a high current above 48A on a Mo substrate. We obtained an improved crystalline Si films with the crystallinity over 80%. We exhibit the properties of structural and electrical properties of high temperature poly-Si thin film transistor on the Mo substrates.

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Field Electron Emission from Amorphous Carbon Thin Film Grown Using Rf Magnetron Sputtering Method (RF 마그네트론 스퍼터링법으로 성장된 Amorphous carbon 각막의 전계전자방출)

  • ;;K. Oura
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.14 no.3
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    • pp.234-240
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    • 2001
  • Using RF magnetron sputtering, amorphous carbon(a-C) thin films as electron filed emitter were fabricated. these a-C thin films were deposited on Si(001) substrate at several temperatures. The field electron emission property of these a-C thin films was estimated by a diode technique. As the result, we observed that the field emission properties of the films were changed singnificantly with the substrate temperature and structural features of a-C film. The field emission properties were promoted by higher substrate temperatures. Furthermore N-doped a-C film exhibits more field emission property than that of undoped a-C film. These results are explained as change of surface morphology and structural properties of a-C film.

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A Study of Oxygen Vacancy on SnO2 Thin Films (SnO2 박막의 산소 빈자리에 관한 연구)

  • Jeong, Jin;Choi, Seung-Pyung
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.18 no.2
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    • pp.109-115
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    • 2005
  • The study of Oxygen Vacancy on SnO$_2$ thin films grown by thermal chemical vapor deposition were investigated with different substrate temperature. X-ray diffraction showed that the crystallinity of the grown thin films increased with increasing substrate temperature. Two narrow peaks and two broad peaks were observed from the photoluminescence measurements at 6 K. The intensity and shape of the broad peaks were changed with increasing substrate temperature. It was concluded that the origin of the broad peak at 2.4 eV was due to oxygen vacancies and that of peak at 3.1 eV was related to structural defects. Hall effect measurements showed that the carrier density was decreased as increasing deposition time from 10 to 30 min., but increased for the deposition of 60 min.

Characteristic of FS-laser ablation of metal thin film with respect to the variation of material and substrate (펨토초 레이저를 이용한 박막 재료 및 기판 변화에 따른 가공 특성에 관한 연구)

  • Kim B.H.;Shin H.G.;Lee J.G.;Jeong S.C.
    • Proceedings of the Korean Society of Precision Engineering Conference
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    • 2006.05a
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    • pp.671-672
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    • 2006
  • We have investigated the behavior of the ultrafast laser ablation of chromium films (200nm) on the silicon and pyrex-glass(corning 7740) substrate with respect to the laser fluence and the number of laser pulses. In addition, several experiments about ITO thin film were carried out with femto-second Ti:Sapphire laser (150fs). Finally, we introduce the ablation characteristic in accordance with materials of thin film and substrate.

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Analysis of the Failure Position in the Unimorph Cantilever for Energy Harvesting (에너지 하베스팅용 압전 캔틸레버의 위치에 따른 파단점 분석)

  • Kim, Hyung-Chan;Jeong, Dae-Yong;Yoon, Seok-Jin;Kim, Hyun-Jai
    • Korean Journal of Materials Research
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    • v.17 no.2
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    • pp.121-123
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    • 2007
  • Energy harvesting from the vibration through the piezoelectric effect has been studied for powering the wireless sensor node. As piezoelectric unimorph cantilever structure can transfer low vibration to large displacement, this structure was commonly deployed to harvest electric energy from vibrations. Piezoelectric unimorph structure was composed of small stiff piezoelectric ceramic on the large flexible substrate. As there is the large Young's modulus difference between the flexible substrate and stiff piezoelectric ceramic, flexible substrate could not homogeneously transfer the vibration to stiff piezoelectric ceramic. As a result, most piezoelectric ceramics had been broken at the certain point. We measured and analyzed the stress distribution on the piezoelectric ceramic on the cantilever.

Fabrication Condition Effects on the Magnetostrictive Properties of Sputtered Tb-Fe Thin Films

  • Na, S.M.;Suh, S.J.;Lim, S.H.
    • Proceedings of the Korean Magnestics Society Conference
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    • 2002.12a
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    • pp.140-141
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    • 2002
  • In proto-type microactuators driven by magnetostrictive Tb-Fe thin films, the deflection was observed to be much smaller than that expected from large-sized "standard" Tb-Fe thin films. A striking difference was observed when the results from a thin substrate of 28 $\mu\textrm{m}$ for microactuator applications were compared with those from a standard substrate. At a standard substrate thickness (several hundred $\mu\textrm{m}$), an amorphous phase was formed and the coercivity was low being 80 Oe. (omitted)

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Comparison of the optical properties of ZnO thin films grown on various substrates by pulsed laser deposition (기판 변화에 따른 ZHO 박막의 광학특성 연구)

  • 배상혁;이상렬
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2000.07a
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    • pp.828-830
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    • 2000
  • Various substrates were compared for the investigation of the optical properties of ZnO thin films. ZnO thin films have been deposited on (100) p-type silicon substrates and (001) sapphire substrates by pulsed laser deposition technique using a Nd:YAG laser with the wavelength of 355 nm. Oxygen and nitrogen gases were used as ambient gases. Substrate temperatures were varied in the range of 200$^{\circ}C$ to 600$^{\circ}C$ at a fixed ambient gas pressure of 350 mTorr. ZnO films have been deposited on various substrates, such as Si and sapphire wafers. We have investigated substrate effect on the optical and structural properties of ZnO thin films using X-ray diffraction (XRD) and photoluminescence (PL).

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Electrical characteristics of ZnO Thin Film according to deposition conditions (증착조건에 따른 ZnO 박막의 전기적 특성)

  • Lee, Dong-Yoon
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2003.05c
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    • pp.131-135
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    • 2003
  • Zinc Oxide(ZnO) thin films on Si (100) substrate were deposited by RF magnetron sputter with changing sputtering conditions such as argon/oxygen gas ratios, RF power, and substrate temperature, chamber pressure and target-substrate distance. To analyze a crystallographic properties of the films, $\theta/2\theta$ mode X-ray diffraction, SEM, and AFM analyses. C-axis preferred orientation, resistivity, and surface roughness highly depended on $Ar/O_2$ gas ratios. The resistivity of ZnO thin films rapidly increased with increasing oxygen ratio and the resistivity value of $9{\times}10^7{\Omega}cm$ was obtained at a working pressure of 10 mTorr with $Ar/O_2$=50/50. The surface roughness was also improved with increasing oxygen ratio and the ZnO films deposited with $Ar/O_2$=50/50 showed the excellent roughness value of $28.7{\AA}$.

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Synthesis of diamond thin film on WC-Co by RF PACVO (고주파 플라즈마 CVD에 의한 초경합금상에 다이아몬드 박막의 합성)

  • 김대일;이상희;박종관;박구범;조기선;박상현;이덕출
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2000.07a
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    • pp.452-455
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    • 2000
  • Diamond thin films were synthesized on WC-Co substrate at various experimental parameters using 13.56MHz RF PACVD(radio frequency plasma-assisted chemical vapor deposition). In order to increase the nucleation density, the WC-Co substrate was polished with 3$\mu\textrm{m}$ diamond paste. And the WC-Co substrate was pretreated in HNO$_3$: H$_2$O = 1:1 and O$_2$ plasma. In H$_2$-CH$_4$gas mixture, the crystallinity of thin film increased with decreasing CH$_4$concentration at 800W discharge power and 20torr reaction pressure. In H$_2$-CH$_4$-O$_2$gas mixture, the crystallinity of thin film increased with increasing O$_2$concentration at 800W discharge power, 20torr reaction pressure and 4% CH$_4$concentration.

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