• 제목/요약/키워드: thermal oxidation

검색결과 1,006건 처리시간 0.028초

비정질 및 단결정 실리콘에서 10~50 keV 에너지로 주입된 안티몬 이온의 분포와 열적인 거동에 따른 연구 (A Study on Implanted and Annealed Antimony Profiles in Amorphous and Single Crystalline Silicon Using 10~50 keV Energy Bombardment)

  • 정원채
    • 한국전기전자재료학회논문지
    • /
    • 제28권11호
    • /
    • pp.683-689
    • /
    • 2015
  • For the formation of $N^+$ doping, the antimony ions are mainly used for the fabrication of a BJT (bipolar junction transistor), CMOS (complementary metal oxide semiconductor), FET (field effect transistor) and BiCMOS (bipolar and complementary metal oxide semiconductor) process integration. Antimony is a heavy element and has relatively a low diffusion coefficient in silicon. Therefore, antimony is preferred as a candidate of ultra shallow junction for n type doping instead of arsenic implantation. Three-dimensional (3D) profiles of antimony are also compared one another from different tilt angles and incident energies under same dimensional conditions. The diffusion effect of antimony showed ORD (oxygen retarded diffusion) after thermal oxidation process. The interfacial effect of a $SiO_2/Si$ is influenced antimony diffusion and showed segregation effects during the oxidation process. The surface sputtering effect of antimony must be considered due to its heavy mass in the case of low energy and high dose conditions. The range of antimony implanted in amorphous and crystalline silicon are compared each other and its data and profiles also showed and explained after thermal annealing under inert $N_2$ gas and dry oxidation.

연구로 해체시 발생되는 흑연폐기물의 열적 거동 (Thermal Behavior of the Nuclear Graphite Waste Generated from the Decommissioning of the Nuclear Research Reactor)

  • 양희철;은희철;이동규;조용준;강영애;이근우;오원진
    • 한국방사성폐기물학회:학술대회논문집
    • /
    • 한국방사성폐기물학회 2004년도 학술논문집
    • /
    • pp.105-114
    • /
    • 2004
  • This study investigated the thermal behavior of the nuclear graphite waste generated from the decommissioning of the Korean nuclear research reactor, The first part study investigated the decomposition rate of the nuclear graphite waste up to $1000^{\circ}C$ under various oxygen partial pressures using a thermo-gravimetric analyzer (TGA). Tested graphite waste sample not easily destroyed in the oxygen-deficient condition. However, the gas-solid oxidation reaction was found to be very effective in the presence of oxygen. No significant amount of the product of incomplete combustion was formed even in the limited oxygen concentration of 4% $O_2$. The influence of temperature and oxygen partial pressure was evaluated by the theoretical model analysis of the thermo-gravimetric data. The activation energy and the reaction order of graphite oxidation were evaluated as 128 kJ/mole and 1.1, respectively. The second part of this study investigated the behavior of radioactive elements under graphite oxidation atmosphere using thermodynamic equilibrium model. $^{22}Na$, $^{134}Cs$ and $^{137}Cs$ were found be the semi-volatile elements. Since volatile uranium species can be formulated at high temperatures above $1050^{\circ}C$, the temperature of incinerator furnace should be minimized. Other corrosion/activation products, fission products and uranium were found to be the non-volatile species.

  • PDF

SiC CMOS 게이트 산화막에 관한 연구 (Study of The SiC CMOS Gate Oxide)

  • 최재승;이원선;신동현;김영석;이형규;박근형
    • 대한전자공학회:학술대회논문집
    • /
    • 대한전자공학회 2001년도 하계종합학술대회 논문집(2)
    • /
    • pp.29-32
    • /
    • 2001
  • In this paper, the thermal oxidation behaviors and the electrical characteristics of the thermal oxide grown on SiC are discussed. For these studies the oxide layers with various thickness were on SiC in wet $O_2$ or dry $O_2$ at l15$0^{\circ}C$ and the MOS capacitors using the 350$\AA$ gate oxide grown in wet $O_2$ were fabricated and electrically characterized. It was found from the experimental results that the oxidation rate of SiC with the Si-face and with the carbon-face were about 10% and 50% of oxidation rate of Si. The C-V measurement results of the SiC oxide showed abnormal hysterisis properties which had ever been not observed for the Si oxide. And the hysterisis behavior was seen more significant when initial bias voltage was more negative or more positive. The hysterisis property of the SiC oxide was believed to be due the substantial amount of the deep level traps to exist at the interface between the oxide and the SiC substrate. The leakage of the SiC oxide was found to be one order larger than the Si oxide, but the breakdown strength was almost equal to that of the Si oxide.

  • PDF

폴리카보실란을 이용하여 탄소단열재에 코팅한 실리콘카바이드 코팅막의 내산화 특성 (Preperation of Silicon Carbide Oxidation Protection Film on Carbon Thermal Insulator Using Polycarbosilane and Its Characterization)

  • 안수빈;이윤주;방정원;신동근;권우택
    • 한국재료학회지
    • /
    • 제27권9호
    • /
    • pp.471-476
    • /
    • 2017
  • In order to improve the high temperature oxidation resistance and lifespan of mat type porous carbon insulation, SiC was coated on carbon insulation by solution coating using polycarbosilane solution, curing in an oxidizing atmosphere at $200^{\circ}C$, and pyrolysis at temperatures up to $1200^{\circ}C$. The SiOC phase formed during the pyrolysis process was converted into SiC crystals as the heat treatment temperature increased, and a SiC coating with a thickness of 10-15 nm was formed at $1600^{\circ}C$. The SiC coated specimen showed a weight reduction of 8.6 % when it was kept in an atmospheric environment of $700^{\circ}C$ for 1 hour. On the other hand, the thermal conductivity was 0.17 W/mK, and no difference between states before and after coating was observed at all.

SiC가 코팅된 그라파이트 Foam의 제조 및 특성 분석 (Preparation and Characterization of SiC Coated Graphite Foam)

  • 경재진;김정주;김수룡;권우택;조광연;김영희
    • 한국세라믹학회지
    • /
    • 제44권11호
    • /
    • pp.622-626
    • /
    • 2007
  • Graphite is widely used in electronic industry due to its excellent electrical and thermal properties. However, graphite starts to oxidize around $400^{\circ}C$ that seriously degrades its properties. SiC coating can be applied to graphite foam to improve its high temperature oxidation resistance. In this research, SiC coating on graphite foam was made via preceramic polymer using a polyphenylcarbosilane. 20% of polyphenylcarbosilane in hexane solution was coated onto graphite by dip coating method. Thermal oxidation was carried out at $200^{\circ}C$ for crosslink of the preceramic polymer and the sample were pyrolysized at $800^{\circ}C{\sim}1200^{\circ}C$ under nitrogen to convert the preceramic polymer to SiC film. The microstructure of the SiC coating after pyrolysis was investigated using FESEM and oxidation resistance up to $800^{\circ}C$ was evaluated.

LPPS용사법과 HVOF 용사법으로 제조된 CoNiCrAlY 코팅의 고온물성에 관한 연구 (A study on the high temperature properties of CoNiCrAlY coating fabricated by HVOF and LPPS process)

  • 강현욱;권현옥;송요승
    • 한국표면공학회지
    • /
    • 제34권2호
    • /
    • pp.161-168
    • /
    • 2001
  • A Thermal Barrier Coating (TBC) can play an important role in protecting parts from harmful environments at high temperatures such as oxidation, corrosion, and wear in order to improve the efficiency of aircraft engines by lowering the surface temperature of the turbine blade. The TBC can increase the life span of the product and improve the operating properties. Therefore, in this study the mechanical and thermal properties of the TBC such as oxidation, fatigue and shock at high temperatures were evaluated. A samples of a bond coat (CoNiCrAlY) produced by the High Velocity Oxygen Fuel (HVOF) and Low Pressure Plasma Spray (LPPS) method were used. The thickness of the HVOF coating layer was approximately $450\mu\textrm{m}$ to 500$\mu\textrm{m}$ and the hardness number of the coating layer was between 350Hv and 400Hv. The thickness of the LPPS coating was about 350$\mu\textrm{m}$ to 400$\mu\textrm{m}$ and the hardness number of the coating was about 370Hv to 420Hv. The X-ray diffraction analysis showed that CoNiCrAlY coating layer of the HVOF and LPPS was composed of the $\beta$and ${\gamma}$phase. After the high temperature oxidation test, the oxide scale with about l0$\mu\textrm{m}$ to 20$\mu\textrm{m}$ thickness appeared at the coating surface on the Al-depleted zone was observed under the oxide scale layer.

  • PDF

합금원소 첨가가 TiAI계의 내산화성에 미치는 영향 (Effects of 3rd Element Additions on the Oxidation Resistance of TiAi Intermetallics)

  • 김봉구;황성식;양명승;김길무;김종집
    • 한국재료학회지
    • /
    • 제4권6호
    • /
    • pp.669-680
    • /
    • 1994
  • 합금원소(Cr, V, Si. Mo, Nb)가 첨가된 TiAi 금속간화합물의 고온 산화거동을 대기중의 900~$1100^{\circ}C$에서 관찰하였다. 산화반응물은 XRD, SEM, WDX을 이용하여 분석하였다. 등온 산화에 있어서 Cr과 V이 각각 첨가된 시편은 무게증가가 많았으나, Si, Mo, Vb가 각각 첨가된 시편은 상대적으로 무게증가각 적었아. 그리고, Cr과 V이 각각 첨가된 시편의 산화속도는 TiAi의 그것보다 항상 크게 나타났으며, Si, Mo, Vb가 각각 첨가된 시편의 산화속도는 TiAi의 그것보다 향상되지 않고, Si, Mo또는 Nb 첨가는 내산화성을 향상시킨다. Si, Mo, Nb이 각각 첨가된 TiAI합금표면에 형성된 산화물은 보호막 역할을 함으로 산소와 합금원소의 확산을 감소시키는 역할을 하였다. 특히, Nb는 산화의 초기단계에서는 $AI_{2}O_{3}$를 형성하려는 경향이 강하기 때문에 연속적인 $AI_{2}O_{3}$층과 조밀한 $Tio_{2}+AI_{2}O_{3}$ 혼합층이 형성되었다. Nb가 첨가된 합금의 백금 marker 실험결과에 따르면, 산소가 주로 합금내부로 확산하여 합금표면에서 산화물을 형성하였다. $900^{\circ}C$에서의 열반복주기(thermal cyclic)산화실험 결과, 다른 합금원소와 비교해 볼 때 Cr또는 Nb첨가가 금속기지와 산화층간의 접착력을 향상시키는 것으로 나타났다.

  • PDF

Ni 기지 초내열합금의 고온산화 저항성에 미치는 Ti의 영향 (Effects of Ti on High Temperature Oxidation of Ni-Based Superalloys)

  • 박시준;서성문;유영수;정희원;장희진
    • Corrosion Science and Technology
    • /
    • 제15권3호
    • /
    • pp.129-134
    • /
    • 2016
  • The effects of Ti on the high temperature oxidation of Ni-based superalloys were investigated by cyclic oxidation at $850^{\circ}C$ and $1000^{\circ}C$. The oxide scale formed at $850^{\circ}C$ consists of $Cr_2O_3$, $Al_2O_3$, and $NiCr_2O_4$ layers, while a continuous $Al_2O_3$ layer was formed at $1000^{\circ}C$. The oxidation rate of the alloy with higher Ti content was higher than the alloy with less Ti content at $850^{\circ}C$, possibly due to the increase in the metal vacancy concentration in the $Cr_2O_3$ layer involved by incorporation of $Ti^{4+}$. However, Ti improved the oxidation resistance of the superalloy at $1000^{\circ}C$ by reducing oxygen vacancy concentration in $Al_2O_3$ layer.

고온가압으로 소결한 고순도 이트리아 세라믹 소결체의 산화반응 특성 (Characteristics of Thermal Oxidation on Hot-Pressed Pure Yttria Ceramics)

  • 최진삼;신동우;배원태
    • 한국세라믹학회지
    • /
    • 제50권3호
    • /
    • pp.180-185
    • /
    • 2013
  • We investigated the characteristics of hot-pressed pure yttria ceramics, and annealed them in an oxidation atmosphere. Regardless of the heat treatment in the oxidation atmosphere, XRD analysis showed that all the samples had a $Y_2O_3$ phase without structural change. Even though the color variation of the hot-pressed $Y_2O_3$ ceramics was due to the sintering temperatures, the oxidation process turned the color of the $Y_2O_3$ ceramics into white. The color change during oxidation treatment appears to be related to oxygen defects. In addition, oxygen defects also affected the weight change and microstructure of the $Y_2O_3$ ceramics. The $Y_2O_3$ ceramic sintered at $1600^{\circ}C$ had a $5.03g/cm^3$ density, which is close to the theoretical density of $Y_2O_3$. As the sintering temperature increased, small homogeneous grains grew to large grains which affected the Vickers hardness. $Y_2O_3$ ceramics hot-pressed at $1600^{\circ}C$ and annealed at $1200^{\circ}C$ had a flexural strength of 140MPa.

열산화 방법으로 제작한 $WO_3$박막의 안정성 연구 (The stability of $WO_3$ thin film prepared by thermal oxidation method)

  • 조형호;임원택;안일신;이창효
    • 한국진공학회지
    • /
    • 제8권2호
    • /
    • pp.136-140
    • /
    • 1999
  • The stability and response time of $WO_3$ thin films for EC device are critical problems being solved. Those are affected by the species of electrolyte, preparation conditions and fabricating methods of specimen. In this paper, we compared the stabilities of three kinds of tungsten oxide film in electrolyte. Each of three films was prepared by different manufacturing conditions, that is, one is a thermal oxidation film of tungsten metal deposited on pure glass substrate, another is a $WO_3$ film made on ITO glass directly, the other is a thermally oxidized film on tungsten plate. It was observed that thermally oxidized $WO_3$ films has a remarkable stability (the lifetime was above $10^6$ cycle). From these results, we found that the stability was closely related to the stoichiometric bonding between tungsten and oxygen atoms in addition to crystallinity and density of film.

  • PDF