• 제목/요약/키워드: thermal evaporation

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Effect of oxygen working pressure on morphology and luminescence properties of SnO2 micro/nanocrystals formed by thermal evaporation method

  • Kim, Min-Sung
    • Journal of Ceramic Processing Research
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    • v.19 no.5
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    • pp.424-427
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    • 2018
  • The effect of oxygen pressure in the synthesis of $SnO_2$ micro/nanocrystals through thermal evaporation of Sn powder was investigated. The thermal evaporation process was performed at $1000^{\circ}C$ for 1 hr under various oxygen pressures. The pressure of oxygen changed from 10 to 500 Torr. The morphology of $SnO_2$ crystals changed drastically with oxygen pressure. $SnO_2$ nanoparticles with an average diameter of 120 nm were formed at oxygen pressure lower than 10 Torr. $SnO_2$ nanowires were grown under an oxygen pressure of 100 Torr. The nanowires have diameters in the range of 100 ~ 500 nm and lengths of several tens of micrometers. As increasing the oxygen pressure to 500 Torr, the sizes of wires increased. A strong visible emission peak centered at about 500 ~ 600 nm was observed in the room temperature cathodoluminescence spectra of all the products.

A Study on the Thermal Pump of the Hot Water Boiler (온수 보일러용 열구동 펌프에 관한 연구)

  • Yeom, Han-Gil;Kim, Uk-Joong;Kim, Chang-Ju
    • 연구논문집
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    • s.30
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    • pp.15-23
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    • 2000
  • In this study, develop the thermal pump using water evaporation and condensation. Vapor from heating room moves up to pumping room and press the water of pumping room. Consequently water is pumped out to water tank. Then hot vapor direct contact with cold water in condensing room after pumping process. At this time, pressure of condensing room is down to-5kPa and suck in water of tank. This pump executes self ping and good durability because of no mechanical moving parts. Thermal pump is pumped cyclic so that, this pump is not used single. Therefore thermal pump of hot water boiler used to multi-stage for stable pumping rate. As the result of performance test, the developed thermal pump proves pumping action of water evaporation/condensation. And total volume flow rate is 500liter during one hour. If three thermal pump is installed parallel, this pump can use to the hot water boiler in the 300,000kcal/h class.

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Homeotropic Alignment Effect of a Nematic Liquid Crystal on Oblique Deposited SiOx Thin-film with e-beam Evaporation

  • Choi, Dai-Seub
    • Transactions on Electrical and Electronic Materials
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    • v.8 no.6
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    • pp.274-277
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    • 2007
  • In this study, liquid crystal(LC) aligning capabilities for homeotropic alignment on the $SiO_x$ thin film by electron beam evaporation method were investigated. Also, the control of pretilt angles and thermal stabilities of the nematic liquid crystal(NLC) treated on $SiO_x$ thin film were investigated. A high pretilt angle of about $86.5^{\circ}$ was obtained, and also the suitable pretilt angle of the NLC on the $SiO_x$ thin film at $10{\sim}50nm$ thickness with e-beam evaporation can be achieved. The uniform LC alignment and good thermal stabilities on the $SiO_x$ thin film surfaces with electron beam evaporation can be achieved. It is considered that the LC alignment on the $SiO_x$ thin film by electron beam evaporation is attributed to elastic interaction between LC molecules and micro-grooves at the $SiO_x$ thin film surface created by evaporation.

Liquid Crystal Aligning Capabilities for Nematic Liquid Crystal on the ZrOx Thin Film Layer with E-beam Evaporation

  • Kim, Mi-Jung;Han, Jin-Woo;Kim, Young-Hwan;Kim, Byoung-Yong;Han, Jeong-Min;Moon, Hyun-Chan;Park, Kwang-Bum;Seo, Dae-Shik
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2007.06a
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    • pp.378-378
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    • 2007
  • In this study, liquid crystal (LC) aligning capabilities for homeotropic alignment on the $ZrO_x$ thin film by electron beam evaporation method were investigated. Also, the control of pretilt angles and thermal stabilities of the NLC treated on $ZrO_x$ thin film were investigated. The uniform LC alignment on the $ZrO_x$ thin film surfaces and good thermal stabilities with electron beam evaporation can be achieved. It is considerated that the LC alignment on the $ZrO_x$ thin film by electron beam evaporation is attributed to elastic interaction between LC molecules and micro-grooves at the $ZrO_x$ thin film surface created by evaporation. In addition, it can be achieved the good electro-optical (EO) properties of the VA-LCD on $ZrO_x$ thin film layer with. oblique electron beam evaporation.

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Perovskite Solar Cells through Application of Hole Transporting Layers based on Vacuum Thermal Evaporation (진공 열 증착 기반의 정공수송층 적용을 통한 페로브스카이트 태양전지)

  • Kim, Hye Seung;Song, Myoung Hoon
    • Current Photovoltaic Research
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    • v.10 no.1
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    • pp.23-27
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    • 2022
  • In this study, we investigate organic-inorganic halide perovskite solar cells with a vacuum thermal evaporated hole transporting layer (NPB/MoO3-x). By replacing solution process based Spiro-MeOTAD with vacuum thermal evaporation based NPB/MoO3-x, a thin hole transporting layer was implemented. In addition, parasitic absorption that may occur during the doping process was eliminated by excluding solution process doping. In a solar cell with a thin vacuum thermal evaporated hole transporting layer, the short-circuit current density (Jsc) increased to 23.93 mA/cm2, resulting in the highest power converstion efficiency (PCE) at 18.76%. Considering these results, it is essential to control the thickness of hole transporting layer located at the top in solar cell configuration.

Film Properties of TiO2 Made by Activated Reactive Evaporation (활성화 반응으로 제작된 TiO2의 박막특성)

  • Park, Yong-Gwon;Choi, Jae-Ha
    • Journal of the Korean Society for Heat Treatment
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    • v.14 no.3
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    • pp.151-154
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    • 2001
  • $TiO_2$ thin film has wide application because of its high capacitanca, reflection, and good transmissivity in visible range. $TiO_2$ thin film can be made by thermal deposition method, reactive evaporation method, activated reactive evaporation(ARE) method. In the case of thermal deposition, the oxygen deficiency can occur because the melting point of Ti is very high. While in the case of reactive evaporation, high density $TiO_2$ can not be made, because reactive gas($O_2$) and evaporated material(Ti) are not fully combined, activated reactive evaporation, $TiO_2$ is easily deposited at lower gas pressure compared with reactive evaporation because the ionized reactive gas is made by plasma. Therefore, activated reactive evaporation is very useful to deposit the material having the high melting point. In this work, we formed $TiO_2$ thin film by activated reactive evaporation method. The surface of $TiO_2$ thin film was analyzed by X-ray photoelectron spectroscopy. The surface morphology which was analyzed by atomic force microscopy(AFM) shows that feature of the film surface is uniform. The dielectric capacitance, withstanding voltage were $600{\mu}F/cm^2$, 0.4V respectively. In further work, we can increase the withstanding voltage by improving the deposition parameter of substrates.

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Analysis of Heat Transfer Performance of Oxi-nitriding Surface during Droplet Evaporation (산질화 표면에서의 액적 증발 열전달 성능 분석)

  • Kim, Dae Yun;Lee, Seong Hyuk
    • Journal of ILASS-Korea
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    • v.24 no.4
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    • pp.203-208
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    • 2019
  • In general, the oxi-nitriding method is well known as such a surface treatment way for substantial enhancement in corrosion resistance, even comparable to that of titanium. However, there are still lacks of information on thermal performance of the oxi-nitriding surface being of additional compound layers on the base substrate. Above all, the quantitative measurement of its thermal performance still was not evaluated yet. Thus, the present study experimentally measures the thermal resistance of the oxi-nitriding surface during droplet evaporation and then estimates heat transfer performance with the use of the onedimensional heat transfer model in vertical direction. From the experimental results, it is found that the total evaporation time slightly increased with the thermal resistance caused by the oxi-nitriding layer, showing a maximum difference of approximately 20% with that of the bare surface. Although the heat transfer performance of oxi-nitriding surface became slightly lower than that of the bare surface, the oxi-nitriding surface exhibits much better heat transfer performance compared to titanium.

The development of the highly efficient Circular Nozzle Source by using a study on the flux distributions of nozzle type thermal evaporation sources

  • Kim, Sung-Moon;Jeong, Kwang-Ho
    • 한국정보디스플레이학회:학술대회논문집
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    • 2008.10a
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    • pp.1171-1174
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    • 2008
  • We studied the properties of vapor flux distributions of nozzle shaped thermal evaporation sources and the factors, which can change the flux distributions such as nozzle structure. We used a simulation and experiment methods for this study. By using the results of our study, we improved the Circular Nozzle Source, which can make uniform thin films without substrate rotation, into more efficient source.

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A Study on the thermal Kinetics for Disposal of Sewage Sludge Using Thermal Wind Drying of One mechanical Power (ONE구동 열풍건조시스템을 이용한 하수슬러지 감량화를 위한 열적거동 연구)

  • Bae, Hae-Ryong;Ha, Sang-An
    • Journal of the Korea Organic Resources Recycling Association
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    • v.13 no.2
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    • pp.74-84
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    • 2005
  • The objectives of this study was to investigate the improvement of thermal kinetics for disposal of sewage sludge using thermal wind drying. The operational parameters varied are the temperature of $130{\sim}170^{\circ}C$ and evaporation velocity WD. Important parameters effect on thermal kinetics for evaporation of water in sewage sludge studied include the drying time, water content of sewage sludge, solids amount of sewage sludge(TS%) by the varied temperature. The saturation point of water evaporation was observed at the drying time of 60 min in conditions of drying temperature $170^{\circ}C$ and drying time of 120 min by drying temperature $130^{\circ}C$ and WD=0.95 m/s. Operation at drying temperature of $170^{\circ}C$ led to higher rate of evaporation than those 130, $150^{\circ}C$ at WD=1.0 m/s and WD=1.0 m/s was higher than WD=0.5 m/s at drying temperature of $130^{\circ}C$.

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