• Title/Summary/Keyword: thin reflective film

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Solution-Processed Anti Reflective Transparent Conducting Electrode for Cu(In,Ga)Se2 Thin Film Solar Cells (CIGS 박막태양전지를 위한 반사방지특성을 가진 용액공정 투명전극)

  • Park, Sewoong;Park, Taejun;Lee, Sangyeob;Chung, Choong-Heui
    • Korean Journal of Materials Research
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    • v.30 no.3
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    • pp.131-135
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    • 2020
  • Silver nanowire (AgNW) networks have been adopted as a front electrode in Cu(In,Ga)Se2 (CIGS) thin film solar cells due to their low cost and compatibility with the solution process. When an AgNW network is applied to a CIGS thin film solar cell, reflection loss can increase because the CdS layer, with a relatively high refractive index (n ~ 2.5 at 550 nm), is exposed to air. To resolve the issue, we apply solution-processed ZnO nanorods to the AgNW network as an anti-reflective coating. To obtain high performance of the optical and electrical properties of the ZnO nanorod and AgNW network composite, we optimize the process parameters - the spin coating of AgNWs and the concentration of zinc nitrate and hexamethylene tetramine (HMT - to fabricate ZnO nanorods. We verify that 10 mM of zinc nitrate and HMT show the lowest reflectance and 10% cell efficiency increase when applied to CIGS thin film solar cells.

THE EFFECT OF PROCESS CONDITIONS ON THE PHYSICAL PROPERTIES OF SILVER FILMS PREPARED BY USING SPUTTERING ON POLYESTER SUBSTRATE

  • Hoang, Tae-Su;Ri, Eui-Jae
    • Journal of Surface Science and Engineering
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    • v.32 no.3
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    • pp.401-405
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    • 1999
  • Reflective silver films with high quality were prepared on polyester substrate by using sputter deposit on techniques. Best reflectivity thin films of silver were produced with process parameters of $10^{-6}$ Torr as base pressure, 50 W as R.F. power, 5 mTorr as working pressure, and 10 sccm as Ar flow rate. Being deposited with an R.F. power of 50 W, Ag films revealed the highest 96.3 % reflectance as illuminated with a light of 700 nm wavelength. The adhesion of sample films showed as high as 14 to $20{\;}kg/\textrm{cm}^2$, which is suitable for industrial purposes. Their film crystallinity and orientation resulted in the planes of (111) and (200) for the growth with a preferred orientation of <111>, in general. The cross-sections of thin film specimens showed columnar structures. It is noted that columns became coarsened and less dense as R.F. power increased, resulting in a low reflectivity for the product film.

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Ultra Thin Reflective Flexible Liquid Crystal Display

  • Liu, Kang-Hung;Kuo, Chia-Wei;Ku, Chun-Kang;Chang, Chih-Yuan;Liao, Chi-Chang
    • 한국정보디스플레이학회:학술대회논문집
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    • 2008.10a
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    • pp.1080-1082
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    • 2008
  • An ultra-thin reflective flexible LCD film has been demonstrated. The 30% thickness of the display can be reduced by applying a quarter-wave-plate film as upper substrate. A low temperature alignment material and special designed photo spacer were applied in this new display. The bending behavior was improved by reduced thickness.

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Computer Simulation of Multiple Reflection Waves for Thickness Measurement by Ultrasonic Spectroscopy (초음파 Spectroscopy에 의한 두께측정을 위한 다중반사파의 시뮬레이션)

  • Park, I.G.;Han, E.K.;Choi, M.Y.
    • Journal of the Korean Society for Nondestructive Testing
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    • v.12 no.1
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    • pp.9-15
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    • 1992
  • Ultrasonic spectroscopy is likely to become a very powerful NDE method for detection of microfects and thickness measurement of thin film below the limit of ultrasonic distance resolution in the opaque materials, provides a useful information that cannot be obtained by a conventional ultrasonic measuring system. In this paper, we considered a thin film below the limit of ultrasonic distance resolution sandwitched between two substances as acoustical analysis model, demonstrated the usefulness of ultrasonic spectroscopic analysis technique using information of ultrasonic frequency for measurements of thin film thickness, regardless of interference phenomenon and phase reversion of ultrasonic waveform. By using frequency intervals(${\triangle}f$) of periodic minima from the ratio of reference power spectrum of reflective waveform obtained a sample to power spectrum of multiple reflective waves obtained interference phenomenon caused by ultrasonic waves reflected at the upper and lower surfaces of a thin layer, can measured even dimensions of interest are smaller than the ultrasonic wave length with simplicity and accuracy.

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The variation of optical pass length between incident and reflective beam in multilayer thin film (다층박막에서의 입사광과 반사광의 광로정변화)

  • 김문환;최영규
    • Korean Journal of Optics and Photonics
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    • v.13 no.6
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    • pp.515-520
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    • 2002
  • The variation of the optical pass length between incident and reflective beam in a multilayer thin film reflection mirror is investigated. This variation is caused mainly by environmental parameters around the optical system, such as the air pressure, temperature, humidity and $CO_2$concentration. In this paper, a new method for measuring optical pass length variation is proposed. This optical pass length is measured against the above parameters by experiment. From the experimental results, it is clarified that the optical pass length is mostly effected by humidity changes.

Fabrication of An Organic Thin-Film Transistor Array by Wettability Patterning for Liquid Crystal Displays

  • Kim, Sung-Jin;Bae, Jin-Hyuk;Ahn, Taek;Suh, Min-Chul;Chang, Seung-Wook;Mo, Yeon-Gon;Chung, Ho-Kyoon;Lee, Sin-Doo
    • 한국정보디스플레이학회:학술대회논문집
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    • 2007.08a
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    • pp.151-154
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    • 2007
  • We demonstrate a novel selective patterning process of a semiconducting polymer for channel regions to fabricate an array of organic thin-film transistors (OTFTs). This process is applicable for various organic films over large area. A reflective liquid crystal display based on the OTFT array was produced using the selective patterning through a wettability control.

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Deposition of SiO2 Thin Film for the Core of Planar Light-Wave-Guide by Transformer Coupled Plasma Chemical-Vapor-Deposition (TCP-CVD 장비를 활용한 광도파로용 Core-SiO2 증착)

  • Kim, Chang-Jo;Shin, Paik-Kyun
    • Journal of the Korean Vacuum Society
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    • v.19 no.3
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    • pp.230-235
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    • 2010
  • In this paper, we controlled the deposition rate and reflective index with process conditions that are TCP power, gas flow ratio and bias for optical properties of $SiO_2$ thin film using TCP-CVD equipment. We obtained a excellent $SiO_2$ thin film which has a excellent uniformity (<1 [%]), deposition rate (0.28 [${\mu}m$/ min]) and reflective index (1.4610-1.4621) within 4" wafer with process conditions ($SiH_4:O_2$=50 : 100 [sccm], TCP power 1 [kW], bias 200 [W]) at [$300^{\circ}C$].

Anti-Reflective Coating with Hydrophilic/Abraion-Resistant Properties using TiO2/SiOxCy Double-Layer Thin Film (TiO2/SiOxCy 이중 박막을 이용한 투명 친수성/내마모성 반사방지 코팅)

  • Lee, Sung-jun;Lee, Min-kyo;Park, Young-chun
    • Journal of Surface Science and Engineering
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    • v.50 no.5
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    • pp.345-351
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    • 2017
  • A double-layered anti-reflective coating with hydrophilic/abrasion-resistant properties was studied using anatase titanium dioxide($TiO_2$) and silicon oxycarbide($SiO_xC_y$) thin film. $TiO_2$ and $SiO_xC_y$ thin films were sequentially deposited on a glass substrate by DC sputtering and PECVD, respectively. The optical properties were measured by UV-Vis-NIR spectrophotometer. The abrasion-resistance and the hydrophilicity were observed by a taber abrasion tester and a contact angle analyzer, respectively. The $TiO_2/SiO_xC_y$ double-layer thin film had an average transmittance of 91.3%, which was improved by 10% in the visible light region (400 to 800 nm) than that of the $TiO_2$ single-layer thin film. The contact angle of $TiO_2/SiO_xC_y$ film was $6.9^{\circ}$ right after UV exposure. After 9 days from the exposure, the contact angle was $10.2^{\circ}$, which was $33^{\circ}$ lower than that of the $TiO_2$ single-layer film. By the abrasion test, $SiO_xC_y$ film showed a superior abrasion-resistance to the $TiO_2$ film. Consequently, the $TiO_2/SiO_xC_y$ double-layer film has achieved superior anti-reflection, hydrophilicity, and abrasion resistance over the $TiO_2$ or $SiO_xC_y$ single-layer film.

Anti-Reflective coating for External Efficiency of Organic Light Emitting Diode

  • Kim, Byoung-Yong;Han, Jin-Woo;Kim, Jong-Yeon;Han, Jeong-Min;Moon, Hyun-Chan;Park, Kwang-Bum;Seo, Oae-Shik
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2007.06a
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    • pp.449-449
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    • 2007
  • OLED has many advantages of low voltage operation, self radiation, light weight, thin thickness, wide view angle and fast response time to overcome existing liquid crystal display (LCD)'s weakness. Therefore, It draws attention as promising display and has already developed for manufactured goods. Also, OLED is regarded as a only substitute of flexible display with a thin display. A considerable portion of the light originating film emissive centers buried in a solid film never escapes due to internal reflection at the air-film interface and is scattered as edge emission or dissipated within the solid film This is one of the major reasons why the luminous power efficiency of OLED remains low, in spite of research progress in OLED. Although several ways of overcoming this difficulty have been reported, no comprehensive method has been proposed yet. In this paper, we propose that use of anti-reflective coating layers.

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Preparation and Characterization of Alumina Thin Film by Sol-Gel Method (III) Preparation of Anti-Reflective Coating Glass (졸겔법에 의한 알루미나 박막의 제조 및 특성 (III) 저반사 코팅유리의 제조)

  • 이재호;최세영
    • Journal of the Korean Ceramic Society
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    • v.32 no.1
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    • pp.57-62
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    • 1995
  • The coating condition of reproducible anti-reflective coating film and the light transmittance characteristics of the prepared anti-reflective coating glass were investigated as a study for the preparation of single-layer anti-reflective coating glasss. In case of coating with the sol in which the solvent was substituted with the ethanol with the addition of 0.1 mol HNO3, the coated glass showed the minimum value of the refractive index of 1.464, light transmittance of 94.2% at 550nm standard wavelength which is 3.2% higher than that of the parent glass, and the reflectance in the entire wave range of visible light. The refractive index represented its minimum at the sol concentration of 1.0 mol per 100mols of water and the higher the sol concentration, the higher the refractive index, resulting in the decrease of the light transmitance. The production condition of the reproducible anti-reflective coating on glass with the maximum transmittance of 94.2% was 4cm/min of withdrawal speed, 40$0^{\circ}C$ and 1 hour of heat treatment temperature and time, resulting in the film thickness of 94nm.

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